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1. 发明申请

WO2010005541A2 CLAMPED SHOWERHEAD ELECTRODE ASSEMBLY 审中-公开
标题翻译：夹式淋浴头电极组件
公开(公告)号：WO2010005541A2
公开(公告)日：2010-01-14
申请号：PCT/US2009/003953
申请日：2009-07-06
申请人： LAM RESEARCH CORPORATION , KADKHODAYAN, Babak , DHINDSA, Rajinder , DE LA LLERA, Anthony , KELLOGG, Michael, C.
发明人： KADKHODAYAN, Babak , DHINDSA, Rajinder , DE LA LLERA, Anthony , KELLOGG, Michael, C.
IPC分类号： H05H1/34 , H05H1/38 , H01L21/3065
CPC分类号： H01J37/32532 , H01J37/32091 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01J37/32568 , H01J37/32605
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which includes an inner electrode mechanically attached to a backing plate by a clamp ring and an outer electrode attached to the backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release cam pins extending upward from the upper face of the outer electrode. To compensate for differential thermal expansion, the clamp ring can include expansion joins at spaced locations which allow the clamp ring to absorb thermal stresses.
摘要翻译：用于半导体衬底处理中的等离子体反应室的电极组件。该组件包括上部喷头电极，该上部喷头电极包括通过夹环机械连接到背板的内电极以及通过一系列间隔开的凸轮锁附接到背板的外电极。保护环包围背板并可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以利用工具旋转以释放从外部的上表面向上延伸的凸轮销电极。为了补偿不同的热膨胀，夹环可以包括在间隔位置处的膨胀连接，这允许夹环吸收热应力。

2. 发明申请

WO2012030382A2 SHOWERHEAD ELECTRODE 审中-公开
标题翻译：淋浴电极
公开(公告)号：WO2012030382A2
公开(公告)日：2012-03-08
申请号：PCT/US2011/001500
申请日：2011-08-25
申请人： LAM RESEARCH CORPORATION , DE LA LLERA, Anthony , MANKIDY, Pratik , KELLOGG, Michael C. , DHINDSA, Rajinder
发明人： DE LA LLERA, Anthony , MANKIDY, Pratik , KELLOGG, Michael C. , DHINDSA, Rajinder
IPC分类号： H01L21/3065 , H01L21/205 , H05H1/46
CPC分类号： H01R13/20
摘要： Abstract A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.
摘要翻译：摘要提供了一种用于蚀刻半导体衬底的等离子体反应室中的喷头电极，垫圈组件及其组件，其具有改进的气体注入孔图案，定位精度和减小的翘曲，这导致等离子体处理速率的均匀性提高。将内部电极和垫圈组装在支撑构件上的方法包括凸轮锁的同时接合。

3. 发明申请

WO2008076408A1 SHOWERHEAD ELECTRODE ASSEMBLY WITH GAS FLOW MODIFICATION FOR EXTENDED ELECTRODE LIFE 审中-公开
标题翻译：用于延长电极寿命的喷淋电极组件
公开(公告)号：WO2008076408A1
公开(公告)日：2008-06-26
申请号：PCT/US2007/025730
申请日：2007-12-17
申请人： LAM RESEARCH CORPORATION , AUGUSTINO, Jason , DE LA LLERA, Anthony , RONNE, Allan K. , KIM, Jaehyun , DHINDSA, Rajinder , WANG, Yen-Kun , ULLAL, Saurabh J. , NORELL, Anthony J. , COMENDANT, Keith , DENTY, William M., Jr.
发明人： AUGUSTINO, Jason , DE LA LLERA, Anthony , RONNE, Allan K. , KIM, Jaehyun , DHINDSA, Rajinder , WANG, Yen-Kun , ULLAL, Saurabh J. , NORELL, Anthony J. , COMENDANT, Keith , DENTY, William M., Jr.
IPC分类号： H01L21/3065 , C23C16/505 , H01L21/205
CPC分类号： H01L21/67069 , C23C16/45565 , C23C16/45582 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01L21/67017
摘要： A showerhead electrode assembly for a plasma processing apparatus is provided. The showerhead electrode assembly includes a first member attached to a second member. The first and second members have first and second gas passages in fluid communication. When a process gas is flowed through the gas passages, a total pressure drop is generated across the first and second gas passages. A fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages.
摘要翻译：提供了一种用于等离子体处理装置的喷头电极组件。喷头电极组件包括附接到第二构件的第一构件。第一和第二构件具有流体连通的第一和第二气体通道。当处理气体流过气体通道时，跨越第一和第二气体通道产生总压降。跨越第二气体通道的总压降的一小部分大于跨越第一气体通道的总压降的一部分。

4. 发明申请

WO2008048543A1 UPPER ELECTRODE BACKING MEMBER WITH PARTICLE REDUCING FEATURES 审中-公开
标题翻译：具有颗粒减少特性的上电极背部构件
公开(公告)号：WO2008048543A1
公开(公告)日：2008-04-24
申请号：PCT/US2007/021989
申请日：2007-10-16
申请人： LAM RESEARCH CORPORATION , DE LA LLERA, Anthony , RONNE, Allan, K. , KIM, Jaehyun , AUGUSTINO, Jason , DHINDSA, Rajinder , WANG, Yen-Kun , ULLAL, Saurabh, J. , NORELL, Anthony, J. , COMENDANT, Keith , DENTY, Jr., William
发明人： DE LA LLERA, Anthony , RONNE, Allan, K. , KIM, Jaehyun , AUGUSTINO, Jason , DHINDSA, Rajinder , WANG, Yen-Kun , ULLAL, Saurabh, J. , NORELL, Anthony, J. , COMENDANT, Keith , DENTY, Jr., William
IPC分类号： H01L21/205 , H01L21/203
CPC分类号： H01J37/32449 , H01J37/32009 , H01J37/32541 , H01J37/3255
摘要： Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.
摘要翻译：等离子体处理装置的组件包括具有气体通道的背衬构件，气体通道连接到具有气体通道的上部电极。为了补偿金属背衬构件和上部电极之间的热膨胀系数的差异，气体通道的定位和尺寸使得它们在环境温度下不对准并且在升高的处理温度下基本上同心。由于热膨胀，弹性粘合材料中可能会产生不均匀的剪切应力。剪切应力可以通过施加不同厚度的弹性粘合材料或使用包括多个片的背衬构件来适应。

5. 发明申请

WO2013081844A2 MOVABLE GROUNDING ARRANGEMENTS IN A PLASMA PROCESSING CHAMBER AND METHODS THEREFOR 审中-公开
标题翻译：等离子体加工室中的可移动接地装置及其方法
公开(公告)号：WO2013081844A2
公开(公告)日：2013-06-06
申请号：PCT/US2012/065214
申请日：2012-11-15
申请人： LAM RESEARCH CORPORATION , DE LA LLERA, Anthony , KELLOG, Michael C. , MARAKHTANOV, Alexei , DHINDSA, Rajinder
发明人： DE LA LLERA, Anthony , KELLOG, Michael C. , MARAKHTANOV, Alexei , DHINDSA, Rajinder
IPC分类号： H05H1/24 , H05K13/00
CPC分类号： H01J37/32082 , H01J37/32577
摘要： A plasma processing systems having at least one plasma processing chamber, comprising a movable grounding component, an RF contact component configured to receive RF energy from an RF source when the RF source provides the RF energy to the RF contact component, and a ground contact component coupled to ground. The plasma processing system further includes an actuator operatively coupled to the movable grounding component for disposing the movable grounding component in a first position and a second position. The first position represents a position whereby the movable grounding component is not in contact with at least one of the RF contact component and the ground contact component. The second position represents a position whereby the movable grounding component is in contact with both the RF contact component and the ground contact component.
摘要翻译：一种具有至少一个等离子体处理室的等离子体处理系统，包括可移动接地部件，RF接触部件，其被配置为当RF源向RF接触部件提供RF能量时从RF源接收RF能量;以及接地部件加上地面。等离子体处理系统还包括可操作地耦合到可移动接地部件的致动器，用于将可移动接地部件设置在第一位置和第二位置。第一位置表示可移动接地部件不与RF接触部件和接地部件中的至少一个接触的位置。第二位置表示可移动接地部件与RF接触部件和接地部件接触的位置。

6. 发明申请

WO2006026110A2 YTTRIA INSULATOR RING FOR USE INSIDE A PLASMA CHAMBER 审中-公开
标题翻译： YTTRIA绝缘子环用于等离子体室内
公开(公告)号：WO2006026110A2
公开(公告)日：2006-03-09
申请号：PCT/US2005/028571
申请日：2005-08-12
申请人： LAM RESEARCH CORPORATION , KADKHODAYAN, Babak , DHINDSA, Rajinder , FU, Yuehong
发明人： KADKHODAYAN, Babak , DHINDSA, Rajinder , FU, Yuehong
IPC分类号： H01L21/306 , B44C1/22
CPC分类号： C04B35/505 , C04B2235/725 , C04B2235/728 , C04B2235/77 , C04B2235/9692 , H01J37/32642 , H01J2237/0206 , Y10T29/4973
摘要： A yttria insulator ring for use in a plasma processing apparatus is provided to minimize arcing between the apparatus and a ground extension, while also increasing a mean time between cleanings (MTBC). The yttria insulator ring may be located between a ground extension and a plasma generation zone, or gap, of the chamber of the apparatus, as well as between an edge ring and the ground extension. Compared to a quartz ring, the yttria insulator ring can also provide improved semiconductor substrate uniformity because of improved RF coupling as a result of decreased reactivity and increased dielectric constant.
摘要翻译：提供用于等离子体处理装置的氧化钇绝缘体环，以最小化装置和地面延伸部之间的电弧，同时也增加清洗之间的平均时间（MTBC）。氧化钇绝缘体环可以位于设备的室的接地延伸部和等离子体产生区域或间隙之间，以及边缘环和接地延伸部之间。与石英环相比，氧化钇绝缘体环也可以提供改善的半导体衬底均匀性，因为由于反应性降低和介电常数增加导致RF耦合改善。

7. 发明申请

WO2011014328A2 LIGHT-UP PREVENTION IN ELECTROSTATIC CHUCKS 审中-公开
标题翻译：静电卡匣中的防眩光
公开(公告)号：WO2011014328A2
公开(公告)日：2011-02-03
申请号：PCT/US2010/040284
申请日：2010-06-29
申请人： LAM RESEARCH CORPORATION , STEVENSON, Tom , BYUN, Daniel , ULLAL, Saurabh , KADKHODAYAN, Babak , DHINDSA, Rajinder
发明人： STEVENSON, Tom , BYUN, Daniel , ULLAL, Saurabh , KADKHODAYAN, Babak , DHINDSA, Rajinder
IPC分类号： H01L21/687 , B23Q3/15 , H02N13/00
CPC分类号： H01L21/68757 , H01J37/32541 , H01J37/3255 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L21/6875
摘要： An electrostatic chuck assembly is provided comprising a ceramic contact layer, a patterned bonding layer, an electrically conductive base plate, and a subterranean arc mitigation layer. The ceramic contact layer and the electrically conductive base plate cooperate to define a plurality of hybrid gas distribution channels formed in a subterranean portion of the electrostatic chuck assembly. Individual ones of the hybrid gas distribution channels comprise surfaces of relatively high electrical conductivity presented by the electrically conductive base plate and relatively low electrical conductivity presented by the ceramic contact layer. The subterranean arc mitigation layer comprises a layer of relatively low electrical conductivity and is formed over the relatively high conductivity surfaces of the hybrid gas distribution channels in the subterranean portion of the electrostatic chuck assembly. Semiconductor wafer processing chambers are also provided.
摘要翻译：提供了一种静电吸盘组件，其包括陶瓷接触层，图案化的接合层，导电基板和地下电弧缓和层。陶瓷接触层和导电基板共同限定形成在静电吸盘组件的地下部分中的多个混合气体分配通道。混合气体分配通道中的各个混合气体分配通道包括由导电基板呈现的相对高电导率的表面以及由陶瓷接触层呈现的相对低的电导率。地下电弧缓和层包括具有相对低电导率的层并形成在静电吸盘组件的地下部分中的混合气体分配通道的相对高导电性表面上。还提供了半导体晶圆处理室。

8. 发明申请

WO2009114175A2 CAM LOCK ELECTRODE CLAMP 审中-公开
标题翻译：凸轮锁电极夹
公开(公告)号：WO2009114175A2
公开(公告)日：2009-09-17
申请号：PCT/US2009/001593
申请日：2009-03-13
申请人： LAM RESEARCH CORPORATION , KELLOGG, Michael, C. , NORELL, Anthony, J. , DE LA LIERA, Anthony , DHINDSA, Rajinder
发明人： KELLOGG, Michael, C. , NORELL, Anthony, J. , DE LA LIERA, Anthony , DHINDSA, Rajinder
IPC分类号： H01L21/683 , H01L21/68 , H01L21/30
CPC分类号： H01L21/68728 , H01L21/687 , Y10T403/7005 , Y10T403/7007 , Y10T403/7041
摘要： A cam lock clamp comprises a stud having a substantially cylindrical body with a first end including a head area and a second end arranged to support one or more disc springs concentrically about the stud. A socket is arranged to mechanically couple concentrically around the stud with the head area of the stud being exposed above an uppermost portion of the socket. The socket is configured to be firmly attached to a consumable material. A camshaft has a substantially cylindrical body and is configured to mount within a bore of a backing plate. The camshaft further comprises an eccentric cutout area located in a central portion of the camshaft body. The camshaft is configured to engage and lock the head area of the stud when the consumable material and the backing plate are proximate to one another.
摘要翻译：凸轮锁紧夹具包括具有大致圆柱形本体的螺柱，该大致圆柱形本体具有包括头部区域的第一端和布置成围绕螺柱同心地支撑一个或多个盘形弹簧的第二端。插座被布置成机械地耦合在螺柱周围，螺柱的头部区域暴露在插座的最上部分上方。插座配置为牢固地连接到消耗材料上。凸轮轴具有大致圆柱形的本体并且构造成安装在背板的孔内。凸轮轴还包括位于凸轮轴本体的中心部分中的偏心切口区域。当消耗材料和背板彼此靠近时，凸轮轴被构造成接合并锁定螺栓的头部区域。

9. 发明申请

WO2013128361A1 HYBRID PLASMA PROCESSING SYSTEMS 审中-公开
标题翻译：混合等离子体处理系统
公开(公告)号：WO2013128361A1
公开(公告)日：2013-09-06
申请号：PCT/IB2013/051506
申请日：2013-02-25
申请人： LAM RESEARCH CORPORATION , LAM RESEARCH AG , DHINDSA, Rajinder
发明人： DHINDSA, Rajinder
IPC分类号： H01L23/60 , H01L23/34 , H01L21/3065
CPC分类号： H01J37/3255 , H01J37/321 , H01J37/32568
摘要： A hybrid plasma processing system and methods for manufacturing and operating same are disclosed. The hybrid plasma processing system includes an RF -powered lower electrode for supporting the substrate during processing and a hybrid upper electrode disposed in a spaced-apart relationship above the lower electrode. The hybrid upper electrode may be thermally controlled and includes a first plate formed of a first material having a first electrical resistivity, a conductive grounded plate having therein a plurality of radial slots and disposed above the first plate. The conductive plate is formed of a second material having a second electrical resistivity different from the first electrical resistivity. The hybrid upper electrode also includes an RF -powered inductive coil disposed above the conductive ground plate.
摘要翻译：公开了一种混合等离子体处理系统及其制造和操作方法。混合等离子体处理系统包括用于在处理期间支撑衬底的RF供电下电极和在下电极上方以间隔关系设置的混合上电极。混合上电极可以是热控制的，并且包括由具有第一电阻率的第一材料形成的第一板，其中具有多个径向槽并且设置在第一板上方的导电接地板。导电板由具有不同于第一电阻率的第二电阻率的第二材料形成。混合上电极还包括布置在导电接地板上方的RF施力感应线圈。

10. 发明申请

WO2013070472A2 SYSTEM, METHOD AND APPARATUS FOR PLASMA SHEATH VOLTAGE CONTROL 审中-公开
标题翻译：用于等离子体电压控制的系统，方法和装置
公开(公告)号：WO2013070472A2
公开(公告)日：2013-05-16
申请号：PCT/US2012/062867
申请日：2012-10-31
申请人： LAM RESEARCH CORPORATION , MARAKHTANOV, Alexei , DHINDSA, Rajinder , HUDSON, Eric , BAILEY III, Andrew, D.
发明人： MARAKHTANOV, Alexei , DHINDSA, Rajinder , HUDSON, Eric , BAILEY III, Andrew, D.
IPC分类号： H01L21/3065 , C23F1/08
CPC分类号： H01J37/32091 , H01J37/32165 , H01J37/32174
摘要： A system, method and apparatus for increasing an energy level of the ions emitted from a plasma include a plasma chamber, including a top electrode and a bottom electrode, a multiple RF sources, at least one of the RF sources being coupled to the bottom electrode. A phase locking circuit is coupled to at least two of the RF sources hereafter designated the first RF source and the second RF source. A controller is coupled to the plasma chamber, each of the RF sources and the phase locking circuit. The controller including operating system software, multiple logic circuits and a process recipe.
摘要翻译：用于增加从等离子体发射的离子的能量水平的系统，方法和装置包括等离子体室，包括顶部电极和底部电极，多个RF源，至少一个RF源耦合到底部电极。相位锁定电路耦合到以下称为第一RF源和第二RF源的至少两个RF源。控制器耦合到等离子体室，每个RF源和锁相电路。该控制器包括操作系统软件，多个逻辑电路和一个过程配方。

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