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1. 发明申请

WO2010032156A3 CAPACITIVE MICROMACHINED ULTRASOUND TRANSDUCER 审中-公开
公开(公告)号：WO2010032156A3
公开(公告)日：2010-03-25
申请号：PCT/IB2009/053914
申请日：2009-09-08
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , KLOOTWIJK, Johan, H. , DIRKSEN, Peter , MULDER, Marcel , MOONEN, Elisabeth, M. L.
发明人： KLOOTWIJK, Johan, H. , DIRKSEN, Peter , MULDER, Marcel , MOONEN, Elisabeth, M. L.
IPC分类号： B06B1/02
摘要： The patent application discloses a capacitive micromachined ultrasound transducer, comprising a silicon substrate; a cavity; a first electrode, which is arranged between the silicon substrate and the cavity; wherein the first electrode is arranged under the cavity; a membrane, wherein the membrane is arranged above the cavity and opposite to the first electrode; a second electrode, wherein the second electrode is arranged above the cavity and opposite to the first electrode; wherein the second electrode is arranged in or close to the membrane, wherein the first electrode and the second electrode are adapted to be supplied by a voltage; and a first isolation layer, which is arranged between the first electrode and the second electrode, wherein the first isolation layer comprises a dielectric. It is also described a system for generating or detecting ultrasound waves, wherein the system comprises a transducer according to the patent application. Further, it is disclosed a method for manufacturing a transducer according to the patent application, wherein the transducer is manufactured with the help of a CMOS manufacturing process,wherein the transducer can be manufactured as a post-processing feature during a CMOS process.

2. 发明申请

WO2013001437A1 A TRACKING SYSTEM FOR TRACKING INTERVENTIONAL TOOLS IN ULTRASOUND GUIDED INTERVENTIONS AND AN ULTRASOUND DIAGNOSTIC SYSTEM COMPRISING SUCH A TRACKING SYSTEM 审中-公开
标题翻译：用于跟踪超声引导干预中的传统工具的跟踪系统和包含这种追踪系统的超声诊断系统
公开(公告)号：WO2013001437A1
公开(公告)日：2013-01-03
申请号：PCT/IB2012/053195
申请日：2012-06-25
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , DIRKSEN, Peter , SOER, Wouter Anthon , VAN RENS, Antonia Cornelia , MARCELIS, Bout , DEKKER, Ronald
发明人： DIRKSEN, Peter , SOER, Wouter Anthon , VAN RENS, Antonia Cornelia , MARCELIS, Bout , DEKKER, Ronald
IPC分类号： A61B5/06 , A61B8/08 , A61B17/34 , A61B19/52
CPC分类号： A61B5/066 , A61B8/0841 , A61B34/20 , A61B2034/2063 , A61B2090/3786
摘要： An interventional tooltracking system is disclosed which utilises the response ofa CMUT-based tracking sensor located on the interventional tool to insonification, from a remoteultrasoundsource, in order to determine the position of the interventional tool during an interventional procedure.
摘要翻译：公开了一种介入式工具跟踪系统，其利用位于介入工具上的基于CMUT的跟踪传感器的响应来从远程超声源进行增强，以便在介入过程期间确定介入工具的位置。

3. 发明申请

WO2012140556A3 TEMPERATURE COMPENSATION IN A CMUT DEVICE 审中-公开
公开(公告)号：WO2012140556A3
公开(公告)日：2012-10-18
申请号：PCT/IB2012/051719
申请日：2012-04-06
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , DIRKSEN, Peter , LEEUWESTEIN, Adriaan
发明人： DIRKSEN, Peter , LEEUWESTEIN, Adriaan
IPC分类号： B06B1/02
摘要： CMUT devices are used in many applications e.g. for ultrasound imaging and pressure measurement. These devices operate by sensing a change in capacitance caused by deflection of a membrane (32) comprising one of a pair of electrodes in the device by ultrasound exposure of, or pressure applied on, the membrane. The CMUT device may be susceptible to the effects of changing temperature.

4. 发明申请

WO2012014111A2 THIN FILM ULTRASOUND TRANSDUCER 审中-公开
标题翻译：薄膜超声波传感器
公开(公告)号：WO2012014111A2
公开(公告)日：2012-02-02
申请号：PCT/IB2011/053096
申请日：2011-07-12
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , KLEE, Mareike , MAUCZOK, Ruediger , BOOTS, Henri Marie Joseph , DE WILD, Nico Maris Adriaan , SREEDHARAN NAIR, Biju Kumar , WUNNICKE, Olaf , PASVEER, Willem Franke , VAN DE LAGEMAAT, Dirk , DIRKSEN, Peter
发明人： KLEE, Mareike , MAUCZOK, Ruediger , BOOTS, Henri Marie Joseph , DE WILD, Nico Maris Adriaan , SREEDHARAN NAIR, Biju Kumar , WUNNICKE, Olaf , PASVEER, Willem Franke , VAN DE LAGEMAAT, Dirk , DIRKSEN, Peter
IPC分类号： B06B1/06
CPC分类号： H03H3/02 , B06B1/06 , B06B1/0622 , B06B1/0688 , H03H9/172
摘要： The present invention relates to a transducer (11) comprising - a membrane (31) configured to change shape in response to a force, the membrane (31) having a first major surface (16) and a second major surface (17), - a piezoelectric layer (18) formed over the first major surface (16) of the membrane (31), the piezoelectric layer (18) having an active portion, - first and second electrodes (19) in contact with the piezoelectric layer (18), wherein an electric field between the first and second electrodes (19) determines the mechanical movement of the piezoelectric layer (18), -support structures (40) at the second major surface (17) of the membrane (15) on adjacent sides of the active portion of the piezoelectric layer (18), at least part of the support structures (40) forming walls perpendicular, or at least not parallel, to the second major surface (17) of the membrane (31), so as to form a trench (41) of any shape underlying the active portion, so that an ultrasound transducer is obtained with a high output pressure at the support side than at the opposite side. The invention also relates to a method of forming such a transducer, and an array comprising at least one transducer of the like.
摘要翻译：本发明涉及一种换能器（11），其包括 - 被配置为响应于力而改变形状的膜（31），所述膜（31）具有第一主表面（16）和第二主表面（17）， - 形成在膜（31）的第一主表面（16）上方的压电层（18），压电层（18）具有有源部分， - 与压电层（18）接触的第一和第二电极（19），其中所述第一和第二电极（19）之间的电场确定所述压电层（18）的机械运动， - 在所述膜（15）的相邻侧上的所述膜（15）的第二主表面（17）处支撑结构（40）压电层（18）的有效部分，至少部分支撑结构（40）形成与膜（31）的第二主表面（17）垂直或至少不平行的壁，以便形成在活动部分下方具有任何形状的沟槽（41），使得超声波换能器为ob 在支撑侧具有高于在相对侧的高输出压力。本发明还涉及一种形成这种换能器的方法，以及包括至少一个这样的换能器的阵列。

5. 发明申请

WO2005083525A2 DETERMINING IMAGE BLUR IN AN IMAGING SYSTEM 审中-公开
标题翻译：在成像系统中确定图像图像
公开(公告)号：WO2005083525A2
公开(公告)日：2005-09-09
申请号：PCT/IB2005/050496
申请日：2005-02-08
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , DIRKSEN, Peter , JANSSEN, Augustus, J., E., M. , BRAAT, Josephus, J., M. , LEEUWESTEIN, Adriaan
发明人： DIRKSEN, Peter , JANSSEN, Augustus, J., E., M. , BRAAT, Josephus, J., M. , LEEUWESTEIN, Adriaan
IPC分类号： G03F9/00
CPC分类号： G03F7/70608 , G03F7/706
摘要： The invention relates to a method of determining a parameter relating to image blur in an imaging system (IS) comprising the step of illuminating an object having a test pattern (MTP) by means of the imaging system (IS), thereby forming an image of the test pattern,. The test pattern (MTP) has a size smaller than the resolution of the imaging system (IS), which makes the image of the test pattern independent of illuminator aberrations. The test pattern (MTP) is an isolated pattern, which causes the image to be free of optical proximity effects. The image is blurred due to stochastic fluctuations in the imaging system and/or in the detector detecting the blurred image. The parameter relating to the image blur is determined from a parameter relating to the shape of the blurred image. According to the invention, resist diffusion and/or focus noise may be characterized. In the method of designing a mask, the parameter relating to the image blur due to diffusion in the resist is taken into account. The computer program according to the invention is able to execute the step of determining the parameter relating to the image blur from a parameter relating to a shape of the blurred image.
摘要翻译：本发明涉及一种确定与成像系统（IS）中的图像模糊相关的参数的方法，包括通过成像系统（IS）照亮具有测试图案（MTP）的对象的步骤，从而形成图像测试模式。测试图案（MTP）的尺寸小于成像系统（IS）的分辨率，这使得测试图案的图像与照明器像差无关。测试图案（MTP）是一种孤立的图案，使图像无光学邻近效应。图像由于成像系统中的随机波动和/或检测模糊图像的检测器而模糊。根据与模糊图像的形状相关的参数确定与图像模糊有关的参数。根据本发明，可以表征抗蚀剂扩散和/或聚焦噪声。在设计掩模的方法中，考虑与抗蚀剂中的扩散引起的图像模糊有关的参数。根据本发明的计算机程序能够执行从与模糊图像的形状相关的参数确定与图像模糊有关的参数的步骤。

6. 发明申请

WO2004059394A3 DETERMINING LITHOGRAPHIC PARAMETERS TO OPTIMISE A PROCESS WINDOW 审中-公开
公开(公告)号：WO2004059394A3
公开(公告)日：2004-07-15
申请号：PCT/IB2003/006094
申请日：2003-12-18
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , VAN WINGERDEN, Johannes , JUFFERMANS, Casparus, A., H. , DIRKSEN, Peter
发明人： VAN WINGERDEN, Johannes , JUFFERMANS, Casparus, A., H. , DIRKSEN, Peter
IPC分类号： G03F7/20
摘要： For determining best process variables (E, F, W) setting that provide optimum process window for a lithographic process for printing features having critical dimensions (CD) use is made of an overall performance characterizing parameter (C pk ) and of an analytical model, which describes CD data as a function of process parameters, like exposure dose (E) and focus( F). This allows calculating of the average value (µCD) and the variance (σCD) of the statistical CD distribution (CDd) and to determine the highest C pk value and the associated values of process parameters, which values provide the optimum process window.

7. 发明申请

WO2010097729A1 PRE-COLLAPSED CMUT WITH MECHANICAL COLLAPSE RETENTION 审中-公开
标题翻译：具有机械收缩保持力的预拉伸CMUT
公开(公告)号：WO2010097729A1
公开(公告)日：2010-09-02
申请号：PCT/IB2010/050614
申请日：2010-02-10
申请人： KONINKLIJKE PHILIPS ELECTRONICS, N.V. , DIRKSEN, Peter
发明人： DIRKSEN, Peter
IPC分类号： A61B8/00 , B06B1/02
CPC分类号： A61B8/00 , A61B8/4483 , B06B1/0292
摘要： A CMUT transducer cell suitable for use in an ultrasonic CMUT transducer array has a membrane with a first electrode, a substrate with a second electrode, and a cavity between the membrane and the substrate. The CMUT is operated in a precollapsed state by biasing the membrane to a collapsed condition with the floor of the cavity, and a lens is cast over the collapsed membrane. When the lens material has polymerized or is of a sufficient stiffness, the bias voltage is removed and the lens material retains the membrane in the collapsed state.
摘要翻译：适用于超声CMUT换能器阵列的CMUT换能器单元具有膜，其具有第一电极，具有第二电极的基板以及膜与基板之间的空腔。 CMUT通过将膜偏置到具有空腔的底部的折叠状态并且将透镜投射在折叠的膜上而在预胶合状态下操作。当透镜材料已经聚合或具有足够的刚度时，偏移电压被去除并且透镜材料将膜保持在折叠状态。

8. 发明申请

WO2009156942A1 MICROARRAY CHARACTERIZATION SYSTEM AND METHOD 审中-公开
标题翻译：微阵列特征系统和方法
公开(公告)号：WO2009156942A1
公开(公告)日：2009-12-30
申请号：PCT/IB2009/052683
申请日：2009-06-23
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , WIMBERGER-FRIEDL, Reinhold , DIRKSEN, Peter , BOAMFA, Marius, I. , VAN DIJK, Erik, M., H., P.
发明人： WIMBERGER-FRIEDL, Reinhold , DIRKSEN, Peter , BOAMFA, Marius, I. , VAN DIJK, Erik, M., H., P.
IPC分类号： G01N21/64
CPC分类号： G01N21/6452 , B01L3/5027 , G02B21/0028
摘要： A system and method is described for detecting a plurality of analytes in a sample. The characterization system (100) comprises an aperture array (108) and a lens array (110) for generating and focusing a plurality of excitation sub-beams on different sub-regions of a substrate. These sub-regions can be provided with different binding sites for binding different analytes in the sample. By detecting the different luminescent responses in a detector, the presence or amount of different analytes can be determined simultaneously. Alternatively or in addition thereto collection of the luminescence radiation can be performed using the lens array for directly collecting the luminescence response and for guiding the collected luminescence response to corresponding apertures. In a preferred embodiment, the excitation sub-beams are focused at the side of the substrate opposite of the lens array and an immersion fluid is provided between the lens array and the substrate to increase the collection efficiency of the luminescence radiation.
摘要翻译：描述了用于检测样品中多个分析物的系统和方法。表征系统（100）包括孔径阵列（108）和透镜阵列（110），用于在衬底的不同子区域上产生和聚焦多个激励子束。这些子区域可以具有不同的结合位点，用于结合样品中的不同分析物。通过检测检测器中的不同发光响应，可以同时测定不同分析物的存在或量。或者或另外，可以使用透镜阵列来进行发光辐射的收集，用于直接收集发光响应并且用于将所收集的发光响应引导到相应的孔。在优选实施例中，激发子光束在与透镜阵列相对的一侧聚焦，并且在透镜阵列和基板之间提供浸没流体，以增加发光辐射的收集效率。

9. 发明申请

WO2009037655A2 PRODUCTION OF PRE-COLLAPSED CAPACITIVE MICRO-MACHINED ULTRASONIC TRANSDUCERS AND APPLICATIONS THEREOF 审中-公开
标题翻译：预拉伸电容式微机超声波传感器的生产及其应用
公开(公告)号：WO2009037655A2
公开(公告)日：2009-03-26
申请号：PCT/IB2008/053778
申请日：2008-09-17
申请人： KONINKLIJKE PHILIPS ELECTRONICS, N.V. , U.S. PHILIPS CORPORATION , DIRKSEN, Peter , VAN DER LUGT, Anthonie
发明人： DIRKSEN, Peter , VAN DER LUGT, Anthonie
CPC分类号： B06B1/0292 , A61B8/00 , H04R19/005 , Y10T29/43 , Y10T29/49005 , Y10T29/4908
摘要： Methods are provided for production of pre-collapsed capacitive micro-machined ultrasonic transducers (cMUTs). Methods disclosed generally include the steps of obtaining a nearly completed traditional cMUT structure prior to etching and sealing the membrane, defining holes through the membrane of the cMUT structure for each electrode ring fixed relative to the top face of the membrane, applying a bias voltage across the membrane and substrate of the cMUT structure so as to collapse the areas of the membrane proximate to the holes to or toward the substrate, fixing and sealing the collapsed areas of the membrane to the substrate by applying an encasing layer, and discontinuing or reducing the bias voltage. CMUT assemblies are provided, including packaged assemblies, integrated assemblies with an integrated circuit/chip (e.g., a beam-steering chip) and a cMUT/lens assembly. Advantageous cMUT-based applications utilizing the disclosed pre-collapsed cMUTs are also provided, e.g., ultrasound transducer-based applications, catheter-based applications, needle-based applications and flowmeter applications.
摘要翻译：提供了用于生产预塌陷电容式微加工超声波换能器（cMUT）的方法。所公开的方法通常包括以下步骤：在蚀刻和密封膜之前获得几乎完成的传统cMUT结构，通过cMUT结构的膜定义孔，用于相对于膜的顶面固定的每个电极环，施加偏压 cMUT结构的膜和基底，以便将膜的靠近孔的区域折叠到基底或朝向基底，通过施加包封层将膜的折叠区域固定和密封到基底，并且中断或者减少偏压。提供CMUT组件，包括封装组件，具有集成电路/芯片（例如，光束转向芯片）和cMUT /透镜组件的集成组件。还提供了利用所公开的预塌陷cMUT的有利的基于cMUT的应用，例如基于超声换能器的应用，基于导管的应用，基于针的应用和流量计应用。

10. 发明申请

WO2005064409A3 REMOVABLE PELLICLE FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：WO2005064409A3
公开(公告)日：2005-07-14
申请号：PCT/IB2004/052886
申请日：2004-12-22
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , DIRKSEN, Peter , MORTON, Robert, D. , ZANDBERGEN, Peter , VAN STEENWINCKEL, David , AKSENOV, Yuri , LAMMERS, Jeroen, H. , VAN WINGERDEN, Johannes , MARINIER, Laurent
发明人： DIRKSEN, Peter , MORTON, Robert, D. , ZANDBERGEN, Peter , VAN STEENWINCKEL, David , AKSENOV, Yuri , LAMMERS, Jeroen, H. , VAN WINGERDEN, Johannes , MARINIER, Laurent
IPC分类号： G03F7/20
摘要： A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and through the transparent layer, such that imperfections in the fluid are out of focus as projected on the surface, and subsequently removing the transparent layer. The transparent layer can help distance such imperfections from the focus of the radiation on the surface and so can reduce or eliminate shadowing. Hence the irradiation can be more complete, and defects reduced. It can be particularly effective for imperfections in the form of small bubbles or particles in the immersion fluid especially at the fluid/surface interface for example. The radiation can be for any purpose including inspection, processing, patterning and so on. The removal of the transparent layer can be combined with a step of developing the resist layer.

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