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    • 4. 发明申请
    • VAPORIZATION APPARATUS WITH PRECISE POWDER METERING
    • 具有精密粉末计量的蒸发装置
    • WO2009088444A1
    • 2009-07-16
    • PCT/US2008/013973
    • 2008-12-22
    • EASTMAN KODAK COMPANYBOROSON, Michael LouisPALONE, Thomas WilliamKOPPE, Bruce EdwardLONG, Michael
    • BOROSON, Michael LouisPALONE, Thomas WilliamKOPPE, Bruce EdwardLONG, Michael
    • C23C14/24C23C16/448B65G31/04
    • C23C14/246C23C16/4486
    • Apparatus for vaporizing a particulate material, comprising a metering apparatus including: a reservoir (130a); a housing (140) having an internal volume (150) and first and second openings (160) for respectively receiving and discharging the particulate material; a rotatable shaft (170) disposed in the internal volume, the shaft having a smooth surface and a circumferential groove for receiving particulate material from the reservoir and for discharging the particulate material; the rotatable shaft and the internal volume cooperating such that the particulate material is transported by the circumferential groove and not along the remainder of the rotatable shaft; a scraper disposed in relation to the second opening (160), having at its end substantially the same cross section as the groove in the rotating shaft, the scraper cooperating with the groove to dislodge particulate material retained therein, and in response to the shaft rotating, delivers metered amounts of particulate material through the second opening (160); to the flash evaporator (120a).
    • 用于蒸发颗粒材料的装置,包括计量装置,包括:储存器(130a); 具有内部体积(150)的壳体(140)和用于分别接收和排出颗粒材料的第一和第二开口(160); 设置在所述内部容积中的可旋转轴(170),所述轴具有光滑的表面和用于从所述储存器接收颗粒材料并用于排出所述颗粒材料的周向槽; 所述可旋转轴和所述内部容积协调使得所述颗粒材料由所述圆周凹槽而不是沿着所述可旋转轴的其余部分输送; 相对于第二开口(160)设置的刮刀,其端部与旋转轴中的槽基本相同的横截面,刮刀与槽配合以移除保留在其中的颗粒材料,并且响应于轴旋转 通过第二开口(160)输送计量的颗粒材料; 到闪蒸发生器(120a)。
    • 7. 发明申请
    • HIGH THICKNESS UNIFORMITY VAPORIZATION SOURCE
    • 高浓度均匀蒸发源
    • WO2005098079A1
    • 2005-10-20
    • PCT/US2005/008252
    • 2005-03-11
    • EASTMAN KODAK COMPANYLONG, MichaelGRACE, Jeremy, MatthewKOPPE, Bruce, EdwardFREEMAN, Dennis, RayREDDEN, Neil, PeterZWAAP, Robert, Ferdinand
    • LONG, MichaelGRACE, Jeremy, MatthewKOPPE, Bruce, EdwardFREEMAN, Dennis, RayREDDEN, Neil, PeterZWAAP, Robert, Ferdinand
    • C23C14/24
    • C23C14/24C23C14/12C23C14/243C23C14/26
    • A vapor deposition source for use in vacuum chamber for coating an organic layer on a substrate of an OLED device, includes a manifold(60) including side and bo ttom walls defining a chamber for receiving organic material, and an aperture pl ate(40) disposed between the side walls, the aperture plate having a plurality of spaced apart apertures(90) for emitting vaporized organic material; the apertu re plate including conductive material which in response to an electrical current produces heat; means for heating the organic material to a temperature which c auses its vaporization, and heating the side walls of the manifold; and an elect rical insulator(120) coupling the aperture plate to the side walls for concentra ting heat in the unsupported region of the aperture plate adjacent to the apertu res, whereby the distance between the aperture plate and the substrate can be re duced to provide high coatA vapor deposition source for use in vacuum chamber for coating an organic layer on a substrate of an OLED device, includes a manifoldincluding side and bottom walls defining a chamber for receiving organic materi al, and an aperture plate disposed between the side walls, the aperture plate ving a plurality of spaced apart apertures for emitting vaporized organic materi al; the aperture plate including conductive material which in response to an ele ctrical current produces heat; means for heating the organic material to a tempe rature which causes its vaporization, and heating the side walls of the manifold and an electrical insulator coupling the aperture plate to the side walls for concentrating heat in the unsupported region of the aperture plate adjacent to t he apertures, whereby the distance between the aperture plate and the substrate can be reduced to provide high coating thickness uniformity on the substrate.
    • 一种用于在OLED器件的衬底上涂覆有机层的真空室中的气相沉积源,包括歧管(60),其包括限定用于接收有机材料的室的侧壁和底壁,以及孔(40) 设置在所述侧壁之间,所述孔板具有用于发射蒸发的有机材料的多个间隔开的孔(90) 包括响应于电流的导电材料的印模板产生热量; 用于将有机材料加热到使其蒸发的温度并加热歧管的侧壁的装置; 以及将孔板连接到侧壁上的电绝缘体(120),用于在孔板的邻近孔径区域的未支撑区域内集中热量,由此可以减小孔板和衬底之间的距离以提供 高涂层用于在OLED器件的衬底上涂覆有机层的真空室中的气相沉积源包括限定用于接收有机物的室的侧面和底壁以及设置在侧壁之间的孔板, 孔板,其具有多个间隔开的孔,用于发射蒸发的有机物质; 包括响应于电流电流的导电材料的孔板产生热量; 用于将有机材料加热到导致其蒸发的温度的装置,以及加热歧管的侧壁和将孔板耦合到侧壁的电绝缘体,用于将热量集中在邻近的孔板的未支撑区域 孔,从而可以减小孔板和基底之间的距离,以在基底上提供高的涂层厚度均匀性。