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1. 发明申请

WO2006019214A1 LINEAR DEPOSITION APPARATUS FOR FORMING ORGANIC THIN LAYER 审中-公开
标题翻译：用于形成有机薄层的线性沉积装置
公开(公告)号：WO2006019214A1
公开(公告)日：2006-02-23
申请号：PCT/KR2005/000268
申请日：2005-01-29
申请人： DOOSAN DND CO., LTD. , HWANG, Chang-Hun , HAN, Seung-Jin , WON, You-Tae , LIM, Gun-Mook , KIM, Kwang-Ho , NOH, Sok-Won , LEE, Kyung-Wook , LEE, Chan-Yong
发明人： HWANG, Chang-Hun , HAN, Seung-Jin , WON, You-Tae , LIM, Gun-Mook , KIM, Kwang-Ho , NOH, Sok-Won , LEE, Kyung-Wook , LEE, Chan-Yong
IPC分类号： H05B33/10
CPC分类号： H01L51/56 , C23C14/042 , C23C14/568 , H01L21/67173 , H01L21/67184 , H01L21/67236 , H01L21/67742 , H01L51/001
摘要： Disclosed herein are a linear deposition apparatus suitable for mass production of organic light emitting diode (OLED) devices and transfer units thereof to enable the linear transfer of a substrate and a metal mask. Especially, the present invention allows a plurality of substrates to be simultaneously transferred linearly and horizontally along substrate transfer chambers or be simultaneously transferred vertically from the substrate transfer chambers to process chambers, thereby enabling the simultaneous implementation of different several processes of OLED devices, and obtaining a space required for the repair and maintenance of the apparatus.
摘要翻译：本文公开了一种线性沉积装置，其适用于批量生产有机发光二极管（OLED）器件及其转移单元，以使得能够线性地转移衬底和金属掩模。特别地，本发明允许多个基板沿着基板传送室线性和水平同时转移，或者同时从基板传送室垂直转移到处理室，从而能够同时实现OLED器件的不同几种工艺，并获得维修和保养设备所需的空间。

2. 发明申请

WO2005091683A1 SUBSTRATE DEPOSITING METHOD AND ORGANIC MATERIAL DEPOSITING APPARATUS 审中-公开
标题翻译：基材沉积方法和有机材料沉积装置
公开(公告)号：WO2005091683A1
公开(公告)日：2005-09-29
申请号：PCT/KR2005/000269
申请日：2005-01-29
申请人： DOOSAN DND CO., LTD. , HWANG, Chang-Hun , LIM, Gun-Mook , WON, You-Tae , NOH, Sok-Won , KIM, Kwang-Ho , KANG, Taek-Sang , KIM, Seung-Han
发明人： HWANG, Chang-Hun , LIM, Gun-Mook , WON, You-Tae , NOH, Sok-Won , KIM, Kwang-Ho , KANG, Taek-Sang , KIM, Seung-Han
IPC分类号： H05B33/10
CPC分类号： C23C14/12 , B05D1/60 , C23C14/50 , C23C14/56
摘要： The invention relates to an apparatus and method for depositing an organic material, and, more particularly, to an apparatus and method for depositing an organic material, designed to prevent a large size substrate conveyed into a chamber of the apparatus from sagging during a process of depositing an organic material. The apparatus comprises a chamber having an internal space shielded from the outside, an entrance provided at one side of the chamber to allow a substrate to be conveyed into or out of the chamber, and a gate for opening or closing the entrance, a substrate mounting platen provided at an upper portion of the chamber for applying tensile force to a substrate in order to prevent the substrate from sagging by fixing both ends of the substrate conveyed into the chamber via compressing force and moving one side of the substrate having both ends in a fixed state towards the outside, a rotational lifter coupled to the center of an upper surface of the substrate mounting platen for rotating, lifting or lowering the substrate mounting platen, and a heater and an organic material boat provided at a lower portion of the chamber for vaporizing the organic material and depositing it onto the substrate.
摘要翻译：

3. 发明申请

WO2007035050A1 SPUTTERING DEPOSITION DEVICE 审中-公开
标题翻译：溅射沉积装置
公开(公告)号：WO2007035050A1
公开(公告)日：2007-03-29
申请号：PCT/KR2006/003759
申请日：2006-09-21
申请人： DOOSAN DND CO., LTD. , HWANG, Chang-Hun , KIM, Yong-Ki , WON, You-Tae
发明人： HWANG, Chang-Hun , KIM, Yong-Ki , WON, You-Tae
IPC分类号： H01L21/203
CPC分类号： C23C14/34 , H01J37/32623 , H01J37/34 , H01J37/3435 , H01J37/3447
摘要： Disclosed is a sputtering deposition device for depositing a thin film on a substrate. The sputtering deposition device comprises a substrate fixing part configured to fix a substrate; a target mounting member configured to mount a target and form an opening part on a front surface or a part of the top thereof; and a blocking shield provided on the top of the target mounting member. The present invention can minimize ion damage and heat damage of an organic thin film by blocking particles having strong energy and scanning the substrate in a horizontal direction.
摘要翻译：公开了一种用于在基板上沉积薄膜的溅射沉积设备。溅射沉积设备包括：基板固定部分，被构造为固定基板; 目标安装构件，所述目标安装构件构造成安装靶并且在其顶部的前表面或其一部分上形成开口部分; 以及设置在靶安装构件的顶部上的阻挡屏蔽件。本发明可以通过阻挡具有强能量的粒子并沿水平方向扫描衬底来使有机薄膜的离子损伤和热损伤最小化。

4. 发明申请

WO2007046623A1 APPARATUS FOR CONTINUOUS METAL DEPOSITION FOR MASS PRODUCTION 审中-公开
标题翻译：用于大量生产的连续金属沉积装置
公开(公告)号：WO2007046623A1
公开(公告)日：2007-04-26
申请号：PCT/KR2006/004215
申请日：2006-10-17
申请人： DOOSAN DND CO., LTD. , HWANG, Chang-Hun , LEE, Kyoung-Ook , ANN, Jeong-Su , PARK, Ki-Ju , WON, You-Tae
发明人： HWANG, Chang-Hun , LEE, Kyoung-Ook , ANN, Jeong-Su , PARK, Ki-Ju , WON, You-Tae
IPC分类号： C23C14/56
CPC分类号： C23C14/56 , C23C14/246
摘要： Disclosed herein is an apparatus for continuous metal deposition. The apparatus comprises at least one casing (20) located on a bottom surface of a deposition chamber, two or more metal boats (30) received in the casing, and a cooling unit to cool the casing (20) and the metal boats (30). Specifically, the chamber is provided with a pair of casings (20), each of which has four metal boats (30) received therein. The apparatus further comprises a transfer unit to horizontally move the casings (20) within the chamber. The apparatus enables continuous deposition of a metallic thin film without destroying vacuum of the deposition chamber for replacement of the boats.
摘要翻译：本文公开了一种用于连续金属沉积的装置。该装置包括位于沉积室的底表面上的至少一个壳体（20），容纳在壳体中的两个或更多个金属舟皿（30）和用于冷却壳体（20）和金属舟皿（30）的冷却单元）。具体地说，该腔室设置有一对壳体（20），每一个壳体中有四个金属舟皿（30）被容纳在其中。该装置还包括用于水平移动腔室内的壳体（20）的传送单元。该装置能够连续沉积金属薄膜而不破坏沉积室的真空以更换船。

5. 发明申请

WO2007069865A1 CRUCIBLE ASSEMBLY FOR DEPOSITION OF ORGANIC THIN FILM 审中-公开
标题翻译：用于沉积有机薄膜的混凝土组件
公开(公告)号：WO2007069865A1
公开(公告)日：2007-06-21
申请号：PCT/KR2006/005490
申请日：2006-12-15
申请人： DOOSAN DND CO., LTD. , HAN, Seung-Jin , MOK, Jin-Il , KIM, Byung-Jin , SONG, Ha-Jin , KIM, Hae-Won , HWANG, Chang-Hun , KONG, Jong-Hwan , NAM, Seung-Hoon
发明人： HAN, Seung-Jin , MOK, Jin-Il , KIM, Byung-Jin , SONG, Ha-Jin , KIM, Hae-Won , HWANG, Chang-Hun , KONG, Jong-Hwan , NAM, Seung-Hoon
IPC分类号： H05B33/10
CPC分类号： C23C14/12 , C23C14/243
摘要： Disclosed is a crucible assembly for deposition of an organic thin film according to the present invention. The crucible assembly comprises a body for containing organic material for deposition of a thin film; a cap fastened to the upper part of the body and having a nozzle for scattering of the organic material in a vapor phase; and said nozzle being downwardly extended from the top of the cap. Accordingly, it is prevented that the molten organic material is escaped from the connections of the body and the cap, thereby causing the heating means including a heater and the walls of the crucible assembly to be contaminated. The baffles may be easily mounted or separated. The amount of the organic material wasted may be reduced by controlling the scattering anger and pattern of the organic material vapor. It is prevented that the deposition of the organic material is locally concentrated, e.g. at the center portion of the substrate.
摘要翻译：公开了根据本发明的用于沉积有机薄膜的坩埚组件。坩埚组件包括用于容纳用于沉积薄膜的有机材料的主体; 固定在主体的上部并具有用于在气相中散射有机材料的喷嘴的盖; 并且所述喷嘴从盖的顶部向下延伸。因此，防止熔融的有机材料从主体和盖的连接部脱出，从而使包括加热器的加热装置和坩埚组件的壁被污染。挡板可以容易地安装或分离。通过控制有机材料蒸气的散射怒气和图案，可以减少浪费的有机材料的量。防止有机材料的沉积局部浓缩，例如，在基板的中心部分。

6. 发明申请

WO2006057481A1 APPARATUS AND METHOD FOR HEATING GLASS 审中-公开
标题翻译：用于加热玻璃的装置和方法
公开(公告)号：WO2006057481A1
公开(公告)日：2006-06-01
申请号：PCT/KR2005/000247
申请日：2005-01-28
申请人： DOOSAN DND CO., LTD. , HWANG, Chang-Hun , KIM, Seung-Han , KIM, Do-Gon , KIM, Beom-Jae , BACK, Ju-Hyun
发明人： HWANG, Chang-Hun , KIM, Seung-Han , KIM, Do-Gon , KIM, Beom-Jae , BACK, Ju-Hyun
IPC分类号： H05B33/10
CPC分类号： C03C23/007 , F27B5/04 , F27B5/14
摘要： Apparatus and method for heating glass to perform drying and baking processes of a patterned thin film on the glass, and more particularly apparatus and method for heating glass to perform a drying process using a heating plate prepared in a lower portion of the inside of a chamber and provided with a hot wire wound therein and perform a baking process using a sheath heater prepared in an upper portion of the inside of the chamber. The apparatus includes a chamber, in which drying and baking processes of the glass are performed, including a first through hole formed through the central portion of the lower wall thereof and a plurality of second through holes formed through the lower wall thereof such that the second through holes are spaced from each other by a designated distance; a heating plate having a platy structure installed in a lower portion of the inside of the chamber, including a plurality of first pin holes formed through designated positions thereof perpendicularly to the second through holes, and supported by power supply means inserted from the outside of the chamber thereinto through the first through hole; a sheath heater having a platy structure installed in an upper portion of the inside of the chamber, and provided with a hot wire formed thereon in a designated pattern; reflecting means prepared along the inner side surface of the chamber and a virtual horizontal plane between the inner lower wall of the chamber and the heating plate, and including a plurality of second pin holes formed through the horizontal plane perpendicularly to the second through holes; a plurality of glass support pins passing through the second through holes and the first and second pin holes and vertically moving; and support pin ascending and descending means for vertically moving the glass support pins.
摘要翻译：玻璃的加热装置和方法，用于对玻璃上的图案化薄膜进行干燥和烘烤处理，特别是玻璃加热装置和方法，使用制备在室内的下部的加热板进行干燥处理并且设置有缠绕在其中的热丝，并且使用在室的内部的上部中制备的护套加热器进行烘烤处理。该装置包括一个室，其中执行玻璃的干燥和烘烤过程，包括通过其下壁的中心部分形成的第一通孔和穿过其下壁形成的多个第二通孔，使得第二通孔通孔彼此间隔一定距离; 具有安装在所述室的内部的下部的板状结构的加热板，所述加热板包括形成为与所述第二通孔垂直的指定位置形成的多个第一销孔，并且由从所述第二通孔的外部插入的供电装置支撑通过第一通孔; 护套加热器，其具有安装在所述腔室的内部的上部中的板状结构，并且设置有以指定图案形成在其上的热丝; 沿着室的内侧表面准备的反射装置和在室的内下壁和加热板之间的虚拟水平面，并且包括通过垂直于第二通孔的水平面形成的多个第二销孔; 多个玻璃支撑销穿过第二通孔和第一和第二销孔并垂直移动; 以及用于垂直移动玻璃支撑销的支撑销上升和下降装置。

7. 发明申请

WO2006049371A1 SUBSTRATE ENCAP PROCESS 审中-公开
标题翻译：基板加密程序
公开(公告)号：WO2006049371A1
公开(公告)日：2006-05-11
申请号：PCT/KR2005/000248
申请日：2005-01-28
申请人： DOOSAN DND CO., LTD. , HWANG, Chang-Hun , KIM, Seung-Han , KIM, Do-Gon , KIM, Beom-Jae
发明人： HWANG, Chang-Hun , KIM, Seung-Han , KIM, Do-Gon , KIM, Beom-Jae
IPC分类号： H05B33/10
CPC分类号： H01L21/67126 , H01L51/524 , H01L51/5253
摘要： The present invention relates to the thin film encap process on the substrate and provides the following substrate encap process; first process that the thin film sitting on the top of robot arm is located at designated distance (Dl) apart from the heating plate, the second process that the thin film sitting on the top of robot arm is taken up by holders which are assembled at two sides of chamber and are able to horizontal shift, and the robot arm is moved out from the chamber, the third process that the heating plate is shifted up until infinitesimal distance (D2) from the thin film and the chamber is turned to vacuum state by extraction of air by pump, the fourth process that one of the grip in holder is released and shifted horizontally toward the direction to chamber, then the other grip in other holder is shifted horizontally toward the corresponding direction to chamber.
摘要翻译：本发明涉及衬底上的薄膜封装工艺，并提供以下衬底封装工艺; 位于机器人臂顶部的薄膜位于与加热板分开的指定距离（D1）处的第一处理，位于机器人手臂顶部的薄膜被保持器吸收的第二过程是由组装在能够水平移动并且机器人臂从腔室移出，加热板向上移动的第三过程直到来自薄膜和室的无限小距离（D2）转到真空状态通过泵抽取空气，保持器中的一个把手被释放并朝向腔室的方向水平移动的第四过程，然后另一个保持器中的另一把手水平朝向与腔室相对应的方向水平移动。

8. 发明申请

WO2006041240A1 LARGE-SIZE OLED MANUFACTURING APPARATUS USING INK- JET PRINTING TECHNIQUES AND LOW MOLECULE THERMAL DEPOSITION TECHNIQUES 审中-公开
标题翻译：使用喷墨打印技术和低分子热沉积技术的大尺寸OLED制造设备
公开(公告)号：WO2006041240A1
公开(公告)日：2006-04-20
申请号：PCT/KR2005/000276
申请日：2005-01-31
申请人： DOOSAN DND CO., LTD. , HWANG, Chang-Hun , KIM, Do-Gon , KIM, Seung-Han
发明人： HWANG, Chang-Hun , KIM, Do-Gon , KIM, Seung-Han
IPC分类号： H05B33/10
CPC分类号： H01L21/67173 , H01L21/67207 , H01L21/67236 , H01L51/0005 , H01L51/56
摘要： An in-line OLED manufacturing apparatus, in which chambers used to manufacture OLEDs are connected in a line so that the OLEDs are manufactured under the condition that substrates moves linearly. In the in-line OLED manufacturing apparatus, a plurality of carrier chambers and a plurality of buffer chambers are alternately disposed in a line, a loading chamber and an unloading chamber are respectively disposed at the carrier chambers of both ends of the line, and process chambers for performing steps of a process for manufacturing OLED substrates are disposed at the respective carrier chambers.
摘要翻译：一种在线OLED制造装置，其中用于制造OLED的室连接成一行，使得在基板线性移动的条件下制造OLED。在线内OLED制造装置中，多个载体室和多个缓冲室交替地设置在管线中，装载室和卸载室分别设置在管线两端的载体室处，并且处理用于执行制造OLED基板的工艺步骤的室设置在相应的载体室处。

9. 发明申请

WO2006041239A1 MULTI-NOZZLE CRUCIBLE ASSEMBLY FOR OLED DEPOSITION PROCESS 审中-公开
标题翻译：用于OLED沉积工艺的多孔可溶性组件
公开(公告)号：WO2006041239A1
公开(公告)日：2006-04-20
申请号：PCT/KR2005/000249
申请日：2005-01-28
申请人： DOOSAN DND CO., LTD. , HWANG, Chang-Hun
发明人： HWANG, Chang-Hun
IPC分类号： H05B33/10
CPC分类号： C23C14/12 , C23C14/243 , H01L51/001
摘要： The present invention relates to the crucible assembly used as a evaporation source in the OLED deposition process, particularly, when the crucible is heated, the organic material is evaporated and the resulting organic vapor is deposited on the substrate located at the opposite side to produce the OLED substrate, and to accomplish the uniform deposition of organic vapor, the multi nozzle part (40) which controls the direction and quantity of organic vapor material and the cylinder type crucible (50) which has open structure on the top portion are combined, particularly, in the process of OLED deposition process, is designed to improve the uniformity of the thin film significantly and is also to improve the efficiency of organic material consumption.
摘要翻译：本发明涉及在OLED沉积工艺中用作蒸发源的坩埚组件，特别是当坩埚被加热时，有机材料被蒸发并且所得的有机蒸气沉积在位于相对侧的基板上，以产生 OLED基板，并且为了实现有机蒸气的均匀沉积，控制有机蒸气材料的方向和数量的多喷嘴部分（40）和顶部具有开放结构的圆筒型坩埚（50）组合，特别是在OLED沉积工艺的过程中，旨在显着提高薄膜的均匀性，也是提高有机材料消耗的效率。

10. 发明申请

WO2006033508A1 INDUCTIVELY COUPLED PLASMA TREATMENT APPARATUS 审中-公开
标题翻译：电感耦合等离子体处理装置
公开(公告)号：WO2006033508A1
公开(公告)日：2006-03-30
申请号：PCT/KR2005/000270
申请日：2005-01-29
申请人： DOOSAN DND CO., LTD. , HWANG, Chang-Hun , AHN, Jeong-Su
发明人： HWANG, Chang-Hun , AHN, Jeong-Su
IPC分类号： H01L21/68
CPC分类号： H01J37/32733 , H01J37/321 , H01L21/68742 , H01L21/68792
摘要： Disclosed herein is an inductively coupled plasma treatment apparatus configured such that a substrate chuck thereof is vertically movable with a high accuracy and a plasma is discharged from the center of a bottom wall of a chamber, thereby performing a substrate plasma treatment under optimum process conditions.
摘要翻译：这里公开了一种电感耦合等离子体处理装置，其被配置为使得其基板卡盘可高精度地垂直移动，并且等离子体从腔室的底壁的中心排出，从而在最佳工艺条件下进行基板等离子体处理。

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