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    • 3. 发明申请
    • SULPHONIUM SALT INITIATORS
    • 硫酸钡发射器
    • WO2009047151A1
    • 2009-04-16
    • PCT/EP2008/062988
    • 2008-09-29
    • CIBA HOLDING INC.HAYOZ, PascalYAMATO, Hitoshi
    • HAYOZ, PascalYAMATO, Hitoshi
    • C07C381/12C09D5/03C09D5/08G03F7/004
    • G03F7/0045B33Y70/00C07C321/28C07C381/12C09D4/00C09D11/101G03F7/0007G03F7/031G03F7/038G03F7/0382G03F7/0392Y10S430/122Y10S430/123
    • Compounds of the formula (I), wherein X is a single bond, CR a R b O, S, NR C , NCOR C , CO, SO or SO 2 ; L, L 1 , L 2 , L 3 , L 4 , L 5 , L 6 , L 7 and L 8 are for example hydrogen, R 1 or COT; T denotes T 1 or O-T 2 ; T 1 and T 2 for example are hydrogen, C 1 -C 20 alkyl, C 3 -C 12 cycloalkyl, C 2 -C 20 alkenyl, C 5 - C 12 cycloalkenyl, C 6 -C 14 aryl, C 3 -C 12 heteroaryl, C 1 -C 20 alkyl substituted by one or more D, C 2 - C 20 alkyl interrupted by one or more E, C 2 -C 20 alkyl substituted by one or more D and inter- rupted by one or more E or Q; R 1 , R 2 , R 3 , R 4 , R a , R b and R c are T 1 ; D is for example R 5 , OR 5 , SR 5 or Q 1 ; E is for example O, S, COO or Q 2 ; R 5 and R 6 for example are hydrogen, C 1 - C 12 alkyl or phenyl; Q is for example C 6 -C 12 bicycloalkyl, C 6 -C 12 bicycloalkenyl or C 6 - C 12 tricycloalkyl; Q 1 is for example, C 6 -C 14 aryl or C 3 -C 12 heteroaryl; Q 2 is for example C 6 - C 14 arylene or C 3 -C 12 heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L 1 , L 2 , L 3 , L 4 , L 5 , L 6 , L 7 and L 8 is other than hydrogen; and provided that (i) at least one of T 1 or T 2 is a group Q; or (ii) at least one D is a group Q 1 ; or (iii) at least one E is a group Q 2 ; are suitable as photolatent catalysts.
    • 式(I)化合物,其中X为单键,CRaRbO,S,NRC,NCORC,CO,SO或SO2; L,L1,L2,L3,L4,L5,L6,L7和L8例如为氢,R1或COT; T表示T1或O-T2; 例如,T 1和T 2是氢,C 1 -C 20烷基,C 3 -C 12环烷基,C 2 -C 20链烯基,C 5 -C 12环烯基,C 6 -C 14芳基,C 3 -C 12杂芳基,被一个或多个D,C 2 -C 20烷基取代的C 1 -C 20烷基,被一个或多个 E,被一个或多个D取代并被一个或多个E或Q中断的C 2 -C 20烷基; R1,R2,R3,R4,Ra,Rb和Rc为T1; D是例如R5,OR5,SR5或Q1; E例如为O,S,COO或Q2; R 5和R 6例如是氢,C 1 -C 12烷基或苯基; Q为例如C 6 -C 12二环烷基,C 6 -C 12双环烯基或C 6 -C 12三环烷基; Q1是例如C 6 -C 14芳基或C 3 -C 12杂芳基; Q2是例如C 6 -C 14亚芳基或C 3 -C 12杂芳基; Y是阴离子; M是阳离子; 条件是L,L1,L2,L3,L4,L5,L6,L7和L8中的至少一个不是氢; 并且(i)T1或T2中的至少一个是组Q; 或(ii)至少一个D为基团Q1; 或(iii)至少一个E为基团Q2; 适合作为光催化剂。
    • 6. 发明申请
    • HEAT-SENSITIVE COATING COMPOSITIONS BASED ON RESORCINYL TRIAZINE DERIVATIVES
    • 基于间苯二酚衍生物的热敏涂料组合物
    • WO2008110487A1
    • 2008-09-18
    • PCT/EP2008/052637
    • 2008-03-05
    • CIBA HOLDING INC.CUNNINGHAM, Allan, FrancisEHLIS, ThomasBIRBAUM, Jean-LucHAYOZ, PascalFONDEKAR, Kamalesh Pai
    • CUNNINGHAM, Allan, FrancisEHLIS, ThomasBIRBAUM, Jean-LucHAYOZ, PascalFONDEKAR, Kamalesh Pai
    • C09D5/26C09D7/00C07D251/24C08K5/3492C07D251/14B41M5/333
    • B41M5/3335B41M5/3336C08K5/3492C09D5/26C09D7/41Y10T428/24802
    • The present invention provides heat-sensitive coating compositions, which comprise a a colour developer of formula (1) or mixtures thereof wherein R 1 can be hydrogen, C 1-20 -alkyl, C 3-8 -cycloalkyl, C 2-10 -alkenyl, aryl or SO 3 H, and R 2 and R 3 can be the same or different and can be hydrogen, halogen, C 1-20 -alkyl, C 3-8 -cyclo-alkyl, C 2-10 -alkenyl, aryl, OR 6 , NR 7 R 8 , SR 9 , SO 3 H or COOR 10 and R 4 and R 5 can be the same or different, and can be hydrogen, halogen, C 1-20 -alkyl, C 3-8 -cyclo-alkyl, C 2-10 -alkenyl, aryl, OR 6 , NR 7 R 8 or SR 9 , R 6 , R 7 , R 8 , R 9 and R 10 can be the same or different and can be hydrogen, C 1-30 -alkyl, C 3-8 -cycloalkyl, C 2-10 -alkenyl or aryl, wherein C 1-20 -alkyl can be unsubstituted or substituted with one or more C 3-8 -cycloalkyl, C 2-10 -alkenyl, phenyl, halogen, OR 11 , NR 12 R 13 , SR 14 , SO 3 H or COOR 15 , and aryl can be unsubstituted or substituted with one or more halogen, C 1-10 -alkyl, halogenated C 1-10 -alkyl, C 3-8 -cycloalkyl, C 2-10 -alkenyl, phenyl, OR 11 , NR 12 R 13 , SR 14 , SO 3 H or COOR 15 , wherein R 11 , R 12 , R 13 , R 14 and R 15 can be the same or different and can be hydrogen, C 1-10 -alkyl, C 3-8 -cycloalkyl or C 2-10 -alkenyl, a process for the preparation of these compositions, a process of coating substrates with these compositions, substrates coated with these compositions, a process for preparing marked substrates using these compositions, marked substrates obtainable by the latter process, and certain colour developers.
    • 本发明提供热敏涂料组合物,其包含式(1)的显色剂或其混合物,其中R 1可以是氢,C 1〜20位 - 烷基 C 3-8 - 环烷基,C 2-10 - 烯基,芳基或SO 3 H,R 2, SO 2和R 3可以相同或不同,并且可以是氢,卤素,C 1-20 - 烷基,C 3-8 - 环烷基,C 2-10 - 烯基,芳基,OR 6,NR 7,R 8, SO 3,SO 3 H或COOR 10和R 4和R 5, 可以是相同或不同的,并且可以是氢,卤素,C 1-20 - 烷基,C 3-8 - 环烷基,C 2- 10个 - 烯基,芳基,OR 6,NR 7 R 8或SR 9,R 7,R 7,R 8,R 9和R 10可以是 相同或不同,可以是氢,C 1-3 - 烷基,C 3-8 - 环烷基,C 2-10 - 烯基或芳基,其中C 1-20 - 烷基可以是未取代的或被一个或多个C 3-8 - 环烷基,C 2-10 - 亚烷基,苯基,卤素,OR 11,NR 12,R 13,SR 14, H 3或COOR 15,且芳基可以是未取代的或被一个或多个卤素取代,C 1-10烷基,卤代C 可以相同或不同,并且可以是氢,C 1-10 - 烷基,C 3-8 - 环烷基或C 2-10 - 烯基,这些组合物的制备方法,用这些组合物涂覆基质的方法,用这些组合物涂覆的基材,使用这些共聚物制备标记的底物的方法 可以通过后一种方法获得的粘合剂,标记的底物和某些彩色显影剂。