专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012089224A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2012089224A1
公开(公告)日：2012-07-05
申请号：PCT/EP2010/007953
申请日：2010-12-28
申请人： CARL ZEISS SMT GMBH , PATRA, Michael , BIELING, Stig , DEGÜNTHER, Markus , SCHLESENER, Frank , SCHWAB, Markus
发明人： PATRA, Michael , BIELING, Stig , DEGÜNTHER, Markus , SCHLESENER, Frank , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70158 , G03F7/70058
摘要： An illumination system of a microlithographic projection exposure apparatus (10) comprises a light source (30), which is configured to produce a projection light beam (34), and a first and a second diffractive optical element (42, 44; 242, 244) arranged between the light source (30) and a pupil plane (84). The diffractive effect produced by each diffractive optical element depends on the position of a light field (110) that is irradiated by the projection light beam (34) on the diffractive optical elements (42, 44; 242, 244). A displacement mechanism (54, 64) changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism (54, 64), the light field (110) extends both over the first and the second diffractive optical element (42, 44; 242, 244). This makes it possible to produce in a simple manner continuously variable illumination settings.
摘要翻译：微光刻投影曝光装置（10）的照明系统包括被配置为产生投影光束（34）的光源（30）和第一和第二衍射光学元件（42,44; 242,244））布置在光源（30）和光瞳平面（84）之间。由每个衍射光学元件产生的衍射效应取决于由投影光束（34）照射在衍射光学元件（42,44; 242,244）上的光场（110）的位置。位移机构（54,64）改变衍射光学元件的相互空间布置。在借助位移机构（54,64）可获得的相互空间布置中的至少一个中，光场（110）在第一和第二衍射光学元件（42,44; 242）之上延伸，244）。这使得可以以简单的方式生产连续可变的照明设置。

2. 发明申请

WO2013104744A1 POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：特别是在微波投影曝光装置中的极化影响光学布置
公开(公告)号：WO2013104744A1
公开(公告)日：2013-07-18
申请号：PCT/EP2013/050462
申请日：2013-01-11
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHLESENER, Frank
发明人： SÄNGER, Ingo , SCHLESENER, Frank
IPC分类号： G02B5/30 , G03F7/20
CPC分类号： G03F7/7015 , G02B5/3083 , G02B27/281 , G03F7/70275 , G03F7/70308 , G03F7/70566 , G03F7/70891 , G03F7/70966
摘要： The invention relates to a polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus. According to an aspect of the disclosure, a polarization-influencing optical arrangement comprises a first retardation element (110, 310, 410), which comprises at least one first partial element (111, 311, 411) composed of optically positively uniaxial crystal material and at least one second partial element (112, 312, 412) composed of optically negatively uniaxial crystal material, and a second retardation element (120, 320, 420), which comprises at least one third partial element (121, 321, 421) composed of optically positively uniaxial crystal material and at least one fourth partial element (122, 322, 422) composed of optically negatively uniaxial crystal material, wherein in at least one configuration of the polarization-influencing optical arrangement (100, 300, 400) the polarization-influencing effect of the first retardation element (110, 310, 410) corresponds to the effect of a first lambda/2 plate having a first fast axis of the birefringence and the polarization-influencing effect of the second retardation element (120, 320, 420) corresponds to the effect of a second lambda/2 plate having a second fast axis of the birefringence, wherein the angle between the first fast axis and the second fast axis is 45°±5°.
摘要翻译：本发明涉及一种偏振影响光学装置，特别是在微光刻投影曝光装置中。根据本公开的一个方面，偏振影响光学装置包括第一延迟元件（110,310,410），其包括由光学正性单轴晶体材料构成的至少一个第一部分元件（111,311,411）和由光学负单轴晶体材料构成的至少一个第二部分元件（112,312,412）和包括至少一个第三部分元件（121,321,421）的第二延迟元件（120,320,420），所述第三部分元件的光学正单轴晶体材料和由光学负单轴晶体材料构成的至少一个第四部分元件（122,322,422），其中在偏振影响光学装置（100,300,400）的至少一个配置中，极化第一延迟元件（110,310,410）的影响对应于具有双折射的第一快轴和偏振影响的第一λ/ 2板的效果第二延迟元件（120,320,420）的效果对应于具有双折射的第二快轴的第二λ/ 2板的作用，其中第一快轴和第二快轴之间的角度为45°± 5°。

3. 发明申请

WO2014048828A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD 审中-公开
标题翻译：微观投影曝光装置和微观曝光方法的光学系统
公开(公告)号：WO2014048828A1
公开(公告)日：2014-04-03
申请号：PCT/EP2013/069458
申请日：2013-09-19
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHLESENER, Frank
发明人： SÄNGER, Ingo , SCHLESENER, Frank
IPC分类号： G03F7/20 , G02B27/28
CPC分类号： G03F7/70191 , G02B5/3075 , G02B17/002 , G02B26/0816 , G02B27/286 , G03F7/70116 , G03F7/70566
摘要： The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises at least one mirror arrangement (200, 400) having a plurality of mirror elements (200a, 200b, 200c,..., 400a, 400b, 400c,... ), wherein these mirror elements can be adjusted independently of one another for changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical arrangement (110, 210, 310, 320, 330) which is arranged downstream of the mirror arrangement (200, 400) in the light propagation direction, wherein the polarization-influencing optical arrangement (110, 210, 310, 320, 330) reflects a light beam incident on the arrangement (110, 210, 310, 320, 330) in at least two reflections, which do not occur in a common plane, for at least one angular distribution of the light reflected by the mirror arrangement (200, 400).
摘要翻译：本发明涉及一种用于微光刻投影曝光装置的光学系统和一种微光刻曝光方法。一种用于微光刻投影曝光装置的光学系统包括至少一个具有多个反射镜元件（200a，200b，200c，...，400a，400b，400c，...）的反射镜装置（200,400），其中这些镜子元件可以彼此独立地调节，以改变由反射镜装置反射的光的角度分布;以及偏振影响光学装置（110,210,310,320,330），其布置在反射镜装置的下游 200,140,320,330）在光传播方向上偏振影响光学布置（110,210,310,320,330）至少反射入射在所述布置（110,210,310,320,330）上的光束对于由反射镜装置（200,400）反射的光的至少一个角度分布，在公共平面中不发生两个反射。

4. 发明申请

WO2013056981A1 MICROLITHOGRAPHIC EXPOSURE METHOD AND ILLUMINATION DEVICE 审中-公开
标题翻译：微观曝光方法和照明装置
公开(公告)号：WO2013056981A1
公开(公告)日：2013-04-25
申请号：PCT/EP2012/069621
申请日：2012-10-04
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SINGER, Wolfgang , GÖHNERMEIER, Aksel , SCHLESENER, Frank
发明人： SÄNGER, Ingo , SINGER, Wolfgang , GÖHNERMEIER, Aksel , SCHLESENER, Frank
IPC分类号： G02F1/01 , G03F7/20
CPC分类号： G03F7/70116 , G02F1/0131 , G03F7/70566
摘要： The invention relates to a microlithographic exposure method and to an illumination device. In a microlithographic exposure method an illumination device illuminates an object plane of a projection lens, wherein the object plane is imaged into an image plane of the projection lens (20) by means of the projection lens (20), wherein the illumination device (10) comprises at least one retardation element by means of which, for light impinging on the retardation element, a temporally varying retardation dependent on the location of the impingement can be generated, wherein at least two light rays are directed through different regions of the retardation element, which differ from one another with regard to the retardation respectively generated by the retardation element, and wherein the retardation element is a photoelastic modulator (100).
摘要翻译：本发明涉及微光刻曝光方法和照明装置。在微光刻曝光方法中，照明装置照射投影透镜的物平面，其中通过投影透镜（20）将物平面成像到投影透镜（20）的像平面中，其中照明装置）包括至少一个延迟元件，通过该延迟元件，对于光照射在延迟元件上，可产生取决于冲击位置的随时间变化的延迟，其中至少两个光线被引导通过延迟元件的不同区域，其相对于由相位差元件分别产生的延迟而彼此不同，并且其中延迟元件是光弹性调制器（100）。

5. 发明申请

WO2013060561A1 OPTICAL SYSTEM IN AN ILLUMINATION DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微晶投影曝光装置照明装置中的光学系统
公开(公告)号：WO2013060561A1
公开(公告)日：2013-05-02
申请号：PCT/EP2012/069632
申请日：2012-10-04
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHLESENER, Frank
发明人： SÄNGER, Ingo , SCHLESENER, Frank
IPC分类号： G03F7/20
CPC分类号： G03F7/70108 , G03F7/70158 , G03F7/70566
摘要： The invention relates to an optical system in an illumination device of a microlithographic projection exposure apparatus. According to one aspect, an optical system in an illumination device of a microlithographic projection exposure apparatus has at least one polarization-influencing element (110, 210, 310, 410, 510, 610), which, during the operation of the projection exposure apparatus, brings about a change in the polarization state of passing-through light, which change varies over the light-beam cross section, and at least one diffractive structure (130, 230, 430, 530, 630), which is arranged such that it and the polarization-influencing element directly follow one another in the light-propagation direction and, during the operation of the projection exposure apparatus, brings about a ray deflection of passing-through light, which ray deflection varies over the light-beam cross section, wherein the polarization-influencing element (110, 210, 310, 410, 510, 610) is produced from linearly or circularly birefringent material and has a geometry which, at least in regions, is wedge-shaped.
摘要翻译：本发明涉及微光刻投影曝光装置的照明装置中的光学系统。根据一个方面，微光刻投影曝光装置的照明装置中的光学系统具有至少一个偏振影响元件（110,210,310,410,510,610），其在投影曝光装置的操作期间导致光束横截面上变化的穿透光的偏振状态的变化，以及至少一个衍射结构（130,230,430,530,630），其被设置成使得它并且偏振影响元件在光传播方向上直接相互依赖，并且在投影曝光装置的操作期间，引起光束横截面上的射线偏转变化的穿透光的射线偏转，其中所述偏振影响元件（110,210,310,410,510,610）由线性或圆形双折射材料制成，并且具有至少在区域中是楔形的几何形状。

6. 发明申请

WO2013156278A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的光学系统
公开(公告)号：WO2013156278A1
公开(公告)日：2013-10-24
申请号：PCT/EP2013/056442
申请日：2013-03-26
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHLESENER, Frank
发明人： SÄNGER, Ingo , SCHLESENER, Frank
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B5/3066 , G02B5/3075 , G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising at least one polarization-influencing arrangement (100, 200,...) having a first reflection surface (110, 210,...) and a second reflection surface (120, 220,...), wherein the first reflection surface (110, 210,...) and the second reflection surface (120, 220,...) are arranged at an angle of 0°±10° or at an angle of 90°±10° relative to one another, wherein light incident on the first reflection surface (110, 210,...) during the operation of the optical system forms an angle of 45°±5° with said first reflection surface, and wherein the polarization-influencing arrangement (100, 200,...) is rotatable about a rotation axis (A) running parallel to the light propagation direction of light incident on the first reflection surface (110, 210,...) during the operation of the optical system.
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统，特别是用于在EUV中操作的光学系统，包括至少一个具有第一反射表面（110,210，...）的偏振影响装置（100,200，...） ...）和第二反射表面（120,220，...），其中所述第一反射表面（110,210，...）和所述第二反射表面（120,220，...）角度为0°±10°或相对于彼此为90°±10°的角度，其中在光学系统的操作期间入射在第一反射表面（110,210，...）上的光形成角度 45°±5°，并且其中所述偏振影响装置（100,200，...）能够围绕与入射在所述第一反射面上的光的光传播方向平行的旋转轴线（A）旋转在光学系统的操作期间的表面（110,210，...）。

7. 发明申请

WO2013143803A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的光学系统
公开(公告)号：WO2013143803A1
公开(公告)日：2013-10-03
申请号：PCT/EP2013/054202
申请日：2013-03-01
申请人： CARL ZEISS SMT GMBH , SCHLESENER, Frank , SÄNGER, Ingo
发明人： SCHLESENER, Frank , SÄNGER, Ingo
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B5/3083 , G03F7/70116 , G03F7/70566 , G03F7/70966
摘要： The invention relates to an optical system of a microlithographic projection exposure apparatus, comprising at least one mirror arrangement (120, 320, 420, 520, 620, 720, 820, 920, 960), having a plurality of mirror elements (120a, 120b, 120c,...) which are adjustable independently of one another for varying an angular distribution of the light reflected by the mirror arrangement, a polarization-influencing optical arrangement (110, 210, 310, 410, 510, 610, 710, 810, 910, 950), by means of which, for a light beam passing through during the operation of the projection exposure apparatus, different polarization states can be set by means of the light beam cross section, and a retarder arrangement (130, 230, 330, 430, 530, 630, 730, 830, 930, 970), which is arranged upstream of the polarization-influencing optical arrangement in the light propagation direction and at least partly compensates for a disturbance of the polarization distribution that is present elsewhere in the projection exposure apparatus, wherein the polarization-influencing optical arrangement has optical components (111 -113, 311 -313, 411-413, 511-513, 611-613, 711-713, 811-813, 911-913, 951-953) which are adjustable in their relative position with respect to one another, wherein different output polarization distributions can be produced by this adjustment in conjunction with the mirror arrangement.
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统，包括至少一个具有多个镜元件（120a，120b）的反射镜装置（120,320,420,520,620,720,820,920,960），120c，...），其可彼此独立地调节，以改变由反射镜装置反射的光的角分布;偏振影响光学装置（110,210,310,410,510,610,710,810 ，910,950），通过它们，对于在投影曝光装置的操作期间通过的光束，可以通过光束横截面来设定不同的偏振状态，并且延迟器装置（130,230， 330,430,530,630,730,830,930,970），其在光传播方向上布置在偏振影响光学装置的上游，并且至少部分地补偿在其他地方存在的偏振分布的干扰投影exp 其中所述偏振影响光学装置具有光学部件（111-131,313,313,411-413,511-513,611-613,711-713,811-813,911-913,951-953）它们可以相对于彼此相对位置调节，其中通过结合镜子装置的这种调整可以产生不同的输出偏振分布。

8. 发明申请

WO2013013947A2 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC EXPOSURE METHOD 审中-公开
标题翻译：微型投影曝光装置的光学系统及微型曝光方法
公开(公告)号：WO2013013947A2
公开(公告)日：2013-01-31
申请号：PCT/EP2012/063102
申请日：2012-07-05
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , ZIMMERMANN, Jörg , RUOFF, Johannes , MEIER, Martin , SCHLESENER, Frank , HENNERKES, Christoph
发明人： SÄNGER, Ingo , ZIMMERMANN, Jörg , RUOFF, Johannes , MEIER, Martin , SCHLESENER, Frank , HENNERKES, Christoph
IPC分类号： G03F7/20 , G02B27/10 , G02B27/28 , G02B5/09
CPC分类号： G03F7/70191 , G02B27/283 , G03F7/70108 , G03F7/70116 , G03F7/70566
摘要： The disclosure relates to optical systems of a microlithographic projection exposure apparatus, and to a microlithographic exposure method. According to an aspect of the disclosure, an optical system has a light source, a ray-splitting optical element (110, 310, 410, 510, 706), which splits a light ray incident on this element when the projection exposure apparatus is in operation into a first partial ray (S101, S301, S401, S501, S701) and a second partial ray (S102, S302, S402, S502, S702), with the first and the second partial ray having mutually orthogonal polarization directions, and at least one ray-deflecting optical element (205, 206, 330, 340, 350, 360, 370, 470, 530, 540, 710, 720, 730, 810, 820, 830) for generating a desired polarized illumination setting from the first partial ray (S101, S301, S401, S501, S701) and the second partial ray (S102, S302, S402, S502, S702), wherein the ray-splitting optical element (110, 310, 410, 510, 706) is arranged such that light incident on this ray-splitting optical element when the projection exposure apparatus is in operation has a degree of polarization of less than one.
摘要翻译：本公开涉及微光刻投影曝光设备的光学系统，并且涉及微光刻曝光方法。根据本公开的一个方面，光学系统具有光源，当投影曝光设备处于入射时将入射在该元件上的光线分开的光线分离光学元件（110,310,410,510,706）在第一和第二部分光线具有相互正交的偏振方向的情况下将第一部分光线（S101，S301，S401，S501，S701）和第二部分光线（S102，S302，S402，S502，S702）至少一个用于从第一个偏振照明装置产生期望的偏振照明设置的光线偏转光学元件（205,206,330,340,350,360,370,470,530,540,710,720,730,810,820,830）（110,310,410,510,706）排列的部分光线（S101，S301，S401，S501，S701）和第二部分光线（S102，S302，S402，S502，S702）使得当投影曝光装置在操作中时入射到该光线分离光学元件上的光具有小于1的偏振度。

9. 发明申请

WO2013007731A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 审中-公开
标题翻译：投影光刻照明光学单元
公开(公告)号：WO2013007731A1
公开(公告)日：2013-01-17
申请号：PCT/EP2012/063520
申请日：2012-07-11
申请人： CARL ZEISS SMT GMBH , HENNERKES, Christoph , SÄNGER, Ingo , ZIMMERMANN, Jörg , RUOFF, Johannes , MEIER, Martin , SCHLESENER, Frank
发明人： HENNERKES, Christoph , SÄNGER, Ingo , ZIMMERMANN, Jörg , RUOFF, Johannes , MEIER, Martin , SCHLESENER, Frank
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B7/1815 , G02B17/06 , G02B26/0816 , G03F7/70108 , G03F7/70116 , G03F7/70891
摘要： An illumination optical unit for projection lithography has a first polarization mirror device (16) for the reflection and polarization of illumination light (3). A second mirror device (22), which is disposed downstream of the polarization mirror device (16), serves for the reflection of an illumination light beam (25). At least one drive device (21; 27) is operatively connected to at least one of the two mirror devices (16; 22). The two mirror devices (16; 22) are displaceable relative to one another with the aid of the drive device (21; 27) between a first relative position, which leads to a first beam geometry of the illumination light beam (25) after reflection at the second mirror device (22), and a second relative position, which leads to a second beam geometry of the illumination light beam (25) after reflection at the second mirror device (22), which is different from the first beam geometry. This results in a flexible predefinition of different illumination geometries, in particular of different illumination geometries with rotationally symmetrical illumination.
摘要翻译：用于投影光刻的照明光学单元具有用于照明光（3）的反射和偏振的第一偏振镜装置（16）。设置在偏振镜装置（16）下游的第二镜装置（22）用于照明光束（25）的反射。至少一个驱动装置（21; 27）可操作地连接到两个反射镜装置（16; 22）中的至少一个。借助于驱动装置（21; 27），两个反射镜装置（16; 22）可相对于彼此移动，该第一相对位置在第一相对位置之间，该第一相对位置在反射之后导致照明光束（25）的第一光束几何形状在第二反射镜装置（22）和第二相对位置，其在第二反射镜装置（22）反射之后导致照明光束（25）的第二光束几何形状，其与第一光束几何形状不同。这导致不同照明几何形状的灵活预定义，特别是具有旋转对称照明的不同照明几何形状。

10. 发明申请

WO2013143594A1 APPARATUS AND METHOD FOR COMPENSATING A DEFECT OF A CHANNEL OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM 审中-公开
标题翻译：补偿微波投影曝光系统通道缺陷的装置及方法
公开(公告)号：WO2013143594A1
公开(公告)日：2013-10-03
申请号：PCT/EP2012/055621
申请日：2012-03-29
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHLESENER, Frank
发明人： SÄNGER, Ingo , SCHLESENER, Frank
IPC分类号： G03F7/20
CPC分类号： G03F7/2006 , G02B5/3083 , G03F7/20 , G03F7/70116 , G03F7/70191 , G03F7/70425 , G03F7/70566
摘要： The invention relates to an illumination system of a microlithographic projection exposure apparatus comprising (a) a plurality of channels, each channel guiding a partial beam and at least one channel comprising at least one defect, and (b) at least one optical element arranged within the at least one channel having the at least one defect, the optical element being adapted to at least partially compensate the at least one defect of the partial beam of the channel.
摘要翻译：本发明涉及一种微光刻投影曝光装置的照明系统，包括（a）多个通道，每个通道引导局部光束和至少一个包含至少一个缺陷的通道，以及（b）至少一个光学元件，其布置在所述至少一个通道具有所述至少一个缺陷，所述光学元件适于至少部分地补偿所述通道的所述部分光束的所述至少一个缺陷。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式