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1. 发明申请

WO2022043110A1 OPTISCHES ELEMENT, OPTISCHE ANORDNUNG UND VERFAHREN ZUM HERSTELLEN EINES OPTISCHEN ELEMENTS 审中-公开
公开(公告)号：WO2022043110A1
公开(公告)日：2022-03-03
申请号：PCT/EP2021/072709
申请日：2021-08-16
申请人： CARL ZEISS SMT GMBH
发明人： NEFZI, Marwene , HEMBACHER, Stefan , KUGLER, Jens , SCHREZENMEIER, Irina
IPC分类号： G03F7/20 , G02B7/185
摘要： Die Erfindung betrifft ein optisches Element (21), umfassend: ein Substrat (30), sowie eine an dem Substrat (30) gebildete optische Oberfläche (32). In das Substrat (30) ist mindestens eine, bevorzugt eine Mehrzahl von fluiddicht abgeschlossenen Kammern (33) eingebettet, in die ein rheologisches Fluid (34) eingebracht ist, um die optische Oberfläche (32) zu verformen. Die Erfindung betrifft auch eine optische Anordnung, insbesondere ein EUV-Lithographiesystem, umfassend: mindestens ein optisches Element (21) wie weiter oben beschrieben, sowie eine Felderzeugungseinrichtung (17b) zur Erzeugung eines bevorzugt zeitlich veränderlichen elektro-magnetischen Felds, insbesondere eines Magnetfelds (38), welches die mindestens eine Kammer (33) durchsetzt, in die das rheologische Fluid (34) eingebracht ist, sowie ein Verfahren zum Herstellen eines optischen Elements (31), das wie weiter oben beschrieben ausgebildet ist.

2. 发明申请

WO2021052940A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY 审中-公开
公开(公告)号：WO2021052940A1
公开(公告)日：2021-03-25
申请号：PCT/EP2020/075725
申请日：2020-09-15
申请人： CARL ZEISS SMT GMBH
发明人： KUGLER, Jens , FEYGIN, Mark , XALTER, Stefan , HEMBACHER, Stefan , GELLRICH, Bernhard
IPC分类号： G02B7/182 , G02B7/02 , G03F7/20
摘要： The invention relates to a projection exposure apparatus (1) for semiconductor lithography having a projection optical unit (9) comprising a sensor frame (30), a carrying frame (40), having a module (50) having an optical element (52) and actuators (53) for positioning and orienting the optical element (52), wherein the module (50) is arranged on the carrying frame (40) and the sensor frame (30) is embodied as a reference for the positioning of the optical element (52), and wherein the module (50) comprises an infrastructure (60). According to the invention, the infrastructure (60) is embodied such that it comprises interfaces (62, 70) for separating a module (50) from the projection optical unit (9). Furthermore, the invention comprises a method for exchanging a module (50) of a projection optical unit (9) of a projection exposure apparatus (1) for semiconductor lithography, wherein the module (50) comprises an optical element (52). According to the invention, a reference (55) for positioning and/or orienting the optical element (52) remains in the projection exposure apparatus (1) during the exchange of the module (50).

3. 发明申请

WO2017092815A1 OPTICAL IMAGING ARRANGEMENT WITH ACTIVELY ADJUSTABLE METROLOGY SUPPORT UNITS 审中-公开
标题翻译：具有可调整的计量支持单元的光学成像装置
公开(公告)号：WO2017092815A1
公开(公告)日：2017-06-08
申请号：PCT/EP2015/078548
申请日：2015-12-03
申请人： CARL ZEISS SMT GMBH
发明人： HEMBACHER, Stefan , GEUPPERT, Bernhard , KUGLER, Jens
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70266 , G03F7/70825 , G03F7/709
摘要： The invention relates to an optical imaging arrangement (101) comprising an optical projection system (102), a support structure system (111, 112), and a control device (109). The optical projection system (102) comprises a group of optical elements supported by the support structure system (111, 112) and configured to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask (103.1) onto a substrate (104.1). The group of optical elements comprises a first optical element (106.6) and a second optical element (106.2) and the control device (109) comprises a sensor device(110) and an active device (113). The sensor device(110) is functionally associated to the first optical element(106.6) and is configured to capture mechanical disturbance information representative of a mechanical disturbance acting on the first optical element (106.6) in at least one degree of freedom up to all six degrees of freedom. The control device (109) is configured to control the active device (113) as a function of the mechanical disturbance information, such that the active device (113) acts on one of the optical elements (106.6) to at least partially correct an optical imaging error of the optical imaging arrangement (101) during the exposure process resulting from the mechanical disturbance acting on the first optical element (106.6). The active device (113) at least acts on the second optical element (106.2) to at least partially correct the optical imaging error.
摘要翻译：本发明涉及包括光学投影系统（102），支撑结构系统（111,112）和控制装置（109）的光学成像装置（101）。光学投影系统（102）包括由支撑结构系统（111,112）支撑的一组光学元件，并且被配置为在曝光过程中使用曝光光沿着曝光光路传送掩模图案的图像（103.1）到衬底（104.1）上。该组光学元件包括第一光学元件（106.6）和第二光学元件（106.2），并且控制装置（109）包括传感器装置（110）和有源装置（113）。传感器装置（110）在功能上与第一光学元件（106.6）相关联，并且被配置为捕获表示作用于第一光学元件（106.6）上的机械干扰的机械干扰信息，该机械干扰信息在至少一个自由度上直到全部六个自由程度。控制装置（109）被配置为根据机械干扰信息来控制有源装置（113），使得有源装置（113）作用于光学元件（106.6）中的一个以至少部分地校正光学元件由于作用在第一光学元件（106.6）上的机械干扰而引起的曝光过程期间光学成像装置（101）的成像误差。有源装置（113）至少作用于第二光学元件（106.2）以至少部分地校正光学成像误差。

4. 发明申请

WO2023016870A1 OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS 审中-公开
公开(公告)号：WO2023016870A1
公开(公告)日：2023-02-16
申请号：PCT/EP2022/071722
申请日：2022-08-02
申请人： CARL ZEISS SMT GMBH
发明人： KUGLER, Jens , NEFZI, Marwène , FETZER, Matthias
IPC分类号： G03F7/20 , G02B7/182
摘要： An optical element (100A, 100B) for a projection exposure apparatus (1), comprising a mirror body (104) having an optically active surface (102), the mirror body (104) comprising a base portion (106, 132) which carries a sensor system (108, 110) and an edge portion (120, 136) on which actuator connectors (122, 124, 126) for connecting actuators to the optical element (100A, 100B) are provided, the base portion (106, 132) having greater stiffness in comparison with the edge portion (120, 136), and the mirror body (104) comprising a stiffening rib structure (120, 130, 138, 140) attached to the edge portion (120, 136) on the back side.

5. 发明申请

WO2021233631A1 METHOD FOR MAINTAINING A PROJECTION EXPOSURE APPARATUS, SERVICE MODULE AND ARRANGEMENT FOR SEMICONDUCTOR LITHOGRAPHY 审中-公开
公开(公告)号：WO2021233631A1
公开(公告)日：2021-11-25
申请号：PCT/EP2021/060328
申请日：2021-04-21
申请人： CARL ZEISS SMT GMBH
发明人： EHM, Dirk , KUGLER, Jens , MODESTE, Benjahman, Julius , NEFZI, Marwene
IPC分类号： G03F7/20
摘要： The invention relates to a method for maintaining a projection exposure apparatus (1) comprising at least two modules (21, 22, 50) and a reference element (30, 40), wherein the modules (21, 22, 50) are referenced to the reference element (30, 40), having the following method steps: - Removing a module (21, 22, 50), - Attaching a service module (60) to or in the vicinity of the projection exposure appa- ratus (1), - Referencing the service module (60) to the reference element (30, 40) of the projection exposure apparatus (1), - Implementing a maintenance measure with the aid of the service module (60). Furthermore, the invention relates to a service module (60) and an arrangement (70) for semiconductor lithography with a projection exposure apparatus (1) comprising at least two modules (21, 22, 50) and a reference element (30, 40), wherein the modules (21, 22, 50) are referenced vis-à-vis the reference element (30, 40), and comprising a service module (60), wherein the service module (60) is referenced to the reference element (30, 40) of the projection exposure apparatus (1).

6. 发明申请

WO2021074054A1 METHOD FOR CONNECTING AN ATTACHMENT TO A MAIN BODY OF AN OPTICAL ELEMENT AND OPTICAL ELEMENT 审中-公开
公开(公告)号：WO2021074054A1
公开(公告)日：2021-04-22
申请号：PCT/EP2020/078557
申请日：2020-10-12
申请人： CARL ZEISS SMT GMBH
发明人： NEFZI, Marwene , KUGLER, Jens , ZACZEK, Christoph
IPC分类号： G02B5/08 , G02B7/00 , G02B26/08 , G03F7/20 , C03C27/00 , C04B37/00 , G02B5/10
摘要： The invention relates to a method for connecting at least one attachment (6) to a main body (2) of an optical element, in particular a reflecting optical element (1), comprising: producing a bonding connection (7) between a surface region (6a), in particular a curved surface region, of the attachment (6) and a surface region (2a), in particular a curved surface region, of the main body (2). The invention also relates to an optical element, in particular a reflecting optical element (1), comprising: a main body (2) and at least one attachment (6). A surface region (6a) of the attachment (6) and a surface region (2a) of the main body (2) are connected to one another by way of a bonding connection (7).

7. 发明申请

WO2017207016A1 OPTICAL IMAGING ARRANGEMENT WITH A PIEZOELECTRIC DEVICE 审中-公开
标题翻译：压电器件的光学成像装置
公开(公告)号：WO2017207016A1
公开(公告)日：2017-12-07
申请号：PCT/EP2016/062138
申请日：2016-05-30
申请人： CARL ZEISS SMT GMBH
发明人： KUGLER, Jens , HEMBACHER, Stefan , SCHMID, Michaela , GEUPPERT, Bernhard , CORVES, Burkhard , RIEDEL, Martin , WAHLE, Martin , HÜSING, Mathias , LORENZ, Michael , DETERT, Tim , NEFZI, Marwene
IPC分类号： G03F7/20 , G02B7/182
摘要： There is provided an optical imaging arrangement comprising an optical element unit (106.1), and an actuator device. The actuator device is connected to the optical element unit and is configured to be connected to a support structure (102.1) for supporting the optical unit. The actuator device is configured to actively adjust, in an adjustment state, a position and/or an orientation of the optical unit with respect to the support structure in N degrees of freedom. The actuator device is configured to support the optical element unit in a statically overdetermined manner in at least one of the N degrees of freedom via a plurality of active first and second actuator components (111.1, 111.2) such that, in a holding state following the adjustment state, the first and second actuator components cause a parasitic residual load (PRL) introduced into the optical element unit in the at least one of the N degrees of freedom. The actuator device comprises an active third actuator component (111.3) configured to at least partially compensate, in a parasitic residual load compensation state, the parasitic residual load introduced into the optical element unit in the at least one of the N degrees of freedom.
摘要翻译：提供了包括光学元件单元（106.1）和致动器装置的光学成像装置。致动器装置连接到光学元件单元并且被配置为连接到用于支撑光学单元的支撑结构（102.1）。致动器装置被配置为在调整状态下主动调整光学单元相对于支撑结构的N个自由度的位置和/或方位。致动器装置被配置为经由多个活动的第一和第二致动器部件（111.1,111.2）以静态超定方式在N个自由度中的至少一个中支撑光学元件单元，使得在紧随调节状态下，第一和第二致动器部件在N个自由度中的至少一个自由度中引起引入到光学元件单元中的寄生残余负载（PRL）。致动器装置包括被配置为在寄生残余负载补偿状态中至少部分地补偿在N个自由度中的至少一个中引入到光学元件单元中的寄生残余负载的主动第三致动器部件（111.3）。 / p>

8. 发明申请

WO2012041459A2 IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：成像光学系统
公开(公告)号：WO2012041459A2
公开(公告)日：2012-04-05
申请号：PCT/EP2011/004744
申请日：2011-09-22
申请人： CARL ZEISS SMT GMBH , ROGALSKY, Olaf , SCHNEIDER, Sonja , BITTNER, Boris , KUGLER, Jens , GELLRICH, Bernhard , FREIMANN, Rolf
发明人： ROGALSKY, Olaf , SCHNEIDER, Sonja , BITTNER, Boris , KUGLER, Jens , GELLRICH, Bernhard , FREIMANN, Rolf
IPC分类号： G03F7/20
CPC分类号： G02B17/06 , G02B17/0663 , G02B27/0012 , G03F7/70258 , G03F7/70308 , G03F7/70891
摘要： An imaging optical system (10), in particular a projection objective, for microlithography, comprises optical elements (M1-M6) configured to guide electromagnetic radiation (19) with a wavelength λ in an imaging beam path for imaging an object field (13) into an image plane (14), and a pupil (24), having coordinates (p, q) which, together with the image field (16), having coordinates (x, y), of the optical system (10), spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q) as a function of which a wavefront W(x, y, p, q) of the radiation (19) passing through the optical system is defined. At least a first of the optical elements (M1-M6) has a non-rotationally symmetrical surface (26) having a respective surface deviation in relation to every rotationally symmetrical surface (28), which two-dimensional surface has a difference between its greatest elevation and its deepest valley of at least λ. A sub-aperture ratio of the non- rotationally symmetrical surface deviates at every point (Ο 1 , O 2 ) of the object field (13) by at least 0.01 from the sub-aperture ratio of every other surface of the optical elements, which is located in the imaging beam path, at the respective point (O 1 , O 2 ) of the object field (13). Furthermore, the surface (26) of the first optical element (M4) is configured such that by displacing the first optical element relative to the other optical elements a change to the wavefront of the optical system (10) can be brought about which has a portion with at least 2-fold symmetry, the maximum value of the wavefront change in the extended 4- dimensional pupil space being at least 1 x 10 -5 of the wavelength λ.
摘要翻译：用于微光刻的成像光学系统（10），特别是投影物镜，包括被配置为在成像光束路径中引导具有波长λ的电磁辐射（19）的光学元件（M1-M6）用于将物场（13）成像到图像平面（14）中，以及瞳孔（24），其具有与图像场（16）一起具有坐标（x，y）的坐标（p，q），光学系统（10）跨越具有坐标（x，y，p，q）的扩展的4维光瞳空间，其作为辐射（19）的波前W（x，y，p，q）通过光学系统的定义。至少第一光学元件（M1-M6）具有相对于每个旋转对称表面（28）具有各自的表面偏差的非旋转对称表面（26），该二维表面具有其最大值海拔及其最深的谷至少为λ。非旋转对称表面的子孔径比在物场（13）的每个点（0 1，0 2，0 2）处偏离至少0.01 位于成像光束路径中的光学元件的每个其他表面的子孔径比在物体的各个点（0 1，0 2，2）字段（13）。此外，第一光学元件（M4）的表面（26）被配置为使得通过相对于其他光学元件移位第一光学元件，可以实现对光学系统（10）的波前的改变，其具有部分具有至少2倍对称性，扩展的四维光瞳空间中波前变化的最大值至少为波长λ的1×10-5。

9. 发明申请

WO2022171538A1 SYSTEM UND PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
公开(公告)号：WO2022171538A1
公开(公告)日：2022-08-18
申请号：PCT/EP2022/052742
申请日：2022-02-04
申请人： CARL ZEISS SMT GMBH
发明人： NEFZI, Marwene , KUGLER, Jens
IPC分类号： G03F7/20 , F16F15/00 , G02B7/182 , G02B26/08
摘要： Ein System (100A, 100B, 100C) für eine Projektionsbelichtungsanlage (1), aufweisend ein erstes Bauteil (102), ein zweites Bauteil (104), und eine Entkopplungseinrichtung (200A, 200B, 200C), die dazu eingerichtet ist, das zweite Bauteil (104) in mehr als einem Freiheitsgrad von mechanischen Anregungen des ersten Bauteils (102) zu entkoppeln, wobei die Entkopplungseinrichtung (200A,200B, 200C) erste Entkopplungselemente (216, 218), die eine positive Steifigkeit aufweisen, und zweite Entkopplungselemente (220, 222, 224, 226, 238, 240), die eine negative Steifigkeit aufweisen, umfasst, und wobei die Entkopplungseinrichtung (200A, 200B, 200C) ein drittes Bauteil (202), das zwischen dem ersten Bauteil (102) und dem zweiten Bauteil (104) angeordnet ist, umfasst.

10. 发明申请

WO2021190835A1 OPTISCHE BAUGRUPPE, PROJEKTIONSBELICHTUNGSANLAGE UND VERFAHREN ZUR HERSTELLUNG EINER OPTISCHEN BAUGRUPPE 审中-公开
公开(公告)号：WO2021190835A1
公开(公告)日：2021-09-30
申请号：PCT/EP2021/054137
申请日：2021-02-19
申请人： CARL ZEISS SMT GMBH
发明人： HEMBACHER, Stefan , KUGLER, Jens , XALTER, Stefan , POSTULKA, Soeren
IPC分类号： G03F7/20 , G03F7/70825 , G03F7/70891
摘要： Die Erfindung betrifft eine optische Baugruppe (40) für die Halbleiterlithographie, insbesondere für eine Projektionsbelichtungsanlage (1), mit einem optischen Element (41), einem Anschlusselement (46) und mindestens einem Verbindungselement (44, 45) zur Verbindung des optischen Elementes (41) mit dem Anschlusselement (46), wobei ein Material des optischen Elementes (41) und des Verbindungselementes (44, 45, 60.x) denselben Wärmeausdehnungskoeffizienten aufweisen. Weiterhin betrifft die Erfindung ein Verfahren zur Herstellung einer optischen Baugruppe (40) für die Halbleiterlithographie, insbesondere für eine Projektionsbelichtungsanlage (1), wobei die optische Baugruppe (40) neben einem optischen Element mindestens ein Verbindungselement (44, 45, 60.x) zur Verbindung mit einem Anschlusselement (46) umfasst, mit folgenden Verfahrensschritten: - Herstellung des optischen Elementes (41). - Herstellung des Verbindungselementes (44, 45, 60.x). - Herstellung des Anschlusselementes (46). - Bonden des Verbindungselementes (44, 45, 60.x) mit dem optischen Element (41) und dem Anschlusselement.

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