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1. 发明申请

WO2015103232A1 METHODS FOR UNIFORM IMPRINT PATTERN TRANSFER OF SUB-20 NM FEATURES 审中-公开
标题翻译：用于均匀印刷SUB-20 NM特征的图案转移的方法
公开(公告)号：WO2015103232A1
公开(公告)日：2015-07-09
申请号：PCT/US2014/072706
申请日：2014-12-30
申请人： CANON NANOTECHNOLOGIES, INC. , MOLECULAR IMPRINTS, INC.
发明人： YE, Zhengmao , LABRAKE, Dwayne L.
IPC分类号： G03F7/00
CPC分类号： H01L21/3086 , G03F7/0002 , H01L21/02532 , H01L21/02623 , H01L21/283 , H01L21/31058 , H01L21/31133 , H01L21/31144 , H01L21/32051
摘要： Methods of increasing etch selectivity in imprint lithography are described which employ material deposition techniques that impart a unique morphology to the multi-layer material stacks, thereby enhancing etch process window and improving etch selectivity. For example, etch selectivity of 50:1 or more between patterned resist layer and deposited metals, metalloids, or non-organic oxides can be achieved, which greatly preserves the pattern feature height prior to the etch process that transfers the pattern into the substrate, allowing for sub-20 nm pattern transfer at high fidelity.
摘要翻译：描述了在压印光刻中提高蚀刻选择性的方法，其采用材料沉积技术，其赋予多层材料堆叠独特的形态，从而增强蚀刻工艺窗口并提高蚀刻选择性。例如，可以实现在图案化的抗蚀剂层和沉积的金属，准金属或非有机氧化物之间的50:1或更大的蚀刻选择性，这大大保持了将图案转移到衬底中的蚀刻工艺之前的图案特征高度，允许以高保真度进行亚20 nm图案转印。

2. 发明申请

WO2011066450A3 ADHESION LAYERS IN NANOIMPRINT LITHOGRAPHY 审中-公开
公开(公告)号：WO2011066450A3
公开(公告)日：2011-06-03
申请号：PCT/US2010/058089
申请日：2010-11-24
申请人： MOLECULAR IMPRINTS, INC. , YE, Zhengmao , XU, Frank, Y. , LABRAKE, Dwayne, L. , SELINIDIS, Kosta, S.
发明人： YE, Zhengmao , XU, Frank, Y. , LABRAKE, Dwayne, L. , SELINIDIS, Kosta, S.
IPC分类号： G03F7/00
摘要： Forming an adhesive layer on a nanoimprint lithography template or a double-sided disk. Forming the adhesive layer on the double-sided disk includes immersing the double-sided disk in a liquid adhesive composition and removing the double-sided disk from the adhesive composition. The outer layer of the double-sided disk is a carbon overcoating or an intermediate layer. The adhesive composition is dried to form a first adhesion layer adhered directly to the carbon overcoating or intermediate layer on a first side of the disk and a second adhesion layer adhered directly to the carbon overcoating or intermediate layer on a second side of the disk. Forming the adhesive layer on the nanoimprint lithography template includes applying an adhesive material to the template, allowing the template to remain motionless, and rinsing a portion of the adhesive material from the template with a solvent, and drying the template.

3. 发明申请

WO2012033943A2 VAPOR DELIVERY SYSTEM FOR USE IN IMPRINT LITHOGRAPHY 审中-公开
标题翻译：用于印刷光刻的气相传输系统
公开(公告)号：WO2012033943A2
公开(公告)日：2012-03-15
申请号：PCT/US2011/050874
申请日：2011-09-08
申请人： MOLECULAR IMPRINTS, INC.
发明人： YE, Zhengmao , RAMOS, Rick , FLETCHER, Edward, B. , JONES, Christopher, E. , LABRAKE, Dwayne, L.
IPC分类号： B29C33/38 , B29C33/42 , B29C33/04
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process.
摘要翻译：描述了在压印光刻工艺期间使用蒸气输送系统使得能够输送粘合促进剂材料的系统和方法。

4. 发明申请

WO2010051024A1 FACILITATING ADHESION BETWEEN SUBSTRATE AND PATTERNED LAYER 审中-公开
标题翻译：促进基板与图案层之间的粘合
公开(公告)号：WO2010051024A1
公开(公告)日：2010-05-06
申请号：PCT/US2009/005870
申请日：2009-10-29
申请人： MOLECULAR IMPRINTS, INC.
发明人： FLETCHER, Edward B. , YE, Zhengmao , XU, Frank Y. , LABRAKE, Dwayne L.
IPC分类号： G03F7/00 , C23C14/12 , H01J37/32 , H01L21/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H01J37/32431 , Y10T428/30 , Y10T428/31663
摘要： Systems and methods for adhering a substrate to a patterned layer are described. Included are in situ cleaning and conditioning of the substrate, and the application of an adhesion layer between the substrate and the patterned layer, as well as forming an intermediate layer between adhesion materials and the substrate.
摘要翻译：描述了将基板粘合到图案层上的系统和方法。包括基材的原位清洁和调理，以及在基材和图案化层之间施加粘合层，以及在粘合材料和基材之间形成中间层。

5. 发明申请

WO2017172382A1 REMOVING SUBSTRATE PRETREATMENT COMPOSITIONS IN NANOIMPRINT LITHOGRAPHY 审中-公开
标题翻译：在纳米印刷光刻技术中去除基底预处理组合物
公开(公告)号：WO2017172382A1
公开(公告)日：2017-10-05
申请号：PCT/US2017/022917
申请日：2017-03-17
申请人： CANON NANOTECHNOLOGIES, INC. , CANON KABUSHIKI KAISHA
发明人： STACHOWIAK, Timothy Brian , LIU, Weijun , KHUSNATDINOV, Niyaz , YE, Zhengmao , ITO, Tochiki
IPC分类号： G03F7/00 , G03F7/004 , H01L21/02 , C08F2/48
摘要： A nanoimprint lithography method to remove uncured pretreatment composition from an imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area, and the composite polymerizable coating is contacted with a nanoimprint lithography template. The composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate, and the uncured portion of the pretreatment coating is removed from the nanoimprint lithography substrate.
摘要翻译：一种纳米压印光刻方法，用于从印刷的纳米压印光刻衬底上除去未固化的预处理组合物。该方法包括将预处理组合物设置在纳米压印光刻衬底上以形成预处理涂层并将压印抗蚀剂的分立部分布置在预处理涂层上，压印抗蚀剂的每个分立部分覆盖纳米压印光刻衬底的目标区域。随着压印抗蚀剂的每个离散部分扩散到其目标区域之外，在纳米压印光刻衬底上形成复合可聚合涂层，并且使复合可聚合涂层与纳米压印光刻模板接触。聚合该可复合可聚合涂层以在纳米压印光刻衬底上产生复合聚合物层和预处理涂层的未固化部分，并且从纳米压印光刻衬底移除预处理涂层的未固化部分。

6. 发明申请

WO2015089158A1 IMPRINT LITHOGRAPHY TEMPLATE AND METHOD FOR ZERO-GAP IMPRINTING 审中-公开
标题翻译：用于零间隙印刷的印刷层析模板和方法
公开(公告)号：WO2015089158A1
公开(公告)日：2015-06-18
申请号：PCT/US2014/069500
申请日：2014-12-10
申请人： CANON NANOTECHNOLOGIES, INC.
发明人： HAASE, Gaddi S. , SELINIDIS, Kosta , YE, Zhengmao
IPC分类号： G03F7/00
CPC分类号： B29C59/022 , B29L2007/001 , G03F7/0002
摘要： Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.
摘要翻译：提供具有前缘和后缘边界的压印光刻模板，其在位于这些场之间的图案排除区（PEZ）中提供的具有全特征高度特征的相邻场之间实现零间隙印记。前缘边界包括虚拟特征，例如，平行于台面边缘定向取向的细长特征，而后缘边界包括延伸到台面边缘的凹部。当用于重复步骤的过程中，后缘边界与先前由模板的前缘边缘图案化的相邻印刷场的边缘部分重叠，从而在这些区域之间的图案排除区域中产生全特征高度特征，并且避免这些场之间的间隙或开放区域，否则会导致诸如蚀刻工艺和CMP之类的下游工艺的不均匀性。

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