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1. 发明申请

WO2015089158A1 IMPRINT LITHOGRAPHY TEMPLATE AND METHOD FOR ZERO-GAP IMPRINTING 审中-公开
标题翻译：用于零间隙印刷的印刷层析模板和方法
公开(公告)号：WO2015089158A1
公开(公告)日：2015-06-18
申请号：PCT/US2014/069500
申请日：2014-12-10
申请人： CANON NANOTECHNOLOGIES, INC.
发明人： HAASE, Gaddi S. , SELINIDIS, Kosta , YE, Zhengmao
IPC分类号： G03F7/00
CPC分类号： B29C59/022 , B29L2007/001 , G03F7/0002
摘要： Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.
摘要翻译：提供具有前缘和后缘边界的压印光刻模板，其在位于这些场之间的图案排除区（PEZ）中提供的具有全特征高度特征的相邻场之间实现零间隙印记。前缘边界包括虚拟特征，例如，平行于台面边缘定向取向的细长特征，而后缘边界包括延伸到台面边缘的凹部。当用于重复步骤的过程中，后缘边界与先前由模板的前缘边缘图案化的相邻印刷场的边缘部分重叠，从而在这些区域之间的图案排除区域中产生全特征高度特征，并且避免这些场之间的间隙或开放区域，否则会导致诸如蚀刻工艺和CMP之类的下游工艺的不均匀性。

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