专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2003042424A1 SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING 审中-公开
标题翻译：自放电和感应耦合等离子喷溅和调光
公开(公告)号：WO2003042424A1
公开(公告)日：2003-05-22
申请号：PCT/US2002/036940
申请日：2002-11-14
申请人： APPLIED MATERIALS, INC. , DING, Peijun , TAO, Rong , XU, Zheng , LUBBEN, Daniel, C. , RENGARAJAN, Suraj , MILLER, Michael, A. , SUNDARRAJAN, Arvind , TANG, Xianmin , FORSTER, John, C. , FU, Jianming , MOSELY, Roderick, C. , CHEN, Fusen , GOPALRAJA, Praburam
发明人： DING, Peijun , TAO, Rong , XU, Zheng , LUBBEN, Daniel, C. , RENGARAJAN, Suraj , MILLER, Michael, A. , SUNDARRAJAN, Arvind , TANG, Xianmin , FORSTER, John, C. , FU, Jianming , MOSELY, Roderick, C. , CHEN, Fusen , GOPALRAJA, Praburam
IPC分类号： C23C14/34
CPC分类号： H01L21/76844 , C23C14/046 , C23C14/345 , C23C14/3457 , C23C14/358 , H01J37/321 , H01J37/3408 , H01J2237/3327 , H01L21/2855 , H01L21/76805 , H01L21/76846 , H01L21/76862 , H01L21/76865 , H01L21/76868 , H01L21/76873 , H01L21/76877 , H01L2221/1089
摘要： A magnetron sputter reactor (410) and its method of use, in which SIP sputtering and ICP sputtering are promoted is disclosed. In another chamber (412) an array of auxiliary magnets positioned along sidewalls (414) of a magnetron sputter reactor on a side towards the wafer from the target is disclosed. The magnetron (436) preferably is a small one having a stronger outer pole (442) of a first polarity surrounding a weaker inner pole (440) of a second polarity all on a yoke (444) and rotates about the axis (438) of the chamber using rotation means (446, 448, 450). The auxiliary magnets (462) preferably have the first polarity to draw the unbalanced magnetic field (460) towards the wafer (424), which is on a pedestal (422) supplied with power (454). Argon (426) is supplied through a valve (428). The target (416) is supplied with power (434).
摘要翻译：公开了一种促进SIP溅射和ICP溅射的磁控溅射反应器（410）及其使用方法。在另一个室（412）中，公开了一种辅助磁体阵列，其沿着磁控溅射反应器的侧面（414）定位，所述磁控溅射反应器在朝向晶片的一侧朝向靶。优选地，磁控管（436）是小的，其具有第一极性的更强的外极（442），其具有围绕轭（444）的第二极性的较弱内极（440），并且围绕轴线（438）旋转所述室使用旋转装置（446,448,450）。辅助磁体（462）优选地具有第一极性，以将不平衡磁场（460）朝着被提供电力（454）的基座（422）上的晶片（424）拉出。氩（426）通过阀（428）供应。目标（416）被供电（434）。

2. 发明申请

WO2009085157A1 PREDICTION AND COMPENSATION OF EROSION IN A MAGNETRON SPUTTERING TARGET 审中-公开
标题翻译：磁控溅射目标中的腐蚀预测和补偿
公开(公告)号：WO2009085157A1
公开(公告)日：2009-07-09
申请号：PCT/US2008/013766
申请日：2008-12-16
申请人： APPLIED MATERIALS, INC. , MILLER, Keith, A. , LUBBEN, Daniel, C.
发明人： MILLER, Keith, A. , LUBBEN, Daniel, C.
IPC分类号： H01L21/203
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3482
摘要： When a magnetron (72) is scanned about the back of a target (38) in a selected complex path (150) having radial components, the target erosion profile has a form depending upon the selection of paths. A radial erosion rate profile (160) for a given magnetron is measured. Periodically during scanning, an erosion profile (168) is calculated from the measured erosion rate profile (160) and profiles (162, 164, 166) derived from it, the time the magnetron spends at different radii, and the target power. The calculated erosion profile may be used to indicate when erosion has become excessive at any location prompting target replacement or to adjust the height of the magnetron above the target for repeated scans, hi another aspect of the invention, the magnetron height is dynamically adjusted (206) during a scan to compensate for erosion. The compensation may be based on the calculated erosion profile or on feedback control of the present value of the target voltage (124) for a constant-power target supply (110).
摘要翻译：当在具有径向分量的选定复合路径（150）中围绕目标（38）的背面扫描磁控管（72）时，目标侵蚀曲线具有取决于路径选择的形式。测量给定磁控管的径向侵蚀速率曲线（160）。在扫描期间，根据测得的侵蚀速率曲线（160）和衍生自其的轮廓（162,164,166），磁控管在不同半径处的时间和目标功率计算出侵蚀曲线（168）。所计算的侵蚀曲线可用于指示在任何位置处的侵蚀已经变得过度，促使目标更换或调整靶上方的磁控管的高度以重复扫描。在本发明的另一方面，磁控管高度被动态地调节（206 ），以补偿侵蚀。补偿可以基于所计算的侵蚀曲线或者针对恒定功率目标电源（110）的目标电压（124）的当前值的反馈控制。

3. 发明申请

WO2005061753A1 COMPENSATION OF SPACING BETWEEN MAGNETRON AND SPUTTER TARGET 审中-公开
标题翻译： MAGNETRON和SPUTTER目标之间的间距补偿
公开(公告)号：WO2005061753A1
公开(公告)日：2005-07-07
申请号：PCT/US2004/040907
申请日：2004-12-07
申请人： APPLIED MATERIALS, INC.
发明人： DING, Peijun , LUBBEN, Daniel, C. , HONG, Ilyoung, Richard , MILLER, Michael, Andrew , YANG, Hsien-Lung , RENGARAJAN, Suraj , SUNDARRAJAN, Arvind , YOUNG, Donny , ROSENSTEIN, Michael , LOWRANCE, Robert, B. , SANKARANARAYAN, Sreekrishnan , YOSHIDOME, Goichi
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A lift mechanism (124) for and a corresponding use of a magnetron (70) in a plasma sputter reactor (30). The magnetron rotating about the target axis (76) is controllably lifted away from the back of the target (34) to compensate for sputter erosion. The apparatus includes a drive source (84), housing (94), tank (118), water bath (116), fixed gear (92), drive plate (96), carrier (81), magnetic yoke (80), isolator (38). Adapter (36), shield (52), vacuum pump system (44), RF power supply (58), capacitive coupling circuit (60), gas source (46), mass flow controller (48), reactor wall (32), magnet ring (114), DC power supply (54), pedestal electrode (40), wafer (42), clamp ring (50), inner magnetic pole (74), outer pole (78), follower shaft (102), follower gear (100), idler gear (98), and planetary scanning mechanism (90).
摘要翻译：用于和等离子体溅射反应器（30）中的磁控管（70）的相应使用的提升机构（124）。围绕目标轴线（76）旋转的磁控管被可控地从目标（34）的后部提升，以补偿溅射侵蚀。该设备包括驱动源（84），壳体（94），罐（118），水浴（116），固定齿轮（92），驱动板（96），托架（81），磁轭（38）。适配器（36），屏蔽（52），真空泵系统（44），RF电源（58），电容耦合电路（60），气源（46），质量流量控制器磁环（114），直流电源（54），基座电极（40），晶片（42），夹环（50），内磁极（74），外极（78），从动轴齿轮（100），空转齿轮（98）和行星扫描机构（90）。

4. 发明申请

WO2003100819A1 PLANETARY MAGNETRON 审中-公开
公开(公告)号：WO2003100819A1
公开(公告)日：2003-12-04
申请号：PCT/US2003/015620
申请日：2003-05-16
申请人： APPLIED MATERIALS, INC.
发明人： HONG, Ilyoung, Richard , TSUNG, James, H. , MILLER, Michael, Andrew , LUBBEN, Daniel, C. , DING, Peijun , MAITY, Nirmalya
IPC分类号： H01J37/34
CPC分类号： H01J37/3408 , H01J37/3455
摘要： A small unbalanced magnet assembly (60) is scanned in a preferably retrograde planetary or epicyclic path (92) about the back of a target (90) being plasma sputtered including an orbital rotation about the center axis (72) of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly may pass through the target center, thus allowing full target coverage. A geared planetary mechanism may include a rotating drive plate (74), a fixed center gear (62), and an idler gear (76) and a follower gear (74) rotatably supported in the drive plate supporting a cantilevered magnet assembly (84) on the side of the drive plate facing the target. A belt (342) and pulleys (344, 346) may be substituted for the gears. The erosion profile may be controlled by varying the rotation rate through the rotation cycle or by modulating the target power. A second planetary stage (302, 304, 306) may be added or non-circular gears (310) be used. Auxiliary electromagnetic coils (254, 258) positioned beside the chamber and below the pedestal (122) may create a focusing magnetic field.
摘要翻译：小型不平衡磁体组件（60）以优选逆行星行星或行星路径（92）围绕靶（90）的背面进行扫描，该等离子体溅射包括围绕靶的中心轴线（72）的轨道旋转和行星围绕围绕目标中心轴线旋转的另一轴线旋转。磁体组件可以穿过目标中心，从而允许完全的目标覆盖。齿轮行星机构可以包括旋转驱动板（74），固定中心齿轮（62）和空转齿轮（76），以及可旋转地支撑在支撑悬臂磁体组件（84）的驱动板中的从动齿轮（74）在驱动板面对目标的一侧。皮带（342）和滑轮（344,346）可以代替齿轮。可以通过改变通过旋转周期的旋转速率或通过调节目标功率来控制侵蚀曲线。可以添加第二行星台（302,304,306）或使用非圆形齿轮（310）。位于腔室旁边和底座（122）下方的辅助电磁线圈（254,258）可产生聚焦磁场。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式