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1. 发明申请

WO2011008805A2 PROCESSING CHAMBER WITH TRANSLATING WEAR PLATE FOR LIFT PIN 审中-公开
标题翻译：加工室用翻转式打码机
公开(公告)号：WO2011008805A2
公开(公告)日：2011-01-20
申请号：PCT/US2010/041895
申请日：2010-07-14
申请人： APPLIED MATERIALS, INC. , WHITE, John, M. , OH, Jeonghoon , CHO, Tom, K. , JAMES, Silja , PAI, Uday , LOPEZ, Oscar , POLYAK, Alexander, S.
发明人： WHITE, John, M. , OH, Jeonghoon , CHO, Tom, K. , JAMES, Silja , PAI, Uday , LOPEZ, Oscar , POLYAK, Alexander, S.
IPC分类号： H01L21/68 , H01L21/683 , H01L21/02 , G02F1/13
CPC分类号： H01L21/68742
摘要： Embodiments of a method and apparatus for processing large area substrates including a translational wear plate and/or bushing assembly are provided for reducing the stress on a lift pin used to space substrates from a substrate support in a processing or other type of chamber. In another embodiment, an apparatus for processing substrates includes processing chamber comprising a substrate support disposed in a chamber body. A bushing assembly is disposed in the substrate support. A lift pin is disposed through the bushing assembly. A wear plate is provided that is coupled to the chamber body and aligned with the lift pin. The wear plate is movable laterally relative to a centerline of the chamber body to accommodate lateral motion of the lift pin when contacting the wear plate.
摘要翻译：提供了用于处理包括平移耐磨板和/或衬套组件的大面积衬底的方法和装置的实施例，用于减小用于将衬底从处理或其它类型的室中的衬底支撑件定位的升降销上的应力。在另一个实施例中，一种用于处理衬底的设备包括处理室，其包括设置在室主体中的衬底支撑件。衬套组件设置在衬底支撑件中。提升销设置穿过套管组件。提供了耐磨板，其连接到腔室主体并与提升销对准。耐磨板相对于室主体的中心线横向运动，以在接触耐磨板时适应提升销的横向运动。

2. 发明申请

WO2010021938A3 SHOWERHEAD AND SHADOW FRAME 审中-公开
公开(公告)号：WO2010021938A3
公开(公告)日：2010-02-25
申请号：PCT/US2009/053922
申请日：2009-08-14
申请人： APPLIED MATERIALS, INC. , CHO, Tom, K. , YUAN, Zheng , SHIEH, Brian, Sy-yuan
发明人： CHO, Tom, K. , YUAN, Zheng , SHIEH, Brian, Sy-yuan
IPC分类号： H01L21/205 , H05H1/34
摘要： The present invention generally relates to a gas distribution showerhead and a shadow frame for an apparatus. By extending the corners of the gas distribution showerhead the electrode area may be expanded relative to the anode and thus, uniform film properties may be obtained. Additionally, the expanded corners of the gas distribution showerhead may have gas passages extending therethrough. In one embodiment, hollow cathode cavities may be present on the bottom surface of the showerhead without permitting gas to pass therethrough. The shadow frame in the apparatus may also have its corner areas extended out to enlarge the anode in the corner areas of the substrate being processed and thus, may lead to deposition of a material on the substrate having substantially uniform properties.

3. 发明申请

WO2009154889A2 GAS DISTRIBUTION SHOWERHEAD SKIRT 审中-公开
标题翻译：气体分配淋浴裙
公开(公告)号：WO2009154889A2
公开(公告)日：2009-12-23
申请号：PCT/US2009/043189
申请日：2009-05-07
申请人： APPLIED MATERIALS, INC. , CHO, Tom, K. , SHIEH, Brian, Sy-yuan , YUAN, Zheng
发明人： CHO, Tom, K. , SHIEH, Brian, Sy-yuan , YUAN, Zheng
IPC分类号： H01L21/205
CPC分类号： C23C16/5096 , C23C16/45565 , C23C16/45587 , H01J37/3244
摘要： The present invention generally includes an extension or skirt that extends from a gas distribution showerhead in a processing chamber. When processing substrates, the gas distribution showerhead may be electrically biased. The electrically biased showerhead may, in some cases, ignite the processing gas into a plasma state. The walls of the processing chamber and the susceptor, may be grounded relative to the showerhead. Thus, the edges of the substrate may have a greater surface area of ground contacts as compared to the electrically biased showerhead. Due to the increase in grounding near the edges, the material deposited on the substrate may have different properties as compared to the middle of the substrate. By extending the showerhead edges down closer toward the substrate, substantially uniform properties of the material may be obtained.
摘要翻译：本发明通常包括从处理室中的气体分配喷头延伸的延伸部或裙部。当处理基板时，气体分配喷头可被电偏置。在某些情况下，电偏置喷头可以将处理气体点燃成等离子体状态。处理室和基座的壁可以相对于喷头接地。因此，与电偏压花洒相比，衬底的边缘可具有更大的接地触点表面积。由于边缘附近的接地增加，与衬底的中间相比，沉积在衬底上的材料可能具有不同的性质。通过将淋浴头边缘向下靠近基板延伸，可以获得材料的基本均匀的特性。

4. 发明申请

WO2013058970A1 SUBSTRATE SUPPORT BUSHING 审中-公开
标题翻译：基座支撑
公开(公告)号：WO2013058970A1
公开(公告)日：2013-04-25
申请号：PCT/US2012/058232
申请日：2012-10-01
申请人： APPLIED MATERIALS, INC. , HOU, Tao , OH, Jeonghoon , CHO, Tom, K. , MATLOSZ, Andrzej , HOOSHDARAN, Frank, F. , YANG, Yao-Hung
发明人： HOU, Tao , OH, Jeonghoon , CHO, Tom, K. , MATLOSZ, Andrzej , HOOSHDARAN, Frank, F. , YANG, Yao-Hung
IPC分类号： H01L21/683
CPC分类号： C23C16/4586 , C23C16/505 , F16C29/02 , H01L21/68742
摘要： A bushing assembly for supporting a substrate within a processing chamber is generally provided. In one aspect, the bushing assembly comprises a tubular body having an outer perimeter and an aperture extending therethrough, a first ring having a first inner edge, the first ring disposed in the aperture in an upper portion of the tubular body, and a second ring having a second inner edge, the second ring disposed in the aperture in a lower portion of the tubular body. In another aspect, the first inner edge has a first radius of curvature, and the second inner edge has a second radius of curvature. In another aspect, a first inner edge diameter, a second inner edge diameter, the first radius of curvature, and the second radius of curvature are selected such that a support pin extending through the aperture contacts the bushing assembly on at most two points.
摘要翻译：通常提供用于在处理室内支撑衬底的衬套组件。在一个方面，套管组件包括具有外周边和延伸穿过其的孔的管状体，第一环具有第一内边缘，第一环设置在管状体的上部中的孔中，第二环具有第二内边缘，所述第二环设置在所述管状体的下部中的所述孔中。在另一方面，第一内边缘具有第一曲率半径，并且第二内边缘具有第二曲率半径。在另一方面，选择第一内边缘直径，第二内边缘直径，第一曲率半径和第二曲率半径，使得延伸穿过孔的支撑销在最多两点处接触衬套组件。

5. 发明申请

WO2010048165A2 MULTIPLE GAS FEED APPARATUS AND METHOD 审中-公开
标题翻译：多气体给料装置和方法
公开(公告)号：WO2010048165A2
公开(公告)日：2010-04-29
申请号：PCT/US2009/061303
申请日：2009-10-20
申请人： APPLIED MATERIALS INC. , TSO, Alan , TSUEI, Lun , CHO, Tom, K. , SHIEH, Brian, Sy-yuan
发明人： TSO, Alan , TSUEI, Lun , CHO, Tom, K. , SHIEH, Brian, Sy-yuan
IPC分类号： H01L21/205
CPC分类号： C23C16/45565 , C23C16/45574
摘要： Embodiments of the present invention generally provide apparatus and methods for introducing process gases into a processing chamber at a plurality of locations. In one embodiment, a central region of a showerhead and corner regions of a showerhead are fed process gases from a central gas source with a first mass flow controller regulating the flow in the central region and a second mass flow controller regulating the flow in the corner regions. In another embodiment, a central region of a showerhead is fed process gases from a first gas source and corner regions of the showerhead are fed process gases from a second gas source. In another embodiment, a central region of a showerhead is fed process gases from a first gas source and each corner region of the showerhead is fed process gases from a separate gas source.
摘要翻译：本发明的实施例通常提供用于将处理气体引入处理室中的多个位置的装置和方法。在一个实施例中，喷头的中心区域和喷头的角区域从中央气源被供给工艺气体，第一质量流量控制器调节中心区域中的流量，第二质量流量控制器调节拐角中的流量区域。在另一个实施例中，喷头的中心区域从第一气源供给工艺气体，并且喷头的拐角区域从第二气源供给工艺气体。在另一个实施例中，喷头的中心区域从第一气源供给工艺气体，并且喷头的每个拐角区域从单独的气源供给工艺气体。

6. 发明申请

WO2020263673A1 METHOD AND APPARATUS FOR ACTIVELY TUNING A PLASMA POWER SOURCE 审中-公开
公开(公告)号：WO2020263673A1
公开(公告)日：2020-12-30
申请号：PCT/US2020/038427
申请日：2020-06-18
申请人： APPLIED MATERIALS, INC.
发明人： WANG, Rongping , SALIMIAN, Siamak , CHO, Tom, K.
IPC分类号： H01J37/32 , H01L21/3065
摘要： An RF plasma generator configured to ignite and maintain a plasma from one or more processing gases is disclosed. A switch mode power supply is configured to convert a DC voltage from a DC power source to an RF voltage. A resonance circuit is configured to deliver an amount of power to an ignited plasma from the switch mode power supply. A plasma controller is configured to operate the power supply to apply an RF voltage corresponding to the amount of power to the one or more processing gases through the resonance circuit. The RF voltage increases in amplitude and decreases in frequency until the one or more processing gasses are ignited into a plasma. Responsive to detecting ignition of the plasma, the plasma controller is further configured to continuously adjust the frequency of the switch mode power supply to deliver the amount of power to the ignited plasma. The amount of power is a substantially constant amount of power.

7. 发明申请

WO2017160457A1 METHOD TO REMOVE RESIDUAL CHARGE ON A ELECTROSTATIC CHUCK DURING THE DE-CHUCKING STEP 审中-公开
标题翻译：在去卡步骤中去除静电卡盘上的残留电荷的方法
公开(公告)号：WO2017160457A1
公开(公告)日：2017-09-21
申请号：PCT/US2017/018163
申请日：2017-02-16
申请人： APPLIED MATERIALS, INC.
发明人： BOYD, Wendell Glen, Jr. , CHO, Tom, K. , HIRAHARA, Robert, T.
IPC分类号： H01L21/683 , H02N13/00 , B23Q3/15
CPC分类号： H01L21/6833 , H01J37/32532 , H01J37/32706 , H01L21/68742
摘要： A method and apparatus for discharging a residual charge from a substrate support. In one example, a substrate support is provided that includes a body, an electrode disposed in the body, a radiation emitter and a diffuser. The body has one or more holes formed in a workpiece support surface, the workpiece support surface configured to accept a substrate thereon. The electrode is configured to electrostatically hold a substrate to the workpiece support surface. The radiation emitter is disposed in a first hole of the one or more holes formed in the workpiece support surface. The radiation emitter is configured to emit electromagnetic energy out of the first hole. The diffuser is disposed in first hole over the radiation emitter.
摘要翻译：用于从衬底支撑件释放残余电荷的方法和设备。在一个示例中，提供了衬底支撑件，其包括本体，设置在本体中的电极，辐射发射器和扩散器。主体具有形成在工件支撑表面中的一个或多个孔，工件支撑表面被构造成在其上接收基板。电极被配置为将基板静电保持到工件支撑表面。辐射发射器设置在形成于工件支撑表面中的一个或多个孔中的第一孔中。辐射发射器被配置为从第一孔发射电磁能。扩散器放置在辐射发射器上方的第一个孔中。

8. 发明申请

WO2010081003A3 SYSTEMS, APPARATUS AND METHODS FOR MOVING SUBSTRATES 审中-公开
公开(公告)号：WO2010081003A3
公开(公告)日：2010-07-15
申请号：PCT/US2010/020503
申请日：2010-01-08
申请人： APPLIED MATERIALS, INC. , CHINTALAPATI, Prudhvi, R. , SUNDAR, Satish , AXELROD, Boris , SILVETTI, Mario, Dave , CHO, Tom, K. , BRODINE, Jaffrey, A. , FOSTER, Jason, K. , NG, Edward
发明人： CHINTALAPATI, Prudhvi, R. , SUNDAR, Satish , AXELROD, Boris , SILVETTI, Mario, Dave , CHO, Tom, K. , BRODINE, Jaffrey, A. , FOSTER, Jason, K. , NG, Edward
IPC分类号： H01L21/677 , B65G49/07 , B25J15/08
摘要： Systems, methods and apparatus are provided for moving substrates in electronic device manufacturing. In some aspects, end effectors having a base portion and at least three pads are provided. Each of the pads has a contact surface, and at least one of the contact surfaces has a curved shape. A substrate supported by the end effector may be moved at a relatively high lateral g-force without significant slipping relative to the pads. Additional aspects are provided.

9. 发明申请

WO2010014553A2 CONCRETE VACUUM CHAMBER 审中-公开
标题翻译：混凝土真空室
公开(公告)号：WO2010014553A2
公开(公告)日：2010-02-04
申请号：PCT/US2009/051860
申请日：2009-07-27
申请人： APPLIED MATERIALS, INC. , POLYAK, Alexander, S. , CHO, Tom, K. , YUDOVSKY, Joseph , VESCI, Anthony
发明人： POLYAK, Alexander, S. , CHO, Tom, K. , YUDOVSKY, Joseph , VESCI, Anthony
IPC分类号： H01L21/00 , H01L21/02 , H01L21/205 , H01L21/203 , H01L21/265 , H01L21/3065
CPC分类号： C23C14/56 , C23C16/44 , H01J37/32467 , H01L21/67236 , H01L21/67772
摘要： The present invention embodies processing systems and vacuum chambers equipped to process substrates for flat panel displays, solar cells, or other electronic devices. The processing system and/or the vacuum chambers as well as their components and supporting structure are constructed of less costly materials and in a more energy efficient manner than that of current large area substrate processing systems. In one embodiment, the processing system chamber bodies and their supporting structures are constructed of reinforced concrete. In one embodiment, system processing chambers include a vacuum tight lining disposed inside reinforced concrete chamber bodies.
摘要翻译：本发明体现了用于处理平板显示器，太阳能电池或其他电子设备的基板的处理系统和真空室。处理系统和/或真空室以及它们的部件和支撑结构由比当前的大面积基板处理系统的成本较低的材料和更节能的方式构成。在一个实施例中，处理系统室主体及其支撑结构由钢筋混凝土构成。在一个实施例中，系统处理室包括设置在钢筋混凝土室体内的真空密封衬里。

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