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1. 发明申请

WO2009038460A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2009038460A1
公开(公告)日：2009-03-26
申请号：PCT/NL2008/050611
申请日：2008-09-17
申请人： ASML Netherlands B.V. , VAN DE VIJVER, Yuri Johannes Gabriël , VAN EMPEL, Tjarko Adriaan Rudolf , VAN SCHOOT, Jan Bernard Plechelmus , SWINKELS, Gerardus Hubertus Petrus Maria , SCHIMMEL, Hendrikus Gijsbertus , LABETSKI, Dzmitry
发明人： VAN DE VIJVER, Yuri Johannes Gabriël , VAN EMPEL, Tjarko Adriaan Rudolf , VAN SCHOOT, Jan Bernard Plechelmus , SWINKELS, Gerardus Hubertus Petrus Maria , SCHIMMEL, Hendrikus Gijsbertus , LABETSKI, Dzmitry
IPC分类号： G03F7/20 , H05G2/00 , G21K1/00
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70841 , G03F7/70908 , G03F7/70916 , G03F7/70933 , H05G2/003 , H05G2/008
摘要： A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system (IL) and an outlet connected to a pumping system (78) to pump away gas from between an inner wall (64) and outer wall (62) of the illumination system (IL) or, if a radiation source (SO) is present, between the inner wall (64) of the illumination system (IL) and an inner wall (62) of the radiation source (SO).
摘要翻译：公开了一种布置成将图案从图案形成装置突出到基板上的光刻设备。光刻设备包括照明系统（IL）和连接到泵送系统（78）的出口，用于泵送从照明系统（IL）的内壁（64）和外壁（62）之间的气体，或者如果在照明系统（IL）的内壁（64）和辐射源（SO）的内壁（62）之间存在辐射源（SO）。

2. 发明申请

WO2009061192A1 RADIATION SYSTEM AND METHOD, AND A SPECTRAL PURITY FILTER 审中-公开
标题翻译：辐射系统和方法，以及光谱滤光片
公开(公告)号：WO2009061192A1
公开(公告)日：2009-05-14
申请号：PCT/NL2008/050704
申请日：2008-11-07
申请人： ASML NETHERLANDS B.V. , SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , LABETSKI, Dzmitry
发明人： SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , LABETSKI, Dzmitry
IPC分类号： G03F7/20 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70575 , G03F7/70983 , G21K1/10 , G21K2201/061 , H05G2/003
摘要： A radation system (3) configured to generate a radiation beam (B). The system (3) has a chamber (3). The chamber (3) includes a radiation source (50) configured to generate radiation (B), and a radiation collector (70) configured to collect radiation (B) generated by the source (50), to transmit collected radiation to a radiation beam emission aperture (60). A spectral purity filter (80) enhances a spectral purity of the radiation (B) that is to be emitted via the aperture (60). The filter (80) is divided the chamber (3) into a high pressure region (Rl) and a low pressure region (R2).
摘要翻译：辐射系统（3），被配置为产生辐射束（B）。系统（3）具有腔室（3）。腔室（3）包括被配置为产生辐射（B）的辐射源（50）和被配置为收集由源（50）产生的辐射（B））的辐射收集器（70），以将收集的辐射传输到辐射束发射孔径（60）。光谱纯度滤光器（80）增强了经由孔径（60）发射的辐射（B）的光谱纯度。过滤器（80）将腔室（3）分成高压区域（R1）和低压区域（R2）。

3. 发明申请

WO2009061188A3 METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2009061188A3
公开(公告)日：2009-05-14
申请号：PCT/NL2008/050700
申请日：2008-11-06
申请人： ASML Netherlands B.V. , SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , HAAST, Marc Antonius Maria , LABETSKI, Dzmitry , FRERIKS, Johannes Maria , VAN DE VIJVER, Yuri Johannes Gabriël , VERSTEEG, Wendelin Johanna Maria , JONKERS, Peter Gerardus
发明人： SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , HAAST, Marc Antonius Maria , LABETSKI, Dzmitry , FRERIKS, Johannes Maria , VAN DE VIJVER, Yuri Johannes Gabriël , VERSTEEG, Wendelin Johanna Maria , JONKERS, Peter Gerardus
IPC分类号： G03F7/20
摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.

4. 发明申请

WO2009036995A1 ELECTROSTATIC CLAMP, LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING AN ELECTROSTATIC CLAMP 审中-公开
标题翻译：静电夹，光刻胶及其制造方法
公开(公告)号：WO2009036995A1
公开(公告)日：2009-03-26
申请号：PCT/EP2008/007916
申请日：2008-09-19
申请人： ASML NETHERLANDS B.V. , SIJBEN, Anko, Jozef, Cornelus , VAN EMPEL, Tjarko, Adriaan, Rudolf , VISSER, Raimond , FRANSSEN, Johannes, Hendrikus, Gertrudis , YANG, Zongquan , BRALS, Albert , RIJPMA, Albert, Pieter
发明人： SIJBEN, Anko, Jozef, Cornelus , VAN EMPEL, Tjarko, Adriaan, Rudolf , VISSER, Raimond , FRANSSEN, Johannes, Hendrikus, Gertrudis , YANG, Zongquan , BRALS, Albert , RIJPMA, Albert, Pieter
IPC分类号： H01L21/683 , H01L21/687
CPC分类号： H01L21/6831 , G03F7/70708 , H01L21/6875
摘要： The invention relates to an electrostatic clamp for use in a lithographic apparatus comprising a layer of material provided with burls, wherein an electrode surrounded by an insulator and or a dielectric material is provided in between the burls and a method of manufacturing such an electrostatic clamp. The electrostatic clamp may be used to clamp an object to an object Support in a lithographic apparatus.
摘要翻译：本发明涉及一种在光刻设备中使用的静电夹具，其包括设置有毛刺的材料层，其中由绝缘体和介电材料包围的电极设置在毛刺之间，以及制造这种静电夹具的方法。静电夹具可用于将物体夹持在光刻设备中的物体支撑件上。

5. 发明申请

WO2004114018A2 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY 审中-公开
标题翻译：光刻设备，器件制造方法及其制造的器件
公开(公告)号：WO2004114018A2
公开(公告)日：2004-12-29
申请号：PCT/NL2004/000448
申请日：2004-06-23
申请人： ASML NETHERLANDS B.V. , VAN EMPEL, Tjarko, Adriaan, Rudolf , VAN MEER, Aschwin, Lodewijk, Hendricus, Johannes , AANTJES, Ton , ZAAL, Koen, Jacobus, Johannes, Maria
发明人： ZAAL, Koen, Jacobus, Johannes, Maria
IPC分类号： G03F7/00
CPC分类号： G03F7/707
摘要： A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder comprising a plurality of first protrusions the distal ends thereof defining a first contact surface for contacting a substrate, said substrate holder provided with clamping means for clamping the substrate against said first contact surface; and a projection system for projecting the patterned beam onto a target portion of the substrate. The substrate holder comprises a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting said substrate, wherein said second protrusions are arranged so that said second contact surface is substantially coinciding with said first contact surface when the substrate is clamped against said first contact surface en so that said wafer is separated from said first contact surface when the substrate is not clamped against said first contact surface.
摘要翻译：一种光刻投影设备，包括：用于提供投影辐射束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案图案化所述投影光束; 衬底保持器，其包括多个第一突起，其远端限定用于接触衬底的第一接触表面，所述衬底保持器设置有用于将衬底夹持在所述第一接触表面上的夹持装置; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。衬底保持器包括多个第二突起，其远端限定用于支撑所述衬底的第二接触表面，其中所述第二突起被布置成使得当衬底被夹紧时所述第二接触表面基本上与所述第一接触表面重合所述第一接触表面en使得当所述基底未被夹紧在所述第一接触表面上时，所述晶片与所述第一接触表面分离。

6. 发明申请

WO2009035328A1 LITHOGRAPHIC APPARATUS WITH ROTATION FILTER DEVICE 审中-公开
标题翻译：具有旋转滤波器的平面设备
公开(公告)号：WO2009035328A1
公开(公告)日：2009-03-19
申请号：PCT/NL2008/050598
申请日：2008-09-12
申请人： ASML Netherlands B.V. , BUIS, Edwin Johan , VAN EMPEL, Tjarko Adriaan Rudolf
发明人： BUIS, Edwin Johan , VAN EMPEL, Tjarko Adriaan Rudolf
IPC分类号： G03F7/20 , C04B35/83 , G21K1/00
CPC分类号： G03F7/70916 , B01D45/14 , C04B35/522 , C04B35/573 , C04B35/83 , C04B2235/5248 , C04B2235/5268 , G03F7/70166 , G03F7/7095
摘要： A lithographic apparatus (1) including a filter device (149) is disclosed. The filter device (149) has a plurality of foils (200) attached to a holder (201) which is able to rotate around a rotation axis (RA). The foils (200) are arranged substantially parallel to the rotation axis (RA). The foils (200) comprise a uni-directional carbon- fiber composite material selected from the group consisting of carbon-carbon composite (C-C composite) and carbon-silicon carbide composite (C-SiC composite). During operation, the filter device (149) rotates and filters out debris from a radiation source (SO), such as a Sn plasma source. Such a filter device (149) per se may be provided.
摘要翻译：公开了一种包括过滤装置（149）的光刻设备（1）。过滤装置（149）具有附接到能够围绕旋转轴线（RA）旋转的保持器（201）的多个箔片（200）。箔（200）基本上平行于旋转轴线（RA）布置。箔（200）包括选自由碳 - 碳复合材料（C-C复合材料）和碳 - 碳化硅复合材料（C-SiC复合材料）组成的组的单向碳纤维复合材料。在操作期间，过滤装置（149）从诸如Sn等离子体源的辐射源（SO）旋转并滤出碎屑。可以提供这种过滤装置（149）本身。

7. 发明申请

WO2009025557A1 MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION 审中-公开
标题翻译：用于生产超极紫外线辐射的模块和方法
公开(公告)号：WO2009025557A1
公开(公告)日：2009-02-26
申请号：PCT/NL2008/050567
申请日：2008-08-25
申请人： ASML Netherlands B.V. , VAN EMPEL, Tjarko Adriaan Rudolf , BANINE, Vadim Yevgenyevich , IVANOV, Vladimir Vitalevich , LOOPSTRA, Erik Roelof , VAN SCHOOT, Jan Bernard Plechelmus , VAN DE VIJVER, Yuri Johannes Gabriël , SWINKELS, Gerardus Hubertus Petrus Maria , SCHIMMEL, Hendrikus Gijsbertus , LABETSKI, Dzmitry , MOORS, Johannes Hubertus Josephina
发明人： VAN EMPEL, Tjarko Adriaan Rudolf , BANINE, Vadim Yevgenyevich , IVANOV, Vladimir Vitalevich , LOOPSTRA, Erik Roelof , VAN SCHOOT, Jan Bernard Plechelmus , VAN DE VIJVER, Yuri Johannes Gabriël , SWINKELS, Gerardus Hubertus Petrus Maria , SCHIMMEL, Hendrikus Gijsbertus , LABETSKI, Dzmitry , MOORS, Johannes Hubertus Josephina
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , G03F7/70175 , G03F7/70916 , G03F7/70983 , H05G2/005 , H05G2/008
摘要： A module (1) for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser (6) arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet (4) which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror (12) having a mirror surface (14) constructed and arranged to reflect the radiation in order to focus the radiation on a focal point (FP). A fluid supply (2) is constructed and arranged to form a gas flow (GF) flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
摘要翻译：用于产生极紫外线辐射的模块（1）包括被配置为将点火材料的液滴供应到预定的目标点火位置的供应装置和设置成聚焦在预定目标点火位置上并通过击打产生等离子体的激光器这种液滴（4）位于预定的目标点火位置，以便将液滴变成极紫外线产生的等离子体。而且，该模块还包括一个收集器反射镜（12），其具有构造和布置成反射辐射的镜面（14），以便将辐射聚焦在焦点（FP）上。流体供应器（2）被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流（GF），以便减轻由等离子体产生的颗粒碎片。

8. 发明申请

WO2004114018A3 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY 审中-公开
公开(公告)号：WO2004114018A3
公开(公告)日：2004-12-29
申请号：PCT/NL2004/000448
申请日：2004-06-23
申请人： ASML NETHERLANDS B.V. , VAN EMPEL, Tjarko, Adriaan, Rudolf , VAN MEER, Aschwin, Lodewijk, Hendricus, Johannes , AANTJES, Ton , ZAAL, Koen, Jacobus, Johannes, Maria
发明人： ZAAL, Koen, Jacobus, Johannes, Maria
IPC分类号： G03F7/20
摘要： A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder comprising a plurality of first protrusions the distal ends thereof defining a first contact surface for contacting a substrate, said substrate holder provided with clamping means for clamping the substrate against said first contact surface; and a projection system for projecting the patterned beam onto a target portion of the substrate. The substrate holder comprises a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting said substrate, wherein said second protrusions are arranged so that said second contact surface is substantially coinciding with said first contact surface when the substrate is clamped against said first contact surface en so that said wafer is separated from said first contact surface when the substrate is not clamped against said first contact surface.

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