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1. 发明申请

WO2014190070A1 FULLERENES 审中-公开
标题翻译：富勒烯
公开(公告)号：WO2014190070A1
公开(公告)日：2014-11-27
申请号：PCT/US2014/038997
申请日：2014-05-21
申请人： ROBINSON, Alex Philip Graaham , PALMER, Richard Edward , FROMMHOLD, Andreas , YANG, Dongxu
发明人： ROBINSON, Alex Philip Graaham , PALMER, Richard Edward , FROMMHOLD, Andreas , YANG, Dongxu
IPC分类号： G03F7/004 , C01B31/02 , C07C62/34 , C07C209/70
CPC分类号： G03F7/0042 , C07C69/753 , C07C69/96 , C07C2604/00 , C07D401/04 , C07D401/14 , G03F7/0043 , G03F7/0045 , G03F7/0046 , G03F7/027 , G03F7/0382 , G03F7/0392 , H01L51/0047
摘要： The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.
摘要翻译：本公开涉及新型富勒烯衍生物，由其制备的正性和负性光致抗蚀剂组合物及其使用方法。衍生物，其光致抗蚀剂组合物和方法对于使用例如紫外线辐射，极紫外辐射，超过紫外线辐射，X射线，电子束和其它带电粒子射线的高速，精细图案处理是理想的。

2. 发明申请

WO2014078097A1 METHANOFULLERENES 审中-公开
公开(公告)号：WO2014078097A1
公开(公告)日：2014-05-22
申请号：PCT/US2013/068021
申请日：2013-11-01
申请人： ROBINSON, Alex Philip, Graham , PREECE, Jon, Andrew , PALMER, Richard, Edward , FROMMHOLD, Andreas , YANG, Dongxu , MCCLELLAND, Alexandra , ATHENS, Drew , XUE, Xiang
发明人： ROBINSON, Alex Philip, Graham , PREECE, Jon, Andrew , PALMER, Richard, Edward , FROMMHOLD, Andreas , YANG, Dongxu , MCCLELLAND, Alexandra , ATHENS, Drew , XUE, Xiang
IPC分类号： C07C69/753 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027 , B82Y30/00
CPC分类号： G03F7/027 , C07C69/753 , C07C69/96 , C07C2604/00 , G03F7/0046 , G03F7/0226 , G03F7/0233 , G03F7/038 , G03F7/0382 , G03F7/20 , G03F7/325 , G03F7/38 , H01L51/0047
摘要： The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
摘要翻译：本公开涉及新的甲醇富勒烯衍生物，由其制备的负型光致抗蚀剂组合物及其使用方法。衍生物，它们的光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超出极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。

3. 发明申请

WO2006030234A2 USE OF METHANOFULLERENE DERIVATIVES AS RESIST MATERIALS AND METHOD FOR FORMING A RESIST LAYER 审中-公开
标题翻译：甲烷腈衍生物用作抗蚀剂材料和形成抗蚀剂层的方法
公开(公告)号：WO2006030234A2
公开(公告)日：2006-03-23
申请号：PCT/GB2005/003587
申请日：2005-09-19
申请人： THE UNIVERSITY OF BIRMINGHAM , ROBINSON, Alex , PREECE, Jon, Andrew , PALMER, Richard, Edward
发明人： ROBINSON, Alex , PREECE, Jon, Andrew , PALMER, Richard, Edward
IPC分类号： G03F7/038
CPC分类号： B82Y30/00 , G03F7/0382 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： The present invention relates in one aspect to the use as a resist material of a methanofullerene derivative having a plurality of open-ended addends, and to a method for forming a patterned resist layer on a substrate using the methanofullerene derivatives. The methanofullerene derivatives can be represented by the formula C 2x (CR 1 R 2 ) m where x is at least (10), m is at least (2), each addend represented by CR 1 R 2 is the same or different, and wherein each R 1 and R 2 is each a monovalent organic group, or a divalent organic group which forms a ring structure by being joined to the fullerene shell, or where both R 1 and R 2 of an addend are divalent groups, they may be mutually joined to form a ring structure, save that at least two of R 1 or two of R 2 are monovalent, or a mixture of such derivatives. The invention also resides in the use of any methanofullerene derivative which has been chemically amplified for formation of a patterned resist layer. The essential step of the method is forming a coating layer comprising the methanofullerene derivative on the substrate surface, the methanofullerene derivative being chemically amplified by including in the coating layer at least one additional component which increases the sensitivity of the exposed layer to actinic radiation which is subsequently used to pattern the layer.
摘要翻译：本发明在一个方面涉及作为具有多个开放式附加物的亚甲基富勒烯衍生物的抗蚀剂材料的用途，以及涉及在基板上形成图案化抗蚀剂层的方法，亚甲基富勒烯衍生物。亚甲基富勒烯衍生物可以由式C 2x（CR 1 R 2 2）m -Y表示，其中x是（10）中，m至少为（2），由CR 1 R 2 2表示的每个加成物是相同的或不同的，并且其中每个R 1， R 2和R 2各自为一价有机基团或通过连接至富勒烯壳而形成环结构的二价有机基团，或者其中两个R 1，和R 2中的至少两个是二价基团，它们可以相互连接形成环结构，除了R 1或R 2中的至少两个或两个以外， 2是单价的，或这些衍生物的混合物。本发明还涉及使用化学放大的任何亚甲基富勒烯衍生物用于形成图案化的抗蚀剂层。该方法的基本步骤是在基底表面上形成包含亚甲基富烯衍生物的涂层，该亚甲基富烯衍生物通过在涂层中包括至少一种增加曝光层对光化辐射敏感性的额外组分而被化学放大，随后用于图案化图层。

4. 发明申请

WO2006030240A3 NOVEL RESIST MATERIAL 审中-公开
标题翻译：新材料
公开(公告)号：WO2006030240A3
公开(公告)日：2006-07-06
申请号：PCT/GB2005003606
申请日：2005-09-19
申请人： UNIV BIRMINGHAM , ROBINSON ALEX , PALMER RICHARD EDWARD
发明人： ROBINSON ALEX , PALMER RICHARD EDWARD
IPC分类号： G03F7/038
CPC分类号： G03F7/0382
摘要： The present invention relates to the use of fullerols having the formula C 2x (OH) n where x is at least 10 and n is at least 2 as resist materials. The invention also includes within its scope methods of patterning a fullerol-based resist layer.
摘要翻译：本发明涉及使用具有式C 2 x（OH）N n的富勒醇，其中x为至少10，n为至少2作为抗蚀剂材料。本发明还包括在其范围内构图富烯醇基抗蚀剂层的方法。

5. 发明申请

WO2006030234A3 USE OF METHANOFULLERENE DERIVATIVES AS RESIST MATERIALS AND METHOD FOR FORMING A RESIST LAYER 审中-公开
标题翻译：甲基呋喃衍生物作为耐药材料的使用和形成耐药层的方法
公开(公告)号：WO2006030234A3
公开(公告)日：2006-09-14
申请号：PCT/GB2005003587
申请日：2005-09-19
申请人： UNIV BIRMINGHAM , ROBINSON ALEX , PREECE JON ANDREW , PALMER RICHARD EDWARD
发明人： ROBINSON ALEX , PREECE JON ANDREW , PALMER RICHARD EDWARD
IPC分类号： G03F7/038
CPC分类号： B82Y30/00 , G03F7/0382 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： The present invention relates in one aspect to the use as a resist material of a methanofullerene derivative having a plurality of open-ended addends, and to a method for forming a patterned resist layer on a substrate using the methanofullerene derivatives. The methanofullerene derivatives can be represented by the formula C 2x (CR 1 R 2 ) m where x is at least (10), m is at least (2), each addend represented by CR 1 R 2 is the same or different, and wherein each R 1 and R 2 is each a monovalent organic group, or a divalent organic group which forms a ring structure by being joined to the fullerene shell, or where both R 1 and R 2 of an addend are divalent groups, they may be mutually joined to form a ring structure, save that at least two of R 1 or two of R 2 are monovalent, or a mixture of such derivatives. The invention also resides in the use of any methanofullerene derivative which has been chemically amplified for formation of a patterned resist layer. The essential step of the method is forming a coating layer comprising the methanofullerene derivative on the substrate surface, the methanofullerene derivative being chemically amplified by including in the coating layer at least one additional component which increases the sensitivity of the exposed layer to actinic radiation which is subsequently used to pattern the layer.
摘要翻译：本发明在一个方面涉及作为具有多个开口加数的亚甲基富勒烯衍生物的抗蚀剂材料的用途，以及在使用甲基富勒烯衍生物的基板上形成图案化抗蚀剂层的方法。亚甲基富勒烯衍生物可以用下式表示：其中x是在下面的式C 2 x X 至少（10），m为至少（2），由CR 1 R 2 2 N表示的每个加成物相同或不同，并且其中每个R 1， / SUB和R 2 2各自是一价有机基团，或通过与富勒烯壳体接合而形成环结构的二价有机基团，或者其中R 1，并且加成物的R 2 2是二价基团，它们可以相互连接以形成环结构，除了R 1或R 2中的至少两个， 2 是一价的，或这些衍生物的混合物。本发明还涉及已经化学放大以形成图案化抗蚀剂层的任何甲基富勒烯衍生物的用途。该方法的基本步骤是在基材表面上形成包含甲基富勒烯衍生物的涂层，通过在涂层中包含至少一种附加组分来化学扩增的甲醇富勒烯衍生物，其增加了曝光层对光化辐射的敏感性，随后用于对图层进行图案化。

6. 发明申请

WO2006030240A2 NOVEL RESIST MATERIAL 审中-公开
标题翻译：新型电阻材料
公开(公告)号：WO2006030240A2
公开(公告)日：2006-03-23
申请号：PCT/GB2005/003606
申请日：2005-09-19
申请人： THE UNIVERSITY OF BIRMINGHAM , ROBINSON, Alex , PALMER, Richard, Edward
发明人： ROBINSON, Alex , PALMER, Richard, Edward
IPC分类号： G03F7/038
CPC分类号： G03F7/0382
摘要： The present invention relates to the use of fullerols having the formula C 2x (OH) n where x is at least 10 and n is at least 2 as resist materials. The invention also includes within its scope methods of patterning a fullerol-based resist layer.
摘要翻译：本发明涉及具有式C 2x（OH）n -n的富勒醇的用途，其中x至少为10且n在至少2个作为抗蚀剂材料。本发明在其范围内还包括构图富勒醇基抗蚀剂层的方法。

7. 发明申请

WO2006030239A2 NOVEL RESIST MATERIAL AND METHOD FOR FORMING A PATTERNED RESIST LAYER ON A SUBSTRATE 审中-公开
标题翻译：用于在衬底上形成图案化电阻层的新型电阻材料和方法
公开(公告)号：WO2006030239A2
公开(公告)日：2006-03-23
申请号：PCT/GB2005/003605
申请日：2005-09-19
申请人： THE UNIVERSITY OF BIRMINGHAM , PALMER, Richard, Edward , ROBINSON, Alex , PREECE, Jon, Andrew
发明人： PALMER, Richard, Edward , ROBINSON, Alex , PREECE, Jon, Andrew
IPC分类号： G03F7/038
CPC分类号： G03F7/0382 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： The present invention resides in a method for the formation of a patterned resist layer on a substrate surface by patternwise irradiation with actinic radiation. The first step of the method is formation of a coating layer comprising a substituted triphenylene compound having a diameter of between 1 and 3 nm, a sensitizer which increases the sensitivity of the exposed layer to the actinic radiation used in a subsequent irradiation step and a cross-linker on the substrate surface. Subsequently the coating layer is irradiated patternwise, and unirradiated areas of the coating layer are removed. The invention also resides in a resist material comprising a solution of: - (i) as the principal resist material a triphenylene derivative having a diameter of from 1 to 3 rim, (ii) a sensitizer which increases the sensitivity of the resist material to actinic radiation, and (iii) a cross linker capable of cross linking molecules of the triphenylene derivative, said cross linker optionally being constituted by a moiety attached to said triphenylene derivative.
摘要翻译：本发明在于通过用光化学辐射进行图案照射来在衬底表面上形成图案化抗蚀剂层的方法。该方法的第一步是形成包含直径在1和3nm之间的取代三亚苯化合物的涂布层，增加曝光层对后续照射步骤中使用的光化辐射的敏感性的敏化剂， - 连接器在基板表面上。随后将涂层按照图案照射，并除去未被照射的涂层区域。本发明还涉及抗蚀剂材料，其包含以下溶液：（i）作为主要抗蚀剂材料的直径为1至3 rim的三亚苯衍生物，（ii）增加抗蚀剂材料对光化性的敏感性的敏化剂辐射，和（iii）能够交联三亚苯衍生物的分子的交联剂，所述交联剂任选由与所述三亚苯衍生物连接的部分构成。

8. 发明申请

WO1997032336A1 MASS SELECTOR 审中-公开
标题翻译：质量选择器
公开(公告)号：WO1997032336A1
公开(公告)日：1997-09-04
申请号：PCT/GB1997000557
申请日：1997-02-27
申请人： THE UNIVERSITY OF BIRMINGHAM , PALMER, Richard, Edward , VON ISSENDORFF, Bernd
发明人： THE UNIVERSITY OF BIRMINGHAM
IPC分类号： H01J49/40
CPC分类号： H01J49/421
摘要： A mass selector is disclosed for separating particles in a particle beam according to mass. The selector has a pair of first electrodes (12, 14) defining an elongate first path (16) for the passage of a focused particle beam. A pair of second electrodes (24, 26) are spaced from the pair of first electrodes (12, 14) and define an elongate second path (28) for separated particles. The first and second paths (16, 28) are mutually parallel. A first voltage pulse is applied across the first electrodes (12, 14) so that the particles in a portion of the beam which is in the first path (16) are accelerated transversely of their direction of movement along said first path toward said second path. A second voltage pulse is applied across the second electrodes (24, 26) so that particles which have been accelerated by said first voltage pulse and which have entered said second path (28) are decelerated transversely of their direction of movement along said second path.
摘要翻译：公开了用于根据质量分离粒子束中的粒子的质量选择器。选择器具有限定用于聚焦粒子束通过的细长第一路径（16）的一对第一电极（12,14）。一对第二电极（24,26）与所述一对第一电极（12,14）间隔开并且限定用于分离的颗粒的细长的第二路径（28）。第一和第二路径（16,28）是相互平行的。第一电压脉冲施加在第一电极（12,14）上，使得处于第一路径（16）中的梁的一部分中的粒子沿其沿着所述第一路径的移动方向横向于朝向所述第二路径。第二电压脉冲施加在第二电极（24,26）上，使得已经被所述第一电压脉冲加速并已经进入所述第二路径（28）的颗粒沿其沿着所述第二路径的运动方向横向减速。

9. 发明申请

WO9962106A2 METHOD OF PRODUCING A STRUCTURED SURFACE 审中-公开
标题翻译：生产结构表面的方法
公开(公告)号：WO9962106A2
公开(公告)日：1999-12-02
申请号：PCT/GB9901606
申请日：1999-05-20
申请人： UNIV BIRMINGHAM , PALMER RICHARD EDWARD , SEEGER KATRIN
发明人： PALMER RICHARD EDWARD , SEEGER KATRIN
IPC分类号： H01J9/02 , H01L21/302 , H01L21/00
CPC分类号： B82Y15/00 , H01J9/025
摘要： Clusters of an etchable material such as silver are deposited on a silicon substrate (10) to form peaks (12). The peaks (12) are then at least partially etched away by plasma etching to form cones (14) or pillars of silicon on the substrate (10).
摘要翻译：可蚀刻材料如银的簇沉积在硅衬底（10）上以形成峰（12）。然后通过等离子体蚀刻至少部分地蚀刻峰（12），以在衬底（10）上形成硅（14）或硅柱。

10. 发明申请

WO2014137663A1 METHANOFULLERENES 审中-公开
公开(公告)号：WO2014137663A1
公开(公告)日：2014-09-12
申请号：PCT/US2014/018245
申请日：2014-02-25
申请人： ROBINSON, Alex Philip, Graham , PRESSE, Jon Andrew , YANG, Dongxu , PALMER, Richard, Edward , FROMMHOLD, Andreas , McCLELLAND, Alexandra , ATHANS, Drew , XUE, Xiang
发明人： ROBINSON, Alex Philip, Graham , PRESSE, Jon Andrew , YANG, Dongxu , PALMER, Richard, Edward , FROMMHOLD, Andreas , McCLELLAND, Alexandra , ATHANS, Drew , XUE, Xiang
IPC分类号： C07C69/753 , G03F7/004 , H01L21/027 , H01L51/46 , B82Y30/00 , B82B1/00
CPC分类号： G03F7/0384 , A61B5/042 , A61B5/065 , A61B5/6852 , A61B5/7221 , A61B34/20 , A61B2505/03 , A61B2505/05 , G03F7/038 , G03F7/0382 , G03F7/2024 , G03F7/38 , Y02P70/521
摘要： The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.
摘要翻译：本公开涉及新的甲醇富勒烯衍生物，由其制备的负型光致抗蚀剂组合物及其使用方法。衍生物，它们的光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超出极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。还公开了负光敏组合物。

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