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    • 1. 发明申请
    • USE OF METHANOFULLERENE DERIVATIVES AS RESIST MATERIALS AND METHOD FOR FORMING A RESIST LAYER
    • 甲烷腈衍生物用作抗蚀剂材料和形成抗蚀剂层的方法
    • WO2006030234A2
    • 2006-03-23
    • PCT/GB2005/003587
    • 2005-09-19
    • THE UNIVERSITY OF BIRMINGHAMROBINSON, AlexPREECE, Jon, AndrewPALMER, Richard, Edward
    • ROBINSON, AlexPREECE, Jon, AndrewPALMER, Richard, Edward
    • G03F7/038
    • B82Y30/00G03F7/0382Y10S430/115Y10S430/122Y10S430/126
    • The present invention relates in one aspect to the use as a resist material of a methanofullerene derivative having a plurality of open-ended addends, and to a method for forming a patterned resist layer on a substrate using the methanofullerene derivatives. The methanofullerene derivatives can be represented by the formula C 2x (CR 1 R 2 ) m where x is at least (10), m is at least (2), each addend represented by CR 1 R 2 is the same or different, and wherein each R 1 and R 2 is each a monovalent organic group, or a divalent organic group which forms a ring structure by being joined to the fullerene shell, or where both R 1 and R 2 of an addend are divalent groups, they may be mutually joined to form a ring structure, save that at least two of R 1 or two of R 2 are monovalent, or a mixture of such derivatives. The invention also resides in the use of any methanofullerene derivative which has been chemically amplified for formation of a patterned resist layer. The essential step of the method is forming a coating layer comprising the methanofullerene derivative on the substrate surface, the methanofullerene derivative being chemically amplified by including in the coating layer at least one additional component which increases the sensitivity of the exposed layer to actinic radiation which is subsequently used to pattern the layer.
    • 本发明在一个方面涉及作为具有多个开放式附加物的亚甲基富勒烯衍生物的抗蚀剂材料的用途,以及涉及在基板上形成图案化抗蚀剂层的方法, 亚甲基富勒烯衍生物。 亚甲基富勒烯衍生物可以由式C 2x(CR 1 R 2 2)m -Y表示,其中x是 (10)中,m至少为(2),由CR 1 R 2 2表示的每个加成物是相同的或不同的,并且其中每个R 1, R 2和R 2各自为一价有机基团或通过连接至富勒烯壳而形成环结构的二价有机基团,或者其中两个R 1, 和R 2中的至少两个是二价基团,它们可以相互连接形成环结构,除了R 1或R 2中的至少两个或两个以外, 2是单价的,或这些衍生物的混合物。 本发明还涉及使用化学放大的任何亚甲基富勒烯衍生物用于形成图案化的抗蚀剂层。 该方法的基本步骤是在基底表面上形成包含亚甲基富烯衍生物的涂层,该亚甲基富烯衍生物通过在涂层中包括至少一种增加曝光层对光化辐射敏感性的额外组分而被化学放大, 随后用于图案化图层。
    • 3. 发明申请
    • NOVEL RESIST MATERIAL AND METHOD FOR FORMING A PATTERNED RESIST LAYER ON A SUBSTRATE
    • 用于在衬底上形成图案化电阻层的新型电阻材料和方法
    • WO2006030239A2
    • 2006-03-23
    • PCT/GB2005/003605
    • 2005-09-19
    • THE UNIVERSITY OF BIRMINGHAMPALMER, Richard, EdwardROBINSON, AlexPREECE, Jon, Andrew
    • PALMER, Richard, EdwardROBINSON, AlexPREECE, Jon, Andrew
    • G03F7/038
    • G03F7/0382Y10S430/106Y10S430/115Y10S430/122
    • The present invention resides in a method for the formation of a patterned resist layer on a substrate surface by patternwise irradiation with actinic radiation. The first step of the method is formation of a coating layer comprising a substituted triphenylene compound having a diameter of between 1 and 3 nm, a sensitizer which increases the sensitivity of the exposed layer to the actinic radiation used in a subsequent irradiation step and a cross-linker on the substrate surface. Subsequently the coating layer is irradiated patternwise, and unirradiated areas of the coating layer are removed. The invention also resides in a resist material comprising a solution of: - (i) as the principal resist material a triphenylene derivative having a diameter of from 1 to 3 rim, (ii) a sensitizer which increases the sensitivity of the resist material to actinic radiation, and (iii) a cross linker capable of cross linking molecules of the triphenylene derivative, said cross linker optionally being constituted by a moiety attached to said triphenylene derivative.
    • 本发明在于通过用光化学辐射进行图案照射来在衬底表面上形成图案化抗蚀剂层的方法。 该方法的第一步是形成包含直径在1和3nm之间的取代三亚苯化合物的涂布层,增加曝光层对后续照射步骤中使用的光化辐射的敏感性的敏化剂, - 连接器在基板表面上。 随后将涂层按照图案照射,并除去未被照射的涂层区域。 本发明还涉及抗蚀剂材料,其包含以下溶液:(i)作为主要抗蚀剂材料的直径为1至3 rim的三亚苯衍生物,(ii)增加抗蚀剂材料对光化性的敏感性的敏化剂 辐射,和(iii)能够交联三亚苯衍生物的分子的交联剂,所述交联剂任选由与所述三亚苯衍生物连接的部分构成。