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1. 发明申请

WO2018156247A1 MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHOD 审中-公开
公开(公告)号：WO2018156247A1
公开(公告)日：2018-08-30
申请号：PCT/US2018/012327
申请日：2018-01-04
申请人： ROBINSON, Alex, P.G. , MCCLELLAND, Alexandra , FROMMHOLD, Andeas , YANG, Dongxu , ROTH, John, L.
发明人： ROBINSON, Alex, P.G. , MCCLELLAND, Alexandra , FROMMHOLD, Andeas , YANG, Dongxu , ROTH, John, L.
IPC分类号： G03F7/004
摘要： The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher- analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

2. 发明申请

WO2014137663A1 METHANOFULLERENES 审中-公开
公开(公告)号：WO2014137663A1
公开(公告)日：2014-09-12
申请号：PCT/US2014/018245
申请日：2014-02-25
申请人： ROBINSON, Alex Philip, Graham , PRESSE, Jon Andrew , YANG, Dongxu , PALMER, Richard, Edward , FROMMHOLD, Andreas , McCLELLAND, Alexandra , ATHANS, Drew , XUE, Xiang
发明人： ROBINSON, Alex Philip, Graham , PRESSE, Jon Andrew , YANG, Dongxu , PALMER, Richard, Edward , FROMMHOLD, Andreas , McCLELLAND, Alexandra , ATHANS, Drew , XUE, Xiang
IPC分类号： C07C69/753 , G03F7/004 , H01L21/027 , H01L51/46 , B82Y30/00 , B82B1/00
CPC分类号： G03F7/0384 , A61B5/042 , A61B5/065 , A61B5/6852 , A61B5/7221 , A61B34/20 , A61B2505/03 , A61B2505/05 , G03F7/038 , G03F7/0382 , G03F7/2024 , G03F7/38 , Y02P70/521
摘要： The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.
摘要翻译：本公开涉及新的甲醇富勒烯衍生物，由其制备的负型光致抗蚀剂组合物及其使用方法。衍生物，它们的光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超出极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。还公开了负光敏组合物。

3. 发明申请

WO2011061501A3 METHANOFULLERENE DERIVATIVES, PHOTORESIST COMPOSITION CONTAINING IT AND METHOD FOR FORMING A RESIST LAYER 审中-公开
公开(公告)号：WO2011061501A3
公开(公告)日：2011-05-26
申请号：PCT/GB2010/002129
申请日：2010-11-18
申请人： THE UNIVERSITY OF BIRMINGHAM , ROBINSON, Alex , PALMER, Richard , PREECE, Jon, Andrew
发明人： ROBINSON, Alex , PALMER, Richard , PREECE, Jon, Andrew
IPC分类号： G03F7/038
摘要： The invention provides methanofullerene derivatives having side chains with acid- labile protecting groups and their use as photoresist materials in a photoresist composition, and particularly as positive - tone photoresists.

4. 发明申请

WO2011061501A2 PHOTORESIST COMPOSITION 审中-公开
标题翻译：光电组合物
公开(公告)号：WO2011061501A2
公开(公告)日：2011-05-26
申请号：PCT/GB2010002129
申请日：2010-11-18
申请人： UNIV BIRMINGHAM , ROBINSON ALEX , PALMER RICHARD , PREECE JON ANDREW
发明人： ROBINSON ALEX , PALMER RICHARD , PREECE JON ANDREW
IPC分类号： G03F7/038
CPC分类号： G03F7/0392 , B82Y30/00 , B82Y40/00 , C01B32/152
摘要： Certain methanofullerene derivatives are described, having side chains with acid-labile protecting groups. The methanofullerene derivatives may find application as photoresist materials, and particularly as positive-tone photoresists.
摘要翻译：描述了某些具有酸不稳定保护基团的侧链的甲基富勒烯衍生物。甲基富勒烯衍生物可用作光致抗蚀剂材料，特别是作为正色调光致抗蚀剂。

5. 发明申请

WO2006030239A3 NOVEL RESIST MATERIAL AND METHOD FOR FORMING A PATTERNED RESIST LAYER ON A SUBSTRATE 审中-公开
标题翻译：在衬底上形成图案层的新颖材料和方法
公开(公告)号：WO2006030239A3
公开(公告)日：2006-05-11
申请号：PCT/GB2005003605
申请日：2005-09-19
申请人： UNIV BIRMINGHAM , PALMER RICHARD EDWARD , ROBINSON ALEX , PREECE JON ANDREW
发明人： PALMER RICHARD EDWARD , ROBINSON ALEX , PREECE JON ANDREW
IPC分类号： G03F7/038
CPC分类号： G03F7/0382 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： The present invention resides in a method for the formation of a patterned resist layer on a substrate surface by patternwise irradiation with actinic radiation. The first step of the method is formation of a coating layer comprising a substituted triphenylene compound having a diameter of between 1 and 3 nm, a sensitizer which increases the sensitivity of the exposed layer to the actinic radiation used in a subsequent irradiation step and a cross-linker on the substrate surface. Subsequently the coating layer is irradiated patternwise, and unirradiated areas of the coating layer are removed. The invention also resides in a resist material comprising a solution of: - (i) as the principal resist material a triphenylene derivative having a diameter of from 1 to 3 rim, (ii) a sensitizer which increases the sensitivity of the resist material to actinic radiation, and (iii) a cross linker capable of cross linking molecules of the triphenylene derivative, said cross linker optionally being constituted by a moiety attached to said triphenylene derivative.
摘要翻译：本发明在于通过用光化辐射的图案照射在衬底表面上形成图案化抗蚀剂层的方法。该方法的第一步是形成包含直径为1至3nm的取代的三亚苯化合物的涂层，增加曝光层对随后照射步骤中使用的光化辐射的敏感性的增感剂和十字在基材表面上连接。随后，图案地照射涂层，并且去除涂层的未照射区域。本发明还涉及一种抗蚀剂材料，其包含以下溶液： - （i）作为主要抗蚀剂材料的具有1至3个边缘直径的三亚苯衍生物，（ii）敏化剂，其增加抗蚀剂材料对光化反应的敏感性辐射，和（iii）能够交联三亚苯衍生物分子的交联剂，所述交联剂任选地由与所述三亚苯衍生物连接的部分构成。

6. 发明申请

WO2016172737A1 SENSITIVITY ENHANCED PHOTORESISTS 审中-公开
标题翻译：灵敏度增强的光电
公开(公告)号：WO2016172737A1
公开(公告)日：2016-10-27
申请号：PCT/US2016/029358
申请日：2016-04-26
申请人： ROBINSON, Alex Phillip, Graham , FROMMHOLD, Andreas , MCCLELLAND, Alexandra , LADA, Thomas , ROTH, John
发明人： ROBINSON, Alex Phillip, Graham , FROMMHOLD, Andreas , MCCLELLAND, Alexandra , LADA, Thomas , ROTH, John
IPC分类号： G03F7/004
CPC分类号： G03F7/0043
摘要： The present disclosure relates to novel positive and negative photoresist compositions containing components that are based on one or more specific metals, metal salts, and/or metal complexes and methods of using them. The photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays. The metals are characterized by high absorption cross sections and selected elastic and inelastic electron cross section.
摘要翻译：本发明涉及包含基于一种或多种特定金属，金属盐和/或金属络合物的组分的新型正型和负型光致抗蚀剂组合物及其使用方法。光致抗蚀剂组合物和方法对于使用例如紫外线辐射，极紫外辐射，超越紫外线辐射，X射线，电子束和其他带电粒子射线的高速，精细图案处理是理想的。金属的特征在于高吸收截面和选择的弹性和非弹性电子横截面。

7. 发明申请

WO2016086236A3 TWO-STEP PHOTORESIST COMPOSITIONS AND METHODS 审中-公开
标题翻译：两步光敏剂组合物和方法
公开(公告)号：WO2016086236A3
公开(公告)日：2016-09-01
申请号：PCT/US2015065691
申请日：2015-12-15
申请人： ROBINSON ALEX PHILLIP GRAHAM , FROMMHOLD ANDREAS , BROWN ALLEN , LADA TOM
发明人： ROBINSON ALEX PHILLIP GRAHAM , FROMMHOLD ANDREAS , BROWN ALLEN , LADA TOM
IPC分类号： G03F7/038 , G03F7/16
CPC分类号： G03F7/38 , A61B5/042 , A61B5/065 , A61B5/6852 , A61B5/7221 , A61B34/20 , A61B2505/03 , A61B2505/05 , A61M25/01 , A61M2025/0166 , A61M2205/13 , A61M2205/18 , A61M2205/50 , A61M2210/125 , A61M2230/005 , A61M2230/04 , G03F7/038 , G03F7/0382 , G03F7/0384 , G03F7/0392 , G03F7/2024 , G06F17/18 , Y02E10/549
摘要： The present disclosure relates to novel two-step photoresist compositions and processes. The processes involve removing acid-labile groups in step one and crosslinking the remaining material with themselves or added crosslinking systems in step two. The incorporation of a multistep pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher- analog and thus enhancing chemical gradient and thus resolution. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Dual functionality photosensitive compositions and methods are also disclosed.
摘要翻译：本公开涉及新颖的两步光致抗蚀剂组合物和方法。该方法涉及在步骤1中除去酸不稳定基团，并在步骤2中将剩余材料与其本身或交联体系交联。在抗蚀剂催化链中掺入多步路径增加了接受低剂量照射的区域中的化学梯度，有效地作为内建的剂量依赖性猝灭剂类似物起作用，从而增强了化学梯度并由此提高了分辨率。光致抗蚀剂组合物和方法对于使用例如紫外辐射，超远紫外辐射，远紫外辐射，X射线和带电粒子射线之外的精细图案处理是理想的。双功能性光敏组合物和方法也被公开。

8. 发明申请

WO2016086236A2 TWO-STEP PHOTORESIST COMPOSITIONS AND METHODS 审中-公开
标题翻译：两步光电组合物和方法
公开(公告)号：WO2016086236A2
公开(公告)日：2016-06-02
申请号：PCT/US2015/065691
申请日：2015-12-15
申请人： ROBINSON, Alex Phillip Graham , FROMMHOLD, Andreas , BROWN, Allen , LADA, Tom
发明人： ROBINSON, Alex Phillip Graham , FROMMHOLD, Andreas , BROWN, Allen , LADA, Tom
IPC分类号： G03F7/038
CPC分类号： G03F7/38 , A61B5/042 , A61B5/065 , A61B5/6852 , A61B5/7221 , A61B34/20 , A61B2505/03 , A61B2505/05 , A61M25/01 , A61M2025/0166 , A61M2205/13 , A61M2205/18 , A61M2205/50 , A61M2210/125 , A61M2230/005 , A61M2230/04 , G03F7/038 , G03F7/0382 , G03F7/0384 , G03F7/0392 , G03F7/2024 , G06F17/18 , Y02E10/549
摘要： The present disclosure relates to novel two-step photoresist compositions and processes. The processes involve removing acid-labile groups in step one and crosslinking the remaining material with themselves or added crosslinking systems in step two. The incorporation of a multistep pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher- analog and thus enhancing chemical gradient and thus resolution. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Dual functionality photosensitive compositions and methods are also disclosed.
摘要翻译：本发明涉及新的两步光刻胶组合物和方法。所述方法包括在步骤1中除去酸不稳定基团，并在第二步中与其自身交联剩余的材料或加入交联体系。在抗蚀剂催化链中结合多步途径增加了接受低剂量照射的区域的化学梯度，有效地作为内置的剂量依赖猝灭剂类似物，从而增强了化学梯度，从而提高了分辨率。光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超过极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。还公开了双功能光敏组合物和方法。

9. 发明申请

WO2016058008A3 SPIN ON HARD-MASK MATERIAL 审中-公开
标题翻译：在硬掩模材料上旋转
公开(公告)号：WO2016058008A3
公开(公告)日：2016-05-26
申请号：PCT/US2015064089
申请日：2015-12-04
申请人： ROBINSON ALEX PHILLIP GRAHAM , FROMMHOLD ANDREAS , BROWN ALLEN , LADA TOM
发明人： ROBINSON ALEX PHILLIP GRAHAM , FROMMHOLD ANDREAS , BROWN ALLEN , LADA TOM
IPC分类号： C01B31/02 , B05D3/02 , B82Y30/00 , C07C69/616 , H01L21/308
CPC分类号： H01L21/0274 , B05D1/005 , B05D3/002 , B05D3/0254 , C01B32/152 , C09D163/04 , C09D177/00 , H01L21/02115 , H01L21/02282 , H01L21/02318 , H01L21/3065 , H01L21/3081 , H01L21/31122 , H01L21/31138
摘要： Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
摘要翻译：本文公开并要求保护的是用于形成旋涂硬掩模的组合物，其具有富勒烯衍生物和交联剂。还公开了一种形成硬掩模的方法。

10. 发明申请

WO2016058008A2 SPIN ON HARD-MASK MATERIAL 审中-公开
标题翻译：旋转硬掩模材料
公开(公告)号：WO2016058008A2
公开(公告)日：2016-04-14
申请号：PCT/US2015/064089
申请日：2015-12-04
申请人： ROBINSON, Alex Phillip Graham , FROMMHOLD, Andreas , BROWN, Allen , LADA, Tom
发明人： ROBINSON, Alex Phillip Graham , FROMMHOLD, Andreas , BROWN, Allen , LADA, Tom
IPC分类号： C01B31/02
CPC分类号： H01L21/0274 , B05D1/005 , B05D3/002 , B05D3/0254 , C01B32/152 , C09D163/04 , C09D177/00 , H01L21/02115 , H01L21/02282 , H01L21/02318 , H01L21/3065 , H01L21/3081 , H01L21/31122 , H01L21/31138
摘要： Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
摘要翻译：本文公开和要求保护的是用于形成具有富勒烯衍生物和交联剂的旋涂硬掩模的组合物。进一步公开的是形成硬掩模的方法。

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