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    • 6. 发明申请
    • SEMICONDUCTOR DIE SEPARATION METHOD
    • 半导体分离方法
    • WO2009155247A3
    • 2010-03-11
    • PCT/US2009047389
    • 2009-06-15
    • VERTICAL CIRCUITS INCCO REYNALDOMELCHER DEANN EILEENPAN WEIPINGVILLAVICENCIO GRANT
    • CO REYNALDOMELCHER DEANN EILEENPAN WEIPINGVILLAVICENCIO GRANT
    • H01L21/78
    • H01L21/78H01L21/6835H01L21/6836H01L24/27H01L24/83H01L2221/68327H01L2221/6834H01L2221/68359H01L2224/274H01L2224/83191H01L2924/14H01L2924/1461H01L2924/00
    • According to the invention, die shift is reduced or substantially eliminated, by cutting the wafer in two stages. In some embodiments a first wafer cutting procedure is carried out prior to thinning the wafer to the prescribed die thickness; and in other embodiments the wafer is thinned to the prescribed die thickness prior to carrying out a first wafer cutting procedure. The first wafer cutting procedure includes cutting along a first set of streets to a depth greater than the prescribed die thickness and optionally along a second set of streets to a depth less than the die thickness. The result of the first cutting procedure is an array of strips or blocks of die, each including a plurality of connected die, that are less subject to shift than are individual singulated die. In a second wafer cutting procedure the die are singulated by cutting through along the second set of streets. Subsequent to the first cutting procedure, and prior to the second cutting procedure, additional die preparation procedures that are sensitive to die shift may be carried out.
    • 根据本发明,通过两个阶段切割晶片来减小或基本消除晶片位移。 在一些实施例中,在将晶片减薄到规定的模具厚度之前执行第一晶片切割程序; 并且在其他实施例中,在执行第一晶片切割程序之前将晶片减薄到规定的模具厚度。 第一晶片切割程序包括沿着第一组街道切割到大于规定模具厚度的深度,并且可选地沿着第二组街道切割至小于模具厚度的深度。 第一切割过程的结果是一组带状或模具块,每个包括多个连接的模具,其比单独的单个模具更少受到偏移。 在第二晶片切割过程中,通过沿着第二组街道切割来切割模具。 在第一切割过程之后,并且在第二切割过程之前,可以进行对模移的敏感的附加的模具制备程序。