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1. 发明申请

WO2014047014A1 INCORPORATING ADDITIVES INTO FIXED ABRASIVE WEBS FOR IMPROVED CMP PERFORMANCE 审中-公开
标题翻译：将添加剂添加到固定磨料中以改善CMP性能
公开(公告)号：WO2014047014A1
公开(公告)日：2014-03-27
申请号：PCT/US2013/060022
申请日：2013-09-17
申请人： 3M INNOVATIVE PROPERTIES COMPANY , QIAN, Julie, Y. , JOSEPH, William, D. , LOPER, Stephen, C.
发明人： QIAN, Julie, Y. , JOSEPH, William, D. , LOPER, Stephen, C.
IPC分类号： B24D3/34 , C09K3/14 , C09C1/68
CPC分类号： B24B37/245 , B24D3/344 , C09K3/1436 , H01L21/31053
摘要： A structured abrasive article is provided that has a backing having first and second opposed major surfaces and a structured abrasive layer disposed on and secured to the first major surface of the backing. The structured abrasive layer includes a polymeric binder, abrasive particles dispersed in the binder and an additive dispersed in the binder. The additive provides improved chemical mechanical planarization (CMP) polish performance, including high oxide/nitride selectively, high removal rates, lower nitride loss and improved with-in- wafer non-uniformity (WIWNU).
摘要翻译：提供了一种结构化的磨料制品，其具有背衬，其具有第一和第二相对的主表面，以及设置在背衬的第一主表面上并固定到背衬的第一主表面上的结构化磨料层。结构化研磨层包括聚合物粘合剂，分散在粘合剂中的磨料颗粒和分散在粘合剂中的添加剂。该添加剂提供了改进的化学机械平面化（CMP）抛光性能，包括高选择性的氧化物/氮化物，高的去除率，较低的氮化物损耗和改进的晶片间不均匀性（WIWNU）。

2. 发明申请

WO2011082155A2 POLISHING PADS INCLUDING PHASE-SEPARATED POLYMER BLEND AND METHOD OF MAKING AND USING THE SAME 审中-公开
标题翻译：包括相分离聚合物混合物的抛光垫及其制造和使用方法
公开(公告)号：WO2011082155A2
公开(公告)日：2011-07-07
申请号：PCT/US2010/062204
申请日：2010-12-28
申请人： 3M INNOVATIVE PROPERTIES COMPANY , JOSEPH, William D. , PALMGREN, Gary M. , LOPER, Stephen C. , LOESCH, Christopher, N.
发明人： JOSEPH, William D. , PALMGREN, Gary M. , LOPER, Stephen C. , LOESCH, Christopher, N.
IPC分类号： B24D11/02 , B24D7/06 , B24D18/00 , B24B37/04
CPC分类号： B24B37/22 , B24B37/26
摘要： Polishing pads containing a phase-separated polymer blend, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements integrally formed in a sheet. In another exemplary embodiment, the polishing elements are bonded to a support layer, for example by thermal bonding. In certain embodiments, the polishing pad may additionally include a compliant layer affixed to the support layer, and optionally, a polishing composition distribution layer.
摘要翻译：包含相分离的聚合物共混物的抛光垫，以及在抛光过程中制造和使用这种垫的方法。在一个示例性实施例中，抛光垫包括整体形成在片中的多个抛光元件。在另一个示例性实施例中，抛光元件例如通过热结合而结合到支撑层。在某些实施方案中，抛光垫可以另外包括附着于支撑层的柔顺层，以及任选的抛光组合物分布层。

3. 发明申请

WO2007149705A2 APPARATUS AND METHOD FOR MODIFYING AN EDGE 审中-公开
标题翻译：装置和方法修改边缘
公开(公告)号：WO2007149705A2
公开(公告)日：2007-12-27
申请号：PCT/US2007070617
申请日：2007-06-07
申请人： 3M INNOVATIVE PROPERTIES CO , GOBENA FEBEN T , JOSEPH WILLIAM D , PALMGREN GARY M , PENDERGRASS DANIEL B JR
发明人： GOBENA FEBEN T , JOSEPH WILLIAM D , PALMGREN GARY M , PENDERGRASS DANIEL B JR
CPC分类号： B24B9/065 , B24B47/10
摘要： Edge modifying apparatuses that include a disc chuck, a disc edge modifying unit having an abrasive article support, and a uniform velocity linear oscillation driver coupled to at least one of the disc chuck and the abrasive article support are described. The uniform velocity linear oscillation driver provides a substantially constant velocity for at least 80% of each half-cycle of oscillation. Methods of modifying the edge of disc using such apparatuses are also described.
摘要翻译：描述了包括盘卡盘，具有磨料制品支撑件的圆盘边缘修改单元和耦合到盘卡盘和磨料制品支撑件中的至少一个的均匀速度线性振荡驱动器的边缘修改装置。均匀速度线性振荡驱动器为振荡的每个半周期的至少80％提供基本恒定的速度。还描述了使用这种装置修改盘边缘的方法。

4. 发明申请

WO2009140622A3 POLISHING PAD WITH ENDPOINT WINDOW AND SYSTEMS AND METHOD USING THE SAME 审中-公开
标题翻译：具有端点窗口和系统的抛光垫及使用其的方法
公开(公告)号：WO2009140622A3
公开(公告)日：2010-02-25
申请号：PCT/US2009044187
申请日：2009-05-15
申请人： 3M INNOVATIVE PROPERTIES CO , SEMIQUEST INC , BAJAJ RAJEEV , FISHER STEPHEN M , JOSEPH WILLIAM D
发明人： BAJAJ RAJEEV , FISHER STEPHEN M , JOSEPH WILLIAM D
IPC分类号： B24B37/04 , B24B49/12 , B24D13/14 , H01L21/304
CPC分类号： B24B37/205 , B24B49/12
摘要： A polishing pad including a path therethrough to transmit a signal for in situ monitoring of an endpoint in a polishing operation. In one embodiment, the polishing pad includes a polishing composition distribution layer on a first side of a guide plate and a support layer on an opposed second side of a guide plate. The guide plate retains a plurality of polishing elements that extend along a first direction substantially normal to a plane including the polishing pad and through the polishing composition distribution layer. The polishing pad includes an optical path along the first direction and through a thickness of the pad.
摘要翻译：抛光垫，其包括穿过其中的通道，以在抛光操作中传输用于原位监测端点的信号。在一个实施例中，抛光垫包括在导向板的第一侧上的抛光组合物分布层和在引导板的相对的第二侧上的支撑层。引导板保持沿着基本上垂直于包括抛光垫的平面的第一方向延伸并穿过抛光组合物分布层的多个抛光元件。抛光垫包括沿着第一方向并通过垫的厚度的光路。

5. 发明申请

WO2007149705A3 APPARATUS AND METHOD FOR MODIFYING AN EDGE 审中-公开
公开(公告)号：WO2007149705A3
公开(公告)日：2007-12-27
申请号：PCT/US2007/070617
申请日：2007-06-07
申请人： 3M INNOVATIVE PROPERTIES COMPANY , GOBENA, Feben T., , JOSEPH, William D., , PALMGREN, Gary M., , PENDERGRASS, Daniel B. Jr.,
发明人： GOBENA, Feben T., , JOSEPH, William D., , PALMGREN, Gary M., , PENDERGRASS, Daniel B. Jr.,
IPC分类号： B24B9/00 , B24B41/06 , B24B47/00
摘要： Edge modifying apparatuses that include a disc chuck, a disc edge modifying unit having an abrasive article support, and a uniform velocity linear oscillation driver coupled to at least one of the disc chuck and the abrasive article support are described. The uniform velocity linear oscillation driver provides a substantially constant velocity for at least 80% of each half-cycle of oscillation. Methods of modifying the edge of disc using such apparatuses are also described.

6. 发明申请

WO2011082156A3 ORGANIC PARTICULATE LOADED POLISHING PADS AND METHOD OF MAKING AND USING THE SAME 审中-公开
标题翻译：有机颗粒加载抛光垫及其制造和使用方法
公开(公告)号：WO2011082156A3
公开(公告)日：2011-11-17
申请号：PCT/US2010062205
申请日：2010-12-28
申请人： 3M INNOVATIVE PROPERTIES CO , JOSEPH WILLIAM D , GOERS BRIAN D
发明人： JOSEPH WILLIAM D , GOERS BRIAN D
IPC分类号： B24D11/02 , B24B37/22 , B24B37/26 , B24D7/06 , B24D11/00 , B24D18/00
CPC分类号： B24D11/00 , B24B37/22 , B24B37/245 , B24B37/26
摘要： Polishing pads including organic particulates in a continuous polymer phase, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements integrally formed in a sheet. In another exemplary embodiment, the polishing elements are bonded to a support layer, for example by thermal bonding. In certain embodiments, the polishing pad may additionally include a compliant layer affixed to the support layer, and optionally, a polishing composition distribution layer.
摘要翻译：包括连续聚合物相中的有机颗粒的抛光垫，以及在抛光过程中制造和使用这种垫的方法。在一个示例性实施例中，抛光垫包括整体形成在片中的多个抛光元件。在另一个示例性实施例中，抛光元件例如通过热结合而结合到支撑层。在某些实施方案中，抛光垫可另外包括附着于支撑层的柔顺层，以及任选的抛光组合物分布层。

7. 发明申请

WO2009158665A1 POLISHING PAD WITH POROUS ELEMENTS AND METHOD OF MAKING AND USING THE SAME 审中-公开
标题翻译：具有多孔元件的抛光垫及其制造和使用方法
公开(公告)号：WO2009158665A1
公开(公告)日：2009-12-30
申请号：PCT/US2009/048940
申请日：2009-06-26
申请人： 3M INNOVATIVE PROPERTIES COMPANY , JOSEPH, William, D.
发明人： JOSEPH, William, D.
IPC分类号： B24B37/04 , B24D13/14
CPC分类号： B24B37/042 , B24B37/26 , B24D18/0009
摘要： The disclosure is directed to polishing pads with porous polishing elements, and to methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pad includes a multiplicity of polishing elements, at least some of which are porous, each polishing element affixed to a support layer so as to restrict lateral movement of the polishing elements with respect to one or more of the other polishing elements, but remaining moveable in an axis normal to a polishing surface of the polishing elements. In certain embodiments, the polishing pad may include a guide plate positioned to arrange and optionally affix the plurality of polishing elements on the support layer, and additionally, a polishing composition distribution layer. In some embodiments, the pores are distributed throughout substantially the entire porous polishing element. In other embodiments, the pores are distributed substantially at the polishing surface of the elements.
摘要翻译：本发明涉及具有多孔抛光元件的抛光垫，以及在抛光过程中制造和使用这种垫的方法。在一个示例性实施例中，抛光垫包括多个抛光元件，至少其中一些抛光元件是多孔的，每个抛光元件固定在支撑层上，以便限制抛光元件相对于其它一个或多个的横向运动抛光元件，但在与抛光元件的抛光表面垂直的轴上保持移动。在某些实施例中，抛光垫可以包括定位成布置和可选地将多个抛光元件固定在支撑层上的引导板，另外还包括抛光组合物分布层。在一些实施方案中，孔分布在基本上整个多孔抛光元件的整个部分。在其它实施例中，孔基本上分布在元件的抛光表面上。

8. 发明申请

WO2011082155A3 POLISHING PADS INCLUDING PHASE-SEPARATED POLYMER BLEND AND METHOD OF MAKING AND USING THE SAME 审中-公开
标题翻译：抛光垫包括相分离的聚合物混合物及其制备和使用方法
公开(公告)号：WO2011082155A3
公开(公告)日：2011-11-17
申请号：PCT/US2010062204
申请日：2010-12-28
申请人： 3M INNOVATIVE PROPERTIES CO , JOSEPH WILLIAM D , PALMGREN GARY M , LOPER STEPHEN C , LOESCH CHRISTOPHER N
发明人： JOSEPH WILLIAM D , PALMGREN GARY M , LOPER STEPHEN C , LOESCH CHRISTOPHER N
IPC分类号： B24D11/02 , B24B37/22 , B24B37/26 , B24D7/06 , B24D18/00
CPC分类号： B24B37/22 , B24B37/26
摘要： Polishing pads containing a phase-separated polymer blend, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements integrally formed in a sheet. In another exemplary embodiment, the polishing elements are bonded to a support layer, for example by thermal bonding. In certain embodiments, the polishing pad may additionally include a compliant layer affixed to the support layer, and optionally, a polishing composition distribution layer.
摘要翻译：包含相分离聚合物共混物的抛光垫，以及在抛光过程中制造和使用这种垫的方法。在一个示例性实施例中，抛光垫包括一体地形成在片材中的多个抛光元件。在另一示例性实施例中，抛光元件例如通过热粘合而结合到支撑层。在某些实施例中，抛光垫可以另外包括固定到支撑层的顺应性层，以及任选的抛光组合物分布层。

9. 发明申请

WO2011087737A3 POLISHING PAD AND METHOD OF MAKING THE SAME 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：WO2011087737A3
公开(公告)日：2011-09-15
申请号：PCT/US2010061199
申请日：2010-12-20
申请人： 3M INNOVATIVE PROPERTIES CO , LI NAICHAO , JOSEPH WILLIAM D
发明人： LI NAICHAO , JOSEPH WILLIAM D
IPC分类号： B24D3/28 , B24D3/34
CPC分类号： B24D3/28 , B24D3/344
摘要： The disclosure is directed to polishing pads with porous polishing layers, methods of making such polishing pads, and methods of using such pads in a polishing process. The polishing pad includes a compliant layer having first and second opposing sides and a porous polishing layer disposed on the first side of the compliant layer. The porous polishing layer includes a crosslinked network comprising a thermally cured component and a radiation cured component, wherein the radiation cured component and the thermally cured component are covalently bonded in the crosslinked network. The porous polishing layer also includes polymer particles dispersed within the crosslinked network, wherein the polymer particles comprise at least one of thermoplastic polymers or thermoset polymers. The porous polishing layer typically also includes closed cell pores dispersed within the crosslinked network.
摘要翻译：本发明涉及具有多孔抛光层的抛光垫，制造这种抛光垫的方法，以及在抛光过程中使用这种垫的方法。抛光垫包括具有第一和第二相对侧的柔顺层和设置在顺应层的第一侧上的多孔抛光层。多孔抛光层包括包含热固化组分和辐射固化组分的交联网络，其中辐射固化组分和热固化组分共价键合在交联网络中。多孔抛光层还包括分散在交联网络内的聚合物颗粒，其中聚合物颗粒包含热塑性聚合物或热固性聚合物中的至少一种。多孔抛光层通常还包括分散在交联网络内的闭孔细孔。

10. 发明申请

WO2011087737A2 POLISHING PAD AND METHOD OF MAKING THE SAME 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：WO2011087737A2
公开(公告)日：2011-07-21
申请号：PCT/US2010/061199
申请日：2010-12-20
申请人： 3M INNOVATIVE PROPERTIES COMPANY , LI, Naichao , JOSEPH, William D.
发明人： LI, Naichao , JOSEPH, William D.
CPC分类号： B24D3/28 , B24D3/344
摘要： The disclosure is directed to polishing pads with porous polishing layers, methods of making such polishing pads, and methods of using such pads in a polishing process. The polishing pad includes a compliant layer having first and second opposing sides and a porous polishing layer disposed on the first side of the compliant layer. The porous polishing layer includes a crosslinked network comprising a thermally cured component and a radiation cured component, wherein the radiation cured component and the thermally cured component are covalently bonded in the crosslinked network. The porous polishing layer also includes polymer particles dispersed within the crosslinked network, wherein the polymer particles comprise at least one of thermoplastic polymers or thermoset polymers. The porous polishing layer typically also includes closed cell pores dispersed within the crosslinked network.
摘要翻译：本公开涉及具有多孔抛光层的抛光垫，制造这种抛光垫的方法以及在抛光工艺中使用这种垫的方法。抛光垫包括具有第一和第二相对侧面的柔性层以及设置在柔性层的第一侧上的多孔抛光层。多孔抛光层包括含有热固化组分和辐射固化组分的交联网络，其中辐射固化组分和热固化组分共价键合在交联网络中。多孔抛光层还包括分散在交联网络内的聚合物颗粒，其中聚合物颗粒包含热塑性聚合物或热固性聚合物中的至少一种。多孔抛光层通常还包括分散在交联网络内的闭孔气孔。

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