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    • 4. 发明申请
    • POLISHING PAD AND METHOD OF MAKING THE SAME
    • 抛光垫及其制造方法
    • WO2011087737A3
    • 2011-09-15
    • PCT/US2010061199
    • 2010-12-20
    • 3M INNOVATIVE PROPERTIES COLI NAICHAOJOSEPH WILLIAM D
    • LI NAICHAOJOSEPH WILLIAM D
    • B24D3/28B24D3/34
    • B24D3/28B24D3/344
    • The disclosure is directed to polishing pads with porous polishing layers, methods of making such polishing pads, and methods of using such pads in a polishing process. The polishing pad includes a compliant layer having first and second opposing sides and a porous polishing layer disposed on the first side of the compliant layer. The porous polishing layer includes a crosslinked network comprising a thermally cured component and a radiation cured component, wherein the radiation cured component and the thermally cured component are covalently bonded in the crosslinked network. The porous polishing layer also includes polymer particles dispersed within the crosslinked network, wherein the polymer particles comprise at least one of thermoplastic polymers or thermoset polymers. The porous polishing layer typically also includes closed cell pores dispersed within the crosslinked network.
    • 本发明涉及具有多孔抛光层的抛光垫,制造这种抛光垫的方法,以及在抛光过程中使用这种垫的方法。 抛光垫包括具有第一和第二相对侧的柔顺层和设置在顺应层的第一侧上的多孔抛光层。 多孔抛光层包括包含热固化组分和辐射固化组分的交联网络,其中辐射固化组分和热固化组分共价键合在交联网络中。 多孔抛光层还包括分散在交联网络内的聚合物颗粒,其中聚合物颗粒包含热塑性聚合物或热固性聚合物中的至少一种。 多孔抛光层通常还包括分散在交联网络内的闭孔细孔。
    • 5. 发明申请
    • POLISHING PAD AND METHOD OF MAKING THE SAME
    • 抛光垫及其制造方法
    • WO2011087737A2
    • 2011-07-21
    • PCT/US2010/061199
    • 2010-12-20
    • 3M INNOVATIVE PROPERTIES COMPANYLI, NaichaoJOSEPH, William D.
    • LI, NaichaoJOSEPH, William D.
    • B24D3/28B24D3/344
    • The disclosure is directed to polishing pads with porous polishing layers, methods of making such polishing pads, and methods of using such pads in a polishing process. The polishing pad includes a compliant layer having first and second opposing sides and a porous polishing layer disposed on the first side of the compliant layer. The porous polishing layer includes a crosslinked network comprising a thermally cured component and a radiation cured component, wherein the radiation cured component and the thermally cured component are covalently bonded in the crosslinked network. The porous polishing layer also includes polymer particles dispersed within the crosslinked network, wherein the polymer particles comprise at least one of thermoplastic polymers or thermoset polymers. The porous polishing layer typically also includes closed cell pores dispersed within the crosslinked network.
    • 本公开涉及具有多孔抛光层的抛光垫,制造这种抛光垫的方法以及在抛光工艺中使用这种垫的方法。 抛光垫包括具有第一和第二相对侧面的柔性层以及设置在柔性层的第一侧上的多孔抛光层。 多孔抛光层包括含有热固化组分和辐射固化组分的交联网络,其中辐射固化组分和热固化组分共价键合在交联网络中。 多孔抛光层还包括分散在交联网络内的聚合物颗粒,其中聚合物颗粒包含热塑性聚合物或热固性聚合物中的至少一种。 多孔抛光层通常还包括分散在交联网络内的闭孔气孔。