发明申请
WO2009158665A1 POLISHING PAD WITH POROUS ELEMENTS AND METHOD OF MAKING AND USING THE SAME
审中-公开
基本信息:
- 专利标题： POLISHING PAD WITH POROUS ELEMENTS AND METHOD OF MAKING AND USING THE SAME
- 专利标题（中）：具有多孔元件的抛光垫及其制造和使用方法
- 申请号：PCT/US2009/048940 申请日：2009-06-26
- 公开(公告)号：WO2009158665A1 公开(公告)日：2009-12-30
- 发明人： JOSEPH, William, D.
- 申请人： 3M INNOVATIVE PROPERTIES COMPANY , JOSEPH, William, D.
- 申请人地址： 3M Center Post Office Box 33427 St. Paul, MN 55133-3427 US
- 专利权人： 3M INNOVATIVE PROPERTIES COMPANY,JOSEPH, William, D.
- 当前专利权人： 3M INNOVATIVE PROPERTIES COMPANY,JOSEPH, William, D.
- 当前专利权人地址： 3M Center Post Office Box 33427 St. Paul, MN 55133-3427 US
- 代理机构： GWIN, H., Sanders
- 优先权： US61/075,970 20080626
- 主分类号： B24B37/04
- IPC分类号： B24B37/04 ; B24D13/14
摘要：
The disclosure is directed to polishing pads with porous polishing elements, and to methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pad includes a multiplicity of polishing elements, at least some of which are porous, each polishing element affixed to a support layer so as to restrict lateral movement of the polishing elements with respect to one or more of the other polishing elements, but remaining moveable in an axis normal to a polishing surface of the polishing elements. In certain embodiments, the polishing pad may include a guide plate positioned to arrange and optionally affix the plurality of polishing elements on the support layer, and additionally, a polishing composition distribution layer. In some embodiments, the pores are distributed throughout substantially the entire porous polishing element. In other embodiments, the pores are distributed substantially at the polishing surface of the elements.
摘要（中）：
本发明涉及具有多孔抛光元件的抛光垫，以及在抛光过程中制造和使用这种垫的方法。 在一个示例性实施例中，抛光垫包括多个抛光元件，至少其中一些抛光元件是多孔的，每个抛光元件固定在支撑层上，以便限制抛光元件相对于其它一个或多个的横向运动 抛光元件，但在与抛光元件的抛光表面垂直的轴上保持移动。 在某些实施例中，抛光垫可以包括定位成布置和可选地将多个抛光元件固定在支撑层上的引导板，另外还包括抛光组合物分布层。 在一些实施方案中，孔分布在基本上整个多孔抛光元件的整个部分。 在其它实施例中，孔基本上分布在元件的抛光表面上。
IPC结构图谱:
| B | 作业；运输 |
| --B24 | 磨削；抛光 |
| ----B24B | 用于磨削或抛光的机床、装置或工艺；磨具磨损表面的修理或调节；磨削，抛光剂或研磨剂的进给 |
| ------B24B37/00 | 研磨机床或装置，即需要在相对软但仍为刚性的研具和被研磨表面之间加入粉末状磨料；及其附件 |
| --------B24B37/04 | .适用于加工平面的 |