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1. 发明申请

WO2012013638A1 LITHOGRAPHIC TARGETS FOR UNIFORMITY CONTROL 审中-公开
标题翻译：用于均匀控制的平台目标
公开(公告)号：WO2012013638A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/062761
申请日：2011-07-25
申请人： CARL ZEISS SMS LTD. , PFORR, Rainer , ZVI, Guy Ben , DMITRIEV, Vladimir , GRAITZER, Erez
发明人： PFORR, Rainer , ZVI, Guy Ben , DMITRIEV, Vladimir , GRAITZER, Erez
IPC分类号： G03F7/20
CPC分类号： H01L22/12 , G03F1/38 , G03F1/44 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G06F17/50 , H01L21/68 , H01L21/681 , H01L21/682 , H01L22/20
摘要： A photo mask having a first set of patterns and a second set of patterns is provided in which the first set of patterns correspond to a circuit pattern to be fabricated on a wafer, and the second set of patterns have dimensions such that the second set of patterns do not contribute to the circuit pattern that is produced using a lithography process based on the first set of patterns under a first exposure condition. The critical dimension distribution of the photo mask is determined based on the second set of patterns that do not contribute to the circuit pattern produced using the lithography process based on the first set of patterns under the first exposure condition.
摘要翻译：提供了具有第一组图案和第二组图案的光掩模，其中第一组图案对应于要在晶片上制造的电路图案，并且第二组图案具有使得第二组图案不利于在第一曝光条件下使用基于第一组图案的光刻工艺产生的电路图案。基于在第一曝光条件下基于第一组图案的使用光刻处理产生的电路图案的第二组图案来确定光掩模的临界尺寸分布。

2. 发明申请

WO2009122417A3 METHOD FOR CREATING, TRAPPING AND MANIPULATING A GAS BUBBLE IN LIQUID 审中-公开
标题翻译：用于创造，追踪和操纵液体中的气体泡沫的方法
公开(公告)号：WO2009122417A3
公开(公告)日：2010-03-18
申请号：PCT/IL2009000374
申请日：2009-04-05
申请人： PIXER TECHNOLOGY LTD , OSHEMKOV SERGEY , DVORKIN LEV , DMITRIEV VLADIMIR
发明人： OSHEMKOV SERGEY , DVORKIN LEV , DMITRIEV VLADIMIR
IPC分类号： G01N21/01
CPC分类号： G02B21/32 , A61B18/26 , A61B2018/263
摘要： A method for producing, trapping and manipulating a gas microbubble in liquid is disclosed. The method includes providing a pulsed laser source for generating a pulsed laser radiation and focusing optics; and focusing a pulsed laser radiation to a focal zone within the liquid, with energy exceeding the threshold of optical breakdown in the liquid at the focal zone. It is also suggested to use focusing optics to focus the laser beam to a focal point at a depth close to the compensation depth of the focusing optics for spherical aberration.
摘要翻译：公开了一种用于在液体中产生，捕获和操纵气体微泡的方法。该方法包括提供用于产生脉冲激光辐射和聚焦光学器件的脉冲激光源; 并且将脉冲激光辐射聚焦到液体内的聚焦区域，其能量超过在聚焦区域处的液体中光学击穿的阈值。还建议使用聚焦光学器件将激光束聚焦到靠近聚焦光学器件的补偿深度的球面像差处的焦点。

3. 发明申请

WO2009122417A2 METHOD FOR CREATING, TRAPPING AND MANIPULATING A GAS BUBBLE IN LIQUID 审中-公开
标题翻译：用于创造，追踪和操纵液体中的气体泡沫的方法
公开(公告)号：WO2009122417A2
公开(公告)日：2009-10-08
申请号：PCT/IL2009/000374
申请日：2009-04-05
申请人： PIXER TECHNOLOGY LTD. , OSHEMKOV, Sergey , DVORKIN, Lev , DMITRIEV, Vladimir
发明人： OSHEMKOV, Sergey , DVORKIN, Lev , DMITRIEV, Vladimir
IPC分类号： G02B26/02
CPC分类号： G02B21/32 , A61B18/26 , A61B2018/263
摘要： A method for producing, trapping and manipulating a gas microbubble in liquid is disclosed. The method includes providing a pulsed laser source for generating a pulsed laser radiation and focusing optics; and focusing a pulsed laser radiation to a focal zone within the liquid, with energy exceeding the threshold of optical breakdown in the liquid at the focal zone. It is also suggested to use focusing optics to focus the laser beam to a focal point at a depth close to the compensation depth of the focusing optics for spherical aberration.
摘要翻译：公开了一种用于在液体中产生，捕获和操纵气体微泡的方法。该方法包括提供用于产生脉冲激光辐射和聚焦光学器件的脉冲激光源; 并且将脉冲激光辐射聚焦到液体内的聚焦区域，其能量超过在聚焦区域处的液体中光学击穿的阈值。还建议使用聚焦光学器件将激光束聚焦到靠近聚焦光学器件的补偿深度的球面像差处的焦点。

4. 发明申请

WO2003071358A1 METHOD AND SYSTEM FOR REPAIRING DEFECTED PHOTOMASKS 审中-公开
标题翻译：修复缺陷光电子的方法和系统
公开(公告)号：WO2003071358A1
公开(公告)日：2003-08-28
申请号：PCT/IL2002/001001
申请日：2002-12-12
申请人： U.C.LASER LTD. , ZAIT, Eitan , DMITRIEV, Vladimir, J. , OSHEMKOV, Sergey, V. , GULETSKIY, Nikolay, N. , BEN-ZVI, Guy
发明人： ZAIT, Eitan , DMITRIEV, Vladimir, J. , OSHEMKOV, Sergey, V. , GULETSKIY, Nikolay, N. , BEN-ZVI, Guy
IPC分类号： G03F9/00
CPC分类号： G03F1/72
摘要： A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) in the chrome layer (36), the method comprising: providing a pulsed laser source (1) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect (42) to write a diffractive optical element (34), thus changing the scattering properties of the substrate at the target location.
摘要翻译：公开了一种用于修复用于光刻工艺的光掩模（52）的系统和方法，所述光掩模（52）由衬底层（38）和覆盖在所述衬底层（38）上的铬层（36）组成，所述光掩模所述铬层（36）中的缺陷（42），所述方法包括：提供用于产生超短脉冲激光束的脉冲激光源（1）提供用于在期望的目标位置处扫描，引导和聚焦脉冲激光束的光学元件; 将脉冲激光束引导通过衬底并将其聚焦在位于邻近缺陷（42）的衬底内的目标位置上以写入衍射光学元件（34），从而改变衬底在目标位置处的散射特性。

5. 发明申请

WO1996009653A1 VERTICAL GEOMETRY LIGHT EMITTING DIODE WITH GROUP III NITRIDE ACTIVE LAYER AND EXTENDED LIFETIME 审中-公开
标题翻译：垂直几何发光二极管与III组氮活性层和延长生命周期
公开(公告)号：WO1996009653A1
公开(公告)日：1996-03-28
申请号：PCT/US1995011472
申请日：1995-09-19
申请人： CREE RESEARCH INC. , EDMOND, John, Adam , BULMAN, Gary, E. , KONG, Hua-Shuang , DMITRIEV, Vladimir
发明人： CREE RESEARCH INC.
IPC分类号： H01L33/00
CPC分类号： H01L33/32 , H01L33/007
摘要： A light emitting diode (20) emits in the blue portion of the visible spectrum and is characterized by an extended lifetime. The light emitting diode comprises a conductive silicon carbide substrate (21); an ohmic contact (22) to the silicon carbide substrate; a conductive buffer layer (23) on the substrate and selected from the group consisting of gallium nitride, aluminum nitride, indium nitride, ternary Group III nitrides having the formula AxB1-xN, where A and B are Group III elements and where x is zero, one, or a fraction between zero and one, and alloys of silicon carbide with such ternary Group III nitrides; and a double heterostructure (24) including a p-n junction on the buffer layer in which the active (25) and heterostructure layers (26, 27) are selected from the group consisting of binary Group III nitrides and ternary Group III nitrides.
摘要翻译：发光二极管（20）在可见光谱的蓝色部分发射，其特征在于延长的使用寿命。发光二极管包括导电碳化硅衬底（21）; 与所述碳化硅衬底的欧姆接触（22）; 选自氮化镓，氮化铝，氮化铟，具有式AxB1-xN的三元III族氮化物的基板上的导电缓冲层（23），其中A和B是III族元素，其中x为零，一个或零和一个之间的分数，以及碳化硅与这种三元III族氮化物的合金; 以及包括在所述缓冲层上的p-n结的双异质结构（24），其中所述活性（25）和异质结构层（26,27）选自二元III族氮化物和三元III族氮化物。

6. 发明申请

WO2009083606A1 METHOD AND APPARATUS FOR MAPPING OF LINE-WIDTH SIZE DISTRIBUTIONS ON PHOTOMASKS 审中-公开
标题翻译：用于在光电子束上映射线宽尺寸分布的方法和装置
公开(公告)号：WO2009083606A1
公开(公告)日：2009-07-09
申请号：PCT/EP2009/050004
申请日：2009-01-02
申请人： CARL ZEISS SMS GMBH , BEN-ZVI, Guy , DMITRIEV, Vladimir , ZAIT, Eitan , GRAITZER, Erez
发明人： BEN-ZVI, Guy , DMITRIEV, Vladimir , ZAIT, Eitan , GRAITZER, Erez
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/84 , G03F7/70625
摘要： In general, in one aspect, a methodincludes determining a critical dimension (CD) distribution on a photomaskby measuring deep Ultra-Violet(DUV) transmission across the photomask.
摘要翻译：通常，在一个方面，一种方法包括通过测量通过光掩模的深层紫外（DUV）透射来确定光掩模上的临界尺寸（CD）分布。

7. 发明申请

WO2013030820A1 METHOD AND APPARATUS FOR LOCALLY DEFORMING AN OPTICAL ELEMENT FOR PHOTOLITHOGRAPHY 审中-公开
标题翻译：用于局部变形光刻元件的方法和装置
公开(公告)号：WO2013030820A1
公开(公告)日：2013-03-07
申请号：PCT/IL2012/000307
申请日：2012-08-21
申请人： CARL ZEISS SMS LTD. , DMITRIEV, Vladimir , STERN, Uri
发明人： DMITRIEV, Vladimir , STERN, Uri
IPC分类号： G03F1/72 , G03F1/60
CPC分类号： G03F7/70191 , B82Y10/00 , B82Y40/00 , G03F1/60 , G03F1/72 , G03F7/0002 , G03F7/70025
摘要： The invention relates to a method for locally deforming an optical ele¬ ment for photolithography in accordance with a predefined deformation form comprising: (a) generating at least one laser pulse having at least one laser beam parameter; and (b) directing the at least one laser pulse onto the optical element, wherein the at least one laser beam parameter of the laser pulse is selected to yield the predefined deformation form.
摘要翻译：本发明涉及一种用于根据预定变形形式局部变形用于光刻的光学元件的方法，包括：（a）产生至少一个具有至少一个激光束参数的激光脉冲; 和（b）将所述至少一个激光脉冲引导到所述光学元件上，其中所述激光脉冲的所述至少一个激光束参数被选择以产生所述预定变形形式。

8. 发明申请

WO2012009108A2 CONTROLLABLE TRANSMISSION AND PHASE COMPENSATION OF TRANSPARENT MATERIAL 审中-公开
标题翻译：透明材料的可控传输和相位补偿
公开(公告)号：WO2012009108A2
公开(公告)日：2012-01-19
申请号：PCT/US2011/041155
申请日：2011-06-21
申请人： CARL ZEISS SMS LTD. , CARL ZEISS SMT GMBH , CARL ZEISS SMS GMBH , OSHEMKOV, Sergey , KLAESGES, Ralph , MENGEL, Markus , KRUGLYAKOV, Vladimir , BEN-ZVI, Guy , DMITRIEV, Vladimir , ZAIT, Eitan , LABOVITZ, Steven
发明人： OSHEMKOV, Sergey , KLAESGES, Ralph , MENGEL, Markus , KRUGLYAKOV, Vladimir , BEN-ZVI, Guy , DMITRIEV, Vladimir , ZAIT, Eitan , LABOVITZ, Steven
IPC分类号： C03C23/00
CPC分类号： G03F7/2002 , C03C23/0025
摘要： A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.
摘要翻译：用于处理衬底的系统包括提供光脉冲的光源，支撑衬底的台，用于将光脉冲聚焦到衬底上的光学器件，扫描穿过衬底的光脉冲的扫描器计算机，用于控制光脉冲的性质和光脉冲的扫描，使得在衬底的各个区域中产生色心，以及（i）用紫外光照射衬底的紫外光源或（ii）加热器，用于在形成色心之后加热基片以稳定基片的透射光谱。

9. 发明申请

WO2011104617A1 ANALYSES OF MEASUREMENT DATA 审中-公开
标题翻译：测量数据分析
公开(公告)号：WO2011104617A1
公开(公告)日：2011-09-01
申请号：PCT/IB2011/000375
申请日：2011-02-23
申请人： CARL ZEISS SMS LTD. , DMITRIEV, Vladimir , SHARONI, Ofir , GRAITZER, Erez , VARVARUK, Igor , BEN-ZVI, Guy
发明人： DMITRIEV, Vladimir , SHARONI, Ofir , GRAITZER, Erez , VARVARUK, Igor , BEN-ZVI, Guy
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/84 , G03F7/70508 , G03F7/70616 , G03F7/70625
摘要： A method includes generating, using a data processor, information showing variations of a parameter across a photo mask relative to an average value of the parameter measured at various locations on the photo mask. For example, the information can include data points, and each data point can be determined based on a ratio between a measurement value and an average of a plurality of measurement values.
摘要翻译：一种方法包括使用数据处理器相对于在光掩模上的各个位置处测量的参数的平均值显示横跨光掩模的参数的变化的信息。例如，信息可以包括数据点，并且可以基于测量值和多个测量值的平均值之间的比率来确定每个数据点。

10. 发明申请

WO2007039895A3 METHOD AND APPARATUS FOR REMOVING CONTAMINANTS OFF A RETICLE 审中-公开
公开(公告)号：WO2007039895A3
公开(公告)日：2007-04-12
申请号：PCT/IL2006/001127
申请日：2006-09-26
申请人： PIXER TECHNOLOGY LTD , ZAIT, Eitan , OSHEMKOV, Sergey , DMITRIEV, Vladimir , BEN-ZVI, Guy , KRUGLYAKOV, Vladimir
发明人： ZAIT, Eitan , OSHEMKOV, Sergey , DMITRIEV, Vladimir , BEN-ZVI, Guy , KRUGLYAKOV, Vladimir
IPC分类号： A61N5/00
摘要： A method for removing a soft defect from a reticle, the reticle comprising a substrate made from material transparent to UV irradiation and having a front surface and a back opposite surface, the front surface provided with a pattern on an absorber coating layer, the soft defect being located on the coating layer, on a space of the pattern or at another location within a volume enclosed between a pellicle substantially covering the front surface and the front surface of the reticle. The method comprises receiving information on the location of the soft defect; generating a pulsed laser beam using the pulsed laser source; and based on the information directing the pulsed laser beam through the back surface of the reticle and into the substrate and focusing the beam on the target location within the substrate adjacent the location of the soft defect or directly on the location of the soft defect.

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