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    • 9. 发明申请
    • METHOD AND APPARATUS FOR REMOVING CONTAMINANTS OFF A RETICLE
    • 关于污染物排放的方法和装置
    • WO2007039895A2
    • 2007-04-12
    • PCT/IL2006001127
    • 2006-09-26
    • PIXER TECHNOLOGY LTDZAIT EITANOSHEMKOV SERGEYDMITRIEV VLADIMIRBEN-ZVI GUYKRUGLYAKOV VLADIMIR
    • ZAIT EITANOSHEMKOV SERGEYDMITRIEV VLADIMIRBEN-ZVI GUYKRUGLYAKOV VLADIMIR
    • G06F19/00
    • G03F1/82
    • A method for removing a soft defect from a reticle, the reticle comprising a substrate made from material transparent to UV irradiation and having a front surface and a back opposite surface, the front surface provided with a pattern on an absorber coating layer, the soft defect being located on the coating layer, on a space of the pattern or at another location within a volume enclosed between a pellicle substantially covering the front surface and the front surface of the reticle. The method comprises receiving information on the location of the soft defect; generating a pulsed laser beam using the pulsed laser source; and based on the information directing the pulsed laser beam through the back surface of the reticle and into the substrate and focusing the beam on the target location within the substrate adjacent the location of the soft defect or directly on the location of the soft defect.
    • 一种用于从掩模版去除软缺陷的方法,所述掩模版包括由对UV照射透明的材料制成的基板,并且具有前表面和后相对表面,所述前表面在吸收器涂层上设置图案,所述软缺陷 位于涂层上,在图案的空间上或在基本上覆盖前表面的防护薄纸巾和掩模版的前表面之间的体积内的另一位置处。 该方法包括接收关于软缺陷位置的信息; 使用脉冲激光源产生脉冲激光束; 并且基于指示脉冲激光束通过掩模版的背表面并进入衬底的信息,并将光束聚焦在邻近软缺陷的位置的衬底内的目标位置上,或者直接在软缺陷的位置上。