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1. 发明申请

WO2003071358A1 METHOD AND SYSTEM FOR REPAIRING DEFECTED PHOTOMASKS 审中-公开
标题翻译：修复缺陷光电子的方法和系统
公开(公告)号：WO2003071358A1
公开(公告)日：2003-08-28
申请号：PCT/IL2002/001001
申请日：2002-12-12
申请人： U.C.LASER LTD. , ZAIT, Eitan , DMITRIEV, Vladimir, J. , OSHEMKOV, Sergey, V. , GULETSKIY, Nikolay, N. , BEN-ZVI, Guy
发明人： ZAIT, Eitan , DMITRIEV, Vladimir, J. , OSHEMKOV, Sergey, V. , GULETSKIY, Nikolay, N. , BEN-ZVI, Guy
IPC分类号： G03F9/00
CPC分类号： G03F1/72
摘要： A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) in the chrome layer (36), the method comprising: providing a pulsed laser source (1) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect (42) to write a diffractive optical element (34), thus changing the scattering properties of the substrate at the target location.
摘要翻译：公开了一种用于修复用于光刻工艺的光掩模（52）的系统和方法，所述光掩模（52）由衬底层（38）和覆盖在所述衬底层（38）上的铬层（36）组成，所述光掩模所述铬层（36）中的缺陷（42），所述方法包括：提供用于产生超短脉冲激光束的脉冲激光源（1）提供用于在期望的目标位置处扫描，引导和聚焦脉冲激光束的光学元件; 将脉冲激光束引导通过衬底并将其聚焦在位于邻近缺陷（42）的衬底内的目标位置上以写入衍射光学元件（34），从而改变衬底在目标位置处的散射特性。

2. 发明申请

WO2009007977A3 METHOD AND APPARATUS FOR DUV TRANSMISSION MAPPING 审中-公开
公开(公告)号：WO2009007977A3
公开(公告)日：2009-01-15
申请号：PCT/IL2008/000960
申请日：2008-07-10
申请人： PIXER TECHNOLOGY LTD. , BEN-ZVI, Guy , ZAIT, Eitan , DMITRIEV, Vladimir, J. , LABOVITZ, Steven, M. , GRAITZER, Erez , SHARONI, Ofir
发明人： BEN-ZVI, Guy , ZAIT, Eitan , DMITRIEV, Vladimir, J. , LABOVITZ, Steven, M. , GRAITZER, Erez , SHARONI, Ofir
IPC分类号： G03F7/20 , G06K9/00
摘要： Apparatus and method for transmittance mapping of an object which is at least partially transparent to deep ultraviolet radiation. The method comprises directing a wide-band deep ultraviolet radiation so as to illuminate different areas of an array of successive areas of the object; using an optical detector positioned on an opposite side of the object with respect to the radiation source detecting the wide-band deep ultraviolet radiation that emerges from the object; and processing signals from the optical detector to determine the transmittance of the radiation through the different areas of the array of successive areas of the object.

3. 发明申请

WO2009083606A1 METHOD AND APPARATUS FOR MAPPING OF LINE-WIDTH SIZE DISTRIBUTIONS ON PHOTOMASKS 审中-公开
标题翻译：用于在光电子束上映射线宽尺寸分布的方法和装置
公开(公告)号：WO2009083606A1
公开(公告)日：2009-07-09
申请号：PCT/EP2009/050004
申请日：2009-01-02
申请人： CARL ZEISS SMS GMBH , BEN-ZVI, Guy , DMITRIEV, Vladimir , ZAIT, Eitan , GRAITZER, Erez
发明人： BEN-ZVI, Guy , DMITRIEV, Vladimir , ZAIT, Eitan , GRAITZER, Erez
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/84 , G03F7/70625
摘要： In general, in one aspect, a methodincludes determining a critical dimension (CD) distribution on a photomaskby measuring deep Ultra-Violet(DUV) transmission across the photomask.
摘要翻译：通常，在一个方面，一种方法包括通过测量通过光掩模的深层紫外（DUV）透射来确定光掩模上的临界尺寸（CD）分布。

4. 发明申请

WO2012009108A2 CONTROLLABLE TRANSMISSION AND PHASE COMPENSATION OF TRANSPARENT MATERIAL 审中-公开
标题翻译：透明材料的可控传输和相位补偿
公开(公告)号：WO2012009108A2
公开(公告)日：2012-01-19
申请号：PCT/US2011/041155
申请日：2011-06-21
申请人： CARL ZEISS SMS LTD. , CARL ZEISS SMT GMBH , CARL ZEISS SMS GMBH , OSHEMKOV, Sergey , KLAESGES, Ralph , MENGEL, Markus , KRUGLYAKOV, Vladimir , BEN-ZVI, Guy , DMITRIEV, Vladimir , ZAIT, Eitan , LABOVITZ, Steven
发明人： OSHEMKOV, Sergey , KLAESGES, Ralph , MENGEL, Markus , KRUGLYAKOV, Vladimir , BEN-ZVI, Guy , DMITRIEV, Vladimir , ZAIT, Eitan , LABOVITZ, Steven
IPC分类号： C03C23/00
CPC分类号： G03F7/2002 , C03C23/0025
摘要： A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.
摘要翻译：用于处理衬底的系统包括提供光脉冲的光源，支撑衬底的台，用于将光脉冲聚焦到衬底上的光学器件，扫描穿过衬底的光脉冲的扫描器计算机，用于控制光脉冲的性质和光脉冲的扫描，使得在衬底的各个区域中产生色心，以及（i）用紫外光照射衬底的紫外光源或（ii）加热器，用于在形成色心之后加热基片以稳定基片的透射光谱。

5. 发明申请

WO2007039895A3 METHOD AND APPARATUS FOR REMOVING CONTAMINANTS OFF A RETICLE 审中-公开
公开(公告)号：WO2007039895A3
公开(公告)日：2007-04-12
申请号：PCT/IL2006/001127
申请日：2006-09-26
申请人： PIXER TECHNOLOGY LTD , ZAIT, Eitan , OSHEMKOV, Sergey , DMITRIEV, Vladimir , BEN-ZVI, Guy , KRUGLYAKOV, Vladimir
发明人： ZAIT, Eitan , OSHEMKOV, Sergey , DMITRIEV, Vladimir , BEN-ZVI, Guy , KRUGLYAKOV, Vladimir
IPC分类号： A61N5/00
摘要： A method for removing a soft defect from a reticle, the reticle comprising a substrate made from material transparent to UV irradiation and having a front surface and a back opposite surface, the front surface provided with a pattern on an absorber coating layer, the soft defect being located on the coating layer, on a space of the pattern or at another location within a volume enclosed between a pellicle substantially covering the front surface and the front surface of the reticle. The method comprises receiving information on the location of the soft defect; generating a pulsed laser beam using the pulsed laser source; and based on the information directing the pulsed laser beam through the back surface of the reticle and into the substrate and focusing the beam on the target location within the substrate adjacent the location of the soft defect or directly on the location of the soft defect.

6. 发明申请

WO2005008333A2 METHOD FOR CORRECTING CRITICAL DIMENSION VARIATIONS IN PHOTOMASKS 审中-公开
标题翻译：校正光度关键尺寸变化的方法
公开(公告)号：WO2005008333A2
公开(公告)日：2005-01-27
申请号：PCT/IL2004/000653
申请日：2004-07-18
申请人： UCLT Ltd. , ZAIT, Eitan , DMITRIEV, Vladimir , GULETSKY, Nikolay , OSHEMKOV, Sergey , BEN- ZVI, Guy
发明人： ZAIT, Eitan , DMITRIEV, Vladimir , GULETSKY, Nikolay , OSHEMKOV, Sergey , BEN- ZVI, Guy
IPC分类号： G03F
CPC分类号： G03F1/70 , G03F1/38 , G03F1/50 , G03F1/54 , G03F7/70433
摘要： A method for compensating for critical dimension (CD) variations of pattern lines of a wafer, by the correcting the CD of the corresponding photomask. The photomask comprises a transparent substrate having two substantially opposite surfaces, a first back surface and a second front surface on which front surface an absorbing coating is provided, on which the pattern lines were formed by removing the coating at the pattern lines. The method comprises: determining CD variations across regions of a wafer exposure field relating to the photomask; and providing Shading Elements (SE) within the substrate of the photomask in regions which correlates to regions of the wafer exposure field where CD variations greater than a predetermined target value were determined, whereby the shading elements attenuate light passing through the regions, so as to compensate for the CD variations on the wafer and hence provide and improved CD tolerance wafer.
摘要翻译：通过校正相应光掩模的CD来补偿晶片图案线的临界尺寸（CD）变化的方法。光掩模包括具有两个基本上相对的表面的透明基板，第一后表面和第二前表面，其上设置有表面吸收涂层，其上通过去除图案线上的涂层而形成图案线。该方法包括：确定跨越与光掩模相关的晶片曝光场的区域的CD变化; 并且在确定了CD变化大于预定目标值的晶片曝光场的区域相关的区域中，在光掩模的衬底内提供遮光元件（SE），由此遮光元件使通过该区域的光衰减，从而补偿晶片上的CD变化，从而提供和改进的CD容限晶片。

7. 发明申请

WO2003033199A1 METHOD FOR IMPROVED WAFER ALIGNMENT 审中-公开
标题翻译：改进波形对准方法
公开(公告)号：WO2003033199A1
公开(公告)日：2003-04-24
申请号：PCT/IL2002/000819
申请日：2002-10-10
申请人： U.C. LASER LTD. , ZAIT, Eitan
发明人： ZAIT, Eitan
IPC分类号： B23K26/00
CPC分类号： H01L23/544 , B23K26/0624 , B23K26/0861 , B23K26/40 , B23K2201/40 , B23K2203/50 , H01L21/67282 , H01L2223/5442 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： A method for improving alignment of a transparent or semi-transparent workpiece (20) consisting of silicone wafer (30, 32) for integrated circuits undergoing multi-step processing during their manufacturing process, the method comprising: providing laser patterning system comprising an ultra-short pulsed laser source (10) for generating an ultra-short pulsed beam, optical elements for directing and focusing the beam at predetermined target locations within the workpiece (20), and control unit (24) for controlling the ultra-short pulsed laser source (10) and the optical elements, so as to produce a predetermined pattern inscribed within the workpiece (20); and inscribing a predetermined pattern within the workpiece (20).
摘要翻译：一种用于改进由在其制造过程中进行多步处理的集成电路的由硅晶片（30,32）组成的透明或半透明工件（20）的对准的方法，所述方法包括：提供激光图案形成系统，用于产生超短脉冲光束的短脉冲激光源（10），用于将光束引导和聚焦在工件（20）内的预定目标位置处的光学元件，以及用于控制超短脉冲激光源（10）和所述光学元件，以便产生内切在所述工件（20）内的预定图案。并在工件（20）内刻有预定图案。

8. 发明申请

WO2003022506A1 ULTRASHORT PULSE LASER ABLATION APPARTUS AND METHOD USING IT TO FORM RETICLES 审中-公开
标题翻译：超声波脉冲激光雷达捕获器和使用其形成反应的方法
公开(公告)号：WO2003022506A1
公开(公告)日：2003-03-20
申请号：PCT/IL2002/000407
申请日：2002-05-23
申请人： U.C.LASER LTD.
发明人： ZAIT, Eitan , DMITRIEV, Vladimir , GULETSKY, Nikolay , OSHEMKOV, Sergei
IPC分类号： B23K26/02
CPC分类号： G03F1/76 , B23K26/009 , B23K26/0624 , B23K26/067 , B23K26/0676 , B23K26/18 , Y10S430/146
摘要： A method and apparatus for manufacturing patterns on a reticle blank (60) comprising a substrate (50) made from material transparent to UV irradiation and having a first surface (52) and a second opposite surface (54), the first surface (52) coated with a chrome layer (48). The method comprises providing ultra-short pulsed laser beams (22), focusing means (5), relative displacement facilitator (7) for facilitating relative displacement of the reticle blank relative to at least one of a plurality of target locations (30), and a controller (8) for controlling the synchronization and operation of the laser beam source, the focusing means and the relative displacement facilitator. Ultra-short pulsed laser beam is irradiated in a predetermined pattern directed at the second surface (52) and passing through the substrate (50), focused on the chrome layer (48) or on its proximity.
摘要翻译：一种用于在掩模版坯料（60）上制造图案的方法和装置，包括由对UV照射透明的材料制成并具有第一表面（52）和第二相对表面（54）的基底（50）涂覆有铬层（48）。该方法包括提供超短脉冲激光束（22），聚焦装置（5），相对位移辅助器（7），用于促进标线片坯料相对于多个目标位置（30）中的至少一个的相对移位;以及用于控制激光束源的同步和操作的控制器（8），聚焦装置和相对位移辅助器。超短脉冲激光束以指向第二表面（52）的预定图案照射并穿过衬底（50），聚焦在铬层（48）上或其接近处。

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