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1. 发明申请

WO2008085257A1 PROCESS INTEGRATION SCHEME TO LOWER OVERALL DIELECTRIC CONSTANT IN BEOL INTERCONNECT STRUCTURES 审中-公开
标题翻译：过程集成方案降低BEOL互连结构中的总体电介质常数
公开(公告)号：WO2008085257A1
公开(公告)日：2008-07-17
申请号：PCT/US2007/025461
申请日：2007-12-12
申请人： LAM RESEARCH CORPORATION , BRIGHT, Nicolas , HEMKER, David , REDEKER, Fritz , DORDI, Yezdi
发明人： BRIGHT, Nicolas , HEMKER, David , REDEKER, Fritz , DORDI, Yezdi
IPC分类号： H01L21/4763 , H01L23/48
CPC分类号： H01L21/76822 , H01L21/76805 , H01L21/76807 , H01L21/76816 , H01L21/76843 , H01L21/76846 , H01L21/76849 , H01L2924/0002 , H01L2924/00
摘要： Back-End of Line (BEoL) interconnect structures, and methods for their manufacture, are provided. The structures are characterized by narrower conductive lines and reduced overall dielectric constant values. Conformal diffusion barrier layers, and selectively formed capping layers, are used to isolate the conductive lines and vias from surrounding dielectric layers in the interconnect structures. The methods of the invention employ techniques to narrow the openings in photoresist masks in order to define narrower vias. More narrow vias increase the amount of misalignment that can be tolerated between the vias and the conductive lines.
摘要翻译：提供了后端（BEoL）互连结构及其制造方法。这些结构的特征在于导线越窄，总介电常数值越小。保形扩散阻挡层和选择性形成的覆盖层用于将导线和通孔与互连结构中的周围电介质层隔离。本发明的方法采用技术来缩小光致抗蚀剂掩模中的开口，以便限定更窄的通孔。更窄的通孔增加了通孔和导电线之间可以容许的不对准量。

2. 发明申请

WO2008017050A9 SMART COMPONENT-BASED MANAGEMENT TECHNIQUES IN A SUBSTRATE PROCESSING SYSTEM 审中-公开
标题翻译：基于智能组件的基础处理系统管理技术
公开(公告)号：WO2008017050A9
公开(公告)日：2008-03-20
申请号：PCT/US2007075113
申请日：2007-08-02
申请人： LAM RES CORP , BENJAMIN NEIL , GOTTSCHO RICHARD ALAN , BRIGHT NICOLAS , STEGER ROBERT
发明人： BENJAMIN NEIL , GOTTSCHO RICHARD ALAN , BRIGHT NICOLAS , STEGER ROBERT
IPC分类号： G06F19/00
CPC分类号： G06Q10/06 , G05B2219/31291 , G05B2219/31421 , G05B2219/45031 , Y02P90/10
摘要： A method of component management in a substrate processing system is disclosed. The substrate processing system has a set of components, at least a plurality of components of the set of components being designated to be smart components, each component of the plurality of components having an intelligent component enhancement (ICE). The method includes querying the plurality of components to request their respective unique identification data from their respective ICEs. The method further includes receiving unique identification data from the plurality of components if any of the plurality of components responds to the querying. The method additionally includes flagging the first component for corrective action if a first component of the plurality of components fails to provide first component unique identification data when the first component identification data is expected.
摘要翻译：公开了一种衬底处理系统中的部件管理方法。衬底处理系统具有一组组件，该组组件中的至少多个组件被指定为智能组件，该多个组件中的每个组件具有智能组件增强（ICE）。该方法包括查询多个组件以从它们各自的ICE请求它们各自的唯一标识数据。该方法还包括如果多个组件中的任何组件响应于查询，则从多个组件接收唯一标识数据。该方法还包括如果多个部件中的第一部件在预期第一部件识别数据时未能提供第一部件唯一识别数据，则标记第一部件以进行纠正动作。

3. 发明申请

WO2005035191A1 METHOD AND APPARATUS FOR WAFER MECHANICAL STRESS MONITORING AND WAFER THERMAL STRESS MONITORING 审中-公开
标题翻译：用于水力机械应力监测和水热应力监测的方法和装置
公开(公告)号：WO2005035191A1
公开(公告)日：2005-04-21
申请号：PCT/US2004/028357
申请日：2004-08-30
申请人： LAM RESEARCH CORPORATION , GOTKIS, Yehiel , KISTLER, Rodney , OWCZARZ, Aleksander , HEMKER, David , BRIGHT, Nicolas, J.
发明人： GOTKIS, Yehiel , KISTLER, Rodney , OWCZARZ, Aleksander , HEMKER, David , BRIGHT, Nicolas, J.
IPC分类号： B24B37/04
CPC分类号： B24B37/015 , B24B49/16
摘要： A chemical mechanical planarization (CMP) system is provided. The CMP system includes a wafer carrier (154) configured to support a wafer (148) during a planarization process, the wafer carrier including a sensor (144) configured to detect a signal indicating a stress being experienced by the wafer during planarization. A computing device (140) in communication with the sensor (144) is included. The computing device (140) is configured to translate the signal to generate a stress map for analysis. A stress relief device responsive to a signal received from the computing device (140) is included. The stress relief device is configured to relieve the stress being experienced by the wafer.
摘要翻译：提供化学机械平面化（CMP）系统。 CMP系统包括被配置为在平坦化处理期间支撑晶片（148）的晶片载体（154），所述晶片载体包括传感器（144），其配置成在平坦化期间检测指示由晶片经历的应力的信号。包括与传感器（144）通信的计算设备（140）。计算设备（140）被配置为平移信号以生成用于分析的应力图。包括响应于从计算设备（140）接收的信号的应力消除装置。应力释放装置被构造成减轻晶片经历的应力。

4. 发明申请

WO2008042578B1 AUTOMATIC DYNAMIC BASELINE CREATION AND ADJUSTMENT 审中-公开
标题翻译：自动动态基线创建和调整
公开(公告)号：WO2008042578B1
公开(公告)日：2008-08-07
申请号：PCT/US2007078574
申请日：2007-09-14
申请人： LAM RES CORP , HUANG CHUNG-HO , SETO JACKIE , BRIGHT NICOLAS
发明人： HUANG CHUNG-HO , SETO JACKIE , BRIGHT NICOLAS
IPC分类号： H01L21/00
CPC分类号： H01J37/3299 , H01J37/32935
摘要： In a plasma processing system., a method for dynamically establishing a baseline is provided. The method includes processing a first substrate The method also includes collecting a first signal data for the first substrate. The method further includes comparing the first signal data against the baseline The method moreover includes including the first signal data in a recalculation of the baseline if the fust signal data is within a confidence level range, which is in between a top level above the baseline and a bottom level below the baseline.
摘要翻译：在等离子体处理系统中，提供了用于动态建立基线的方法。该方法包括处理第一衬底。该方法还包括收集第一衬底的第一信号数据。该方法还包括将第一信号数据与基线进行比较。此外，该方法还包括在第一信号数据重新计算基线时，如果峰值信号数据在置信水平范围内，置信水平范围在基线之上，底线低于基线。

5. 发明申请

WO2008039940A1 METHODS AND ARRANGEMENT FOR CREATING RECIPES USING BEST-KNOWN METHODS 审中-公开
标题翻译：使用最佳方法创建食谱的方法和布置
公开(公告)号：WO2008039940A1
公开(公告)日：2008-04-03
申请号：PCT/US2007/079770
申请日：2007-09-27
申请人： LAM RESEARCH CORPORATION , HUANG, Chung-Ho , FAN, Shih-Jeun , CHANG, Chin-Chuan , BRIGHT, Nicolas
发明人： HUANG, Chung-Ho , FAN, Shih-Jeun , CHANG, Chin-Chuan , BRIGHT, Nicolas
IPC分类号： H01L21/205 , G06F19/00
CPC分类号： G06N5/022 , G05B2219/32097 , G05B2219/45031
摘要： A method for affecting a creation of a recipe for processing a substrate in a processing system is provided. The method includes providing a best-know method driven recipe editor. The best-known method driven recipe editor incorporates best-known methods (BKMs), which are best practice specifications for the recipe. The method also includes creating a plurality of BKM modules based on the BKMs for the recipe. The method further includes defining rules for parameters in the plurality of BKM modules. The rules are propagated by the BKMs. The methods moreover includes creating a BKM driven recipe by employing the best-known method driven recipe editor to enter values for the parameters within the guidelines of BKM rules.
摘要翻译：提供了一种用于影响在处理系统中处理衬底的配方的创建的方法。该方法包括提供最知名的方法驱动的食谱编辑器。最着名的方法驱动的食谱编辑器包含最着名的方法（BKM），这是方法的最佳实践规范。该方法还包括基于用于配方的BKM创建多个BKM模块。该方法还包括为多个BKM模块中的参数定义规则。规则由BKM传播。方法还包括通过采用最着名的方法驱动的配方编辑器来创建BKM驱动的配方，以便在BKM规则的指导下输入参数的值。

6. 发明申请

WO2006121741A2 COMPUTER READABLE MASK SHRINK CONTROL PROCESSOR 审中-公开
标题翻译：计算机可读面板收缩控制处理器
公开(公告)号：WO2006121741A2
公开(公告)日：2006-11-16
申请号：PCT/US2006/017067
申请日：2006-05-02
申请人： LAM RESEARCH CORPORATION , SADJADI, S., M., Reza , BRIGHT, Nicolas
发明人： SADJADI, S., M., Reza , BRIGHT, Nicolas
IPC分类号： G03F1/14
CPC分类号： G03F1/36
摘要： An apparatus comprising computer readable media is provided. The computer readable media comprises computer readable code for receiving a feature layout and computer readable code for applying shrink correction on the feature layout. The computer readable code for applying the shrink correction comprises providing corner cutouts, adjusting line width and length, shape modifications, etc. for forming features in a patterned layer.
摘要翻译：提供了一种包括计算机可读介质的装置。计算机可读介质包括用于接收特征布局的计算机可读代码和用于在特征布局上应用收缩校正的计算机可读代码。用于施加收缩校正的计算机可读代码包括提供拐角切口，调整线宽和长度，形状修改等，以形成图案化层中的特征。

7. 发明申请

WO2008042578A2 AUTOMATIC DYNAMIC BASELINE CREATION AND ADJUSTMENT 审中-公开
标题翻译：自动动态基线的创建和调整
公开(公告)号：WO2008042578A2
公开(公告)日：2008-04-10
申请号：PCT/US2007/078574
申请日：2007-09-14
申请人： LAM RESEARCH CORPORATION , HUANG, Chung-ho , SETO, Jackie , BRIGHT, Nicolas
发明人： HUANG, Chung-ho , SETO, Jackie , BRIGHT, Nicolas
IPC分类号： G03B27/42
CPC分类号： H01J37/3299 , H01J37/32935
摘要： In a plasma processing system., a method for dynamically establishing a baseline is provided. The method includes processing a first substrate The method also includes collecting a first signal data for the first substrate. The method further includes comparing the first signal data against the baseline The method moreover includes including the first signal data in a recalculation of the baseline if the fust signal data is within a confidence level range, which is in between a top level above the baseline and a bottom level below the baseline.
摘要翻译：在等离子体处理系统中，提供了用于动态建立基线的方法。该方法包括处理第一衬底。该方法还包括收集第一衬底的第一信号数据。该方法还包括将第一信号数据与基线进行比较。该方法还包括如果第四信号数据处于置于基线以上的最高电平和第二信号数据之间的置信水平范围内的基线的重新计算中，底线以下的底部水平。

8. 发明申请

WO2006121741A3 COMPUTER READABLE MASK SHRINK CONTROL PROCESSOR 审中-公开
标题翻译：计算机可读面板收缩控制处理器
公开(公告)号：WO2006121741A3
公开(公告)日：2007-02-15
申请号：PCT/US2006017067
申请日：2006-05-02
申请人： LAM RES CORP , SADJADI S M REZA , BRIGHT NICOLAS
发明人： SADJADI S M REZA , BRIGHT NICOLAS
IPC分类号： G03F1/14
CPC分类号： G03F1/36
摘要： An apparatus comprising computer readable media is provided. The computer readable media comprises computer readable code for receiving a feature layout and computer readable code for applying shrink correction on the feature layout. The computer readable code for applying the shrink correction comprises providing corner cutouts, adjusting line width and length, shape modifications, etc. for forming features in a patterned layer.
摘要翻译：提供了一种包括计算机可读介质的装置。计算机可读介质包括用于接收特征布局的计算机可读代码和用于在特征布局上应用收缩校正的计算机可读代码。用于施加收缩校正的计算机可读代码包括提供拐角切口，调整线宽和长度，形状修改等，以形成图案化层中的特征。

9. 发明申请

WO0137311A3 METHOD AND APPARATUS FOR CONTROLLING THE VOLUME OF A PLASMA 审中-公开
标题翻译：用于控制等离子体积的方法和装置
公开(公告)号：WO0137311A3
公开(公告)日：2001-10-11
申请号：PCT/US0042158
申请日：2000-11-14
申请人： LAM RES CORP , BAILEY ANDREW D III , SCHOEPP ALAN M , BRIGHT NICOLAS
发明人： BAILEY ANDREW D III , SCHOEPP ALAN M , BRIGHT NICOLAS
IPC分类号： H05H1/46 , C23C16/507 , H01J37/32 , H01L21/205 , H01L21/3065
CPC分类号： H01J37/32623 , H01J37/32688
摘要： A plasma confinement arrangement for controlling the volume of a plasma while processing a substrate inside a process chamber using a plasma enhanced process is disclosed. The arrangement includes a first magnetic bucket having a plurality of first magnetic elements. The first magnetic elements being configured for producing a first magnetic field inside the process chamber. The arrangement further includes a second magnetic bucket having a plurality of second magnetic elements. The second magnetic elements being configured for producing a second magnetic field inside the process chamber. The second magnetic field being configured to combine with the first magnetic field to produce a resultant magnetic field between the first magnetic bucket and the second magnetic bucket. The resultant magnetic field being configured to permit by-product gas from the processing to pass through while substantially confining the plasma within a volume defined at least by the process chamber and the resultant magnetic field.
摘要翻译：公开了一种等离子体限制装置，用于在使用等离子体增强过程处理处理室内的衬底的同时控制等离子体的体积。该装置包括具有多个第一磁性元件的第一磁性桶。第一磁性元件被配置用于在处理室内产生第一磁场。该装置还包括具有多个第二磁性元件的第二磁性桶。第二磁性元件构造成用于在处理室内产生第二磁场。第二磁场被配置为与第一磁场组合以在第一磁性铲斗和第二磁性铲斗之间产生合成的磁场。所得到的磁场被配置为允许来自处理的副产物气体通过，同时基本上将等离子体限制在至少由处理室限定的体积和所得的磁场中。

10. 发明申请

WO2008017050A3 SMART COMPONENT-BASED MANAGEMENT TECHNIQUES IN A SUBSTRATE PROCESSING SYSTEM 审中-公开
标题翻译：基于组件的管理技术在基板处理系统中的应用
公开(公告)号：WO2008017050A3
公开(公告)日：2008-10-30
申请号：PCT/US2007075113
申请日：2007-08-02
申请人： LAM RES CORP , BENJAMIN NEIL , GOTTSCHO RICHARD ALAN , BRIGHT NICOLAS , STEGER ROBERT
发明人： BENJAMIN NEIL , GOTTSCHO RICHARD ALAN , BRIGHT NICOLAS , STEGER ROBERT
IPC分类号： G06F19/00
CPC分类号： G06Q10/06 , G05B2219/31291 , G05B2219/31421 , G05B2219/45031 , Y02P90/10
摘要： A method of component management in a substrate processing system is disclosed. The substrate processing system has a set of components, at least a plurality of components of the set of components being designated to be smart components, each component of the plurality of components having an intelligent component enhancement (ICE). The method includes querying the plurality of components to request their respective unique identification data from their respective ICEs. The method further includes receiving unique identification data from the plurality of components if any of the plurality of components responds to the querying. The method additionally includes flagging the first component for corrective action if a first component of the plurality of components fails to provide first component unique identification data when the first component identification data is expected.
摘要翻译：公开了一种基板处理系统中的部件管理方法。衬底处理系统具有一组组件，该组组件中的至少多个组件被指定为智能组件，多个组件的每个组件具有智能组件增强（ICE）。该方法包括查询多个组件以从它们各自的ICE请求它们各自的唯一标识数据。该方法还包括如果多个组件中的任何组件响应于查询，则从多个组件接收唯一的标识数据。该方法另外包括：如果在预期第一组件识别数据时多个组件的第一组件不能提供第一组件唯一标识数据，则标记第一组件以用于校正动作。

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