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    • 72. 发明申请
    • IMPROVED METHOD FOR BUMP EXPOSING RELIEF IMAGE PRINTING PLATES
    • 用于缓冲曝光放映图像印刷板的改进方法
    • WO2006019450A2
    • 2006-02-23
    • PCT/US2005/017023
    • 2005-05-16
    • MACDERMID PRINTING SOLUTIONS, LLC
    • ROBERTS, David, H.MUELLER, Gregory, E.
    • G03C1/76
    • G03F7/2022G03F7/029G03F7/031G03F7/168Y10S430/145Y10S430/146
    • A process of producing a relief image printing plate, the process comprising the steps of providing a photosensitive printing element, quenching dissolved oxygen in the photosensitive resin layer by pre-exposing the photosensitive layer to one or more sources of actinic radiation, wherein the range of wavelengths spanned by the one or more sources of actinic radiation differs by no more than about 20 nm, and imagewise exposing the photosensitive resin layer to actinic radiation to crosslink and cure the photosensitive resin layer. The photosensitive composition typically comprises at least one photoinitiator that is present in the photosensitive composition in an amount sufficient to provide an optical density in the photosensitive composition of between about 0.05 and 0.43 at a wavelength used to pre-expose the photosensitive composition.
    • 制备浮雕图像印刷版的方法,所述方法包括以下步骤:提供光敏印刷元件,通过将所述光敏层预曝光于一个或多个光源来淬灭所述光敏树脂层中的溶解氧 其中由所述一种或多种光化辐射源跨越的波长范围相差不超过约20nm,并且将所述光敏树脂层成像曝光于光化辐射以交联和固化所述光敏树脂层。 该光敏组合物典型地包含至少一种光敏引发剂,其存在于光敏组合物中的量足以在用于预曝光光敏组合物的波长下在光敏组合物中提供约0.05至0.43之间的光密度。
    • 73. 发明申请
    • LOW-ACTIVATION ENERGY SILICON-CONTAINING RESIST SYSTEM
    • 低活化能含硅抗蚀剂体系
    • WO2005040918A3
    • 2005-12-15
    • PCT/US2004035253
    • 2004-10-22
    • IBMHUANG WU-SONGALLEN ROBERT DANGELOPOULOS MARIEKWONG RANEE WSOORIYAKUMARAN RATNAM
    • HUANG WU-SONGALLEN ROBERT DANGELOPOULOS MARIEKWONG RANEE WSOORIYAKUMARAN RATNAM
    • G03C1/76G03F20060101G03F7/004G03F7/075
    • G03F7/0757G03F7/0045G03F7/0046
    • Inventive silsesquioxane polymers are provided, and resist compositions that contain such silsesquioxane polymers are provided in which at least a portion of the silsesquioxane polymer contains fluorinated moieties, and at least a portion of the silisesquioxane polymer contains pendant solubility inhibiting acid-labile moieties that have low activation energy for acid-catalyzed cleaving, and the presence of high optical density moieties are minimized or avoided. The inventive polymer also contains pendant polar moieties that promote alkaline solubility of the resist in aqueous alkaline solutions. The inventive polymers are particularly useful in positive resist compositions. The invention encompasses methods of using such resist compositions in forming a patterned structure on a substrate, and particularly multilayer (e.g. bilayer) photolithographic methods, which methods are capable of producing high resolution images at wavelengths such as 193nm and 157nm.
    • 提供了本发明的倍半硅氧烷聚合物,并且提供了包含这种倍半硅氧烷聚合物的抗蚀剂组合物,其中所述倍半硅氧烷聚合物的至少一部分含有氟化部分,并且所述倍半硅氧烷聚合物的至少一部分含有悬挂溶解度抑制酸不稳定部分, 用于酸催化裂解的活化能以及高光密度部分的存在被最小化或避免。 本发明的聚合物还含有促进抗蚀剂在碱性水溶液中的碱溶性的侧链极性部分。 本发明的聚合物在正型抗蚀剂组合物中特别有用。 本发明包括使用这种抗蚀剂组合物在基底上形成图案化结构的方法,特别是多层(例如双层)光刻方法,该方法能够在诸如193nm和157nm的波长产生高分辨率图像。
    • 78. 发明申请
    • STEREOFLEXOGRAPHY
    • WO2004021080A1
    • 2004-03-11
    • PCT/BR2003/000119
    • 2003-08-22
    • DANTAS, Eudes
    • DANTAS, Eudes
    • G03C1/76
    • G03F7/2022
    • Improvement to the photopolymers catalysis in printing plates for the flexographic and of stamp sectors (fig.1), by exposing the photopolymer plate (1), only, by the bottom face (2), to two different and simultaneous levels of radiation; a lower, to catalyze the base of the relief (8) and a maximum, to catalyze the printing relief (10), emitted by radiation device (5, 6), polarized by filter (7), which uses a negative film whose black area is replaced by halftone (3), thereby originating the low radiation level, and keeping its transparent area (4), thereby originating the maximum radiation level, thickening the base of the dot (9) and sharpening the top of the dot (10), thereby eliminating the 'dot droop' and the 'dot gain', respectively; or which uses optic semiconductors, which digitally modulate the radiation in a fixed way (fig.2) for the stamp sector, with DMD or LCD (1), and in a mobile way (fig.3), with DMD (1), for the flexographic sector.
    • 通过将感光聚合物板(1)仅由底面(2)暴露于两种不同和同时的辐射水平,改进柔性版印刷板和印模部分的印刷板中的光聚合物催化(图1)。 以较低的速度催化浮雕(8)的底部和最大值,以催化由辐射装置(5,6)发射的由过滤器(7)偏振的印刷浮雕(10),其由使用黑色 区域由半色调(3)代替,从而产生低辐射水平,并保持其透明区域(4),从而产生最大辐射水平,使点(9)的基部变厚并且锐化点(10)的顶部 ),从而分别消除“点下垂”和“点增益”; 或使用光学半导体,以DMD或LCD(1)为单位以固定方式(图2)数字调制辐射,并以移动方式(图3)DMD(1), 用于柔性部门。