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    • 67. 发明申请
    • COUPLED CAVITY HIGH POWER SEMICONDUCTOR LASER
    • 联合高功率半导体激光器
    • WO01067563A2
    • 2001-09-13
    • PCT/US2001/007230
    • 2001-03-06
    • G02F1/017G02F1/03H01S3/107H01S3/109H01S5/06H01S5/065H01S5/10H01S5/14H01S5/183H01S5/40H01S5/42H01S3/00
    • H01S5/18311H01S3/109H01S5/0207H01S5/1021H01S5/141H01S5/18355H01S5/18386H01S5/18388H01S5/423H01S2301/166
    • An active gain region sandwiched between a 100 % reflective bottom Bragg mirror and an intermediate partially reflecting Bragg mirror is formed on a lower surface of a supporting substrate, to thereby provide the first ("active") resonator cavity of a high power coupled cavity surface emitting laser device. The bottom mirror is preferably in direct thermal contact with an external heat sink for maximum heat removal effectiveness. The reflectivity of the intermediate mirror is kept low enough so that laser oscillation within the active gain region will not occur. The substrate is entirely outside the first active resonator cavity to a level sufficient to cause lasing. The substrate is entirely outside the active cavity but is contained within a second ("passive") resonator cavity defined by the intermediate mirror and a partially reflecting output mirror, where it is subjected to only a fraction of the light intensity that is circulating in the gain region. The active gain region is preferably electrically excited, with a circular bottom electrode formed by an oxide current aperture between the bottom mirror and the heat sink, and with an annular top electrode formed on an upper surface of the substrate.
    • 夹在100%反射底部布拉格反射镜和中间部分反射布拉格反射镜之间的有源增益区域形成在支撑基板的下表面上,从而提供高功率耦合腔表面的第一(“有源”)谐振腔 发射激光器件。 底部反射镜优选与外部散热器直接热接触,以获得最大的散热效果。 中间反射镜的反射率保持足够低,从而不会发生主动增益区域内的激光振荡。 衬底完全在第一有源谐振腔内,达到足以引起激光的水平。 衬底完全在有源腔体的外部,但是被包含在由中间反射镜和部分反射的输出反射镜所限定的第二(“无源”)谐振器腔中,其中它仅受到在 增益区域。 活性增益区优选地被电激励,其中由底部反射镜和散热器之间的氧化物电流孔形成的圆形底部电极,以及形成在衬底的上表面上的环形顶部电极。
    • 68. 发明申请
    • SURFACE-EMITTING SEMICONDUCTOR LASER DEVICE
    • 表面发射半导体激光器件
    • WO01037386A1
    • 2001-05-25
    • PCT/JP2000/008047
    • 2000-11-15
    • H01S5/042H01S5/183
    • H01S5/18394B82Y20/00H01S5/18311H01S5/3432H01S2301/166
    • A surface-emitting semiconductor laser device has a layer structure of semiconductor material formed on a substrate, in which a light-emitting layer (4) is interposed between an upper reflecting-mirror layer structure (5) and a lower reflecting-mirror layer structure (2). A current injection path (3e) is formed in the vicinity of the light-emitting layer (4). An upper electrode (7a) annular when viewed from above is formed on the upper surface of the upper reflecting-mirror structure (5), and the outside of the upper electrode (7a) is covered with a dielectric film (8) and a metal film (9). The metal film (9) is formed in contact with the upper electrode (7a), while the inside of the upper electrode (7a) serves as an emitting window. The peripheral part (6c) of the emitting window is covered with the metal film (9), so that the diameter of the emitting window (6A) is defined by the metal film (9), by which the lateral mode of the laser oscillation is controlled. The diameter (D0) of the emitting window (6A) is smaller than the diameter (D1) of the current injection path (3e), and the diameter (D1) of the current injection path is 10 mu m or more.
    • 表面发射半导体激光器件具有形成在基板上的半导体材料的层结构,其中发光层(4)插入在上反射镜层结构(5)和下反射镜层结构 (2)。 在发光层(4)附近形成电流注入路径(3e)。 在上反射镜结构(5)的上表面上形成有从上方观察的上部电极(7a),上部电极(7a)的外部被绝缘膜(8)覆盖,金属 电影(9)。 金属膜(9)形成为与上电极(7a)接触,而上电极(7a)的内部用作发射窗口。 发射窗口的周边部分(6c)被金属膜(9)覆盖,使得发射窗口(6A)的直径由金属膜(9)限定,激光振荡的横向模式 被控制。 发光窗(6A)的直径(D0)小于电流注入路径(3e)的直径(D1),电流注入路径的直径(D1)为10μm以上。
    • 69. 发明申请
    • METHOD AND APPARATUS FOR INTEGRATED OPTICALLY PUMPED VERTICAL CAVITY SURFACE EMITTING LASERS
    • 集成光学垂直孔表面发射激光的方法和装置
    • WO01033678A1
    • 2001-05-10
    • PCT/US2000/014149
    • 2000-05-23
    • H01S5/183H01S5/02H01S5/026H01S5/04H01S5/06H01S5/062H01S5/18H01S3/0941
    • H01S5/041H01S5/0215H01S5/0216H01S5/026H01S5/0265H01S5/0608H01S5/06216H01S5/06226H01S5/1085H01S5/18H01S5/18311
    • An integrated optically pumped vertical cavity surface emitting laser (VCSEL) (200) is formed by integrating an electrically pumped in-plane semiconductor laser and a vertical cavity surface emitting laser (250) together with a beam steering element (212) formed with the in-plane semiconductor laser. The in-plane semiconductor laser can be a number of different types of in-plane lasers including an edge emitting laser (240), an in-plane surface emitting laser, or a folded cavity surface emitting laser. The in-plane semiconductor laser optically pumps the VCSEL to cause it to lase. The in-plane semiconductor laser is designed to emit photons of relatively short wavelengths while the VCSEL is designed to emit photons of relatively long wavelengths. The in-plane semiconductor laser and the VCSEL can be coupled together in a number of ways including atomic bonding, wafer bonding, metal bonding, epoxy glue or other well known semiconductor bonding techniques. The beam steering element (212) can be an optical grating or a mirrored surface.
    • 通过将电泵浦的面内半导体激光器和垂直腔表面发射激光器(250)与形成有入射光束的光束操纵元件(212)一体地集成而形成集成的光泵浦垂直腔表面发射激光器(VCSEL)(200) 平面半导体激光器。 面内半导体激光器可以是包括边缘发射激光器(240),面内表面发射激光器或折叠空腔表面发射激光器的多种不同类型的面内激光器。 平面内半导体激光器对VCSEL进行光泵浦使其发光。 面内半导体激光器被设计成发射相对短波长的光子,而VCSEL被设计成发射具有相对较长波长的光子。 面内半导体激光器和VCSEL可以以多种方式耦合在一起,包括原子结合,晶片接合,金属粘合,环氧胶或其他众所周知的半导体结合技术。 光束操纵元件(212)可以是光栅或镜面。
    • 70. 发明申请
    • LONG WAVELENGTH PSEUDOMORPHIC InGaNPAsSb TYPE-I AND TYPE-II ACTIVE LAYERS FOR THE GAAS MATERIAL SYSTEM
    • 长波长光子晶体InGaNPAsSb型I型和II型活性层用于GAAS材料系统
    • WO0133677A2
    • 2001-05-10
    • PCT/US0041775
    • 2000-11-01
    • UNIV ARIZONAJOHNSON SHANEDOWD PHILIPBRAUN WOLFGANGZHANG YONG HANGGUO CHANG ZHI
    • JOHNSON SHANEDOWD PHILIPBRAUN WOLFGANGZHANG YONG-HANGGUO CHANG-ZHI
    • H01S5/323H01S5/183H01S5/34H01S5/343H01S3/00
    • B82Y20/00H01S5/18311H01S5/32366H01S5/3422H01S5/34306H01S5/3434
    • The invention discloses improved structures of light-processing (e.g., light-emitting and light-absorbing/sensing) devices, in particular Vertical Cavity Surface Emitting Lasers (VCSELs), such as may find use in telecommunications applications. The disclosed VSCAL devices and production methods provide for an active region having a quantum well structure grown on GaAs-containing substrates, thus providing processing compatibility for light having wavelength in the range 1.0 to 1.6 mu m. The active region structure combines strain-compensating barriers with different band alignments in the quantum wells to achieve a long emission wavelength while at the same time decreasing the strain in the structure. The improved functioning of the devices disclosed results from building them with multicomponent alloy layers having a large number of constituents. The invention discloses as a key constituent in the proposed alloy layers for the active region a substance, such as nitrogen (N), suitable for reducing bandgap energy (i.e., increasing light wavelength) associated with the layers, while at the same time lowering the lattice constant associated with the structure and hence lowering strain.
    • 本发明公开了光处理(例如,发光和光吸收/感测)装置,特别是垂直腔面发射激光器(VCSEL)的改进的结构,例如可用于电信应用。 所公开的VSCAL装置和制造方法提供了在含GaAs衬底上生长的量子阱结构的有源区,从而为波长在1.0至1.6μm的光提供处理兼容性。 有源区结构将应变补偿屏障与量子阱中的不同带对准结合在一起,以实现长发射波长,同时降低结构中的应变。 所公开的装置的改进的功能通过用具有大量成分的多组分合金层来构建它们。 本发明公开了用于活性区域的所提出的合金层中的关键组成部分,适合于降低与层相关的带隙能量(即,增加光波长)的物质,例如氮(N),同时降低 晶格常数与结构相关,从而降低应变。