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51. 发明申请

WO2014140298A3 POSITION SENSOR, SENSOR ARRANGEMENT AND LITHOGRAPHY APPARATUS COMPRISING POSITION SENSOR 审中-公开
标题翻译：位置传感器，传感器布置和包含位置传感器的平面设备
公开(公告)号：WO2014140298A3
公开(公告)日：2014-12-18
申请号：PCT/EP2014055138
申请日：2014-03-14
申请人： ZEISS CARL SMT GMBH
发明人： MONTAGNE ANTON
IPC分类号： G03F7/20
CPC分类号： G01D5/2275 , G01D5/225 , G03F7/70141 , G03F7/70258 , G03F7/7085
摘要： A position sensor for detecting a position of a measurement object (150), in particular of an optical element of a lithography apparatus is suggested, which includes a transmission coil (104; 204; 304; 404; 504; 604), a reception coil (106; 206; 306; 406; 506; 606), which is arranged in such a way that when a transmission signal (Vt, It) is applied to the transmission coil, a reception voltage (Vz, Vx) is generated at the reception coil, and an evaluation device (108; 208; 308; 408; 508; 608), which links a transmission voltage signal generated in a manner dependent on the transmission signal with a reception voltage signal generated in a manner dependent on the reception voltage and generates a sensor output signal containing information about the relative position of the measurement object with respect to the coils of the position sensor.
摘要翻译：提出了一种用于检测测量对象（150）的位置的位置传感器，特别是光刻设备的光学元件的位置传感器，其包括传输线圈（104; 204; 304; 404; 504; 604），接收线圈（106; 206; 306; 406; 506; 606），其布置成使得当发送信号（Vt，It）被施加到发送线圈时，在该发送线圈处产生接收电压（Vz，Vx）接收线圈和评估装置（108; 208; 308; 408; 508; 608），其以取决于所述发送信号的方式生成的发送电压信号与以取决于所述接收电压的方式生成的接收电压信号并且生成包含关于测量对象相对于位置传感器的线圈的相对位置的信息的传感器输出信号。

52. 发明申请

WO2013124052A3 LITHOGRAPHY DEVICE WITH EDDY-CURRENT BRAKE 审中-公开
标题翻译：带有涡流制动的光刻设备
公开(公告)号：WO2013124052A3
公开(公告)日：2013-12-19
申请号：PCT/EP2013000480
申请日：2013-02-19
申请人： ZEISS CARL SMT GMBH
发明人： VOGLER ALEXANDER , HAUF MARKUS
IPC分类号： G03F7/20
CPC分类号： H02K49/04 , G03F7/70258 , G03F7/70766 , G03F7/70825 , G03F7/709 , H02K49/10
摘要： A lithography device (10) includes an eddy-current brake (30, 70) for damping the movement of a structural element (13) of the lithography device (10). The eddy-current brake (30, 70) includes a plurality of magnets disposed in an arc-shaped arrangement, and a plurality of electrically conductive sheets (35, 67) arranged respectively between adjacent ones of said magnets. A relative movement between the magnets and the electrically conductive sheets in a direction to be damped inducing eddy currents in the electrically conductive sheets.
摘要翻译：光刻设备（10）包括用于衰减光刻设备（10）的结构元件（13）的运动的涡流制动器（30,70）。涡流制动器（30,70）包括以弧形布置布置的多个磁体以及分别布置在相邻的所述磁体之间的多个导电片（35,67）。磁体和导电片之间在要阻尼的方向上的相对运动导致导电片中的涡电流。

53. 发明申请

WO2013113480A1 PROJECTION EXPOSURE APPARATUS COMPRISING A MEASURING SYSTEM FOR MEASURING AN OPTICAL ELEMENT 审中-公开
标题翻译：包含用于测量光学元件的测量系统的投影曝光装置
公开(公告)号：WO2013113480A1
公开(公告)日：2013-08-08
申请号：PCT/EP2013/000200
申请日：2013-01-23
申请人： CARL ZEISS SMT GMBH
发明人： BLEIDISTEL, Sascha , HARTJES, Joachim , GRUNER, Toralf
IPC分类号： G02B27/00 , G01N21/41 , G03F7/20
CPC分类号： G03F7/706 , G01K11/00 , G01M11/0242 , G01M11/0271 , G03F7/70141 , G03F7/70258 , G03F7/7085 , G03F7/70891
摘要： A projection exposure apparatus (10) for microlithography comprises a measuring system (50) for measuring an optical element of the projection exposure apparatus. The measuring system (50) comprises: an irradiation device (54), which is configured to radiate measuring radiation (62) in different directions (64) onto the optical element (20), such that the measuring radiation (62) covers a respective optical path length (68) within the optical element (20) for the different directions (64) of incidence, a detection device (56), which is configured to measure, for the respective direction (64) of incidence, the corresponding optical path length covered by the measuring radiation (62) in the optical element (20), and an evaluation device, which is configured to determine a spatially resolved distribution of the refractive index in the optical element (20) by computed-tomographic back projection of the measured path lengths taking account of the respective direction of incidence.
摘要翻译：用于微光刻的投影曝光装置（10）包括用于测量投影曝光装置的光学元件的测量系统（50）。测量系统（50）包括：照射装置（54），其配置成将不同方向（64）上的测量辐射（62）辐射到光学元件（20）上，使得测量辐射（62）覆盖相应的用于不同方向（64）入射的光学元件（20）内的光路长度（68）;检测装置（56），被配置为针对相应的入射方向（64）测量相应的光路由所述光学元件（20）中的所述测量辐射（62）覆盖的长度以及评估装置，其被配置为通过所述光学元件（20）的计算机断层摄影反投影来确定所述光学元件（20）中的折射率的空间分辨分布测量的路径长度考虑到相应的入射方向。

54. 发明申请

WO2012041459A3 IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：成像光学系统的微观算法
公开(公告)号：WO2012041459A3
公开(公告)日：2012-08-30
申请号：PCT/EP2011004744
申请日：2011-09-22
申请人： ZEISS CARL SMT GMBH , ROGALSKY OLAF , SCHNEIDER SONJA , BITTNER BORIS , KUGLER JENS , GELLRICH BERNHARD , FREIMANN ROLF
发明人： ROGALSKY OLAF , SCHNEIDER SONJA , BITTNER BORIS , KUGLER JENS , GELLRICH BERNHARD , FREIMANN ROLF
IPC分类号： G03F7/20 , G02B27/00
CPC分类号： G02B17/06 , G02B17/0663 , G02B27/0012 , G03F7/70258 , G03F7/70308 , G03F7/70891
摘要： An imaging optical system (10), in particular a projection objective, for microlithography, comprises optical elements (M1-M6) configured to guide electromagnetic radiation (19) with a wavelength ? in an imaging beam path for imaging an object field (13) into an image plane (14), and a pupil (24), having coordinates (p, q) which, together with the image field (16), having coordinates (x, y), of the optical system (10), spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q) as a function of which a wavefront W(x, y, p, q) of the radiation (19) passing through the optical system is defined. At least a first of the optical elements (M1-M6) has a non-rotationally symmetrical surface (26) having a respective surface deviation in relation to every rotationally symmetrical surface (28), which two-dimensional surface has a difference between its greatest elevation and its deepest valley of at least ?. A sub-aperture ratio of the non- rotationally symmetrical surface deviates at every point (?1, O2) of the object field (13) by at least 0.01 from the sub-aperture ratio of every other surface of the optical elements, which is located in the imaging beam path, at the respective point (O1, O2) of the object field (13). Furthermore, the surface (26) of the first optical element (M4) is configured such that by displacing the first optical element relative to the other optical elements a change to the wavefront of the optical system (10) can be brought about which has a portion with at least 2-fold symmetry, the maximum value of the wavefront change in the extended 4- dimensional pupil space being at least 1 x 10-5 of the wavelength ?.
摘要翻译：用于微光刻的成像光学系统（10），特别是投影物镜包括光学元件（M1-M6），其被配置为引导具有波长λ的电磁辐射（19）在用于将物场（13）成像到图像平面（14）的成像光束路径中，以及具有坐标（p，q）的光瞳（24），其与图像场（16）一起具有坐标（x，（x，y，p，q）的波前W（x，y，p，q）的函数，跨越具有坐标（x，y，p，q）的扩展的4维瞳孔空间，定义通过光学系统的辐射（19）。至少第一光学元件（M1-M6）具有相对于每个旋转对称表面（28）具有相应表面偏差的非旋转对称表面（26），该二维表面具有最大的海拔及其最深的山谷至少？非旋转对称表面的子孔径比从物体场（13）的每个点（θ1，O 2）偏离光学元件的每个其他表面的子孔径比至少0.01，这是位于成像光束路径中，位于物场（13）的相应点（O1，O2）处。此外，第一光学元件（M4）的表面（26）被配置为使得通过相对于其它光学元件移位第一光学元件，可以使光学系统（10）的波前的改变具有具有至少2倍对称性的部分，扩展的四维光瞳空间中的波前变化的最大值为波长λ的至少1×10 -5。

55. 发明申请

WO2009156111A1 PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONITORING A LATERAL IMAGING STABILITY 审中-公开
标题翻译：用于微观计算的投影曝光系统和监测横向成像稳定性的方法
公开(公告)号：WO2009156111A1
公开(公告)日：2009-12-30
申请号：PCT/EP2009/004493
申请日：2009-06-23
申请人： CARL ZEISS SMT AG , MANGER, Matthias , SCHÖCH, Armin , MÜLLER, Ulrich
发明人： MANGER, Matthias , SCHÖCH, Armin , MÜLLER, Ulrich
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70258 , G03F7/70591 , G03F7/7085
摘要： A projection exposure system (10) for microlithography comprises projection optics (12) for imaging mask structures into a substrate plane (16), an input diffraction element (28) which is configured to convert irradiated measurement radiation (21 ) into at least two test waves (30) directed onto the projection optics (12) with different propagation directions, a detection diffraction element (34; 28) which is disposed in the optical path of the test waves (30) after the latter have passed through the projection optics (12) and is configured to produce a detection beam (36) from the test waves (30) which has a mixture of radiation portions of both test waves (30), a photo detector (38) disposed in the optical path of the detection beam (36) which is configured to record the radiation intensity of the detection beam (36), time resolved, and an evaluation unit which is configured to determine the lateral imaging stability of the projection optics (12) from the radiation intensity recorded.
摘要翻译：用于微光刻的投影曝光系统（10）包括用于将掩模结构成像到基板平面（16）中的投影光学器件（12），被配置为将照射的测量辐射（21）转换成至少两个测试的输入衍射元件（28）以不同的传播方向指向投影光学器件（12）的波（30）;检测衍射元件（34; 28），其被布置在经过投影光学器件的测试波（30）的光路中 12），并且被配置为从具有两个测试波的辐射部分的混合物的测试波（30）产生检测光束（36），设置在检测光束的光路中的光电检测器（38）（36），其被配置为记录检测光束（36）的辐射强度，时间分辨率，以及评估单元，其被配置为根据记录的辐射强度来确定投影光学器件（12）的横向成像稳定性。

56. 发明申请

WO2009039883A1 OPTICAL IMAGING DEVICE WITH THERMAL STABILIZATION 审中-公开
标题翻译：具有热稳定性的光学成像装置
公开(公告)号：WO2009039883A1
公开(公告)日：2009-04-02
申请号：PCT/EP2007/060226
申请日：2007-09-26
申请人： CARL ZEISS SMT AG , KWAN, Yim-Bun Patrick
发明人： KWAN, Yim-Bun Patrick
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/705 , G03F7/70825 , G03F7/70833 , G03F7/7085 , G03F7/70875 , G03F7/70983
摘要： There is provided an optical imaging device comprising an optical imaging system (101) with at least one' optical imaging component (106.1,107.1), a support structure (102.1), a capturing device (111) and a control device (112). The support structure (102.1) supports the at least one optical imaging component (106.1,107.1) and comprises at least one actuator (106.3,107.3). The actuator (106.3,107.3) is adapted to adjust, in at least one degree of freedom, at least one of a geometric parameter of the optical imaging component (106.1,107.1), a relative position of the optical imaging component (106.1,107.1) with respect to at least one reference (108.1) and a relative orientation of the optical imaging component (106.1,107.1) with respect to the at least one reference (108.1) as a function of at least one control signal provided by the control device (112). The capturing device (111) is adapted to continuously capture, at at least one capturing location of the optical projection unit (102), an actual value of a variable representative of a temperature at the location and to provide the actual value to the control device (112). The control device (112) is adapted to generate the at least one control signal as a function of the actual value of the variable and to provide the at least one control signal to the at least one actuator (106.3,107.3) to at least, partially compensate thermally induced alterations in at least one of the geometric parameter, the relative position and the relative orientation of the optical imaging component (106.1,107.1). The control device (112) is adapted to use at least one previously established thermal model of the optical imaging system (101) to generate the at least one control signal,1 the thermal model describing at least one of the geometric parameter, the relative position and the relative orientation of the optical imaging component (106.1,107.1) at least as a function of the variable and the capturing location.
摘要翻译：提供了一种光学成像装置，其包括具有至少一个“光学成像部件”（106.1,107.1），一个支撑结构（102.1），一个捕获装置（111）和一个控制装置（112）的光学成像系统（101）。支撑结构（102.1）支撑至少一个光学成像部件（106.1,107.1）并且包括至少一个致动器（106.3,107.3）。致动器（106.3,107.3）适于在至少一个自由度中调整光学成像部件（106.1,107.1）的几何参数中的至少一个，光学成像部件（106.1,107.1）的相对位置）相对于所述至少一个参考（108.1）的至少一个参考（108.1）以及所述光学成像组件（106.1,107.1）相对于所述至少一个参考（108.1）的相对定向，作为由所述控制设备提供的至少一个控制信号的函数（112）。捕获装置（111）适于在光学投影单元（102）的至少一个捕获位置连续地捕获表示该位置处的温度的变量的实际值，并向控制装置提供实际值（112）。控制装置（112）适于根据变量的实际值产生至少一个控制信号，并且将至少一个控制信号提供给至少一个致动器（106.3,107.3）至少至少一个，部分地补偿光学成像部件（106.1,107.1）的几何参数，相对位置和相对取向中的至少一个中的热诱导变化。所述控制装置（112）适于使用所述光学成像系统（101）的至少一个先前建立的热模型来产生所述至少一个控制信号，所述热模型描述所述几何参数中的至少一个，相对位置以及光学成像组件（106.1,107.1）的相对定向至少作为变量和捕获位置的函数。

57. 发明申请

WO2008151083A1 FEEDFORWARD/FEEDBACK LITHO PROCESS CONTROL OF STRESS AND OVERLAY 审中-公开
标题翻译：反应/反馈LITHO过程控制应力和覆盖
公开(公告)号：WO2008151083A1
公开(公告)日：2008-12-11
申请号：PCT/US2008/065421
申请日：2008-05-30
申请人： KLA-TENCOR CORPORATION , ADEL, Michael , FIELDEN, John , WIDMANN, Amir , ROBINSON, John , CHOI, Dongsub
发明人： ADEL, Michael , FIELDEN, John , WIDMANN, Amir , ROBINSON, John , CHOI, Dongsub
IPC分类号： G06F19/00
CPC分类号： G03F7/70258 , G03F7/705 , G03F7/70525 , G03F7/70616 , G03F7/70783
摘要： A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a lithographic patterning process on the substrate. One or more correctables to the lithographic patterning process may be generated based on the metrology. The lithographic patterning process performed on the substrate (or a subsequent substrate) may be adjusted with the correctables.
摘要翻译：描述了光刻工艺中的工艺控制的方法和装置。在基板上执行光刻图案化处理之前或之后，可以在基板上进行计量。可以基于计量产生光刻图案化过程的一个或多个可修改的内容。可以用可校正的方法来调整在衬底（或随后的衬底）上执行的光刻图案化工艺。

58. 发明申请

WO2008119386A1 SUPPORT FOR A COMPONENT OF AN OPTICAL DEVICE 审中-公开
标题翻译：支持光学设备的组件
公开(公告)号：WO2008119386A1
公开(公告)日：2008-10-09
申请号：PCT/EP2007/053126
申请日：2007-03-30
申请人： Carl Zeiss SMT AG , BISCHOFF, Thomas , FEUCHT, Joachim , WIELAND, Jochen
发明人： BISCHOFF, Thomas , FEUCHT, Joachim , WIELAND, Jochen
IPC分类号： G02B7/00 , G03F7/20
CPC分类号： G03F7/7015 , G02B7/025 , G03F7/70141 , G03F7/70258 , G03F7/70825
摘要： There is provided an arrangement for an optical device comprising a component of said optical device and a support structure supporting said component. The support structure comprises at least one locking device (113), the at least one locking device being connected to the component and comprising a first fixation (113-1) device and an associated second fixation device (113-2). The first fixation device and the second fixation device are adapted to be, in a movable state, movable with respect to each other along a first degree of freedom and a second degree of freedom into a final position. The first fixation device and the second fixation device are further adapted to be, in a locked state, fixed in the final position by at least one locking means contacting the first fixation device and the second fixation device. In the movable state, the first fixation device and the second fixation device are movable, up to the final position, in a manner free from a mutual pre-stress resulting from a restoring force exerted by at least a part of one of the first fixation device and the second fixation device.
摘要翻译：提供了一种用于包括所述光学装置的部件和支撑所述部件的支撑结构的光学装置的装置。所述支撑结构包括至少一个锁定装置（113），所述至少一个锁定装置连接到所述部件并且包括第一固定装置（113-1）和相关联的第二固定装置（113-2）。第一固定装置和第二固定装置适于处于可移动状态，其可以相对于彼此沿着第一自由度和第二自由度移动到最终位置。第一固定装置和第二固定装置进一步适于处于锁定状态，通过接触第一固定装置和第二固定装置的至少一个锁定装置固定在最终位置。在可动状态下，第一固定装置和第二固定装置可以以不受由第一固定件中的一个的至少一部分施加的恢复力产生的相互预应力的方式移动到最终位置装置和第二固定装置。

59. 发明申请

WO2008113605A2 METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AN OPTICAL SYSTEM AND SUCH AN OPTICAL SYSTEM 审中-公开
标题翻译：方法的光学系统的改善画面属性，而这种光学系统
公开(公告)号：WO2008113605A2
公开(公告)日：2008-09-25
申请号：PCT/EP2008002289
申请日：2008-03-20
申请人： ZEISS CARL SMT AG , GRUNER TORALF , KWAN YIM-BUN-PATRICK
发明人： GRUNER TORALF , KWAN YIM-BUN-PATRICK
IPC分类号： G02B27/00 , G03F7/20
CPC分类号： G02B7/028 , G02B27/0068 , G03F7/70258 , G03F7/70308 , G03F7/706 , G03F7/70891
摘要： The invention relates to a method for improving the imaging properties of an optical system (10, 12). The optical system (10, 12) has a plurality of optical elements in order to depict a structure (24) on a substrate (28) that is disposed in an image plane (32) of the optical system (10, 12). The method comprises a process step (a) of detecting at least one first time-dependent and at least partially reversible imaging error of the optical system (10, 12) caused by the heating of at least one of the optical elements (36, 38, and a process step (b) of at least partially correcting the at least first imaging error by replacing at least one of the first optical elements (36, 38) from the plurality of the optical elements with at least one first optical compensation element. The invention further relates to such an optical system (10, 12) having improved imaging properties (Fig. 1).
摘要翻译：本发明涉及一种用于改进的光学系统（10，12）的成像特性的方法。所述光学系统（10，12）具有多个在所述光学系统（10，12）的图像平面（32）的基板（28）上的光学元件被布置成映射结构（24）。该方法包括处理步骤（a）中，检测至少一个第一通过加热光学元件中的至少一个（36，38）引起的与时间相关的至少部分可逆的光学系统（10，12）的像差，以及方法步骤（b）中，至少部分地校正由至少多个光学元件中的第一光学元件（36，38）交换为对至少一个第一光学补偿元件的至少第一图像缺陷。本发明还涉及这样的光学系统（10，12）具有改善的成像特性（图1）。

60. 发明申请

WO2008095695A2 VERFAHREN UND VORRICHTUNG ZUR ÜBERWACHUNG VON MEHRFACHSPIEGELANORDNUNGEN IN EINEM BELEUCHTUNGSSYSTEM EINER MIKROLITHOGRAPHISCHEN PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
标题翻译： METHOD AND APPARATUS FOR IN的微光刻投射曝光设备的照明系统的监控多个MIRROR ARRANGEMENTS
公开(公告)号：WO2008095695A2
公开(公告)日：2008-08-14
申请号：PCT/EP2008/000920
申请日：2008-02-06
申请人： CARL ZEISS SMT AG , XALTER, Stefan , KWAN, Yim-Bun-Patrick , MAJOR, András, G. , MAUL, Manfred , EISENMENGER, Johannes , FIOLKA, Damian , HORN, Jan , DEGÜNTHER, Markus , BACH, Florian , PATRA, Michael , WANGLER, Johannes , LAYH, Michael
发明人： XALTER, Stefan , KWAN, Yim-Bun-Patrick , MAJOR, András, G. , MAUL, Manfred , EISENMENGER, Johannes , FIOLKA, Damian , HORN, Jan , DEGÜNTHER, Markus , BACH, Florian , PATRA, Michael , WANGLER, Johannes , LAYH, Michael
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Ein Beleuchtungssystem (12) einer mikrolithographischen Projektionsbelichtungsanlage (10) hat eine Pupillenfläche und eine im Wesentlichen flächige Anordnung vorzugsweise individuell ansteuerbarer Strahlablenkungselemente (28) zur variablen Ausleuchtung der Pupillenfläche. Durch jedes Strahlablenkungselement (28) lässt sich eine Ablenkung eines darauf auftreffenden Projektionslichtbündels (32) in Abhängigkeit von einem an dem Strahlablenkungselement (28) anliegenden Steuersignal erzielen. Eine Messbeleuchtungseinrichtung (54, 56, 58, 60; 88; 90; 98) richtet ein von den Projektionslichtbündeln (32) unabhängiges Messlichtbündel (36) auf ein Strahlablenkungselement (28). Eine Detektoreinrichtung erfasst das Messlichtbündel (38) nach Ablenkung an dem Strahlablenkungselement (28). Eine Auswertungseinheit bestimmt die Ablenkung des Projektionslichtbündels (32) aus von der Detektoreinrichtung bereitgestellten Messsignalen.
摘要翻译：微光刻投射曝光设备（10）的照明系统（12）具有用于光瞳表面的可变照明光瞳表面及实质呈平面排列优选单独可控光束偏转元件（28）。由每个光束偏转元件（28），可以实现施加的控制信号，在其上投影光束（32）入射的响应于所述梁部件（28）的偏转的偏转。的测量照明装置（54，56，58，60; 88; 90; 98）从投射光束建立（32）独立的测量光束（36）的光束偏转元件（28）。的检测装置检测的测量光束（38）由所述光束偏转元件（28）的偏转。评估单元确定由检测器提供的投影光束（32）的偏转装置的测量信号。

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