会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 53. 发明申请
    • METHOD OF PROCESSING A DEVICE SUBSTRATE
    • 处理器件基片的方法
    • WO2014014811A1
    • 2014-01-23
    • PCT/US2013/050469
    • 2013-07-15
    • INVENSAS CORPORATION
    • MONADGEMI, Pezhman
    • H01L21/768H01L21/78
    • H01L23/562H01L21/304H01L21/31133H01L21/76898H01L21/78H01L2924/0002H01L2924/00
    • Methods of processing a device substrate (200) are disclosed herein. In one embodiment, a method of processing a device substrate (200) can include bonding a first surface (206) of a device substrate (200) to a carrier (302) with a polymeric material (300). The device substrate (200) may have a plurality of first openings (210) extending from the first surface (206) towards a second surface (208) of the device substrate (200) opposite from the first surface (206). Then, material can be removed at the second surface (208) of the device substrate (200), wherein at least some of the first openings (210) communicate with the second surface (208) at least one of before or after performing the removal of the material. Then, at least a portion of the polymeric material (300) disposed between the first surface (206) and the carrier substrate (302) can be exposed to a substance through at least some first openings (210) to debond the device substrate (200) from the carrier substrate (302).
    • 本文公开了处理器件衬底(200)的方法。 在一个实施例中,处理器件衬底(200)的方法可以包括用聚合材料(300)将器件衬底(200)的第一表面(206)结合到载体(302)。 器件衬底(200)可以具有从第一表面(206)延伸到与第一表面(206)相对的器件衬底(200)的第二表面(208)的多个第一开口(210)。 然后,可以在装置基板(200)的第二表面(208)处去除材料,其中至少一些第一开口(210)在执行去除之前或之后与第二表面(208)连通 的材料。 然后,设置在第一表面(206)和载体衬底(302)之间的聚合物材料(300)的至少一部分可以通过至少一些第一开口(210)暴露于物质,以使器件衬底(200)脱粘 )从载体衬底(302)。
    • 56. 发明申请
    • OPTICAL INTERPOSER
    • 光学插件
    • WO2013106288A1
    • 2013-07-18
    • PCT/US2013/020578
    • 2013-01-07
    • INVENSAS CORPORATION
    • KOSENKO, ValentinBCBAIN, Edward LeeUZOH, Cyprian EmekaMONADGEMI, PezhmanSAVASTIOUK, Sergey
    • G02B6/42G02B6/36
    • G02B6/4214G02B6/3628G02B6/3636G02B6/3652G02B6/3692G02B6/4249Y10T29/49117
    • An optical interposer includes grooves (310) for optical fiber cables (104) coupled to a transducer (120). The grooves are formed by etching a cavity (410) in a substrate (130), filling the cavity with some layer (520), then etching the layer to form the grooves. The cavity has outwardly sloped sidewalls on which mirrors (144) are later formed. The groove etch is selective not to damage the sidewalls. The groove depth is uniform due to high etch selectivity of the layer, and also because of good control over the cavity etch due to the low aspect ratio of the cavity. Electrical circuitry for connection to the transducer is fabricated after the cavity filling but before the groove etch. The cavity filling leaves the wafer planar, facilitating fabrication of the electrical circuitry. Grooves can be provided on top and bottom of the interposer.
    • 光学插入器包括耦合到换能器(120)的光纤电缆(104)的凹槽(310)。 凹槽通过蚀刻衬底(130)中的空腔(410)形成,用一些层(520)填充空腔,然后蚀刻该层以形成凹槽。 空腔具有向外倾斜的侧壁,后面形成有反射镜(144)。 凹槽蚀刻是选择性的,不损坏侧壁。 由于该层的高蚀刻选择性,凹槽深度是均匀的,并且还由于腔的低纵横比由于对腔蚀刻的良好控制。 用于连接到换能器的电路在腔填充之后但在凹槽蚀刻之前制造。 空腔填充离开晶片平面,便于制造电路。 可以在插入器的顶部和底部提供凹槽。