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    • 43. 发明申请
    • RESVERATROL-BASED COMPOUNDS
    • 基于RESVERATROL的化合物
    • WO2013049364A1
    • 2013-04-04
    • PCT/US2012/057587
    • 2012-09-27
    • THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORKSNYDER, Scott, A.CHIRIAC, Maria, I.SHAW, Katharina
    • SNYDER, Scott, A.CHIRIAC, Maria, I.SHAW, Katharina
    • A61K31/495
    • C07C41/22C07C317/20C07C2602/08C07F9/12C07C43/225
    • The invention provides a compound having the structure compound having the structure: Formula wherein bond a is present or absent, wherein when bond a is absent, then bond β is: Sign (I) and R 1 is: Formula and when bond a is present, then R 1 is OR 10 , wherein the phenyl is substituted or unsubstituted; wherein R 10 is H, methyl, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, phosphate, sulfate, sulfonic ester, or ester; and R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 and R 9 are each independently H or OR 11 wherein each occurrence of Rn is independently H, methyl, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, phosphate, sulfate, sulfonic ester, or ester; or a salt thereof.
    • 本发明提供具有以下结构的结构化合物的化合物:其中键合a存在或不存在,其中当不存在键a时,键β为:符号(I),并且R 1为:式中,当存在键a时, 那么R1是OR10,其中苯基是取代或未取代的; 其中R 10为H,甲基,取代或未取代的烷基,取代或未取代的杂烷基取代或未取代的芳基,取代或未取代的杂芳基,磷酸酯,硫酸酯,磺酸酯或酯; R 2,R 3,R 4,R 5,R 6,R 7,R 8和R 9各自独立地为H或OR 11,其中每次出现的R n独立地为H,甲基,取代或未取代的烷基,取代或未取代的杂烷基取代或未取代的芳基,取代或未取代的 杂芳基,磷酸根,硫酸根,磺酸酯或酯; 或其盐。
    • 48. 发明申请
    • PROCESS FOR THE MANUFACTURE OF SEVOFLURANE
    • 七氟醚制造工艺
    • WO2011018466A1
    • 2011-02-17
    • PCT/EP2010/061645
    • 2010-08-10
    • SOLVAY FLUOR GMBHBRAUN, Max
    • BRAUN, Max
    • C07C41/22C07C51/15C07C59/305
    • C07C41/22C07C67/31C07C43/123C07C69/708
    • A process for the manufacture of Sevoflurane CF 3 -CH(OCH 2 F)-CF 3 which comprises (a) manufacturing a substituted malonic acid derivative of formula (I) or (II): R 1 OOC-CH(OCH 2 X)-COOR 2 (I) or R 3 HNOC-CH (OCH 2 X)-CONHR 4 (II) wherein X is OH or a leaving group which can be substituted by nucleophilic substitution and R 1 , R 2 , R 3 , R 4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom,, an aralkyl group or an aryl group, (b) further reacting said malonic acid derivative as intermediate for the manufacture of Sevoflurane CF 3 -CH(OCH 2 F)-CF 3
    • 制备七氟醚CF 3 -CH(OCH 2 F)-CF 3的方法,其包括:(a)制备式(I)或(II)的取代的丙二酸衍生物:R1OOC-CH(OCH2X)-COOR2(I)或R3HNOC- CH(OCH 2 X)-CONHR 4(II)其中X是OH或可被亲核取代取代的离去基团,且R 1,R 2,R 3,R 4彼此相同或不同,独立地选自H, 任选被至少一个卤素原子取代的1至10个碳原子,芳烷基或芳基,(b)进一步使所述丙二酸衍生物作为制备七氟烷CF 3 -CH(OCH 2 F)-CF 3的中间体