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41. 发明申请

WO2005110699A2 METHOD OF PATTERNING A CONDUCTIVE LAYER ON A SUBSTRATE 审中-公开
标题翻译：在基板上绘制导电层的方法
公开(公告)号：WO2005110699A2
公开(公告)日：2005-11-24
申请号：PCT/US2005/015180
申请日：2005-05-03
申请人： MOLECULAR IMPRINTS, INC.
发明人： SREENIVASAN, Sidlgata, V.
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present ivention includes a method of patterning a conductive layer on an substrate that features creating a multi-layered structure by solidifying a liquid layer to have a pattern including protrusions and recessions, defining a solidified layer. The liquid conformal layer is reflowed to provide a substantially smooth surface before solidification. In one embodiment of the invention, the liquid conformal layer may include a conductive component. By ensuring that the conformal layer forms a smooth, if not, planar surface, control over the dimensions of the resulting features is maintained. As a result, a single level layer of high density multiple conductive elements may be fabricated.
摘要翻译：本申请包括在衬底上图案化导电层的方法，其特征在于通过使液体层固化以具有限定凝固层的突起和凹陷的图案来形成多层结构。液体保形层被回流以在固化之前提供基本平滑的表面。在本发明的一个实施例中，液体保形层可以包括导电组件。通过确保保形层形成平滑的，如果不是平坦的表面，则维持所得特征的尺寸的控制。结果，可以制造单层高密度多导电元件。

42. 发明申请

WO2005079304A3 METHOD AND SYSTEM TO MEASURE CHARACTERISTICS OF A FILM DISPOSED ON A SUBSTRATE 审中-公开
标题翻译：测量基片上电影特性的方法和系统
公开(公告)号：WO2005079304A3
公开(公告)日：2005-11-24
申请号：PCT/US2005004414
申请日：2005-02-14
申请人： MOLECULAR IMPRINTS INC
发明人： MCMACKIN IAN M , SCHUMAKER PHILIP D , CHOI BYUNG-JIN , SREENIVASAN SIDLGATA V , WATTS MICHAEL P C
IPC分类号： B81C1/00 , B81C99/00 , G01N21/84 , G03F7/00 , G03F7/20 , G01B11/00
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B81C1/0046 , B81C99/004 , B82Y10/00 , B82Y40/00 , G01N21/8422 , G03F7/70625 , G03F7/7065
摘要： The present invention is directed to providing a method and system to measure characteristics of a film (40) disposed on a substrate (38). The method includes identifying a plurality of processing regions (52, 54) on the film (40); measuring characteristics of a subset of the plurality of processing regions (52, 54), defining measured characteristics; determining a variation of one of the measured characteristics; and associating a cause of the variations based upon a comparison of the one of the measured characteristics to measured characteristics associated with the remaining processing regions of the subset. The system carries out the aforementioned method.
摘要翻译：本发明旨在提供一种测量设置在基板（38）上的薄膜（40）的特性的方法和系统。该方法包括在胶片（40）上识别多个处理区域（52,54）; 测量所述多个处理区域（52,54）的子集的特征，定义测量的特征; 确定测量特征之一的变化; 并且基于所测量的特征之一与与所述子集的剩余处理区域相关联的测量特征的比较来将所述变化的原因相关联。系统执行上述方法。

43. 发明申请

WO2005037446A3 APPLYING IMPRINTING MATERIAL TO SUBSTRATES EMPLOYING ELECTROMAGNETIC FIELDS 审中-公开
标题翻译：将印刷材料应用于使用电磁场的基板
公开(公告)号：WO2005037446A3
公开(公告)日：2005-07-28
申请号：PCT/US2004034465
申请日：2004-10-18
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： CHERALA ANSHUMAN , SREENIVASAN SIDLGATA V , SCHUMAKER NORMAN E
IPC分类号： B05D20060101 , B05D1/04 , C23F1/00 , G03F7/00 , B29D35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention comprises a method for applying a liquid, such as imprinting material, to a substrate that features use of an electromagnetic field to rapidly spread the liquid over a desired portion of the substrate, while confining the same to the desired region.
摘要翻译：本发明包括用于将液体（例如压印材料）施加到特征在于使用电磁场的衬底的方法，以将液体快速地扩散到衬底的期望部分上，同时将其限定在所需区域。

44. 发明申请

WO2005037446A2 APPLYING IMPRINTING MATERIAL TO SUBSTRATES EMPLOYING ELECTROMAGNETIC FIELDS 审中-公开
标题翻译：将印刷材料应用于使用电磁场的基材
公开(公告)号：WO2005037446A2
公开(公告)日：2005-04-28
申请号：PCT/US2004/034465
申请日：2004-10-18
申请人： MOLECULAR IMPRINTS, INC. , BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
发明人： CHERALA, Anshuman , SREENIVASAN, Sidlgata V. , SCHUMAKER, Norman E.
IPC分类号： B05D
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention comprises a method for applying a liquid, such as imprinting material, to a substrate that features use of an electromagnetic field to rapidly spread the liquid over a desired portion of the substrate, while confining the same to the desired region.
摘要翻译：本发明包括用于将诸如压印材料的液体施加到基底的方法，该方法的特征在于使用电磁场将液体快速扩散到基底的期望部分上，同时限制与所需区域相同。

45. 发明申请

WO2004006120A1 SYSTEM AND METHOD FOR DISPENSING LIQUIDS 审中-公开
标题翻译：用于分配液体的系统和方法
公开(公告)号：WO2004006120A1
公开(公告)日：2004-01-15
申请号：PCT/US2003/019258
申请日：2003-06-19
申请人： MOLECULAR IMPRINTS, INC.
发明人： WATTS, Michael P., C. , CHOI, Byung-Jin , SREENIVASAN, Sidlgata, V.
IPC分类号： G06F17/00
CPC分类号： B05D7/24 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides a method and a system (10) to dispense a liquid (20, 22), contained in a cartridge (14, 16), onto a substrate (42) employing a dispensing system under control of a processor (52a) in data communication with a memory (52b). An identification (ID) code is associated with a cartridge containing a liquid (100). A request is transmitted by a user to a first sub-system (50 or 52) from a second sub-system (51 or 53). See step (102). The request includes a verifiable ID code and data concerning the sub-system, defining system data. The system then compares the verifiable ID code and system data with historical data concerning prior cartridges used (104). The historical data is stored on the first sub-system. If the comparison results in a mis-match, then an authorization code is denied (106). If the comparison results in a match, then an authorization code is transmitted to the second sub-system (108), thus allowing the user to commence dispensation of the liquid (110).
摘要翻译：本发明提供一种在处理器（52a）的控制下使用分配系统将容纳在盒（14,16）中的液体（20,22）分配到基板（42）上的方法和系统（10）与存储器（52b）进行数据通信。识别（ID）代码与包含液体（100）的盒相关联。请求由用户从第二子系统（51或53）发送到第一子系统（50或52）。参见步骤（102）。该请求包括可验证的ID代码和关于子系统的数据，定义系统数据。然后，系统将可验证的ID代码和系统数据与有关使用的先前的盒的历史数据进行比较（104）。历史数据存储在第一子系统上。如果比较导致错误匹配，则拒绝授权码（106）。如果比较结果匹配，则授权码被发送到第二子系统（108），从而允许用户开始分配液体（110）。

46. 发明申请

WO2018084965A1 SUBSTRATE LOADING SYSTEM 审中-公开
标题翻译：基板加载系统
公开(公告)号：WO2018084965A1
公开(公告)日：2018-05-11
申请号：PCT/US2017/053706
申请日：2017-09-27
申请人： MOLECULAR IMPRINTS, INC.
发明人： PATTERSON, Roy , AHAMED, Yaseer, A.
IPC分类号： H01L21/68 , B29C43/02 , B29C59/00 , B29C59/02 , G03F7/00 , H01L21/67
摘要： Methods, systems, and apparatus for a substrate transfer method, including positioning a tray handler device in a first position with i) cutouts of an aperture of the first tray in superimposition with respective pedestals of a pedestal platform and ii) a distal end of the pedestals extending away from a top surface of the first tray; increasing a distance between the top surface of the first tray and a top surface of the pedestal platform to transfer a first substrate from the pedestals to the tabs defined by the aperture of the first tray, while concurrently engaging the second tray handler with the second tray; and increasing a distance between the top surface of the second tray and the bottom surface of a chuck to transfer a second substrate from the chuck to the tabs defined by the second tray.
摘要翻译：用于基板传送方法的方法，系统和设备包括将托盘处理装置定位在第一位置，其中i）第一托盘的孔的切口与基座平台的各个基座叠置和ii）所述基座的远端远离所述第一托盘的顶表面延伸; 增加第一托盘的顶表面和基座平台的顶表面之间的距离，以将第一基板从基座转移到由第一托盘的孔限定的突片，同时使第二托盘处理器与第二托盘接合 ; 并且增加第二托盘的顶表面和卡盘的底表面之间的距离，以将第二衬底从卡盘转移到由第二托盘限定的突出部。

47. 发明申请

WO2018075174A1 MICROLITHOGRAPHIC FABRICATION OF STRUCTURES 审中-公开
标题翻译：微结构制作结构
公开(公告)号：WO2018075174A1
公开(公告)日：2018-04-26
申请号：PCT/US2017/051850
申请日：2017-09-15
申请人： MOLECULAR IMPRINTS, INC.
发明人： SINGH, Vikramjit , LOU, Kang , MILLER, Michael Nevin , YANG, Shuqiang , XU, Frank Y.
IPC分类号： B29C33/38 , B29C59/02 , B82Y40/00 , G03F7/00 , G03F7/26 , H01L21/00
摘要： Micro- and nano- patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.
摘要翻译：在基底上形成的压印层中的微米图案和纳米图案以及用于形成这种层的光刻方法。所述层包括多个结构，以及具有从基底表面延伸到结构基底的残余层厚度（RLT）的残留层，其中RLT根据预定义图案在基底表面上变化

48. 发明申请

WO2018039468A1 EDGE SEALANT CONFINEMENT AND HALO REDUCTION FOR OPTICAL DEVICES 审中-公开
标题翻译： EDGE SEALANT CONFINEMENT AND HOLO REDUCTION FOR OPTICAL DEVICES
公开(公告)号：WO2018039468A1
公开(公告)日：2018-03-01
申请号：PCT/US2017/048442
申请日：2017-08-24
申请人： MOLECULAR IMPRINTS, INC.
发明人： MILLER, Mike Nevin , XU, Frank Y. , SINGH, Vikramjit , BROWY, Eric C. , SCHAEFER, Jason , TEKOLSTE, Robert D. , LIU, Victor Kai , BHARGAVA, Samarth , SCHMULEN, Jeffrey Dean , SCHOWENGERDT, Brian T.
IPC分类号： G02B5/18 , B82Y40/00 , G03F7/00
摘要： Techniques are described for using confinement structures and/or pattern gratings to reduce or prevent the wicking of sealant polymer (e.g., glue) into the optically active areas of a multi-layered optical assembly. A multi-layered optical structure may include multiple layers of substrate imprinted with waveguide grating patterns. The multiple layers may be secured using an edge adhesive, such as a resin, epoxy, glue, and so forth. A confinement structure such as an edge pattern may be imprinted along the edge of each layer to control and confine the capillary flow of the edge adhesive and prevent the edge adhesive from wicking into the functional waveguide grating patterns of the layers. Moreover, the edge adhesive may be carbon doped or otherwise blackened to reduce the reflection of light off the edge back into the interior of the layer, thus improving the optical function of the assembly.
摘要翻译：描述了使用限制结构和/或图案光栅来减少或防止将密封剂聚合物（例如，胶）芯吸到多层光学组件的光学活性区域中的技术。多层光学结构可以包括用波导光栅图案印刷的多层衬底。可以使用边缘粘合剂（诸如树脂，环氧树脂，胶水等）来固定多个层。诸如边缘图案之类的限制结构可沿着每层的边缘印刷以控制和限制边缘粘合剂的毛细流动并防止边缘粘合剂芯吸到层的功能波导光栅图案中。此外，边缘粘合剂可以是碳掺杂的或以其他方式变黑的，以减少光从边缘反射回到层内部，从而改善组件的光学功能。

49. 发明申请

WO2015103232A1 METHODS FOR UNIFORM IMPRINT PATTERN TRANSFER OF SUB-20 NM FEATURES 审中-公开
标题翻译：用于均匀印刷SUB-20 NM特征的图案转移的方法
公开(公告)号：WO2015103232A1
公开(公告)日：2015-07-09
申请号：PCT/US2014/072706
申请日：2014-12-30
申请人： CANON NANOTECHNOLOGIES, INC. , MOLECULAR IMPRINTS, INC.
发明人： YE, Zhengmao , LABRAKE, Dwayne L.
IPC分类号： G03F7/00
CPC分类号： H01L21/3086 , G03F7/0002 , H01L21/02532 , H01L21/02623 , H01L21/283 , H01L21/31058 , H01L21/31133 , H01L21/31144 , H01L21/32051
摘要： Methods of increasing etch selectivity in imprint lithography are described which employ material deposition techniques that impart a unique morphology to the multi-layer material stacks, thereby enhancing etch process window and improving etch selectivity. For example, etch selectivity of 50:1 or more between patterned resist layer and deposited metals, metalloids, or non-organic oxides can be achieved, which greatly preserves the pattern feature height prior to the etch process that transfers the pattern into the substrate, allowing for sub-20 nm pattern transfer at high fidelity.
摘要翻译：描述了在压印光刻中提高蚀刻选择性的方法，其采用材料沉积技术，其赋予多层材料堆叠独特的形态，从而增强蚀刻工艺窗口并提高蚀刻选择性。例如，可以实现在图案化的抗蚀剂层和沉积的金属，准金属或非有机氧化物之间的50:1或更大的蚀刻选择性，这大大保持了将图案转移到衬底中的蚀刻工艺之前的图案特征高度，允许以高保真度进行亚20 nm图案转印。

50. 发明申请

WO2013126750A1 LARGE AREA IMPRINT LITHOGRAPHY 审中-公开
标题翻译：大面积印刷图
公开(公告)号：WO2013126750A1
公开(公告)日：2013-08-29
申请号：PCT/US2013/027396
申请日：2013-02-22
申请人： MOLECULAR IMPRINTS, INC.
发明人： CHOI, Byung-jin , AHN, Se, Hyun , GANAPATHISUBRAMANIAN, Mahadevan , MILLER, Michael, N. , SREENIVASAN, Sidlgata, V.
IPC分类号： G03F7/00
CPC分类号： B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.
摘要翻译：提供了使用压印光刻技术对分配在柔性基板或平坦基板上的可聚合材料进行图案化的方法和系统。还提供了模板复制方法和系统，其中来自主机的模式被转移到柔性基板以形成柔性膜模板。然后使用这种柔性膜模板来对大面积的平坦基板进行图案化。可以通过模板和衬底之间的相对平移来启动和传播压印模板和衬底之间的接触。

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