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    • 25. 发明申请
    • VARIABLE MELTING POINT SOLDERS AND BRAZES
    • 可变熔炼点焊机和布
    • WO01089757A1
    • 2001-11-29
    • PCT/CA2001/000721
    • 2001-05-24
    • B22F1/00B23K35/02B23K35/14B23K35/26B23K35/28B23K35/30H05K3/34
    • B23K35/3033B22F1/0003B23K35/0227B23K35/0233B23K35/0244B23K35/025B23K35/262B23K35/264B23K35/268B23K35/28B23K35/288B23K35/302H05K3/3463H05K3/3484H05K2201/0272
    • Variable melting point solders and brazes having compositions comprising a metal or metal alloy powder having a low melting point with a metal powder having a higher melting point. Upon heating, in-situ alloying occurs between the low and high melting point powders such that solidification occurs at the solder or braze temperature thus creating a new, higher solidus (or melting) temperature with little or no intermetallic formation. A solder comprising Sn powder mixed with a Sn-Bi eutectic powder having a composition of 63wt.% Sn: 57wt.% Bi such that the bulk composition of the mixture is 3 wt.% Bi has an initial melting point of 140 DEG C and a re-melt temperature of 220 DEG C after heating due to in-situ alloying. A composition of Pb powder mixed with a Pb-Sn eutectic powder having a composition of 62wt.% Sn:58wt.% Pb such that the bulk composition of the mixture is 15 wt.% Sn has an initial melting point of 183 DEG C and a re-melt temperature of 250 DEG C.
    • 可变熔点焊料和钎料具有包含具有低熔点的金属或金属合金粉末与具有较高熔点的金属粉末的组合物的组合物。 在加热时,在低熔点和高熔点粉末之间发生原位合金化,使得在焊料或钎焊温度下发生固化,从而产生具有很少或没有金属间化合物的新的更高的固相(或熔融)温度 形成。 一种焊料,其包含与Sn-Bi共晶粉末混合的Sn粉末,Sn-Bi共晶粉末的组成为63重量%Sn:57重量%Bi,使得混合物的本体组合物为3重量%,Bi的初始熔点为140℃, 由于原位合金化,加热后再熔化温度为220℃。 Pb粉末与Pb-Sn共晶粉末组合物,其组成为62重量%Sn:58重量%Pb,使得混合物的本体组合物为15重量%Sn,初始熔点为183℃, 再熔化温度250℃
    • 27. 发明申请
    • ALLOY TO BE PLATED, ITS PLATING METHOD AND PLATING SOLUTION
    • 合金涂层,镀层方法和镀层解决方案
    • WO1994018350A1
    • 1994-08-18
    • PCT/JP1993000129
    • 1993-02-03
    • WORLD METAL CO., LTD.UEDA, ShigeakiHAYASHIDA, Hidenori
    • WORLD METAL CO., LTD.
    • C22C13/00
    • H05K3/3473B23K35/007B23K35/262B23K35/268C23C30/00H05K3/3463
    • When an electronic component and a wiring board are connected to each other by soldering, the present invention uses, as an alloy to be plated, an alloy containing 0.01 to 90 wt% of palladium in lead, tin or their alloy as a thin film to be formed on a to-be-plated portion of the electronic component or the wiring board so as to effectively carry out the connection. Particularly preferred is an alloy containing 0.1 to 70 wt% of lead, 0.1 to 90 wt% of tin and 0.01 to 90 wt% of palladium. Furthermore, when this alloy further contains 0.1 to 20 wt% of phosphorus or 0.01 to 10 wt% of boron, the drop of solderability of the alloy due to heat can be much more reduced. When 0.1 to 20 wt% of indium is contained, the melting point of the alloy can be lowered and when 0.1 to 20 wt% of silver is contained, leaching can be reduced. This alloy to be plated is preferably formed on the to-be-plated portion by electrolytic or electroless plating by the use of a plating solution for the alloy to be plated which contains 0.001 to 2 mols/l of a palladium compound, 0.001 to 3 mols/l of a tin compound and or 0.001 to 2 mols/l of a lead compound. In the case of electroless plating, it is preferred to use a plating solution additionally containing 0.01 to 1 mol/l of a reducing agent.
    • 当通过焊接将电子部件和布线板彼此连接时,本发明使用作为镀覆合金的含有0.01〜90重量%的铅,锡或其合金中的钯作为薄膜的合金, 形成在电子部件或布线基板的被镀覆部上,以有效地进行连接。 特别优选含有0.1〜70重量%的铅,0.1〜90重量%的锡和0.01〜90重量%的钯的合金。 此外,当该合金还含有0.1〜20重量%的磷或0.01〜10重量%的硼时,可以大大降低合金由于热而引起的可焊性降低。 当含有0.1〜20重量%的铟时,合金的熔点可以降低,并且当含有0.1〜20重量%的银时,可以降低浸出。 该镀合金优选通过使用含有0.001〜2摩尔/升钯化合物的镀覆合金的镀液进行电解或无电镀来形成在被镀层上,0.001〜3 摩尔/升的锡化合物和0.001至2摩尔/升的铅化合物。 在化学镀的情况下,优选使用另外含有0.01〜1mol / l还原剂的电镀液。