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    • 28. 发明申请
    • TRENCH MOSFET WITH RECESSED CLAMPING DIODE
    • 带有钳位二极管的TRENCH MOSFET
    • WO2006011882A1
    • 2006-02-02
    • PCT/US2004/021211
    • 2004-06-30
    • ADVANCED ANALOGIC TECHNOLOGIES, INC.ADVANCED ANALOGIC TECHNOLOGIES (HONG KONG) LIMITEDWILLIAMS, RichardCORNELL, MichaelCHAN, Wai Tien
    • WILLIAMS, RichardCORNELL, MichaelCHAN, Wai Tien
    • H01L27/108
    • H01L29/7813H01L29/0696H01L29/0878H01L29/42368H01L29/66734H01L29/7808
    • In a trench-gated MOSFET (840) including an epitaxial layer (842) over a substrate (841) of like conductivity and trenches containing thick bottom oxide (846), sidewall gate oxide (850), and conductive gates (844), body regions (843) of the complementary conductivity are shallower than the gates (844), and clamp regions (853) are deeper and more heavily doped than the body regions but shallower than the trenches. Zener junctions clamp a drain-source voltage lower than the FPI breakdown of body junctions near the trenches, but the zener junctions, being shallower than the trenches, avoid undue degradation of the maximum drain-source voltage. The epitaxial layer (842) may have a dopant concentration that increases step-wise or continuously with depth. Chained implants of the body (843) and clamp regions (853) permit accurate control of dopant concentrations and of junction depth. Alternative fabrication processes permit implantation of the body (843) and clamp regions (853) before gate bus (852) formation or through the gate bus (852) after gate bus formation.
    • 在包括具有类似导电性的衬底(841)上的外延层(842)和包含厚底部氧化物(846),侧壁栅极氧化物(850)和导电栅极(844)的沟槽的沟槽选通MOSFET(840)中, 互补电导率的区域(843)比栅极(844)浅,并且钳位区域(853)比体区域更深且更重掺杂,但是比沟槽浅。 齐纳结钳位漏极 - 源极电压低于沟槽附近的主体结的FPI击穿,但是比沟槽更浅的齐纳结避免了最大漏极 - 源极电压的不适当的降低。 外延层(842)可以具有随深度逐步增加或连续增加的掺杂剂浓度。 身体(843)和夹紧区域(853)的链式植入允许准确控制掺杂剂浓度和结深度。 替代的制造工艺允许在栅极总线(852)形成之后或在栅极总线形成之后通过栅极总线(852)注入主体(843)和钳位区域(853)。
    • 30. 发明申请
    • ORGANIC SEMICONDUCTING LAYER FORMULATIONS COMPRISING POLYACENES AND ORGANIC BINDER POLYMERS
    • 包含聚丙烯和有机粘合剂聚合物的有机半导体层制剂
    • WO2005055248A3
    • 2005-07-28
    • PCT/GB2004004973
    • 2004-11-25
    • AVECIA LTDBROWN BEVERLEY ANNEVERES JANOSANEMIAN REMI MANOUKWILLIAMS RICHARD THOMASOGIER SIMON DOMINICLEEMING STEPHEN WILLIAM
    • BROWN BEVERLEY ANNEVERES JANOSANEMIAN REMI MANOUKWILLIAMS RICHARD THOMASOGIER SIMON DOMINICLEEMING STEPHEN WILLIAM
    • C07F7/08C08L35/06C08L39/04H01B1/12H01B1/20H01L51/00H01L51/05H01L51/30H01L51/20
    • C08L39/04C07F7/0809C07F7/0818C08L35/06H01L51/0035H01L51/0036H01L51/0039H01L51/0052H01L51/0055H01L51/0056H01L51/0059H01L51/0071H01L51/0072H01L51/0073H01L51/0074H01L51/0094H01L51/0566H01L51/42H01L51/50Y02E10/549C08L2666/02C08L2666/28
    • An organic semiconducting layer formulation, which comprises: an organic binder which has a permittivity, ϵ, at 1,000 Hz of 3.3 or less; and a polyacene compound of Formula: (A) wherein: each of R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11 and R12, which may be the same or different, independently represents hydrogen; an optionally substituted C1-C40 carbyl or hydrocarbyl group; an optionally substituted C1-C40 alkoxy group; an optionally substituted C6-C40 aryloxy group; an optionally substituted C7-C40 alkylaryloxy group; an optionally substituted C2-C40 alkoxycarbonyl group; an optionally substituted C7-C40 aryloxycarbonyl group; a cyano group (-CN); a carbamoyl group (-C(=O)NH2); a haloformyl group (-C(=O)-X, wherein X represents a halogen atom); a formyl group (-C(=O)-H); an isocyano group; an isocyanate group; a thiocyanate group or a thioisocyanate group; an optionally substituted amino group; a hydroxy group; a nitro group; a CF3 group; a halo group (CI, Br, F); or an optionally substituted silyl group; and wherein independently each pair of R2 and R3 and/or R8 and R9, may be cross-bridged to form a C4-C40 saturated or unsaturated ring, which saturated or unsaturated ring may be intervened by an oxygen atom, a sulphur atom or a group shown by formula -N(Ra)- (wherein Ra is a hydrogen atom or an optionally substituted hydrocarbon group), or may optionally be substituted; and wherein one or more of the carbon atoms of the polyacene skeleton may optionally be substituted by a heteroatom selected from N, P, As, O, S, Se and Te; and wherein independently any two or more of the substituents R1-R12 which are located on adjacent ring positions of the polyacene may, together, optionally constitute a further C4-C40 saturated or unsaturated ring optionally interrupted by O, S or -N(Ra) where Ra is as defined above) or an aromatic ring system, fused to the polyacene; and wherein n is 0, 1, 2, 3 or 4, also claimed is an electronic device, particularly an organic field effect transistor comprising the organic semiconductor layer formulation.
    • 一种有机半导体层制剂,其包含:在1000Hz下介电常数ε为3.3或更小的有机粘合剂; 和(A)的多并苯化合物,其中:可以相同或不同的R 1,R 2,R 3,R 4,R 5,R 6,R 7,R 8,R 9,R 10,R 11和R 12各自独立地表示氢; 任选取代的C 1 -C 40碳原子或烃基; 任选取代的C 1 -C 40烷氧基; 任选取代的C 6 -C 40芳氧基; 任选取代的C 7 -C 40烷基芳氧基; 任选取代的C 2 -C 40烷氧基羰基; 任选取代的C 7 -C 40芳氧基羰基; 氰基(-CN); 氨基甲酰基(-C(= O)NH 2); 卤代甲酰基(-C(= O)-X,其中X表示卤素原子); 甲酰基(-C(= O)-H); 异氰基团 异氰酸酯基; 硫氰酸酯基或硫代异氰酸酯基; 任选取代的氨基; 羟基; 硝基; CF3组; 卤代基(CI,Br,F); 或任选取代的甲硅烷基; 并且其中独立地,每对R 2和R 3和/或R 8和R 9可以交桥以形成C 4 -C 40饱和或不饱和环,该饱和或不饱和环可以被氧原子,硫原子或 基团-N(R a) - (其中R a是氢原子或任选取代的烃基),或可以任选地被取代; 并且其中多并苯骨架的一个或多个碳原子可任选地被选自N,P,As,O,S,Se和Te的杂原子取代; 并且其中独立地位于多并苯的相邻环位上的任何两个或更多个取代基R 1 -R 12可以一起任选地构成任选地被O,S或-N(R a)中断的另外的C 4 -C 40饱和或不饱和环, 其中Ra如上所定义)或与多并烯稠合的芳环体系; 并且其中n为0,1,2,3或4,还要求保护的是电子器件,特别是包含有机半导体层配方的有机场效应晶体管。