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11. 发明申请

WO2004108402A1 ELECTROCERAMIC/VARIANT DEVICE AND METHOD OF USE 审中-公开
标题翻译：电动/变体装置及其使用方法
公开(公告)号：WO2004108402A1
公开(公告)日：2004-12-16
申请号：PCT/IB2003/001964
申请日：2003-06-11
申请人： IVANOV, Vladimir
发明人： IVANOV, Vladimir
IPC分类号： B32B3/02
CPC分类号： C04B35/00
摘要： The invention is in from the field of technic which electroceramic is used in. The device with electroceramic has the element made of electroceramic (1),elements made conducting energies,elements made conducting energies are connected with the element made of electroceramic. The device with electroceramic is in a frame (2). Constructive features of the claimed invention give opportunity of effective use of elements made of electroceramic. The claimed invention is simple in construction, comfortable and economical in use and doesn’t take much to be prepared for the work.
摘要翻译：本发明属于使用电陶瓷的技术领域。具有电陶瓷的器件具有由电陶瓷（1）制成的元件，导电能量元件，导电能量元件与由电陶瓷制成的元件连接。具有电陶瓷的装置在框架（2）中。要求保护的发明的构造特征给出了有效使用由电陶瓷制成的元件的机会。要求保护的发明构造简单，使用舒适且经济，并且不需要为工作做好准备。

12. 发明申请

WO2011124434A1 EUV RADIATION SOURCE AND EUV RADIATION GENERATION METHOD 审中-公开
标题翻译： EUV辐射源和EUV辐射发生方法
公开(公告)号：WO2011124434A1
公开(公告)日：2011-10-13
申请号：PCT/EP2011/053432
申请日：2011-03-08
申请人： ASML NETHERLANDS B.V. , YAKUNIN, Andrei , BANINE, Vadim , IVANOV, Vladimir , KOSHELEV, Konstantin, , KRIVTSUN, Vladimir , GLUSHKOV, Denis
发明人： YAKUNIN, Andrei , BANINE, Vadim , IVANOV, Vladimir , KOSHELEV, Konstantin, , KRIVTSUN, Vladimir , GLUSHKOV, Denis
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , H05G2/003
摘要： An EUV radiation source comprising a fuel supply ( 200 ) configured to deliver a droplet of fuel to a plasma generation location ( 201 ), a first laser beam source configured to provide a first beam of laser radiation ( 205 ) incident upon the fuel droplet at the plasma generation location and thereby vaporizes the fuel droplet, and a second laser beam source configured to subsequently provide a second beam of laser radiation ( 205 ) at the plasma generation location, the second beam of laser radiation being configured to vaporize debris particles ( 252 ) arising from incomplete vaporization of the fuel droplet.
摘要翻译： EUV辐射源包括被配置为将等离子体产生位置（201）的燃料液滴输送的燃料供应（200），第一激光束源被配置为提供入射到燃料液滴上的第一激光辐射束（205）等离子体产生位置，从而使燃料液滴蒸发，以及第二激光束源，其被配置为随后在等离子体产生位置提供第二激光辐射束（205），第二激光束被配置为使碎片颗粒（252 ）由燃料液滴的不完全蒸发引起。

13. 发明申请

WO2011072905A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2011072905A1
公开(公告)日：2011-06-23
申请号：PCT/EP2010/065406
申请日：2010-10-14
申请人： ASML NETHERLANDS B.V. , SCACCABAROZZI, Luigi , BANINE, Vadim , IVANOV, Vladimir , YAKUNIN, Andrei
发明人： SCACCABAROZZI, Luigi , BANINE, Vadim , IVANOV, Vladimir , YAKUNIN, Andrei
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/7085 , G03F7/70866
摘要： Thermal radiation from a path of a patterned beam is detected. Particles in the path of the patterned beam heat up quickly and radiate energy at a wavelength shorter than that of a surrounding environment. Thus, by detecting the thermal radiation it is possible to detect any particles in the path of the projection beam. If particles are detected, a mask can be sealed or removed, such that particles will not adhere to it.
摘要翻译：检测来自图案化光束的路径的热辐射。图案化光束的路径中的粒子快速加热，并以比周围环境的波长短的波长辐射能量。因此，通过检测热辐射，可以检测投影光束的路径中的任何粒子。如果检测到颗粒，则可以密封或去除掩模，使得颗粒不会粘附到其上。

14. 发明申请

WO2010034789A1 PROTEASE INHIBITORS 审中-公开
标题翻译： PROTEASE抑制剂
公开(公告)号：WO2010034789A1
公开(公告)日：2010-04-01
申请号：PCT/EP2009/062407
申请日：2009-09-24
申请人： Medivir AB , IVANOV, Vladimir , SAMUELSSON, Bertil , JOHANSSON, Per-Ola , KAHNBERG, Pia , WÄHLING, Horst
发明人： IVANOV, Vladimir , SAMUELSSON, Bertil , JOHANSSON, Per-Ola , KAHNBERG, Pia , WÄHLING, Horst
IPC分类号： C07D491/048 , A61K31/496 , A61P19/00
CPC分类号： C07D491/048
摘要： Compounds of the formula II, wherein R 3 is C 1 -C 3 alkyl or C 3 -C 6 cycloalkyl, either of which is optionally substituted with one or two methyl and/or a fluoro, trifluoromethyl or methoxy, when R 3 is C 3 -C 6 cycloalkyl it may alternatively be gem substituted with fluoro; R 4 is methyl or fluoro; m is 0, 1 or 2; E is a bond, or thiazolyl, optionally substituted with methyl or fluoro; A 1 is CH or N, A 2 is CR 6 R 7 or NR 6 , provided at least one of A 1 and A 2 comprises N; n is 0 or 1 such that the ring containing A 1 and A 2 is a saturated, nitrogen-containing ring of 5 or 6 ring atoms; R 6 is H, C 1 -C 4 alkyl, C 1 -C 4 haloalkyl, C 1 -C 3 alkyl-O-C 1 -C 3 alkyl, or when A 2 is C, R 6 can also be C 1 -C 4 alkoxy or F; R 7 is H, C 1 -C 4 alkyl or F; or a pharmaceutically acceptable salt, N-oxide or hydrate thereof, have utility in the treatment of disorders characterized by inappropriate expression or activation of cathepsin K, such as osteoporosis, osteoarthritis, rheumatoid arthritis or bone metastases.
摘要翻译：其中R 3为C 1 -C 3烷基或C 3 -C 6环烷基，其中R 3为C 3 -C 6环烷基时，任选被一个或两个甲基和/或氟，三氟甲基或甲氧基取代，被氟取代; R4是甲基或氟; m为0,1或2; E是任选被甲基或氟取代的键或噻唑基; A1是CH或N，A2是CR6R7或NR6，条件是A1和A2中的至少一个包括N; n为0或1，使得含有A 1和A 2的环是5或6个环原子的饱和的含氮环; R6是H，C1-C4烷基，C1-C4卤代烷基，C1-C3烷基-O-C1-C3烷基，或当A2是C时，R6也可以是C1-C4烷氧基或F; R 7为H，C 1 -C 4烷基或F; 或其药学上可接受的盐，N-氧化物或其水合物，可用于治疗组织蛋白酶K不适当表达或活化的疾病，例如骨质疏松症，骨关节炎，类风湿性关节炎或骨转移。

15. 发明申请

WO2010018039A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：WO2010018039A1
公开(公告)日：2010-02-18
申请号：PCT/EP2009/058898
申请日：2009-07-13
申请人： ASML NETHERLANDS B.V. , KEMPEN, Antonius , BANINE, Vadim , IVANOV, Vladimir , LOOPSTRA, Erik
发明人： KEMPEN, Antonius , BANINE, Vadim , IVANOV, Vladimir , LOOPSTRA, Erik
IPC分类号： G03F7/20 , G21K1/00
CPC分类号： G03F7/2008 , G03F7/70575 , G03F7/70916 , G03F7/70925 , G03F7/70983 , G21K1/00
摘要： A lithographic apparatus includes a source configured to generate a radiation beam comprising desired radiation and undesired radiation using a plasma, an illumination system configured to condition the radiation beam and to receive hydrogen gas during operation of the lithographic apparatus, and a support structure constructed to hold a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus is configured such that the radiation beam on entering the projection system includes at least 50% of the undesired radiation that is generated by the plasma and includes wavelengths of radiation that interact with the hydrogen gas to generate hydrogen radicals.
摘要翻译：光刻设备包括被配置为产生包含期望辐射和使用等离子体的不期望辐射的辐射束的源，被配置为调节辐射束并在光刻设备的操作期间接收氢气的照明系统，以及构造成保持图案形成装置。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。衬底台被构造成保持衬底，并且投影系统被配置为将图案化的辐射束投影到衬底的目标部分上。光刻设备被配置为使得进入投影系统的辐射束包括由等离子体产生的不期望辐射的至少50％，并且包括与氢气相互作用以产生氢自由基的辐射波长。

16. 发明申请

WO2006034562A1 CASCADED PUMP DELIVERY FOR REMOTELY PUMPED ERBIUM-DOPED FIBER AMPLIFIERS 审中-公开
标题翻译：远程泵浦ERBIUM-DOPED光纤放大器的泵浦泵送
公开(公告)号：WO2006034562A1
公开(公告)日：2006-04-06
申请号：PCT/CA2004/001754
申请日：2004-09-28
申请人： MPB COMMUNICATIONS INC. , PAPERNYI, Serguei , KARPOV, Vladimir , IVANOV, Vladimir , CLEMENTS, Wallace
发明人： PAPERNYI, Serguei , KARPOV, Vladimir , IVANOV, Vladimir , CLEMENTS, Wallace
IPC分类号： H04B10/17
CPC分类号： H04B10/291 , H04B10/2916
摘要： A method for pumping remote optically-pumped fiber amplifiers (ROPAs) in fiberoptic telecommunication systems is disclosed which uses cascaded Raman amplification to increase the maximum amount of pump power that can be delivered to the ROPA. According to the prior art, high power at the ROPA pump wavelength, λp, is launched directly into the fiber and the maximum launch power is limited by the onset of pump depletion by Raman noise and oscillations due to the high Raman gain at ~(λp +100) nm. In preferred embodiments of the present invention, a `primary' pump source of wavelength shorter than λp is launched into the delivery fiber along with two or more significantly lower-power `seed' sources, among which is included one at λp. The wavelength and power of the seed source(s) are chosen such that, when combined with the high-power primary source, a series, n, where n ≥ 2, of Raman conversions within the fiber ultimately leads to the development of high power at λp. In another embodiment, one or more of the seed sources at wavelengths shorter than λp are replaced by reflecting means to return, into the fiber, backward-travelling amplified spontaneous Raman scattered light resulting from high power in the fiber at a wavelength one Raman shift below the particular seed wavelength. In either case, the high power at λp is developed over a distributed length of the fiber, reaching its maximum some distance into the fiber and exceeding the maximum power possible at that point with the prior art.
摘要翻译：公开了一种用于在光纤通信系统中泵送远程光泵浦光纤放大器（ROPA）的方法，该方法使用级联拉曼放大来增加可传递给ROPA的最大泵浦功率量。根据现有技术，ROPA泵浦波长λp处的高功率直接发射到光纤中，并且最大发射功率受到拉曼噪声泵浦耗尽的开始和由于〜（？p + 100）nm。在本发明的优选实施例中，波长小于λp的“初级”泵浦源与两个或多个明显较低功率的“种子”源一起发射到输送光纤中，其中包括一个在pp。种子源的波长和功率被选择为使得当与高功率初级源组合时，光纤内的拉曼转换的n系列n（n）最终导致高功率的发展在？在另一实施例中，波长小于λp的一个或多个种子源被反射装置所取代，以将光纤中的大功率产生的向后行进放大的自发拉曼散射光以波长一拉曼平移低于特定的种子波长。在任一种情况下，在pp上的高功率在光纤的分布长度上显影，达到其最大距离到光纤并且超过现有技术在该点可能的最大功率。

17. 发明申请

WO2003047336A2 TRANSGENIC ANIMALS BEARING HUMAN Igλ LIGHT CHAIN GENES 审中-公开
标题翻译：携带人Igλ光链基因的转基因动物
公开(公告)号：WO2003047336A2
公开(公告)日：2003-06-12
申请号：PCT/US2002/038245
申请日：2002-11-27
申请人： ABGENIX, INC. , GREEN, Larry, L. , IVANOV, Vladimir
发明人： GREEN, Larry, L. , IVANOV, Vladimir
IPC分类号： A01K
CPC分类号： C12N15/8509 , A01K67/0278 , A01K2207/15 , A01K2217/00 , A01K2217/05 , A01K2217/052 , A01K2217/075 , A01K2217/15 , A01K2227/105 , A01K2267/01 , A01K2267/0381 , C07K16/00 , C07K16/24 , C07K2317/21 , C12N2800/206
摘要： The invention relates to transgenic animals bearing one or more human λ light chain loci. The invention also relates to methods and compositions for making transgenic animals that have incorporated human λ light chain loci. The invention further relates to methods of using and compositions derived from the transgenic animals that have incorporated human λ light chain loci.
摘要翻译：本发明涉及带有一个或多个人λ轻链基因座的转基因动物。本发明还涉及用于制备已经掺入人λ轻链基因座的转基因动物的方法和组合物。本发明还涉及使用衍生自已经掺入人λ轻链基因座的转基因动物的方法和组合物。

18. 发明申请

WO2011110467A2 SYSTEM FOR REMOVING CONTAMINANT PARTICLES, LITHOGRAPHIC APPARATUS, METHOD FOR REMOVING CONTAMINANT PARTICLES AND METHOD FOR MANUFACTURING A DEVICE 审中-公开
标题翻译：用于除去污染物颗粒的系统，光刻设备，去除污染物颗粒的方法和制造设备的方法
公开(公告)号：WO2011110467A2
公开(公告)日：2011-09-15
申请号：PCT/EP2011/053171
申请日：2011-03-03
申请人： ASML Netherlands B.V. , IVANOV, Vladimir , ANTSIFEROV, Pavel , SIDELNIKOV, Yurii , SCACCABAROZZI, Luigi , NEERHOF, Hendrik , YAKUNIN, Andrei
发明人： IVANOV, Vladimir , ANTSIFEROV, Pavel , SIDELNIKOV, Yurii , SCACCABAROZZI, Luigi , NEERHOF, Hendrik , YAKUNIN, Andrei
IPC分类号： G03F7/20
CPC分类号： G03F7/70916
摘要： A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.
摘要翻译：提供了一种用于从EUV辐射束的路径去除污染物颗粒的系统，其中至少第一AC电压被提供给EUV辐射束的路径的相对侧上的一对电极，作为第一级作为电压状态的第二阶段，向电极提供直流电压。

19. 发明申请

WO2010070615A1 CYSTEINE PROTEASE INHIBITORS 审中-公开
标题翻译： CYSTEINE PROTEASE抑制剂
公开(公告)号：WO2010070615A1
公开(公告)日：2010-06-24
申请号：PCT/IB2009/055839
申请日：2009-12-18
申请人： MEDIVIR UK LTD , AYESA, Susana , BELFRAGE, Anna, Karin , CLASSON, Björn , GRABOWSKA, Urszula , HEWITT, Ellen , IVANOV, Vladimir , Jönsson, Daniel , KAHNBERG, Pia , LIND, Peter , NILSSON, Magnus , ODÉN, Lourdes , PELCMAN, Mikael , WÄHLING, Horst
发明人： AYESA, Susana , BELFRAGE, Anna, Karin , CLASSON, Björn , GRABOWSKA, Urszula , HEWITT, Ellen , IVANOV, Vladimir , Jönsson, Daniel , KAHNBERG, Pia , LIND, Peter , NILSSON, Magnus , ODÉN, Lourdes , PELCMAN, Mikael , WÄHLING, Horst
IPC分类号： C07D295/20 , A61K31/145 , A61K31/16 , A61K31/341 , A61K31/343 , A61K31/415 , A61K31/4965 , A61K31/5375 , A61P11/00 , A61P17/06 , A61P37/00 , C07C215/20 , C07C235/74 , C07C311/21 , C07D213/71 , C07D215/20 , C07D231/12 , C07D231/40 , C07D233/64 , C07D239/80 , C07D241/12 , C07D275/00 , C07D275/03 , C07D307/46 , C07D307/80
CPC分类号： C07C311/21 , C07C237/24 , C07C271/24 , C07C2601/02 , C07C2601/04 , C07C2601/06 , C07C2601/08 , C07D207/34 , C07D213/40 , C07D213/71 , C07D231/14 , C07D231/40 , C07D239/80 , C07D241/24 , C07D277/36 , C07D277/56 , C07D295/215 , C07D307/68 , C07D307/85 , C07D401/12 , C07D403/12 , C07D405/12 , C07D417/12
摘要： Compounds of the formula I wherein R 1a is H; and R 1b is C 1 -C 6 alkyl, Carbocyclyl or Het; or R 1a and R 1b together define a saturated cyclic amine with 3-6 ring atoms; R 2a and R 2b are H, halo, C 1 -C 4 alkyl, C 1 -C 4 haloalkyl, C 1 -C 4 alkoxy; or R 2a and R 2b together with the carbon atom to which they are attached form a C 3 -C 6 cycloalkyl; R is a branched C 5 -C 10 alkyl chain, C 2 -C 4 haloalkyl or C 3 -C 7 cycloalkylmethyl, R 4 is Het, Carbocyclyl, optionally substituted as defined in the specification and pharmaceutically acceptable salts, hydrates and N-oxides thereof; are inhibitors of cathepsin S and have utility in the treatment of psoriasis, autoimmune disorders and other disorders such as asthma, arteriosclerosis, COPD and chronic pain
摘要翻译：式Ⅰ化合物，其中R1a是H; 并且R 1b是C 1 -C 6烷基，碳环或Het; 或R 1a和R 1b一起限定具有3-6个环原子的饱和环胺; R2a和R2b是H，卤素，C1-C4烷基，C1-C4卤代烷基，C1-C4烷氧基; 或R 2a和R 2b与它们所连接的碳原子一起形成C 3 -C 6环烷基; R是支链C 5 -C 10烷基链，C 2 -C 4卤代烷基或C 3 -C 7环烷基甲基，R 4是Het，碳环基，如说明书中所定义的任选取代，以及其药学上可接受的盐，水合物和N-氧化物; 是组织蛋白酶S的抑制剂，并且可用于治疗牛皮癣，自身免疫性疾病和其它疾病如哮喘，动脉硬化，COPD和慢性疼痛

20. 发明申请

WO2010028899A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：辐射源和光刻设备
公开(公告)号：WO2010028899A1
公开(公告)日：2010-03-18
申请号：PCT/EP2009/059337
申请日：2009-07-21
申请人： ASML NETHERLANDS B.V. , YAKUNIN, Andrei , BANINE, Vadim , IVANOV, Vladimir , LOOPSTRA, Erik , KRIVTSUN, Vladimir , SWINKELS, Gerardus , LABETSKI, Dzmitry
发明人： YAKUNIN, Andrei , BANINE, Vadim , IVANOV, Vladimir , LOOPSTRA, Erik , KRIVTSUN, Vladimir , SWINKELS, Gerardus , LABETSKI, Dzmitry
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H05G2/003
摘要： A radiation source (SO) is configured to generate extreme ultraviolet radiation. The radiation source (SO) includes a plasma formation site (2) located at a position in which a fuel will be contacted by a beam of radiation (5) to form a plasma, an outlet (16) configured to allow gas to exit the radiation source (SO), and a contamination trap (23) at least partially- located inside the outlet (16). The contamination trap is configured to trap (23) debris particles that are generated with the formation of the plasma.
摘要翻译：辐射源（SO）被配置为产生极紫外辐射。辐射源（SO）包括位于燃料将被辐射束（5）接触以形成等离子体的位置的等离子体形成位置（2），被配置为允许气体离开辐射源（SO）和至少部分地位于出口（16）内部的污染物捕集器（23）。污染阱被配置成捕获（23）形成等离子体时产生的碎屑颗粒。

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