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1. 发明申请

WO2013029906A1 RADIATION SOURCE 审中-公开
标题翻译：辐射源
公开(公告)号：WO2013029906A1
公开(公告)日：2013-03-07
申请号：PCT/EP2012/065037
申请日：2012-08-01
申请人： ASML NETHERLANDS B.V. , YAKUNIN, Andrei , IVANOV, Vladimir , VAN SCHOOT, Jan , KRIVTSUN, Vladimir , SWINKELS, Gerardus , MEDVEDEV, Viacheslav
发明人： YAKUNIN, Andrei , IVANOV, Vladimir , VAN SCHOOT, Jan , KRIVTSUN, Vladimir , SWINKELS, Gerardus , MEDVEDEV, Viacheslav
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A radiation source (60) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets (62) along a trajectory (64) towards a plasma formation location (66). The radiation source is configured to receive a first amount of radiation (68) such that the first amount of radiation is incident on a fuel droplet (62a) at the plasma formation location, and such that the first amount of radiation transfers energy into the fuel droplet to generate a modified fuel distribution (70), the modified fuel distribution having a surface. The radiation source is also configured to receive a second amount of radiation (72) such that the second amount of radiation is incident on a portion of the surface (70a) of the modified fuel distribution, the second amount of radiation having a p-polarized component with respect to the portion of the surface; and such that the second amount of radiation transfers energy to the modified fuel distribution to generate a radiation generating plasma, the radiation generating plasma emitting a third amount of radiation (74). The radiation source further comprises a collector (CO) configured to collect and direct at least a portion of the third amount of radiation. The radiation source is configured such that the second amount of radiation propagates in a first direction, the first direction being non-parallel to a normal to the portion of the surface of the modified fuel distribution.
摘要翻译：适于向光刻设备的照明器提供辐射束的辐射源（60）。辐射源包括被配置为沿着轨迹（64）将燃料液滴（62）流引向等离子体形成位置（66）的喷嘴。辐射源被配置为接收第一量的辐射（68），使得第一量的辐射入射在等离子体形成位置处的燃料液滴（62a）上，并且使得第一量的辐射将能量转移到燃料液滴以产生改进的燃料分配（70），所述改进的燃料分布具有表面。辐射源还被配置为接收第二数量的辐射（72），使得第二量的辐射入射在改性燃料分布的表面（70a）的一部分上，第二量的辐射具有p偏振相对于表面的部分; 并且使得第二量的辐射将能量传递到经修改的燃料分布以产生辐射产生等离子体，该辐射产生等离子体发射第三量的辐射（74）。辐射源还包括收集器（CO），其被配置成收集并引导第三量的辐射的至少一部分。辐射源被配置成使得第二数量的辐射在第一方向上传播，第一方向不平行于改性燃料分布的表面部分的法线。

2. 发明申请

WO2009116867A3 A TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD USING THE SAME 审中-公开
标题翻译：目标材料，源，EUV光刻设备和使用其的器件制造方法
公开(公告)号：WO2009116867A3
公开(公告)日：2009-11-12
申请号：PCT/NL2009050132
申请日：2009-03-20
申请人： ASML NETHERLANDS BV , KRIVTSUN VLADIMIR MIHAILOVITC , BANINE VADIM YEVGENYEVICH , BLEEKER ARNO JAN , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , MOORS JOHANNES HUBERTUS JOSEPH , CHURILOV SERGEY , GLUSHKOV DENIS
发明人： KRIVTSUN VLADIMIR MIHAILOVITC , BANINE VADIM YEVGENYEVICH , BLEEKER ARNO JAN , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVITCH , MOORS JOHANNES HUBERTUS JOSEPHINA , CHURILOV SERGEY , GLUSHKOV DENIS
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in a 6.8 nm range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd, or Tb, or a Tb-based composition configured to reduce a melting temperature of Tb.
摘要翻译：目标材料被配置为用于构造和布置成产生具有6.8nm范围波长的辐射束的源。目标材料包括配置成改变Gd或Tb的熔融温度的Gd基组合物或构造成降低Tb的熔融温度的Tb基组合物。

3. 发明申请

WO2009129960A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING SYSTEM AND METHOD FOR CLEANING A PATTERNING DEVICE 审中-公开
标题翻译：液晶显示装置，装置制造方法，清洁装置的清洁系统和方法
公开(公告)号：WO2009129960A1
公开(公告)日：2009-10-29
申请号：PCT/EP2009/002782
申请日：2009-04-16
申请人： ASML NETHERLANDS B. V., , SCACCABAROZZI, Luigi , IVANOV, Vladimir, Vitalevitch , KOSHELEV, Konstantin, Nikolaevich , MOORS, Johannes, Hubertus, Josephina , STEVENS, Lucas, Henricus, Johannes , ANTSIFEROV, Pavel, Stanislavovich , KRIVTSUN, Vladimir, Mihailovitch , DOROKHIN, Leonid, Alexandrovich , VAN KAMPEN, Maarten
发明人： SCACCABAROZZI, Luigi , IVANOV, Vladimir, Vitalevitch , KOSHELEV, Konstantin, Nikolaevich , MOORS, Johannes, Hubertus, Josephina , STEVENS, Lucas, Henricus, Johannes , ANTSIFEROV, Pavel, Stanislavovich , KRIVTSUN, Vladimir, Mihailovitch , DOROKHIN, Leonid, Alexandrovich , VAN KAMPEN, Maarten
IPC分类号： G03F7/20
CPC分类号： G03F7/70925
摘要： A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。图案形成装置被配置为向辐射束施加图案。该装置包括图案形成装置清洁系统，该图案形成装置清洁系统被配置为向图案形成装置上的污染物颗粒提供静电力，并且由辐射束对其进行带电，以便从图案形成装置移除污染物颗粒。

4. 发明申请

WO2010028899A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：辐射源和光刻设备
公开(公告)号：WO2010028899A1
公开(公告)日：2010-03-18
申请号：PCT/EP2009/059337
申请日：2009-07-21
申请人： ASML NETHERLANDS B.V. , YAKUNIN, Andrei , BANINE, Vadim , IVANOV, Vladimir , LOOPSTRA, Erik , KRIVTSUN, Vladimir , SWINKELS, Gerardus , LABETSKI, Dzmitry
发明人： YAKUNIN, Andrei , BANINE, Vadim , IVANOV, Vladimir , LOOPSTRA, Erik , KRIVTSUN, Vladimir , SWINKELS, Gerardus , LABETSKI, Dzmitry
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H05G2/003
摘要： A radiation source (SO) is configured to generate extreme ultraviolet radiation. The radiation source (SO) includes a plasma formation site (2) located at a position in which a fuel will be contacted by a beam of radiation (5) to form a plasma, an outlet (16) configured to allow gas to exit the radiation source (SO), and a contamination trap (23) at least partially- located inside the outlet (16). The contamination trap is configured to trap (23) debris particles that are generated with the formation of the plasma.
摘要翻译：辐射源（SO）被配置为产生极紫外辐射。辐射源（SO）包括位于燃料将被辐射束（5）接触以形成等离子体的位置的等离子体形成位置（2），被配置为允许气体离开辐射源（SO）和至少部分地位于出口（16）内部的污染物捕集器（23）。污染阱被配置成捕获（23）形成等离子体时产生的碎屑颗粒。

5. 发明申请

WO2010028704A1 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：辐射系统和光刻设备
公开(公告)号：WO2010028704A1
公开(公告)日：2010-03-18
申请号：PCT/EP2009/003135
申请日：2009-04-30
申请人： ASML NETHERLANDS B.V. , BANINE, Vadim, Yevgenyevich , LOOPSTRA, Erik, Roelof , IVANOV, Vladimir Vitalevich , KRIVTSUN, Vladimir Mihailovitch
发明人： BANINE, Vadim, Yevgenyevich , LOOPSTRA, Erik, Roelof , IVANOV, Vladimir Vitalevich , KRIVTSUN, Vladimir Mihailovitch
IPC分类号： G03F7/20 , G21K1/00
CPC分类号： G03F7/70916 , G03F7/70175 , G03F7/70858 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source (50) configured to generate a plasma that emits radiation and debris, and a radiation collector (70) configured to direct collected radiation to a radiation beam emission aperture (60). A magnetic field generator (200) is configured to generate a magnetic field with a gradient in magnetic "field strength to direct the plasma away from the radiation collector (70).
摘要翻译：辐射系统被配置为产生辐射束。辐射系统包括被配置为产生发射辐射和碎片的等离子体的辐射源（50）和被配置为将收集的辐射引导到辐射束发射孔径（60）的辐射收集器（70）。磁场发生器（200）被配置为产生具有磁场强度梯度的磁场，以使等离子体远离辐射收集器（70）。

6. 发明申请

WO2009020390A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2009020390A1
公开(公告)日：2009-02-12
申请号：PCT/NL2008/050536
申请日：2008-08-05
申请人： ASML NETHERLANDS B.V. , IVANOV, Vladimir Vitalevitch , BANINE, Vadim Yevgenyevich , KOSHELEV, Konstantin Nikolaevitch , KRIVTSUN, Vladimir Mihailovitch
发明人： IVANOV, Vladimir Vitalevitch , BANINE, Vadim Yevgenyevich , KOSHELEV, Konstantin Nikolaevitch , KRIVTSUN, Vladimir Mihailovitch
IPC分类号： H05G2/00
CPC分类号： H05H1/24 , B82Y10/00 , G03F7/70033 , H05G2/003
摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.
摘要翻译：光刻系统包括被配置为产生辐射的源，所述源包括阴极和阳极，所述阴极和阳极被配置为在位于放电空间中的燃料中产生放电以产生等离子体，所述放电空间包括在使用中，配置成调整等离子体的辐射发射以控制由等离子体限定的体积的物质; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置为对所述辐射进行图案化以形成图案化的辐射束; 衬底支撑件，其构造成支撑衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板上。

7. 发明申请

WO2007129891A1 RADIATION GENERATING DEVICE, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY 审中-公开
标题翻译：辐射发生器件，光刻设备，器件制造方法及其制造的器件
公开(公告)号：WO2007129891A1
公开(公告)日：2007-11-15
申请号：PCT/NL2007/050187
申请日：2007-04-27
申请人： ASML NETHERLANDS B.V. , IVANOV, Vladimir Vitalevitch , BANINE, Vadim Yevgenyevich , KRIVTSUN, Vladimir Mihailovitch
发明人： IVANOV, Vladimir Vitalevitch , BANINE, Vadim Yevgenyevich , KRIVTSUN, Vladimir Mihailovitch
IPC分类号： H05G2/00 , G03F7/20 , H01J1/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： An apparatus for producing radiation by an electrically operated discharge has a first electrode (generated by nozzle 21a), a second electrode, and a capacitor bank (24). The electrodes are configured at a distance from each other which allows plasma ignition. The capacitor bank is electrically connected at a first terminal (A) to the first electrode and at a second terminal (B) to the second electrode, and configured to store a discharge energy. The electrodes and the capacitor bank form an electric circuit. At least the first electrode is formed by an electrically conducting fluid supplied via a first feeding line (45). The apparatus further has a charger (51) and a first high inductance unit (50). The charger is connected to at least one of the terminals. The first high inductance unit is provided upstream the first terminal in the first feeding line for electrically decoupling the electric circuit.
摘要翻译：通过电动放电产生辐射的装置具有第一电极（由喷嘴21a产生），第二电极和电容器组（24）。电极被配置成彼此间隔开，这允许等离子体点火。电容器组在第一端子（A）处电连接到第一电极，并且在第二端子（B）处电连接到第二电极，并且被配置为存储放电能量。电极和电容器组形成电路。至少第一电极由经由第一馈电线（45）供应的导电流体形成。该装置还具有充电器（51）和第一高感应单元（50）。充电器连接到至少一个端子。第一高电感单元设置在第一馈电线路中的第一端子的上游，用于电隔离电路。

8. 发明申请

WO2011124434A1 EUV RADIATION SOURCE AND EUV RADIATION GENERATION METHOD 审中-公开
标题翻译： EUV辐射源和EUV辐射发生方法
公开(公告)号：WO2011124434A1
公开(公告)日：2011-10-13
申请号：PCT/EP2011/053432
申请日：2011-03-08
申请人： ASML NETHERLANDS B.V. , YAKUNIN, Andrei , BANINE, Vadim , IVANOV, Vladimir , KOSHELEV, Konstantin, , KRIVTSUN, Vladimir , GLUSHKOV, Denis
发明人： YAKUNIN, Andrei , BANINE, Vadim , IVANOV, Vladimir , KOSHELEV, Konstantin, , KRIVTSUN, Vladimir , GLUSHKOV, Denis
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , H05G2/003
摘要： An EUV radiation source comprising a fuel supply ( 200 ) configured to deliver a droplet of fuel to a plasma generation location ( 201 ), a first laser beam source configured to provide a first beam of laser radiation ( 205 ) incident upon the fuel droplet at the plasma generation location and thereby vaporizes the fuel droplet, and a second laser beam source configured to subsequently provide a second beam of laser radiation ( 205 ) at the plasma generation location, the second beam of laser radiation being configured to vaporize debris particles ( 252 ) arising from incomplete vaporization of the fuel droplet.
摘要翻译： EUV辐射源包括被配置为将等离子体产生位置（201）的燃料液滴输送的燃料供应（200），第一激光束源被配置为提供入射到燃料液滴上的第一激光辐射束（205）等离子体产生位置，从而使燃料液滴蒸发，以及第二激光束源，其被配置为随后在等离子体产生位置提供第二激光辐射束（205），第二激光束被配置为使碎片颗粒（252 ）由燃料液滴的不完全蒸发引起。

9. 发明申请

WO2011117009A1 LITHOGRAPHIC APPARATUS AND SPECTRAL PURITY FILTER 审中-公开
标题翻译：光刻设备和光谱滤光片
公开(公告)号：WO2011117009A1
公开(公告)日：2011-09-29
申请号：PCT/EP2011/051546
申请日：2011-02-03
申请人： ASML NETHERLANDS B.V. , MEDVEDEV, Viacheslav , BANINE, Vadim , KRIVTSUN, Vladimir , SOER, Wouter , YAKUNIN, Andrei
发明人： MEDVEDEV, Viacheslav , BANINE, Vadim , KRIVTSUN, Vladimir , SOER, Wouter , YAKUNIN, Andrei
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/70575 , B82Y10/00 , G21K1/062 , G21K2201/061
摘要： A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi layer mirror structure and the one or more additional layers, are configured such that radiation of the second wavelength which is reflected from a surface of the reflector interferes in a destructive manner with radiation of the second wavelength which is reflected from within the reflector.
摘要翻译：反射器包括被配置为反射第一波长的辐射和一个或多个附加层的多层反射镜结构。在多层反射镜结构和一个或多个附加层的第二波长处的吸光度和折射率以及多层反射镜结构和一个或多个附加层的厚度被配置为使得第二波长的辐射从反射器的表面反射以破坏性方式干涉从反射器内反射的第二波长的辐射。

10. 发明申请

WO2009083175A1 EXTREME ULTRAVIOLET RADIATION SOURCE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION 审中-公开
标题翻译：极端超紫外线辐射源和生产超极紫外线辐射的方法
公开(公告)号：WO2009083175A1
公开(公告)日：2009-07-09
申请号：PCT/EP2008/010886
申请日：2008-12-19
申请人： ASML NETHERLANDS B.V. , SIDELNIKOV, Yurii, Victorovitch , BANINE, Valdim, Yevgenyevich , KOSHELEV, Konstantin, Nikolaevich , FRIJNS, Olav, Waldemar, Vladimir , KRIVTSUN, Vladimir, Mihailovitch
发明人： SIDELNIKOV, Yurii, Victorovitch , BANINE, Valdim, Yevgenyevich , KOSHELEV, Konstantin, Nikolaevich , FRIJNS, Olav, Waldemar, Vladimir , KRIVTSUN, Vladimir, Mihailovitch
IPC分类号： H05G2/00
CPC分类号： H05G2/003
摘要： A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about (1) Pa and about (10) Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium.
摘要翻译：辐射源被构造和布置成产生极紫外辐射。辐射源包括腔室，至少部分地容纳在腔室中的第一电极，至少部分地容纳在腔室中的第二电极，以及构造和布置成向腔室提供放电气体的供应源。第一电极和第二电极被配置为在放电气体中产生放电以形成等离子体，以产生极紫外辐射。源还包括构造和布置成在靠近放电的位置处提供在约（1）Pa和约（10）Pa之间的分压的气体的气体供应。气体选自氢，氦和氢和氦的混合物。

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