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11. 发明申请

WO2007067304A3 LIGHT CAPTURE WITH PATTERNED SOLAR CELL BUS WIRES 审中-公开
公开(公告)号：WO2007067304A3
公开(公告)日：2007-06-14
申请号：PCT/US2006/043877
申请日：2006-11-10
申请人： MASSACHUSETTS INSTITUTE OF TECHNOLOGY , SACHS, Emanuel, M.
发明人： SACHS, Emanuel, M.
IPC分类号： H01L31/04
摘要： Crystalline silicon PV modules typically use tinned flat copper wire to increase the conductivity of a bus bar metallization and to interconnect to adjacent cells. Such a flat bus wire may be patterned with shallow v-shaped grooves using metal forming techniques, such as rolling, stamping and drawing. The grooves are designed so that incident light is reflected up toward the glass superstrate of t module at an internal interface angle that is large enough (typically greater than about 40°) so that the light undergoes total internal reflection at the glass-air interface and is reflected onto the solar cell. Grooves can be lengthwise along the conductor, or at an angle, angles. Rather than grooves, inclined faces can form pyramids, or other shapes.

12. 发明申请

WO2005114322A2 MANUFACTURING PROCESS, SUCH AS THREE-DIMENSIONAL PRINTING, INCLUDING SOLVENT VAPOR FILMING AND THE LIKE 审中-公开
标题翻译：制造工艺，如三维打印，包括溶剂蒸气包装和类似
公开(公告)号：WO2005114322A2
公开(公告)日：2005-12-01
申请号：PCT/US2005/016698
申请日：2005-05-12
申请人： MASSACHUSETTS INSTITUTE OF TECHNOLOGY , SERDY, James, G. , SACHS, Emanuel, M.
发明人： SERDY, James, G. , SACHS, Emanuel, M.
IPC分类号： G03C1/00
CPC分类号： A61L27/56 , A61F2/28 , A61F2002/30062 , A61F2002/30224 , A61F2002/30225 , A61F2002/30785 , A61F2002/30985 , A61F2210/0004 , A61F2230/0069 , A61F2310/00293 , A61F2310/00353 , A61L27/54 , A61L2300/412 , A61L2300/434 , A61L2300/602 , B33Y10/00 , B33Y70/00 , B33Y80/00 , Y10T428/15 , Y10T428/24273 , Y10T428/31504
摘要： Methods of manufacturing an article use three-dimensional printing for a portion of the manufacturing. Three-dimensionally printing is conducted onto a powder bed which contains both organic-solvent-soluble, water-insoluble particles and water soluble, organic-solvent-insoluble particles. The water-soluble particles which may be selected for properties such as size and may include more than one substance. The organic-solvent-insoluble particles may further include at least one substantially insoluble substance such as a member of the calcium phosphate family. Printing may be done using an aqueous binder liquid. After removal of unbound powder, the preform may be exposed to the vapor of an organic solvent which causes the particles of organic-soluble-polymer to fuse to each other. This may further be followed by dissolving out the water-soluble particles, if such particles were present in the powder. Solvent vapor fusing together with the use of porogen particles may also be used in manufacturing methods other than 3DP. Rather than using organic solvent, heat responsive particles can be used, and can be filmed by elevated temperatures. Articles that may be produced by the described methods exhibit features such as a high porosity and an ability to undergo large deformations without breaking, and by at least partial springback from such deformation. The springback may be substantially instantaneous or may be time-dependent involving a time period of at least several seconds.
摘要翻译：制造制品的方法在制造的一部分中使用三维印刷。将三维打印进行到含有有机溶剂可溶性，水不溶性颗粒和水溶性有机溶剂不溶性颗粒的粉末床上。可以选择尺寸等性质的水溶性颗粒，并且可以包括多于一种物质。有机溶剂不溶性颗粒可以进一步包括至少一种基本上不溶的物质，例如磷酸钙族的成员。可以使用水性粘合剂液体进行印刷。在去除未结合的粉末之后，预制件可能暴露于有机溶剂的蒸气中，这导致有机可溶聚合物颗粒彼此熔合。如果这种颗粒存在于粉末中，则可以进一步溶解水溶性颗粒。与使用致孔剂颗粒一起使用的溶剂蒸汽熔融也可用于3DP以外的制造方法。不使用有机溶剂，可以使用热响应颗粒，并且可以通过升高的温度进行成膜。可以通过所述方法产生的制品表现出诸如高孔隙率和经受大变形而不断裂的能力以及至少部分回弹的特征。回弹可以基本上是瞬时的，或者可以是时间依赖性的，涉及至少几秒的时间段。

13. 发明申请

WO2005053883A2 INFILTRATING A POWDER METAL SKELETON BY A SIMILAR ALLOY WITH DEPRESSED MELTING POINT EXPLOITING A PERSISTENT LIQUID PHASE AT EQUILIBRIUM, SUITABLE FOR FABRICATING STEEL PARTS 审中-公开
标题翻译：通过类似合金渗透粉末冶金点渗透粉末金属表面，在均衡器上开发适用于制造钢件的均匀液相
公开(公告)号：WO2005053883A2
公开(公告)日：2005-06-16
申请号：PCT/US2004/039133
申请日：2004-11-22
申请人： MASSACHUSETTS INSTITUTE OF TECHNOLOGY , KERNAN, Brian, D. , SACHS, Emanuel, M. , ALLEN, Samuel, M. , LORENZ, Adam, M.
发明人： KERNAN, Brian, D. , SACHS, Emanuel, M. , ALLEN, Samuel, M. , LORENZ, Adam, M.
IPC分类号： B22F3/26
CPC分类号： C22C38/18 , B33Y80/00 , C22C33/0242
摘要： A steel powder metal skeleton is infiltrated with an infiltrant composition similar to the skeleton, with an additional agent that depresses the melting point of the infiltrant relative to the skeleton. Infiltration is driven primarily by capillary pressure. The powder and infiltrant compositions differ primarily only in a higher concentration of a melting point depressant agent "MPD" in the infiltrant. Carbon (C) and silicon (Si) and several other elements can be elements in an MPD, either alone or in combination. Certain steel target compositions are such that a complementary infiltrant, and skeleton can be chosen such that a skeleton will remain solid at an infiltration temperature at which the infiltrant can be melted and fully infiltrated, and further where there is a persistent two phase field, with a liquid phase that is large enough (greater than 7% vol, and typically between 20 and 40 volt) so that flow can be maintained without choke off from diffusional solidification. The solid and the liquid phases remaining after any diffusional solidification have different compositions, with a bulk composition of the target. Typically the difference is slight, and the full part is substantially homogeneous. Heat treating, such as austenitizing, quenching, or slow cooling and tempering, can improve homogeneity and mechanical properties. The MPD can have a relatively high diffusivity and solubility in the skeleton. Methods of designing systems of target, skeleton and infiltrant compositions and infiltration temperature are disclosed.
摘要翻译：钢粉末金属骨架用类似于骨架的渗透剂组合物渗透，另外一种可以降低渗透剂相对于骨架的熔点的试剂。渗透主要由毛细管压力驱动。粉末和渗透剂组合物主要仅在浸润剂中较高浓度的熔点降低剂“MPD”。碳（C）和硅（Si）等几种元素可以单独或组合使用在MPD中的元素。某些钢靶组合物使得可以选择互补的浸润剂和骨架，使得骨架将在浸润剂可以熔化和完全渗透的浸润温度下保持固体，并且进一步在存在持续的两相场的情况下，足够大的液相（大于7％体积，通常在20和40伏特之间），从而可以保持流动而不会阻碍扩散凝固。在任何扩散固化后残留的固体和液相具有不同的组成，具有靶的体积组成。通常，差异很小，整个部分基本上是均匀的。诸如奥氏体化，淬火或缓慢冷却和回火的热处理可以改善均匀性和机械性能。 MPD可以在骨架中具有相对较高的扩散性和溶解性。公开了设计目标，骨架和浸润剂组合物系统的方法和浸润温度。

14. 发明申请

WO2008100603A1 SOLAR CELLS WITH TEXTURED SURFACES 审中-公开
标题翻译：带有纹理表面的太阳能电池
公开(公告)号：WO2008100603A1
公开(公告)日：2008-08-21
申请号：PCT/US2008/002058
申请日：2008-02-15
申请人： MASSACHUSETTS INSTITUTE OF TECHNOLOGY , SACHS, Emanuel, M. , BREDT, James, F.
发明人： SACHS, Emanuel, M. , BREDT, James, F.
IPC分类号： H01L31/0352 , H01L31/00
CPC分类号： H01L31/02363 , C23C18/1607 , C23C18/1608 , C23C18/161 , C23C18/1635 , C23C18/1653 , C23C18/1692 , C23C18/1893 , C25D5/006 , C25D5/02 , C25D5/022 , C25D7/126 , H01L31/02168 , H01L31/022425 , Y02E10/50
摘要： Semiconductor photovoltaic cells have surfaces that are textured for processing and photovoltaic reasons. The absorbing regions may have parallel grooves that reduce loss of solar energy that would otherwise be lost by reflection. One form of texturing has parallel grooves and ridges. The cell also includes regions of metallization for collecting the generated electrical carriers and conducting them away, which may be channels. The topography is considered during production, using a process that takes advantage of the topography to govern what locations upon will receive a specific processing, and which locations will not receive such a processing. Liquids are treated directly into zones of the cell. They migrate throughout a zone and act upon the locations contacted. They do not migrate to other zones, due to impediments to fluid flow that are features of the surface texture, such as edges, walls and ridges. Blocking liquid may also be deposited and migrate within a zone, to block or mask a subsequent activity, such as etching.
摘要翻译：半导体光伏电池具有纹理的表面用于处理和光伏原因。吸收区域可以具有平行的沟槽，其减少否则将被反射损失的太阳能损失。一种形式的纹理具有平行的凹槽和脊。电池还包括金属化区域，用于收集所产生的电载体并使其远离，这可以是通道。在生产期间考虑地形，使用利用地形的过程来管理将接收特定处理的位置，以及哪些位置将不会接收到这样的处理。将液体直接处理到细胞的区域。他们迁移到整个区域，并对所联系的地点采取行动。它们不会迁移到其他区域，因为阻碍流体流动，这是表面纹理的特征，例如边缘，壁和脊。封闭液体也可以沉积并在区域内迁移，以阻挡或掩盖随后的活动，例如蚀刻。

15. 发明申请

WO2016122731A1 METHOD FOR CREATING A SEMICONDUCTOR WAFER HAVING PROFILED DOPING AND WAFERS AND SOLAR CELL COMPONENTS HAVING A PROFILED FIELD, SUCH AS DRIFT AND BACK SURFACE 审中-公开
标题翻译：用于创建具有轮廓抛光和抛光的半导体波形的方法和具有轮廓和后表面的轮廓细胞部件
公开(公告)号：WO2016122731A1
公开(公告)日：2016-08-04
申请号：PCT/US2015/055460
申请日：2015-10-14
申请人： 1366 TECHNOLOGIES, INC.
发明人： JONCZYK, Ralf , KERNAN, Brian, D. , HUDELSON, Stephen, G.D. , LORENZ, Adam, M. , SACHS, Emanuel, M.
IPC分类号： H01L21/00
CPC分类号： H01L31/1804 , H01L21/00 , H01L31/02167 , H01L31/022425 , H01L31/0288 , H01L31/056 , H01L31/068 , Y02E10/52 , Y02E10/547 , Y02P70/521
摘要： A semiconductor wafer forms on a mold containing a dopant. The dopant dopes a melt region adjacent the mold. There, dopant concentration is higher than in the melt bulk. A wafer starts solidifying. Dopant diffuses poorly in solid semiconductor. After a wafer starts solidifying, dopant can not enter the melt. Afterwards, the concentration of dopant in the melt adjacent the wafer surface is less than what was present where the wafer began to form. New wafer regions grow from a melt region whose dopant concentration lessens over time. This establishes a dopant gradient in the wafer, with higher concentration adjacent the mold. The gradient can be tailored. A gradient gives rise to a field that can function as a drift or back surface field. Solar collectors can have open grid conductors and better optical reflectors on the back surface, made possible by the intrinsic back surface field.
摘要翻译：在包含掺杂剂的模具上形成半导体晶片。掺杂剂掺杂与模具相邻的熔融区域。那里，掺杂剂浓度高于熔体体积。晶片开始凝固。掺杂剂在固体半导体中扩散不良。晶圆开始凝固后，掺杂剂不能进入熔体。之后，与晶片表面相邻的熔体中的掺杂剂浓度小于晶片开始形成时的浓度。新的晶片区域从其掺杂浓度随时间减少的熔融区域生长。这在晶片中建立了掺杂剂梯度，在模具附近具有较高的浓度。渐变可以定制。梯度产生可用作漂移或背表面场的场。太阳能集热器可以在后表面具有开放的栅格导体和更好的光学反射器，这可以通过固有的背面场来实现。

16. 发明申请

WO2015167826A1 METHODS AND APPARATI FOR MAKING THIN SEMI-CONDUCTOR WAFERS WITH LOCALLY CONTROLLED REGIONS THAT ARE RELATIVELY THICKER THAN OTHER REGIONS AND SUCH WAFERS 审中-公开
标题翻译：用于制造具有相对于其他区域和其他区域的相对厚度的局部控制区域的薄半导体波导的方法和装置
公开(公告)号：WO2015167826A1
公开(公告)日：2015-11-05
申请号：PCT/US2015/026389
申请日：2015-04-17
申请人： 1366 TECHNOLOGIES, INC.
发明人： SACHS, Emanuel, M. , JONCZYK, Ralf , LORENZ, Adam, L. , WALLACE, Richard, L. , HUDELSON, Stephen George, D.
IPC分类号： H01L31/0236
CPC分类号： C30B11/02 , C30B29/06 , H01L29/0657 , H01L31/022441 , H01L31/028 , H01L31/035281 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： Semi-conductor wafers with thin and thicker regions at controlled locations may be for Photovoltaics. The interior may be less than 180 microns or thinner, to 50 microns, with a thicker portion, at 180 - 250 microns. Thin wafers have higher efficiency. A thicker perimeter provides handling strength. Thicker stripes, landings and islands are for metallization coupling. Wafers may be made directly from a melt upon a template with regions of different heat extraction propensity arranged to correspond to locations of relative thicknesses. Interstitial oxygen is less than 6 x 10 17 atoms/cc, preferably less than 2 x 10 17 , total oxygen less than 8. 75 x 10 17 atoms/cc, preferably less than 5. 25 x 10 17 . Thicker regions form adjacent template regions having relatively higher heat extraction propensity; thinner regions adjacent regions with lesser extraction propensity. Thicker template regions have higher extraction propensity. Functional materials upon the template also have differing extraction propensities.
摘要翻译：半导体晶片在受控位置具有较薄和较厚的区域可能适用于光伏发电。内部可以小于180微米或更薄，至50微米，较厚部分为180-250微米。薄晶圆具有更高的效率。较厚的周长提供处理强度。较厚的条纹，着陆和岛屿用于金属化耦合。晶片可以直接从熔体制成模板，其中不同热提取倾向的区域布置成对应于相对厚度的位置。间隙氧小于6×1017原子/立方厘米，优选小于2×1017，小于8.75×10 17原子/立方厘米，优选小于5.25×1017的总氧。较大的区域形成相对较高的相邻模板区域热提取倾向; 较薄的区域具有较小的提取倾向。较厚的模板区域具有较高的提取倾向。模板上的功能材料也具有不同的提取倾向。

17. 发明申请

WO2013056059A2 APPARATUS AND PROCESS FOR DEPOSITING A THIN LAYER OF RESIST ON A SUBSTRATE 审中-公开
标题翻译：在基板上沉积薄层的装置和工艺
公开(公告)号：WO2013056059A2
公开(公告)日：2013-04-18
申请号：PCT/US2012/059967
申请日：2012-10-12
申请人： 1366 TECHNOLOGIES INC.
发明人： DANNER, Guy, M. , GATES, Holly, G. , TARASOV, Vladimir, S. , KANE, Peter, E. , MADDEN, Peter, G. , SACHS, Emanuel, M.
IPC分类号： B05D1/06
CPC分类号： B05B5/001 , B05B5/005 , B05B5/087 , B05B7/0012 , B05B12/16 , B05B13/02 , B05D1/04 , B05D1/06 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/67109 , H01L21/67115 , H01L21/6715 , H01L21/6776
摘要： The present inventions relate to the formation of a thin polymer film on a substrate. Apparatus is described for transforming a solid polymer resist into an aerosol of small particles, electrostatically charging and depositing the particles onto a substrate, and flowing the particles into a continuous layer. Apparatus is further described for transforming solid resist into an aerosol of small particles by heating the resist to form a low viscosity liquid such as is compatible with nebulization and applying the techniques of jet or impact nebulization and aerosol particle sizing to form the aerosol. A method is further described of using ionized gas to confer charge onto the aerosol particles and using a progression of charging devices establish an electric field directing the flow of charged particles to the substrate. The progression of charging devices and associated apparatus results in high collection efficiency for the aerosol particles.
摘要翻译：本发明涉及在基材上形成薄聚合物膜。描述了用于将固体聚合物抗蚀剂转化成小颗粒气溶胶的装置，将颗粒静电充电并沉积到基底上，并将颗粒流入连续层。进一步描述了将固体抗蚀剂转化为小颗粒气溶胶的装置，通过加热抗蚀剂以形成与雾化相容的低粘度液体，并应用喷射或冲击雾化和气溶胶颗粒尺寸的技术以形成气溶胶。进一步描述了使用电离气体将电荷赋予气溶胶颗粒的方法，并且使用充电装置的进展建立了将带电粒子流引导到基底的电场。充电装置和相关设备的进展导致气溶胶颗粒的高收集效率。

18. 发明申请

WO2013103930A2 METHODS TO SELECTIVELY TREAT PORTIONS OF A SURFACE USING A SELF-REGISTERING MASK 审中-公开
标题翻译：使用自注册掩模选择表面处理方法的方法
公开(公告)号：WO2013103930A2
公开(公告)日：2013-07-11
申请号：PCT/US2013/020435
申请日：2013-01-06
申请人： 1366 TECHNOLOGIES, INC.
发明人： TARASOV, Vladimir , ERSEN, Ali , STERN, Eric , CRISCIONE, Jason, M. , SACHS, Emanuel, M.
IPC分类号： H01L21/3063
CPC分类号： H01L31/02363 , H01L31/0248 , Y02E10/50
摘要： Processes increase light absorption into silicon wafers by selectively changing the reflective properties of the bottom portions of light trapping cavity features. Modification of light trapping features includes: deepening the bottom portion, increasing the curvature of the bottom portion, and roughening the bottom portion, all accomplished through etching. Modification may also be by the selective addition of material at the bottom of cavity features. Different types of features in the same wafers may be treated differently. Some may receive a treatment that improves light trapping while another is deliberately excluded from such treatment. Some may be deepened, some roughened, some both. No alignment is needed to achieve this selectively. The masking step achieves self-alignment to previously created light trapping features due to softening and deformation in place.
摘要翻译：通过选择性地改变光阱特征的底部的反射特性，工艺增加了对硅晶片的光吸收。光捕获特征的改进包括：深化底部部分，增加底部部分的曲率，以及粗糙化底部部分，全部通过蚀刻来实现。修改也可以通过在腔体特征的底部选择性地添加材料。不同类型的相同晶片中的特征可以被不同地对待。有些可能会接受改善光线捕获的治疗方法，而另一种方法被故意排除在这种治疗之外。有些可能会加深，有些粗糙，有的两个。不需要对准以选择性地实现。掩蔽步骤由于在现场的软化和变形而实现了先前产生的光捕获特征的自对准。

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