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91. 发明申请

WO02054460A1 EXPOSURE DEVICE 审中-公开
标题翻译：曝光装置
公开(公告)号：WO02054460A1
公开(公告)日：2002-07-11
申请号：PCT/JP2001/011454
申请日：2001-12-26
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70775 , G03F7/70875 , G03F7/70891 , G03F7/70933
摘要： An exposure device, comprising a temperature controller (56) installed on a support member (48) for supporting a laser interferometer (47), wherein the temperature of the air blown from a blow hole (51) is measured with a temperature sensor (52) and the temperature of the support member (48) is measured with a temperature sensor (65) to allow the temperature of the blown air to be identical to the temperature of the support member (48), whereby a detection light beam (DL1) from the laser interferometer (47) is suppressed from being swayed on an optical path by the affection of the temperature.
摘要翻译：一种曝光装置，包括安装在用于支撑激光干涉仪（47）的支撑构件（48）上的温度控制器（56），其中用吹扫孔（51）吹送的空气的温度用温度传感器（52 ），并且用温度传感器（65）测量支撑构件（48）的温度，以允许吹送空气的温度与支撑构件（48）的温度相同，由此检测光束（DL1）来自激光干涉仪（47）的光通过温度的影响被抑制在光路上。

92. 发明申请

WO02049084A1 EXPOSURE METHOD AND SYSTEM, AND DEVICE PRODUCING METHOD 审中-公开
标题翻译：曝光方法和系统，以及装置的制造方法
公开(公告)号：WO02049084A1
公开(公告)日：2002-06-20
申请号：PCT/JP2001/010937
申请日：2001-12-13
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70866 , G03F7/70883 , G03F7/70933
摘要： An exposure method and system capable of providing stable imaging characteristics even when gas other than a purge gas remains on the light path of exposure light, or even when the residual concentration of gas other than the purge gas varies. Vacuum-UV-region exposure light (IL) from an exposure light source (1) illuminates a reticle (R) to transfer the reticle's pattern image onto a wafer (W) via a projection optical system (PL). The reticle (R) and the wafer (W) are respectively housed in a reticle stage room (40) and a wafer stage room (60) that are air-tight rooms, the inside of the projection optical system (PL) is turned to an air-tight room, and purge gas transmitting the exposure light (IL) is supplied to those air-tight rooms from a gas purifying device (71). For example, imaging characteristics of the projection optical system (PL) are adjusted via an imaging characteristic controller (57) according to the residual concentration of gas other than the purge gas in the projection optical system (PL) so as to offset variation amounts of imaging characteristics caused by this residual concentration.
摘要翻译：即使当清除气体以外的气体保留在曝光光的光路上时，或甚至当吹扫气体以外的气体的残留浓度变化时，也能够提供稳定的成像特性的曝光方法和系统。来自曝光光源（1）的真空UV区域曝光光（IL）照射光罩（R），以经由投影光学系统（PL）将光罩的图案图像转印到晶片（W）上。标线片（R）和晶片（W）分别容纳在作为气密室的标线片平台室（40）和晶片台室（60）中，投影光学系统（PL）的内部转向气体室，从气体净化装置（71）向透气室供给透过曝光灯（IL）的净化气体。例如，投影光学系统（PL）的成像特性通过成像特征控制器（57）根据投影光学系统（PL）中的净化气体以外的气体的残留浓度进行调整，以抵消投影光学系统由该残留浓度引起的成像特性。

93. 发明申请

WO02039491A1 OPTICAL DEVICE, EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光学装置，曝光装置和装置的制造方法
公开(公告)号：WO02039491A1
公开(公告)日：2002-05-16
申请号：PCT/JP2001/009838
申请日：2001-11-09
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70883 , G03F7/70933
摘要： An optical device has a lens barrel integrated with an annular support member which is provided on its upper face with three projections. By these projections, the lower side of the parallel flat plate is supported at the three points and in direct contact with them. In this supported state, the parallel flat plate confronts the confronting face of the support member with a spacing of, e. g., several micrometers. As a result, the space on one side of the parallel flat plate is almost isolated from the space on the other side. Therefore, for example even if the spaces on both sides of the parallel flat plate are in different gas environments, the gases of the two can be effectively prevented from being mixed with each other. Moreover, the parallel flat plate is supported at the three points in one plane, so that the parallel flat plate does not deform by the supporting force supporting the parallel flat plate, thereby suppressing variation of the refractive index.
摘要翻译：光学装置具有与环形支撑构件一体化的透镜筒，该环形支撑构件在其上表面上设置有三个突起。通过这些突起，平行平板的下侧被支撑在三个点处并与它们直接接触。在该支撑状态下，平行平板以例如间隔的方式面对支撑构件的面对面，例如几微米。结果，平行平板的一侧的空间与另一侧的空间几乎隔离。因此，例如即使平行平板的两侧的空间处于不同的气体环境中，也能够有效地防止两者的气体彼此混合。此外，平行平板被支撑在一个平面中的三个点处，使得平行平板不会由支撑平行平板的支撑力而变形，从而抑制折射率的变化。

94. 发明申请

WO2002021583A1 露光装置及びデバイス製造方法审中-公开
标题翻译：对准器和制造器件的方法
公开(公告)号：WO2002021583A1
公开(公告)日：2002-03-14
申请号：PCT/JP2001/007740
申请日：2001-09-06
申请人：株式会社ニコン , 中原兼文
发明人：中原兼文
IPC分类号： H01L21/027
CPC分类号： G03F1/66 , G03F7/70741 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： An aligner, wherein a buffer (116) allowing a plurality sheets of masks to stock therein and allowed to be loaded and unloaded is disposed in a mask carrying route ranging from the carrying in/out ports (22A, 22B) of an SMIF pod (28) to a mask stage (RST), and a mask carrying system (32) transfers the masks between the carrying in/out ports (22A, 22B), buffer (116), and mask stage (RST), whereby, because the carrying system (32) carries in order the masks carried into a device in the state of being stored in the SMIF pod (28), the masks can be maximally stored therein to allow sufficient sheets of masks necessary for exposure to be always held in the device and, because the carrying system transfers the masks between the carrying in/out ports, buffer, and mask stage, the mask container replacement operation by an operator's manual operation can be eliminated.
摘要翻译：对准器，其中允许多张掩模在其中储存并被允许装载和卸载的缓冲器（116）设置在从SMIF盒的输入/输出端口（22A，22B） 28）传送到掩模级（RST），并且掩模传送系统（32）在输入/输出端口（22A，22B），缓冲器（116）和掩模级（RST）之间传送掩模，由此携带系统（32）将掩模携带在被存储在SMIF盒（28）中的状态下的设备中，可以将掩模最大程度地存储在其中，以使曝光所需的足够的面罩始终保持在并且由于承载系统在进/出端口，缓冲器和掩模级之间传送掩模，所以可以消除操作人员手动操作的掩模容器更换操作。

95. 发明申请

WO01097347A1 GAS DISCHARGE LASER ELECTRODE WITH REDUCED SENSITIVITY TO ADVERSE BOUNDARY LAYER EFFECTS 审中-公开
标题翻译：气体放电激光电极，具有降低敏感性，不利于边界层效应
公开(公告)号：WO01097347A1
公开(公告)日：2001-12-20
申请号：PCT/US2001/013197
申请日：2001-04-24
IPC分类号： G03F7/20 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0979 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/708 , G03F7/70933 , H01S3/036 , H01S3/0381 , H01S3/0382 , H01S3/0384 , H01S3/0385 , H01S3/223 , H01S3/225 , H01S3/2256
摘要： A long life laser chamber for a halogen containing gas discharge laser. In a preferred embodiment electrode erosion caused by excited fluorine (i.e., atomic fluorine and fluorine ions) is reduced by forcing the excited fluorine away from the discharge footprint of the electrodes. Preferred embodiments include electrodes (83) with a large number of small holes (42) in the discharge footprint through which laser gas flows (86a) to remove the excited fluorine from the footprint region in the time period between electric discharges.
摘要翻译：一种用于含卤素气体放电激光器的长寿命激光室。在优选实施例中，由激发的氟（即原子氟和氟离子）引起的电极腐蚀通过迫使激发的氟远离电极的放电足迹而减小。优选实施例包括在放电足迹中具有大量小孔（42）的电极（83），通过该放电足迹，激光气体流过（86a）以在放电期间从占位区域去除激发的氟。

96. 发明申请

WO2001075501A1 光学部材の保持方法及び装置、光学装置、露光装置、並びにデバイス製造方法审中-公开
标题翻译：用于保持光学部件，光学装置，曝光装置和装置制造方法的方法和装置
公开(公告)号：WO2001075501A1
公开(公告)日：2001-10-11
申请号：PCT/JP2001/002593
申请日：2001-03-28
申请人：株式会社ニコン , 西川仁
发明人：西川　仁
IPC分类号： G02B7/02
CPC分类号： G03F7/70933 , G02B7/022 , G03F7/70833 , G03F7/70866 , G03F7/70883
摘要： A flange part (80) is provided to at least part of the periphery of the optically axial center position of a lens (L3). The lens (L3) is held by clamping members (52a, 52b, 52c) and a lens holding metallic part (25), with the flange part (80) pressed by the clamping parts (52a, 52b, 52c). The portion where the flange part (80) is provided suffers no compressive strain and tensile strain due to bend of the lens (L3) and is a part of the periphery of a neutral plane, which is the farthest plane from the optical plane of the lens (L3). Therefore the influence of the clamping force acting on the flange part (80) on the other portions of the lens (L3) is most suppressed and the deformation of the optical plane due to the force exerted on the flange part (80) is made minimum. As a result the deterioration of the optical performance of the lens is prevented to the utmost.
摘要翻译：在透镜（L3）的光学中心位置的周边的至少一部分上设有凸缘部（80）。透镜（L3）由夹紧构件（52a，52b，52c）和透镜保持金属部分（25）保持，凸缘部分（80）被夹紧部分（52a，52b，52c）挤压。设置凸缘部分（80）的部分由于透镜（L3）的弯曲而没有压缩应变和拉伸应变，并且是中性平面的周边的一部分，该中性面是与光学平面的最远平面透镜（L3）。因此，最大限度地抑制作用在凸缘部（80）上的夹持力对透镜（L3）的其他部分的影响，并且由于施加在凸缘部（80）上的力使光学平面的变形最小。结果，可以最大限度地防止透镜的光学性能的劣化。

97. 发明申请

WO01073825A1 ALIGNER, APPARATUS AND METHOD FOR TRANSFERRING WAFER, MICRODEVICE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：对准器，用于传输波形的装置和方法，微型器件及其制造方法
公开(公告)号：WO01073825A1
公开(公告)日：2001-10-04
申请号：PCT/JP2001/002634
申请日：2001-03-29
IPC分类号： G03F7/20 , H01L21/027 , B65G49/00 , H01L21/68
CPC分类号： G03F7/70808 , G03F7/70741 , G03F7/7075 , G03F7/70866 , G03F7/70933
摘要： An aligner comprising transfer mechanisms (14, 16) provided with a gas inflow suppression mechanism (17) for forming a gas flow for suppressing inflow of gas from transfer paths (13, 15) into at least one space (S) between an exposing energy generating source and a wafer stage. When a wafer is transferred into the space or out therefrom by means of the transfer mechanisms, the gas inflow suppression mechanism can prevent inflow of gas from the transfer path into the space without interrupting the transfer of the wafer temporarily. Furthermore, the concentration of light absorbing substances in the space can be maintained at a low level without replacing gas in a load lock chamber between the transfer path and the space.
摘要翻译：一种对准器，包括设置有气体流入抑制机构（17）的传送机构（14,16），用于形成用于抑制气体从传送路径（13,15）流入至少一个曝光能量之间的空间（S）的气流产生源和晶片台。当通过传送机构将晶片转移到空间中或从其传出时，气体流入抑制机构可以防止气体从传送路径流入空间，而不会暂时中断晶片的传送。此外，空间中的光吸收物质的浓度可以保持在低水平，而不需要替换传送路径和空间之间的装载锁定室中的气体。

98. 发明申请

WO01059522A1 METHOD AND APPARATUS FOR A RETICLE WITH PURGED PELLICLE-TO-RETICLE GAP 审中-公开
标题翻译：一种具有纯粹的裂隙特征的方法和装置
公开(公告)号：WO01059522A1
公开(公告)日：2001-08-16
申请号：PCT/US2000/030432
申请日：2000-11-06
IPC分类号： G03F1/00 , G03F1/64 , G03F7/20 , G03F1/14
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983
摘要： A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system is described. A porous frame between a reticle and a pellicle maintains the purged optical gap. A porous frame includes a first and a second opposing surface. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. A gas supply interface infuses a purge gas through the porous frame and into the gap.
摘要翻译：描述了一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清除的光学间隙的方法和装置。掩模版和防护薄膜组件之间的多孔框架保持被清除的光学间隙。多孔框架包括第一和第二相对表面。第一相对表面限定第一开口，并且被配置为与防护薄膜组合。第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。气体供应接口通过多孔框架注入吹扫气体并进入间隙。

99. 发明申请

WO00031780A1 OPTICAL DEVICE, EXPOSURE SYSTEM, AND LASER BEAM SOURCE, AND GAS FEED METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光学装置，曝光系统和激光束源，以及气体馈送方法，曝光方法和装置制造方法
公开(公告)号：WO00031780A1
公开(公告)日：2000-06-02
申请号：PCT/JP1999/003985
申请日：1999-07-26
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70933 , G03F7/70858
摘要： An optical device, an exposure system, and a laser beam source capable of suppressing a hazing from occurring on an optical element while a working environment in maintenance and at the time of abnormality is maintained in good condition, wherein an inert gas feed system (33) and a dry air feed system (35) are connected selectively to a first lens-barrel (46) and a second lens-barrel (48) of an exposure device main body (11) and a light source chamber (16) of a laser device (12), oxygen sensors (78, 42) for measuring the oxygen concentration and exhaust amount monitors (77, 41) for detecting the exhaust amount through an exhaust duct (40) are provided inside a chamber (45) of the exposure device main body (11) and a chamber (15) of the laser device (12), respectively and, when at least one of the oxygen concentration and exhaust amount detected by the oxygen sensors (78, 42) and exhaust amount monitors (77, 41) lowers below a specified value, a purge gas fed to the first and second lens-barrels (45, 46) and light source chamber (16) is switched from inert gas to dry air.
摘要翻译：在保持工作环境和异常状态的同时，能够抑制光学元件发生混浊的光学装置，曝光系统和激光束源，其中惰性气体供给系统（33））和干燥空气供给系统（35）选择性地连接到曝光装置主体（11）的第一透镜镜筒（46）和第二透镜镜筒（48）和光源室（16）激光装置（12），用于测量用于检测通过排气管道（40）的排气量的氧浓度和排气量监测器（77,41）的氧传感器（78,42）设置在曝光室（45）内并且当氧传感器（78,42）和排气量监视器（77）检测到的氧浓度和排气量中的至少一个时，分别设置有激光装置（12）的装置主体（11）和室（15），41）降低到指定值以下，净化气体供给到第一和第二液体 s型筒（45,46）和光源室（16）从惰性气体切换到干燥空气。

100. 发明申请

WO2017084872A1 EUV SOURCE CHAMBER AND GAS FLOW REGIME FOR LITHOGRAPHIC APPARATUS, MULTI-LAYER MIRROR AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：用于光刻设备，多层反射镜和光刻设备的EUV源房间和气体流动方案
公开(公告)号：WO2017084872A1
公开(公告)日：2017-05-26
申请号：PCT/EP2016/076287
申请日：2016-11-01
申请人： ASML NETHERLANDS B.V.
发明人： YAKUNIN, Andrei, Mikhailovich , ASTAKHOV, Dmitry, Igorevich , BERENDSEN, Christianus, Wilhelmus, Johannes , CLOIN, Christian, Gerardus, Norbertus, Hendricus, Marie , GLUSHKOV, Denis, Alexandrovich , LABETSKI, Dzmitry , MULDER, Heine, Melle , TYCHKOV, Andrey, Sergeevich , VAN SCHAIK, Willem
IPC分类号： G03F7/20
CPC分类号： G03F7/70033 , G03F7/70916 , G03F7/70933 , G03F7/70983
摘要： Disclosed is a radiation source module, and associated method of transporting fuel debris out of a source chamber. The radiation source module generates a radiation producing plasma (2) at a plasma formation site by excitation of a fuel. The radiation source (SO) comprises: a source chamber (435); a radiation collector (400) within the source chamber for collecting and focusing said radiation; a primary buffer gas inlet (410) for admitting a primary buffer gas (415) into the source chamber; and a buffer gas outlet (420) in the vicinity of said radiation collector, for exhausting said primary buffer gas from the source chamber. Also disclosed is a multi-layer mirror, and in particular a radiation collector, comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer.
摘要翻译：公开了一种辐射源模块以及将燃料碎屑从源腔室输送出去的相关方法。辐射源模块通过激励燃料在等离子体形成位置处产生辐射产生等离子体（2）。辐射源（SO）包括：源室（435）; 在源室内的辐射收集器（400），用于收集和聚焦所述辐射; 主缓冲气体入口（410），用于允许主缓冲气体（415）进入源腔室; 和在所述辐射收集器附近的缓冲气体出口（420），用于从所述源室排出所述主缓冲气体。还公开了多层反射镜，特别是辐射收集器，其包括在反射层内涂覆有至少一个反射层和多个穿孔的基底。

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