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1. 发明申请

WO2005004189A3 SIDEWALL MAGNET IMPROVING UNIFORMITY OF INDUCTIVELY COUPLED PLASMA AND SHIELDS USED THEREWITH 审中-公开
标题翻译：电动磁铁改善电感耦合等离子体和平板电脑的均匀性
公开(公告)号：WO2005004189A3
公开(公告)日：2006-01-19
申请号：PCT/US2004020186
申请日：2004-06-22
申请人： APPLIED MATERIALS INC , GUNG TZA-JING , TANG XIANMIN , FORSTER JOHN , DING PEIJUN , SCHWEITZER MARC , MILLER KEITH A , LAVITSKY ILYA
发明人： GUNG TZA-JING , TANG XIANMIN , FORSTER JOHN , DING PEIJUN , SCHWEITZER MARC , MILLER KEITH A , LAVITSKY ILYA
IPC分类号： H05H1/46 , C23C14/04 , C23C14/34 , C23C14/35 , H01J37/32 , H01J37/34 , H01L21/285 , H01L21/768
CPC分类号： H01J37/3402 , C23C14/046 , C23C14/345 , C23C14/3457 , C23C14/358 , H01J37/321 , H01J37/32623 , H01J37/3408 , H01J37/3411 , H01J37/3441 , H01J2237/3327 , H01L21/2855 , H01L21/76843 , H01L21/76877
摘要： One aspect of the invention includes an auxiliary magnet ring positioned outside of the chamber wall of a plasma sputter reactor and being disposed at least partially radially outwardly of an RF coil used to inductively generate a plasma, particularly for sputter etching the substrate being sputter deposited. Thereby, a magnetic barrier prevents the plasma from leaking outwardly to the coil and improves the uniformity of sputter etching. The magnetic field also acts as a magnetron when the coil, when made aspect of the same material as the primary target, is being used as a secondary target. Another aspect of the invention includes a one-piece inner shield extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil.
摘要翻译：本发明的一个方面包括位于等离子体溅射反应器的室壁外部的辅助磁环，并且至少部分地设置在用于感应地产生等离子体的RF线圈的径向外侧，特别是用于溅射蚀刻被溅射沉积的衬底。因此，磁屏障防止等离子体向外泄漏到线圈并提高溅射蚀刻的均匀性。当线圈当与主要目标相同的材料制成的方面被用作次要靶时，磁场也用作磁控管。本发明的另一方面包括从目标件延伸到具有光滑的内表面并由屏蔽件的中间部分中的环形凸缘支撑的一体式内屏蔽件。屏蔽可用于支持RF线圈。

2. 发明申请

WO2009155208A2 APPARATUS AND METHOD FOR UNIFORM DEPOSITION 审中-公开
标题翻译：用于均匀沉积的装置和方法
公开(公告)号：WO2009155208A2
公开(公告)日：2009-12-23
申请号：PCT/US2009047103
申请日：2009-06-11
申请人： APPLIED MATERIALS INC , CAO YONG , EWERT MAURICE E , TANG XIANMIN , MILLER KEITH A , LUBBEN DANIEL C , KELKAR UMESH M , GUNG TZA-JING , SUBRAMANI ANANTHA K
发明人： CAO YONG , EWERT MAURICE E , TANG XIANMIN , MILLER KEITH A , LUBBEN DANIEL C , KELKAR UMESH M , GUNG TZA-JING , SUBRAMANI ANANTHA K
IPC分类号： C23C14/34 , C23C14/54
CPC分类号： C23C14/35 , C23C14/046 , H01J37/34 , H01J37/3447
摘要： Embodiments of the present invention generally relate to an apparatus and method for uniform sputter depositing of materials into the bottom and sidewalls of high aspect ratio features on a substrate. In one embodiment, a sputter deposition system includes a collimator that has apertures having aspect ratios that decrease from a central region of the collimator to a peripheral region of the collimator. In one embodiment, the collimator is coupled to a grounded shield via a bracket member that includes a combination of internally and externally threaded fasteners. In another embodiment, the collimator is integrally attached to a grounded shield. In one embodiment, a method of sputter depositing material includes pulsing the bias on the substrate support between high and low values.
摘要翻译：本发明的实施例一般涉及用于均匀溅射沉积到衬底上的高纵横比特征的底部和侧壁中的装置和方法。在一个实施例中，溅射沉积系统包括准直器，其具有从准直器的中心区域到准直器的外围区域的纵横比减小的孔。在一个实施例中，准直器经由包括内螺纹紧固件和外螺纹紧固件的组合的支架构件联接到接地屏蔽件。在另一个实施例中，准直器一体地附接到接地屏蔽。在一个实施例中，溅射沉积材料的方法包括在高和低值之间使衬底支撑上的偏压脉动。

3. 发明申请

WO2011109337A2 PHYSICAL VAPOR DEPOSITION WITH A VARIABLE CAPACITIVE TUNER AND FEEDBACK CIRCUIT 审中-公开
标题翻译：具有可变电容调谐器和反馈电路的物理蒸气沉积
公开(公告)号：WO2011109337A2
公开(公告)日：2011-09-09
申请号：PCT/US2011026601
申请日：2011-03-01
申请人： APPLIED MATERIALS INC , RASHEED MUHAMMAD M , DEDORE RONALD D , COX MICHAEL S , MILLER KEITH A , YOUNG DONNY , FORSTER JOHN C , ALLEN ADOLPH M , HAWRYLCHAK LARA
发明人： RASHEED MUHAMMAD M , DEDORE RONALD D , COX MICHAEL S , MILLER KEITH A , YOUNG DONNY , FORSTER JOHN C , ALLEN ADOLPH M , HAWRYLCHAK LARA
CPC分类号： H01J37/3444 , H01J37/32091 , H01J37/32165 , H01J37/32174 , H01J37/3438
摘要： Apparatus and methods for performing plasma processing on a wafer supported on a pedestal are provided. The apparatus can include a pedestal on which the wafer can be supported, a variable capacitor having a variable capacitance, a motor attached to the variable capacitor which varies the capacitance of the variable capacitor, a motor controller connected to the motor that causes the motor to rotate, and an output from the variable capacitor connected to the pedestal. A desired state of the variable capacitor is associated with a process recipe in a process controller. When the process recipe is executed the variable capacitor is placed in the desired state.
摘要翻译：提供了在支撑在基座上的晶片上进行等离子体处理的装置和方法。该装置可以包括可以支撑晶片的基座，具有可变电容的可变电容器，附接到可变电容器的电动机，其改变可变电容器的电容;连接到电动机的电动机控制器，其使电动机旋转，以及连接到基座的可变电容器的输出。可变电容器的期望状态与过程控制器中的过程配方相关联。当执行处理配方时，将可变电容器置于所需状态。

4. 发明申请

WO2010025104A2 PROCESS KIT SHIELDS AND METHODS OF USE THEREOF 审中-公开
标题翻译：工艺套件及其使用方法
公开(公告)号：WO2010025104A2
公开(公告)日：2010-03-04
申请号：PCT/US2009054741
申请日：2009-08-24
申请人： APPLIED MATERIALS INC , SOMMERS JOSEPH F , MILLER KEITH A
发明人： SOMMERS JOSEPH F , MILLER KEITH A
IPC分类号： H01L21/00 , H01L21/02 , H01L21/683 , H01L21/687
CPC分类号： H01J37/32495 , C23C14/35 , C23C14/564 , C23C16/4404 , C23C16/4407 , H01J37/32477 , H01J37/32504 , H01J37/3408
摘要： Process kit shields for use in a process chamber and methods of use thereof are provided herein. In some embodiments, the process kit shield may include a body having a wall comprising a first layer and a second layer bonded to the first layer, wherein the first layer comprises a first material resistant to a cleaning chemistry utilized to remove material disposed on the first layer during processing, and wherein the second layer comprises a second material different than the first material and having a coefficient of thermal expansion substantially similar to that of the first material. In some embodiments, the process kit shield may be disposed in a process chamber having a processing volume and a non-processing volume. The process kit shield may be disposed between the processing volume and the non-processing volume
摘要翻译：在处理室中使用的工艺组件护罩及其使用方法在本文中提供。在一些实施例中，处理套件屏蔽件可以包括具有壁的主体，该主体包括第一层和结合到第一层的第二层，其中第一层包含耐洗涤化学物质的第一材料，用于去除设置在第一层上的材料层，并且其中第二层包括与第一材料不同的第二材料，并且具有基本上类似于第一材料的热膨胀系数。在一些实施例中，处理套件屏蔽可以设置在具有处理量和非处理量的处理室中。处理套件屏蔽可以设置在处理量和非处理量之间

5. 发明申请

WO2012019017A2 ELECTROSTATIC CHUCK AND METHODS OF USE THEREOF 审中-公开
标题翻译：静电切片及其使用方法
公开(公告)号：WO2012019017A2
公开(公告)日：2012-02-09
申请号：PCT/US2011046611
申请日：2011-08-04
申请人： APPLIED MATERIALS INC , ROY SHAMBHU N , RIKER MARTIN LEE , MILLER KEITH A , PARKHE VIJAY D , SANSONI STEVEN V
发明人： ROY SHAMBHU N , RIKER MARTIN LEE , MILLER KEITH A , PARKHE VIJAY D , SANSONI STEVEN V
IPC分类号： H01L21/683 , B23Q3/15 , H01L21/687 , H02N13/00
CPC分类号： H01L21/67109 , H01L21/67103 , H01L21/6831
摘要： An electrostatic chuck and method of use thereof is provided herein. In some embodiments, an electrostatic chuck may include a disk having a first side to support a substrate thereon and a second side, opposing the first side, to provide an interface to selectively couple the disk to a thermal control plate, a first electrode disposed within the disk proximate the first side to electrostatically couple the substrate to the disk and a second electrode disposed within the disk proximate the opposing side of the disk to electrostatically couple the disk to the thermal control plate. In some embodiments, the second electrode may also be configured to heat the disk.
摘要翻译：本文提供一种静电吸盘及其使用方法。在一些实施例中，静电卡盘可以包括具有第一侧以支撑其上的基板的盘和与第一侧相对的第二侧，以提供用于选择性地将盘耦合到热控制板的界面，第一电极设置在靠近第一侧的磁盘将基板静电耦合到盘，以及设置在靠近盘的相对侧的盘内的第二电极，以将磁盘静电耦合到热控制板。在一些实施例中，第二电极也可以被配置为加热盘。

6. 发明申请

WO2007103902A2 NOTCHED DEPOSITION RING 审中-公开
标题翻译：凹槽沉积环
公开(公告)号：WO2007103902A2
公开(公告)日：2007-09-13
申请号：PCT/US2007063353
申请日：2007-03-06
申请人： APPLIED MATERIALS INC , MILLER KEITH A
发明人： MILLER KEITH A
IPC分类号： C23C14/00
CPC分类号： H01L21/68735 , H01J37/32495
摘要： A process kit for a semiconductor processing chamber is provided. In one embodiment, a process kit includes a notched deposition ring. In another embodiment, a process kit includes a cover ring configured to engage the notched deposition ring. In another embodiment, a process kit includes an annular deposition ring body having inner, outer, upper and bottom walls. A trough is recessed into an upper surface of the body between the upper and inner walls. A recessed surface is formed on a lower surface of the body between the bottom and inner walls. A notch extends inward from the body to catch deposition material passing through a notch of the substrate being processed.
摘要翻译：提供了一种用于半导体处理室的处理套件。在一个实施例中，处理套件包括缺口沉积环。在另一个实施例中，处理套件包括构造成接合缺口沉积环的盖环。在另一个实施例中，处理套件包括具有内壁，外壁，上壁和底壁的环形沉积环体。槽在上壁和内壁之间凹陷到主体的上表面中。凹陷表面形成在主体的底壁和内壁之间的下表面上。凹口从主体向内延伸以捕捉穿过正被处理的基板的凹口的沉积材料。

7. 发明申请

WO2009154853A3 WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS 审中-公开
标题翻译：波浪加工沉积屏蔽部件
公开(公告)号：WO2009154853A3
公开(公告)日：2010-02-25
申请号：PCT/US2009040487
申请日：2009-04-14
申请人： APPLIED MATERIALS INC , RIKER MARTIN LEE , MILLER KEITH A , SUBRAMANI ANANTHA K
发明人： RIKER MARTIN LEE , MILLER KEITH A , SUBRAMANI ANANTHA K
IPC分类号： H01L21/203
CPC分类号： C23C16/4585 , C23C14/34 , C23C14/50 , C23C14/564 , H01J37/32623 , H01J37/32633 , H01J37/3408 , H01J37/3441
摘要： Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support.
摘要翻译：本文描述的实施例通常涉及用于半导体处理室的部件，用于半导体处理室的处理套件以及具有处理套件的半导体处理室。在一个实施例中，提供了用于环绕溅射靶的底部屏蔽件和衬底支撑件。下屏蔽包括具有第一直径的圆柱形外带，其尺寸被设计成围绕溅射靶的溅射表面和衬底支撑件，该圆柱形带包括围绕溅射靶的溅射表面的顶壁和围绕溅射靶的底壁衬底支撑件，包括搁置表面并从圆柱形外带径向向外延伸的支撑凸缘，从圆柱形带的底壁径向向内延伸的底板，以及与基板耦合并部分围绕外围的圆柱形内带基板支撑的边缘。

8. 发明申请

WO2012057987A3 DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER 审中-公开
标题翻译：用于物理蒸气沉积室的沉积环和静电吸盘
公开(公告)号：WO2012057987A3
公开(公告)日：2012-07-19
申请号：PCT/US2011055374
申请日：2011-10-07
申请人： APPLIED MATERIALS INC , RASHEED MUHAMMAD , MILLER KEITH A , WANG RONGJUN
发明人： RASHEED MUHAMMAD , MILLER KEITH A , WANG RONGJUN
IPC分类号： H01L21/203 , H01L21/683
CPC分类号： C23C14/50 , C23C14/3407 , C23C14/564 , C23C16/4585 , H01L21/68735
摘要： Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a deposition ring and a pedestal assembly. The components of the process kit work alone, and in combination, to significantly reduce their effects on the electric fields around a substrate during processing.
摘要翻译：本发明的实施例一般涉及用于半导体处理室的处理套件和具有套件的半导体处理室。更具体地，本文所述的实施例涉及包括沉积环和基座组件的处理套件。处理套件的组件单独工作，并且组合工作，以显着降低它们对处理期间基板周围的电场的影响。

9. 发明申请

WO2008141142A3 FIBER RETENTION SLEEVE 审中-公开
标题翻译：光纤保持套管
公开(公告)号：WO2008141142A3
公开(公告)日：2010-01-07
申请号：PCT/US2008063194
申请日：2008-05-09
申请人： PREFORMED LINE PRODUCTS CO , GRUBISH CHRISTOPHER S , MILLER KEITH A , DUDASH GEORGE , HORNSBY JOHN L , STRANSKY MARK A , CLOUD RANDY G
发明人： GRUBISH CHRISTOPHER S , MILLER KEITH A , DUDASH GEORGE , HORNSBY JOHN L , STRANSKY MARK A , CLOUD RANDY G
IPC分类号： G02B6/00
CPC分类号： G02B6/4477 , G02B6/4453 , G02B6/4471
摘要： A fiber retention device is provided for retention of fibers such as optical fibers, tubing, cables, buffer tubes and other elongate objects. The retention device includes, generally, a mounting retainer and a resilient sleeve. The mounting retainer is formed of a resilient material and defines one or more generally U-shaped support channels. The resilient sleeve is positioned in the U-shaped support channel and defines at least one expandable passageway for receiving a fiber therein. The passageway diameter is less than the fiber diameter in a pre-load orientation or relaxed condition prior to inserting the fiber into the passageway. The support channel selectively includes a plurality of tabs for locating the sleeve therein including tabs on a bottom wall for resisting relative horizontal movement and tabs on a side wall for resisting relative vertical movement of the sleeve within the channel. The sleeve is positively located by the channel, and the fiber is retained and strain relieved by the elastomer sleeve. A mounting flange is provided for coupling a plurality of mounting retainers in a coupled orientation as desired.
摘要翻译：提供纤维保持装置用于保持诸如光纤，管道，电缆，缓冲管和其它细长物体之类的纤维。保持装置通常包括安装保持器和弹性套筒。安装保持器由弹性材料形成并且限定一个或多个大体上U形的支撑通道。弹性套筒定位在U形支撑通道中，并且限定了用于在其中容纳纤维的至少一个可扩张通道。在将纤维插入通道之前，通道直径小于预加载取向或松弛状态下的纤维直径。支撑通道选择性地包括多个用于将套筒定位在其中的突出部，其中包括用于抵抗相对水平运动的底壁上的突舌和侧壁上的突出部，用于抵抗套管在通道内的相对垂直运动。套筒由通道确定地定位，并且纤维被弹性体套筒保持和应变释放。提供了安装法兰，用于根据需要以联接方向联接多个安装保持器。

10. 发明申请

WO02097488A3 FIBER OPTIC CABLE CLOSURE 审中-公开
标题翻译：光纤电缆封闭
公开(公告)号：WO02097488A3
公开(公告)日：2003-09-25
申请号：PCT/US0205975
申请日：2002-02-27
申请人： PREFORMED LINE PRODUCTS CO , CLOUD RANDY G , MILLER KEITH A , MURES MARCEL G , GARCIA JOSE ANTONIO RIVERO
发明人： CLOUD RANDY G , MILLER KEITH A , MURES MARCEL G , GARCIA JOSE ANTONIO RIVERO
IPC分类号： G02B6/44 , H02G15/013 , H02G15/076
CPC分类号： H02G15/076 , G02B6/4444 , H02G3/22
摘要： A cable closure assembly (10) includes a rotatable collar (24) secured to an end plate (20) for rotating the end plate with respect to the closeure. Drop ports (34) and express ports (36) are provided within the end plate to accommodate either cut or unctu cables within the closure. Grommet (28) and cap tools (26) are provided which consist of two pieces to bbe installed over cables after the cables are inserted into the closure. A modular closure system is provided including a dome closure (12) and extender or expander closures (120) to increase storage and splicing area within the dome closure. A sliding and locking bracket (200) allow for movement and pivoting of splice trays (172) to access splice trays (172) below other stacked trays. An extender (102) for a strenght member bracket (100) accomodates various lengths of strenght members on the cable fiber cable. A bracket (300) on an end of a rigid bar member (170) permits wrapping of the cable within the closure and positions the cable within the closure.
摘要翻译：电缆闭合组件（10）包括固定到端板（20）的可旋转的环（24），用于相对于闭合旋转端板。卸料口（34）和快速端口（36）设置在端板内，以容纳封闭件内的切割或未切割的电缆。提供了索环（28）和盖工具（26），其包括两个部件，以在电缆插入封闭件中之后安装在电缆上。提供了一种模块化闭合系统，其包括圆顶盖（12）和延伸器或膨胀器封闭件（120），以增加圆顶盖内的储存和拼接区域。滑动和锁定支架（200）允许接合托盘（172）的移动和枢转以便接合其它堆叠的托盘下面的接合托盘（172）。用于强度构件支架（100）的延伸件（102）可容纳缆绳光缆上的各种长度的强度构件。在刚性杆构件（170）的端部上的支架（300）允许将电缆缠绕在封闭件内并将电缆定位在封闭件内。

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