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1. 发明申请

US20050052103A1 Small electron gun 有权
标题翻译：小电子枪
公开(公告)号：US20050052103A1
公开(公告)日：2005-03-10
申请号：US10873358
申请日：2004-06-23
申请人： Soichi Katagiri , Takashi Ohshima
发明人： Soichi Katagiri , Takashi Ohshima
IPC分类号： H01J37/18 , H01J7/16 , H01J7/18 , H01J37/07 , H01J37/073 , H01J41/20
CPC分类号： H01J37/18 , H01J7/16 , H01J7/18 , H01J37/07 , H01J2237/022 , H01J2237/062 , H01J2237/06316 , H01J2237/1825 , H01J2237/188
摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.
摘要翻译：提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。由非蒸发式吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或用于非蒸发吸气泵的复合气体。通过使用电子枪发射电子的高度和宽度约为15cm的小型电子枪，可以保持10 -10乇的高真空压力，而不需要离子泵。

2. 发明授权

US07339167B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US07339167B2
公开(公告)日：2008-03-04
申请号：US11196399
申请日：2005-08-04
申请人： Takashi Ohshima , Mitsugu Sato , Soichi Katagiri
发明人： Takashi Ohshima , Mitsugu Sato , Soichi Katagiri
IPC分类号： H01J37/256 , H01J37/28 , H01J49/24
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/0268 , H01J2237/04756 , H01J2237/1205 , H01J2237/121 , H01J2237/188 , H01J2237/24465 , H01J2237/2611 , H01J2237/31749
摘要： A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, and a detector for secondary electrons is located inside the drift tube. This solves the problem associated with the provision of a secondary electron detector, which heretofore has been a bottleneck in making a subminiature high-resolution SEM column.
摘要翻译：使用静电透镜作为主聚焦元件以获得超小型高灵敏度高分辨率SEM的带电粒子束装置，用于电子束的漂移管位于电子源和样品之间的列内，并且用于二次电子的检测器位于漂移管内。这解决了与提供二次电子检测器相关的问题，这种二次电子检测器迄今已成为制造超小型高分辨率SEM柱的瓶颈。

3. 发明申请

US20070236143A1 Small electron gun 审中-公开
公开(公告)号：US20070236143A1
公开(公告)日：2007-10-11
申请号：US11806196
申请日：2007-05-30
申请人： Soichi Katagiri , Takashi Ohshima
发明人： Soichi Katagiri , Takashi Ohshima
IPC分类号： H01J17/24
CPC分类号： H01J37/18 , H01J7/16 , H01J7/18 , H01J37/07 , H01J2237/022 , H01J2237/062 , H01J2237/06316 , H01J2237/1825 , H01J2237/188
摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

4. 发明授权

US5408320A Workpiece having alignment marks for positioning a pattern at a different pitch to be formed thereon, and method for fabricating the same 失效
标题翻译：具有用于定位在其上形成的不同间距的图案的对准标记的工件及其制造方法
公开(公告)号：US5408320A
公开(公告)日：1995-04-18
申请号：US994963
申请日：1992-12-22
申请人： Soichi Katagiri , Shigeo Moriyama , Tsuneo Terasawa , Masaaki Itou
发明人： Soichi Katagiri , Shigeo Moriyama , Tsuneo Terasawa , Masaaki Itou
IPC分类号： G01B11/27 , G01D5/30 , G03F9/00 , G01B9/02
CPC分类号： G03F9/7084 , G01B11/272 , G01D5/30 , G03F9/70
摘要： A semiconductor wafer includes a top surface on which a semiconductor circuit pattern is to be fabricated, and a bottom surface on which alignment marks for positioning the semiconductor circuit pattern are arranged. The alignment marks are arranged at a predetermined pitch and in an arrangement that is not unique to the pattern formed on the top surface.
摘要翻译：半导体晶片包括其上要制造半导体电路图案的顶表面和布置有用于定位半导体电路图案的对准标记的底表面。对准标记以预定的间距布置，并且以对于形成在顶表面上的图案不是唯一的布置来布置。

5. 发明授权

US08232712B2 Small electron gun 有权
标题翻译：小电子枪
公开(公告)号：US08232712B2
公开(公告)日：2012-07-31
申请号：US12461195
申请日：2009-08-04
申请人： Soichi Katagiri , Takashi Ohshima
发明人： Soichi Katagiri , Takashi Ohshima
IPC分类号： G01N23/225
CPC分类号： H01J37/18 , H01J7/16 , H01J7/18 , H01J37/07 , H01J2237/022 , H01J2237/062 , H01J2237/06316 , H01J2237/1825 , H01J2237/188
摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.
摘要翻译：提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。由非蒸发式吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或用于非蒸发吸气泵的复合气体。通过使用电子枪发射电子的高度和宽度约为15cm的小型电子枪，可以保持10-10托的高真空压力，而不需要离子泵。

6. 发明申请

US20090289186A1 Small electron gun 有权
标题翻译：小电子枪
公开(公告)号：US20090289186A1
公开(公告)日：2009-11-26
申请号：US12461195
申请日：2009-08-04
申请人： Soichi Katagiri , Takashi Ohshima
发明人： Soichi Katagiri , Takashi Ohshima
IPC分类号： G01N23/225
CPC分类号： H01J37/18 , H01J7/16 , H01J7/18 , H01J37/07 , H01J2237/022 , H01J2237/062 , H01J2237/06316 , H01J2237/1825 , H01J2237/188
摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 1010 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.
摘要翻译：提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。由非蒸发式吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或用于非蒸发吸气泵的复合气体。在电子枪发射电子的同时，通过使用高度和宽度约为15cm的小型电子枪，可以保持1010Torr的高真空压力，而不需要离子泵。

7. 发明授权

US07238939B2 Small electron gun 有权
标题翻译：小电子枪
公开(公告)号：US07238939B2
公开(公告)日：2007-07-03
申请号：US10873358
申请日：2004-06-23
申请人： Soichi Katagiri , Takashi Ohshima
发明人： Soichi Katagiri , Takashi Ohshima
IPC分类号： H01J37/18
CPC分类号： H01J37/18 , H01J7/16 , H01J7/18 , H01J37/07 , H01J2237/022 , H01J2237/062 , H01J2237/06316 , H01J2237/1825 , H01J2237/188
摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.
摘要翻译：提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。由非蒸发吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或用于非蒸发吸气泵的复合气体。通过使用高度和宽度约为15cm的小型电子枪，在从电子枪发射电子的同时，可以保持高10 -10乇的高真空压力，而不需要离子泵。

8. 发明申请

US20060076489A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20060076489A1
公开(公告)日：2006-04-13
申请号：US11196399
申请日：2005-08-04
申请人： Takashi Ohshima , Mitsugu Sato , Soichi Katagiri
发明人： Takashi Ohshima , Mitsugu Sato , Soichi Katagiri
IPC分类号： G21K7/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/0268 , H01J2237/04756 , H01J2237/1205 , H01J2237/121 , H01J2237/188 , H01J2237/24465 , H01J2237/2611 , H01J2237/31749
摘要： A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, and a detector for secondary electrons is located inside the drift tube. This solves the problem associated with the provision of a secondary electron detector, which heretofore has been a bottleneck in making a subminiature high-resolution SEM column.
摘要翻译：使用静电透镜作为主聚焦元件以获得超小型高灵敏度高分辨率SEM的带电粒子束装置，用于电子束的漂移管位于电子源和样品之间的列内，并且用于二次电子的检测器位于漂移管内。这解决了与提供二次电子检测器相关的问题，这种二次电子检测器迄今已成为制造超小型高分辨率SEM柱的瓶颈。

9. 发明授权

US6099393A Polishing method for semiconductors and apparatus therefor 失效
标题翻译：半导体抛光方法及其设备
公开(公告)号：US6099393A
公开(公告)日：2000-08-08
申请号：US80728
申请日：1998-05-21
申请人： Soichi Katagiri , Shigeo Moriyama , Kan Yasui , Katsuhiko Yamaguchi
发明人： Soichi Katagiri , Shigeo Moriyama , Kan Yasui , Katsuhiko Yamaguchi
IPC分类号： B24B37/00 , B24B53/007 , B24B53/013 , H01L21/304 , B24B1/00
CPC分类号： B24B53/017 , B24B53/013
摘要： In the polishing machine 10 for pressing the polished surface 7 of the workpiece 1 against the face where there are abrasives 15 of the rotating polishing tool 11 and executing chemical mechanical polishing, the brushing device 30, the cleaner 40, the abrasive supplier 52, and the pure water supplier 60 are sequentially arranged behind the location of the head 20 for pressing the workpiece 1 against the polishing tool 11 in the rotational direction. The cleaner 40 sprays the cleaning water 47 to the face where there are abrasives 15 of the rotating polishing tool 11 and sucks and collects it by the vacuum hole 45. Fresh slurry 62 is always supplied by the slurry supplier 63 comprising the abrasive supplier 52 and the pure water supplier 60.
摘要翻译：在用于将工件1的抛光表面7压靠在旋转抛光工具11的磨料15的表面上并执行化学机械抛光的抛光机10中，刷洗装置30，清洁器40，磨料供应器52和纯水供应器60顺序地布置在头部20的位置之后，用于将工件1沿着旋转方向压靠在抛光工具11上。清洁器40将清洗水47喷射到旋转研磨工具11的磨料15的表面，并通过真空孔45吸收并收集。新鲜浆料62总是由包含磨料供应器52的浆料供给器63供应，纯水供应商60。

10. 发明授权

US5222112A X-ray pattern masking by a reflective reduction projection optical system 失效
标题翻译：通过反射缩小投影光学系统的X射线图案掩模
公开(公告)号：US5222112A
公开(公告)日：1993-06-22
申请号：US812022
申请日：1991-12-23
申请人： Tsuneo Terasawa , Masaaki Itou , Shigeo Moriyama , Soichi Katagiri , Hiroshi Fukuda
发明人： Tsuneo Terasawa , Masaaki Itou , Shigeo Moriyama , Soichi Katagiri , Hiroshi Fukuda
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/7085 , G03F7/2039 , G03F7/702 , G03F7/70233 , G03F7/70283 , G03F7/70358 , G03F7/70558 , G03F7/70566 , G03F7/70583 , G21K1/06
摘要： In printing patterns on a mask onto a wafer with high accuracy via a reflective reduction projection optical system by using an X-ray or vacuum ultraviolet beam there is an elliptical mirror having a source position defined in an X-ray source and a position of reflection image of entrance pupil of an imaging optical system with respect to the mask as foci and introducing means for synchronously scanning the mask and wafer. Due to inserting a plane mirror for bending an X-ray by approximately 90.degree. at at least one point in the imaging optical system so that the plane of incidence may be perpendicular to the polarization plane the reflectivity does not lower even when the angle of incidence is 45.degree.. A reflecting mirror or an X-ray filter having a lower reflectivity in the peripheral part thereof as compared with the reflectivity of the central part thereof in the stop position of the imaging optical system, brings about an effect of lessened influence of mutual interference between adjacent pattern provides pattern printing with high shape accuracy.
摘要翻译：通过使用X射线或真空紫外线，通过反射式还原投影光学系统将掩模上的印刷图案高精度地印刷在晶片上，具有在X射线源和反射位置中定义的源位置的椭圆镜相对于掩模作为焦点的成像光学系统的入射光瞳的图像和用于同步扫描掩模和晶片的引入装置。由于在成像光学系统的至少一个点处插入用于将X射线弯曲大约90°的平面镜，使得入射平面可以垂直于偏振面，即使当入射角也是如此，反射率也不降低是45度。与其在成像光学系统的停止位置的中心部分的反射率相比，其周边部分具有较低反射率的反射镜或X射线滤光器产生相邻干涉的相互干扰影响减小的效果图案提供具有高形状精度的图案印刷。

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