专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08367211B2 Photochromic lens 有权
标题翻译：光致变色镜头
公开(公告)号：US08367211B2
公开(公告)日：2013-02-05
申请号：US12959201
申请日：2010-12-02
申请人： Xuzhi Qin , Hideyo Sugimura , Michael S. Boulineau , Thomas J. Moravec , Derek Harris
发明人： Xuzhi Qin , Hideyo Sugimura , Michael S. Boulineau , Thomas J. Moravec , Derek Harris
IPC分类号： B32B27/40
CPC分类号： B29D11/0073 , B32B27/08 , B32B27/18 , B32B27/40 , C08G18/10 , C08G18/4277 , C08G18/758 , C08K5/0041 , C08L75/04 , G02B1/041 , Y10T428/269 , Y10T428/31507 , Y10T428/31551 , Y10T428/31576 , C08G18/3206 , C08L2666/20
摘要： A cast photochromic lens including a photochromic film and a cast resin, curable by heat or radiation.
摘要翻译：包括光致变色膜和铸塑树脂的铸造光致变色透镜，可通过热或辐射固化。

2. 发明申请

US20070122626A1 Photochromic Lens 有权
标题翻译：光致变色镜头
公开(公告)号：US20070122626A1
公开(公告)日：2007-05-31
申请号：US11537571
申请日：2006-09-29
申请人： Xuzhi Qin , Hideyo Sugimura , Michael Boulineau , Thomas Moravec , Derek Harris
发明人： Xuzhi Qin , Hideyo Sugimura , Michael Boulineau , Thomas Moravec , Derek Harris
IPC分类号： B32B27/36 , B32B27/40
CPC分类号： B29D11/0073 , B32B27/08 , B32B27/18 , B32B27/40 , C08G18/10 , C08G18/4277 , C08G18/758 , C08K5/0041 , C08L75/04 , G02B1/041 , Y10T428/269 , Y10T428/31507 , Y10T428/31551 , Y10T428/31576 , C08G18/3206 , C08L2666/20
摘要： A cast photochromic lens including a photochromic film and a cast resin, curable by heat or radiation.
摘要翻译：包括光致变色膜和铸塑树脂的铸造光致变色透镜，可通过热或辐射固化。

3. 发明申请

US20060187411A1 Laminated functional wafer for plastic optical elements 有权
公开(公告)号：US20060187411A1
公开(公告)日：2006-08-24
申请号：US11398814
申请日：2006-04-05
申请人： Michael Boulineau , Eric Woelfle , Xuzhi Qin , Hideyo Sugimura , Derek Harris
发明人： Michael Boulineau , Eric Woelfle , Xuzhi Qin , Hideyo Sugimura , Derek Harris
IPC分类号： G02C7/10
CPC分类号： B29C45/14811 , B29C45/14836 , B29C2045/14901 , B29D11/0073 , B29K2029/04 , B29L2011/00 , G02C7/102 , G02C7/12 , G02C2202/16
摘要： A functional wafer of the present invention is disclosed to solve manufacturing difficulties involved in the production of optical elements such as polycarbonate ophthalmic lenses. The functional wafer may include a front layer, a functional layer, and a back layer, whereas the front layer and the back layer are bonded to the functional layer with or without additional adhesive. Said functional layer is smaller than at least the front layer by about 0.5 mm to 5 mm along the perimeter edge. A functional wafer of this construction can be conveniently and effectively incorporated into a lens through an insert injection molding process, in which said back layer will be in contact with the lens material.

4. 发明申请

US20110070432A1 Photochromic Lens 有权
标题翻译：光致变色镜头
公开(公告)号：US20110070432A1
公开(公告)日：2011-03-24
申请号：US12959201
申请日：2010-12-02
申请人： Xuzhi Qin , Hideyo Sugimura , Michael S. Boulineau , Thomas J. Moravec , Derek Harris
发明人： Xuzhi Qin , Hideyo Sugimura , Michael S. Boulineau , Thomas J. Moravec , Derek Harris
IPC分类号： B32B27/40 , B29D11/00 , G02B1/12
CPC分类号： B29D11/0073 , B32B27/08 , B32B27/18 , B32B27/40 , C08G18/10 , C08G18/4277 , C08G18/758 , C08K5/0041 , C08L75/04 , G02B1/041 , Y10T428/269 , Y10T428/31507 , Y10T428/31551 , Y10T428/31576 , C08G18/3206 , C08L2666/20
摘要： A cast photochromic lens including a photochromic film and a cast resin, curable by heat or radiation.
摘要翻译：包括光致变色膜和铸塑树脂的铸造光致变色透镜，可通过热或辐射固化。

5. 发明授权

US07858001B2 Photochromic lens 有权
标题翻译：光致变色镜头
公开(公告)号：US07858001B2
公开(公告)日：2010-12-28
申请号：US11537571
申请日：2006-09-29
申请人： Xuzhi Qin , Hideyo Sugimura , Michael S. Boulineau , Thomas J. Moravec , Derek Harris
发明人： Xuzhi Qin , Hideyo Sugimura , Michael S. Boulineau , Thomas J. Moravec , Derek Harris
IPC分类号： B29D11/00
CPC分类号： B29D11/0073 , B32B27/08 , B32B27/18 , B32B27/40 , C08G18/10 , C08G18/4277 , C08G18/758 , C08K5/0041 , C08L75/04 , G02B1/041 , Y10T428/269 , Y10T428/31507 , Y10T428/31551 , Y10T428/31576 , C08G18/3206 , C08L2666/20
摘要： A cast photochromic lens including a photochromic film and a cast resin, curable by heat or radiation.
摘要翻译：包括光致变色膜和铸塑树脂的铸造光致变色透镜，可通过热或辐射固化。

6. 发明授权

US07036932B2 Laminated functional wafer for plastic optical elements 有权
标题翻译：用于塑料光学元件的层压功能晶片
公开(公告)号：US07036932B2
公开(公告)日：2006-05-02
申请号：US10680658
申请日：2003-10-06
申请人： Michael S. Boulineau , Eric J. Woelfle , Xuzhi Qin , Hideyo Sugimura , Derek Harris
发明人： Michael S. Boulineau , Eric J. Woelfle , Xuzhi Qin , Hideyo Sugimura , Derek Harris
IPC分类号： G02C7/10
CPC分类号： B29C45/14811 , B29C45/14836 , B29C2045/14901 , B29D11/0073 , B29K2029/04 , B29L2011/00 , G02C7/102 , G02C7/12 , G02C2202/16
摘要： A functional wafer of the present invention is disclosed to solve manufacturing difficulties involved in the production of optical elements such as polycarbonate ophthalmic lenses. The functional wafer may include a front layer, a functional layer, and a back layer, whereas the front layer and the back layer are bonded to the functional layer with or without additional adhesive. Said functional layer is smaller than at least the front layer by about 0.5 mm to 5 mm along the perimeter edge. A functional wafer of this construction can be conveniently and effectively incorporated into a lens through an insert injection molding process, in which said back layer will be in contact with the lens material.
摘要翻译：公开了本发明的功能性晶片以解决制造诸如聚碳酸酯眼镜片之类的光学元件的制造困难。功能性晶片可以包括前层，功能层和背层，而前层和后层在有或没有附加粘合剂的情况下结合到功能层。所述功能层沿着周边边缘小于至少前层约0.5mm至5mm。这种结构的功能性晶片可以通过插入式注射成型工艺方便且有效地并入到透镜中，其中所述背层将与透镜材料接触。

7. 发明授权

US06562249B2 Method utilizing a magnetic assembly during etching thin shadow masks 失效
公开(公告)号：US06562249B2
公开(公告)日：2003-05-13
申请号：US09902456
申请日：2001-07-10
申请人： Craig Clay Eshleman , Charles Michael Wetzel , Randall Eugene McCoy , Leo B. Kriksunov , Lance Benjamin , Derek Harris , Thomas R. Sage
发明人： Craig Clay Eshleman , Charles Michael Wetzel , Randall Eugene McCoy , Leo B. Kriksunov , Lance Benjamin , Derek Harris , Thomas R. Sage
IPC分类号： C25F300
CPC分类号： H01J9/142
摘要： In an improved method of etching apertures in a thin metal sheet to form a shadow mask for a color picture tube, the metal sheet has a first acid-resistant stencil on one major surface thereof and a second acid-resistant stencil on the other major surface thereof. At least one of the stencils has openings therein at locations of intended apertures. The improvement comprises the steps of magnetically holding the metal sheet with a flat magnetic assembly, and moving the magnetic assembly magnetically holding the metal sheet thereon through an etching chamber. The magnetic assembly includes a magnetic layer that is supported on an acid-resistant board.

8. 发明授权

US06682875B2 Method and apparatus for imaging with fiber optic arrays on non-flat surfaces 失效
标题翻译：用于在非平坦表面上用光纤阵列进行成像的方法和装置
公开(公告)号：US06682875B2
公开(公告)日：2004-01-27
申请号：US09883685
申请日：2001-06-18
申请人： Leo B. Kriksunov , Derek Harris , John Mattson
发明人： Leo B. Kriksunov , Derek Harris , John Mattson
IPC分类号： G03F724
CPC分类号： G03F7/24 , H05K1/0284 , H05K3/0082 , H05K3/064
摘要： A photoresist etching process and system can be used for the etching of non-planar or three-dimensional surfaces by using a non-planar shaped fiber optic array or fiber optic panel. The array or panel has a contour or shape that may nest a non-planar or three-dimensional article or surface. The non-planar or three-dimensional article or surface has a photoresist composition on its surface facing the optical fibers of the fiber optic array or panel, and the article or surface is nested against the contour or shape of the array or panel. Radiation is transported through the optical fibers and exposes the photoresist composition. The optical fiber array may perform an image-wise exposure of the photoresist composition by appropriate blockage of the radiation before it enters or as it enters a distal end of the optical fibers. In this manner, an image-wise distribution of radiation is presented against the photoresist composition, and an image-wise developable resist pattern is created on the non-planar or three-dimensional article or surface. This process can be used on cylinders, tubes, spheres, undulating surfaces, blocks, wavy surfaces, stepped surfaces, and any other shape that can be standardized or formatted into a nesting shape.
摘要翻译：光致抗蚀剂蚀刻工艺和系统可用于通过使用非平面形状的光纤阵列或光纤面板来蚀刻非平面或三维表面。阵列或面板具有可嵌套非平面或三维制品或表面的轮廓或形状。非平面或三维制品或表面在其面向光纤阵列或面板的光纤的表面上具有光致抗蚀剂组合物，并且制品或表面嵌套在阵列或面板的轮廓或形状上。辐射通过光纤传输并暴露光致抗蚀剂组合物。光纤阵列可以在辐射入射之前适当地阻挡辐射，或者在进入光纤的远端时进行光致抗蚀剂组合物的成像曝光。以这种方式，针对光致抗蚀剂组合物呈现辐射的图像分布，并且在非平面或三维制品或表面上形成图像显影抗蚀剂图案。该过程可用于圆柱体，管子，球体，波状表面，块状，波浪形表面，台阶表面以及可被标准化或格式化成嵌套形状的任何其它形状。

9. 发明授权

US07377639B2 Laminated functional wafer for plastic optical elements 有权
标题翻译：用于塑料光学元件的层压功能晶片
公开(公告)号：US07377639B2
公开(公告)日：2008-05-27
申请号：US11398814
申请日：2006-04-05
申请人： Michael S. Boulineau , Eric J. Woelfle , Xuzhi Qin , Hideyo Sugimura , Derek Harris
发明人： Michael S. Boulineau , Eric J. Woelfle , Xuzhi Qin , Hideyo Sugimura , Derek Harris
IPC分类号： G02C7/02
CPC分类号： B29C45/14811 , B29C45/14836 , B29C2045/14901 , B29D11/0073 , B29K2029/04 , B29L2011/00 , G02C7/102 , G02C7/12 , G02C2202/16
摘要： A functional wafer of the present invention is disclosed to solve manufacturing difficulties involved in the production of optical elements such as polycarbonate ophthalmic lenses. The functional wafer may include a front layer, a functional layer, and a back layer, whereas the front layer and the back layer are bonded to the functional layer with or without additional adhesive. Said functional layer is smaller than at least the front layer by about 0.5 mm to 5 mm along the perimeter edge. A functional wafer of this construction can be conveniently and effectively incorporated into a lens through an insert injection molding process, in which said back layer will be in contact with the lens material.
摘要翻译：公开了本发明的功能性晶片以解决制造诸如聚碳酸酯眼镜片之类的光学元件的制造困难。功能性晶片可以包括前层，功能层和背层，而前层和后层在有或没有附加粘合剂的情况下结合到功能层。所述功能层沿着周边边缘小于至少前层约0.5mm至5mm。这种结构的功能性晶片可以通过插入式注射成型工艺方便且有效地并入到透镜中，其中所述背层将与透镜材料接触。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式