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1. 发明申请

US20040217013A1 Apparatus and method for electropolishing a metal wiring layer on a semiconductor device 审中-公开
标题翻译：在半导体器件上电镀金属布线层的装置和方法
公开(公告)号：US20040217013A1
公开(公告)日：2004-11-04
申请号：US10814381
申请日：2004-03-31
申请人： Samsung Electronics Co., Ltd.
发明人： Sun-jung Lee , Ki-chul Park
IPC分类号： H01L021/66 , C25F003/00 , B23H003/00
CPC分类号： H01L21/7684 , B23H3/00 , B23H5/08 , B23H9/00 , C25F3/02 , C25F7/00 , H01L21/32125
摘要： The present invention relates to an apparatus and method for electropolishing a metal wire layer on a semiconductor device. To electropolish the metal wiring layer, a wafer is dipped into an electrolyte solution, and positive and negative voltages are applied to the wafer and electrodes, respectively. The electrodes include a main electrode and a plurality of auxiliary electrodes disposed above the main electrode. In a preferred embodiment, the plurality of auxiliary electrodes are mesh-type electrodes and are annular in shape and concentrically disposed, and thus the electrolyte solution can readily flow between them. Further, the metal wiring layer is preferably sequentially electropolished outwardly from the center of the wafer by sequentially applying negative voltages to the plurality of annular auxiliary electrodes. In this manner, a uniform electropolishing process is performed.
摘要翻译：本发明涉及一种在半导体器件上对金属线层进行电解抛光的装置和方法。为了对金属布线层进行电解抛光，将晶片浸入电解质溶液中，并且将正和负电压分别施加到晶片和电极。电极包括主电极和设置在主电极上方的多个辅助电极。在一个优选实施例中，多个辅助电极是网状电极，并且是环形的并且同心设置，因此电解质溶液可以容易地在它们之间流动。此外，金属布线层优选通过依次向多个环形辅助电极施加负电压而从晶片的中心向外电镀抛光。以这种方式，进行均匀的电抛光处理。

2. 发明申请

US20030180631A1 Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same 有权
公开(公告)号：US20030180631A1
公开(公告)日：2003-09-25
申请号：US10370776
申请日：2003-02-24
申请人： HOYA CORPORATION
发明人： Yuuki Shiota , Osamu Nozawa , Ryo Ohkubo , Hideaki Mitsui
IPC分类号： G03F001/08 , B32B015/00 , B32B017/06 , B32B009/04 , B32B003/10 , B44C001/22 , C25F003/00
CPC分类号： G03F1/32 , G03F1/80 , Y10T428/24331 , Y10T428/31616
摘要： A halftone phase shift mask blank for use in manufacturing a halftone phase shift mask comprises a transparent substrate, a light transmitting portion formed on the substrate for transmitting an exposure light beam, a phase shifter portion formed on the substrate for transmitting a part of the exposure light beam as a transmitted light beam and for shifting a phase of the transmitted light beam by a predetermined amount, and a phase shifter film for forming the phase shifter portion. The halftone phase shift mask has an optical characteristic such that light beams passing through the light transmitting portion and through the phase shifter portion cancel each other in the vicinity of a boundary portion therebetween, thereby maintaining and improving an excellent contrast at a boundary portion of an exposure pattern to be transferred onto the surface of an object to be exposed. The phase shifter film comprises a film containing silicon, oxygen, and nitrogen as main components and an etching stopper film formed between the film and transparent substrate.

3. 发明申请

US20030178320A1 Method and composition for polishing a substrate 有权
标题翻译：抛光基材的方法和组合物
公开(公告)号：US20030178320A1
公开(公告)日：2003-09-25
申请号：US10378097
申请日：2003-02-26
申请人： APPLIED MATERIALS, INC.
发明人： Feng Q. Liu , Stan D. Tsai , Yongqi Hu , Siew S. Neo , Yan Wang , Alain Duboust , Liang-Yuh Chen
IPC分类号： C25F003/00 , B23H007/00 , B23H009/00
CPC分类号： H01L21/32125 , B23H3/08 , B23H5/08 , B24B37/0056 , B24B37/044 , B24B37/046 , C09G1/02 , C09G1/04 , C25F3/02 , H01L21/32134
摘要： Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition includes an acid based electrolyte system, one or more chelating agents, one or more corrosion inhibitors, one or more inorganic or organic acid salts, one or more pH adjusting agents to provide a pH between about 3 and about 10, a polishing enhancing material selected from the group of abrasive particles, one or more oxidizers, and combinations thereof, and a solvent. The composition may be used in an conductive material removal process including disposing a substrate having a conductive material layer formed thereon in a process apparatus comprising an electrode, providing the composition between the electrode and substrate, applying a bias between the electrode and the substrate, and removing conductive material from the conductive material layer.
摘要翻译：提供了抛光组合物和从衬底表面去除导电材料的方法。一方面，组合物包括酸性电解质体系，一种或多种螯合剂，一种或多种腐蚀抑制剂，一种或多种无机或有机酸盐，一种或多种pH调节剂，以提供约3至约10的pH ，选自磨料颗粒，一种或多种氧化剂及其组合的研磨增强材料和溶剂。该组合物可用于导电材料去除工艺中，包括在包括电极的处理设备中设置其上形成有导电材料层的衬底，在电极和衬底之间提供组合物，在电极和衬底之间施加偏压，以及从导电材料层去除导电材料。

4. 发明申请

US20030173330A1 Micromechanical component and method for producing the same 有权
标题翻译：微机械部件及其制造方法
公开(公告)号：US20030173330A1
公开(公告)日：2003-09-18
申请号：US10240339
申请日：2003-05-09
发明人： Markus Lutz
IPC分类号： C25F003/00
CPC分类号： B81C1/00333 , B81B2201/0235 , B81C2203/0136
摘要： A method of manufacturing a micromechanical component having the following steps is described: providing a substrate (1); providing a first micromechanical functional layer (5) on the sacrificial layer (4); structuring the first micromechanical functional layer (5) in such a manner that it is provided with a mobilizable sensor structure (6); providing and structuring a first sealing layer (8) on the structured first micromechanical functional layer (5); providing and structuring a second micromechanical functional layer (10) on the first sealing layer (8) which has at least a covering function and is at least partially anchored in the first micromechanical functional layer (5); making the sensor structure (6) movable and providing a second sealing layer (8) on the second micromechanical functional layer (10). A corresponding micromechanical component is also described.
摘要翻译：描述了制造具有以下步骤的微机械部件的方法：提供基板（1）; 在所述牺牲层（4）上提供第一微机械功能层（5）; 以使其设置有可调动传感器结构（6）的方式构造第一微机械功能层（5）; 在所述结构化的第一微机械功能层（5）上提供和构造第一密封层（8）; 在所述第一密封层（8）上提供和构造具有至少覆盖功能并且至少部分地锚定在所述第一微机械功能层（5）中的第一密封层（8）上的第二微机械功能层（10）。使传感器结构（6）可移动并在第二微机械功能层（10）上提供第二密封层（8）。还描述了相应的微机械部件。

5. 发明申请

US20030173230A1 Method and apparatus for substrate polishing 失效
标题翻译：用于基板抛光的方法和装置
公开(公告)号：US20030173230A1
公开(公告)日：2003-09-18
申请号：US10098796
申请日：2002-03-13
申请人： Applied Materials, Inc.
发明人： Ralph Wadensweiler , Alain Duboust , Liang-Yuh Chen , Manoocher Birang , Ratson Morad , Paul D. Butterfield
IPC分类号： C25F003/00 , C25F007/00
CPC分类号： B23H5/08 , C25F7/00
摘要： A method and apparatus are provided for polishing a substrate surface. In one aspect, an apparatus for polishing a substrate includes a conductive polishing pad and an electrode having a membrane disposed therebetween. The membrane is orientated relative the conductive pad in a manner that facilitates removal of entrained gas from electrolyte flowing towards the conductive pad. The apparatus may be part of an electrochemical polishing station that may optionally be part of a system that includes chemical mechanical polishing stations.
摘要翻译：提供了一种用于抛光衬底表面的方法和装置。一方面，用于抛光衬底的装置包括导电抛光垫和在其间设置有膜的电极。膜以相对于导电垫的方向定向，以便于从电解液中流出的夹带气体去除导电垫。该设备可以是电化学抛光站的一部分，其可以可选地是包括化学机械抛光站的系统的一部分。

6. 发明申请

US20030116529A1 Device for x-ray lithography 失效
标题翻译： X射线光刻设备
公开(公告)号：US20030116529A1
公开(公告)日：2003-06-26
申请号：US10203020
申请日：2002-11-08
发明人： Muradin Abubekirovich Kumakhov
IPC分类号： B44C001/22 , C25F003/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70191 , G03F7/702 , G03F7/7035 , G21K1/06
摘要： An invention relates to a contact lithography device and comprises a soft X-ray source (preferable as an X-ray tube 1 with a rotating anode), a half lens 2 for a divergent radiation of this source transforming to a quasi-parallel one (the said lens includes a set of channels for a radiation transporting with total external reflection, the said channels are oriented along a generatrix of barrel-shaped surfaces), the means for placing a mask 3 and a substrate 4 with a resist 5 applied on it (the said means are placed on the output face side of a half lens 2), and an absorbing filter 6 for smoothing a nonuniformity of a beam intensity of an emergent radiation of a half lens, presenting in intensity decreasing as from the center to the periphery of a beam. An absorbing filter 6 is placed between the radiation source 1 and the input face of a half lens 2, and a relationship of cross sizes of a half lens and its focal distance from the input side is chosen so that to provide a capture angle of a source radiation in the following limits:0.7/E1.5nullnullnull1.3/E1.5,where null is an angle of a radiation capture nullradnull; E is radiation energy of the used source nullkeVnull. A material, reflecting surface of the channels for a radiation transporting is made of, includes elements with an atomic number not more than 22, and radiation energy of the used source is 0.6-6 keV. Owing to the increased capture angle and an absorbing filter placing before the input of a half lens an efficiency of a source radiation using increases and simultaneously an area of a plate-substrate under processing magnifies and lens longevity increases.
摘要翻译：本发明涉及一种接触式光刻装置，其包括软X射线源（优选为具有旋转阳极的X射线管1），用于该源的发散辐射的半透镜2转换为准并行光源所述透镜包括一组用于具有全部外部反射的辐射传输的通道，所述通道沿着筒形表面的母线定向），用于将掩模3和基底4放置在其上的抗蚀剂5的装置（所述装置被放置在半透镜2的输出面侧），以及吸收滤光器6，用于平滑半透镜的出射辐射的光束强度的不均匀性，其强度从中心到第梁的外围。吸收滤光器6被放置在辐射源1和半透镜2的输入面之间，并且选择半透镜的交叉大小与其与输入侧的焦距的关系，以便提供一个源辐射在以下限度：0.7 / E1.5 <= psi <= 1.3 / E1.5，其中psi是辐射捕获角度[rad]; E是使用源的辐射能量[keV]。用于辐射传输的通道的反射表面的材料由原子数不大于22的元素构成，所使用的源的辐射能量为0.6-6keV。由于增加的捕获角度和放置在半透镜的输入之前的吸收滤光器，源辐射的使用效率增加并且同时处理中的板 - 基板的面积放大并且透镜寿命增加。

7. 发明申请

US20020179565A1 Coated beads and process utilizing such beads for forming an etch mask having a discontinuous regular pattern 失效
标题翻译：涂覆的珠粒和利用这种珠子的方法用于形成具有不连续规则图案的蚀刻掩模
公开(公告)号：US20020179565A1
公开(公告)日：2002-12-05
申请号：US10200850
申请日：2002-07-22
发明人： Joel M. Frendt
IPC分类号： B44C001/22 , C25F003/00
CPC分类号： B82Y30/00 , B82Y10/00 , G02F1/13394 , H01J9/025 , Y10S438/945 , Y10T428/24372 , Y10T428/25 , Y10T428/252 , Y10T428/256
摘要： A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating. Beads which have a core and a spacer coating are dispensed as a hexagonally-packed monolayer onto a thermo-adhesive layer, which is on a target layer. The beads are kept in place by a bead confinement wall. Following a vibrational step which facilitates hexagonal packing of the beads, the resultant assembly is heated so that the beads adhere to the adhesive layer. Excess beads are then discarded. Spacer shell material is then removed from each of the beads, leaving core etch masks. The core-masked target layer is then plasma etched to form a column of target material directly beneath each core. The cores and any spacer material underneath the cores are removed. The resulting circular island of target material may be used as an etch mask during wet isotropic etching of an underlying layer. Such a combination of plasma etching using the bead cores as a primary mask and a wet etch using the islands formed by the plasma etch as a secondary mask may be used to form micropoint cathode emitter tips in an underlying conductive or semiconductive layer.
摘要翻译：用于形成具有不连续规则图案的蚀刻掩模的方法使用珠，其中每个具有由可移除的间隔物涂层覆盖的基本上不可取的芯。具有芯和间隔层的珠粒作为六边形填充单层分配到目标层上的热粘合层上。珠子通过小珠限制壁保持在适当位置。在促进珠的六边形填充的振动步骤之后，加热所得组件，使得珠粘附到粘合剂层。然后丢弃多余的珠子。然后从每个珠粒中除去间隔壳材料，留下核心蚀刻掩模。然后将核心掩蔽的目标层进行等离子体蚀刻，以在每个核心的正下方形成目标材料柱。核心和核心下面的任何间隔物材料被去除。所得到的靶材料的圆形岛可以在下层的湿各向同性蚀刻期间用作蚀刻掩模。使用使用珠芯作为主掩模的等离子体蚀刻和使用通过等离子体蚀刻形成的岛作为二次掩模的湿蚀刻的这种组合可以用于在下面的导电或半导体层中形成微点阴极发射极尖端。

8. 发明申请

US20020148732A1 Method and apparatus for electrochemically depositing a material onto a workpiece surface 失效
标题翻译：将材料电化学沉积到工件表面上的方法和装置
公开(公告)号：US20020148732A1
公开(公告)日：2002-10-17
申请号：US09832657
申请日：2001-04-11
发明人： Ismail Emesh , Saket Chadda , Nikolay Korovin , Brian Mueller
IPC分类号： C25D005/06 , C25F003/00 , C25D017/00 , B23H009/00
CPC分类号： C25D17/001 , B23H5/08 , C25D5/06 , C25D5/22 , C25D17/14 , H01L21/2885 , H01L21/67167 , H01L21/67219 , H01L21/6723
摘要： An electrochemical deposition apparatus and method for depositing a material onto a surface of a workpiece and for polishing the material are disclosed. The apparatus includes a platen and a polishing surface, including a conductive material and conductors embedded therein, disposed proximate the platen. During material deposition, a bias is applied across the conductor and the platen to cause deposition of material onto the workpiece surface.
摘要翻译：公开了一种用于将材料沉积在工件的表面上并用于抛光材料的电化学沉积设备和方法。该设备包括压板和抛光表面，其包括邻近压板设置的导电材料和嵌入其中的导体。在材料沉积期间，跨导体和压板施加偏压以使材料沉积到工件表面上。

9. 发明申请

US20020139690A1 Electrolytic ozone water production method and device therefor and solid polymer electrolyte membrane regenerating method 失效
标题翻译：电解臭氧水生产方法及其设备及固体高分子电解质膜再生方法
公开(公告)号：US20020139690A1
公开(公告)日：2002-10-03
申请号：US09926344
申请日：2001-10-17
发明人： Takafumi Kanaya , Noriaki Okubo
IPC分类号： C25C001/00 , C25F003/00 , C25F007/00 , B23H003/00 , B23H009/00
CPC分类号： C25B9/12 , C25B1/13 , C25B15/02
摘要： A method for producing water containing ozone by electrolysis, using an apparatus comprising, an anodic electrode (3) disposed on one side of a solid polymer electrolyte membrane (5) and having a catalyst function for generating ozone, a cathode electrode (4) disposed on other side of the solid polymer electrolyte membrane (5), a mechanism for advancing and reversing both or at least one of the electrodes (3,4 ) as against the solid polymer electrolyte membrane (5), wherein DC voltage is applied between the both electrodes (3,4) in the state of the solid polymer electrolyte membrane (5) pressed by the both electrodes (3,4), water flows on both sides of the solid polymer electrolyte membrane (5), water containing ozone is produced at the anodic electrode (3) side by electrolysis of water current, further, an operation for changing the pressing force is carried out, in which the pressing force of the anodic electrode (3), the cathode electrode (4) or both electrodes (3,4) as against the solid polymer electrolyte membrane (5) changes in accordance with preset condition, after that, the pressing force returns to an original pressing force, thereby, a recovery of the solid polymer electrolyte membrane is carried out while continuing the production of the water containing ozone. And an apparatus thereof and a recovery method of the solid polymer electrolyte membrane.
摘要翻译：一种通过电解生产含臭氧的水的方法，使用的装置包括设置在固体聚合物电解质膜（5）的一侧上并具有用于产生臭氧的催化剂功能的阳极电极（3），设置有阴极电极在固体聚合物电解质膜（5）的另一侧上设置用于使固体聚合物电解质膜（5）上的两个或至少一个电极（3,4）前进和反转的机构，其中在电极固体高分子电解质膜（5）由两个电极（3,4）按压的状态下的两个电极（3,4），水在固体高分子电解质膜（5）的两侧流动，生成含臭氧的水通过电解电流在阳极电极（3）侧进行改变按压力的操作，其中阳极电极（3），阴极电极（4）或两个电极（ 3,4）反对固体高分子电解质膜（5）根据预设条件变化，之后压力恢复到原来的按压力，由此在继续生产含臭氧的水的同时进行固体高分子电解质膜的回收。及其固体高分子电解质膜的装置和回收方法。

10. 发明申请

US20020137247A1 Method of fabrication to sharpen corners of Y-branches in integrated optical components and other micro-devices 失效
标题翻译：用于锐化集成光学部件和其他微器件中的Y分支的角部的制造方法
公开(公告)号：US20020137247A1
公开(公告)日：2002-09-26
申请号：US09814424
申请日：2001-03-21
发明人： Francisco A. Leon , Everett X. Wang
IPC分类号： B44C001/22 , C25F003/00 , H01L021/00
CPC分类号： G02B6/136 , G02B6/125 , G02B2006/1213
摘要： Substantially sharp corners for optical waveguides in integrated optical devices, photonic crystal devices, or for micro-devices, can be fabricated. Non-sharp corners such as rounded corners, are first formed using lithographic patterning and vertical etching. Next, isotropic etching is used to sharpen the rounded corners. A monitor can be used to determine if the rounded corners have been sufficiently sharpened by the isotropic etching.
摘要翻译：可以制造用于集成光学器件，光子晶体器件或微器件中的光波导的基本上尖锐的角。首先使用平版印刷图案和垂直蚀刻来形成诸如圆角的非锐角。接下来，使用各向同性蚀刻来锐化圆角。可以使用监视器来确定通过各向同性蚀刻圆角是否已被充分锐化。

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