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    • 2. 发明申请
    • Ion exchange waveguides and methods fabrication
    • 离子交换波导和方法制造
    • US20050115491A1
    • 2005-06-02
    • US10919695
    • 2004-08-16
    • Lee Burrows
    • Lee Burrows
    • C30B15/00C30B33/00G02B6/12G02B6/134G02F1/035C30B1/00C30B3/00C30B5/00C30B28/02G02B6/10
    • G02F1/035C30B15/00C30B29/30C30B33/00G02B6/1345G02B2006/12169G02F2201/066G02F2201/07G02F2202/20Y10S117/91
    • A method for fabricating ion exchange waveguides, such as lithium niobate or lithium tantalate waveguides in optical modulators and other optical waveguide devices, utilizes pressurized annealing to further diffuse and limit exchange of the ions and includes ion exchanging the crystalline substrate with a source of ions and annealing the substrate by pressurizing a gas atmosphere containing the lithium niobate or lithium tantalate substrate above normal atmospheric pressure, heating the substrate to a temperature ranging from about 150 degrees Celsius to about 1000 degrees Celsius, maintaining pressure and temperature to effect greater ion diffusion and limit exchange, and cooling the structure to an ambient temperature at an appropriate ramp down rate. In another aspect of the invention a powder of the same chemical composition as the crystalline substrate is introduced into the anneal process chamber to limit the crystalline substrate from outgassing alkaline earth metal oxide during the anneal period. In yet another aspect of the invention an anneal container is provided that allows for crystalline substrates to be annealed in the presence of powder without contaminating the substrate with the powder during the anneal process. Waveguides manufactured in accordance with the method exhibit superior drift performance.
    • 用于制造离子交换波导的方法,如光调制器和其它光波导器件中的铌酸锂或钽酸锂波导,利用加压退火来进一步扩散和限制离子的交换,并且包括使晶体衬底与离子源离子交换, 通过将含有铌酸锂或钽酸锂衬底的气体气氛加压到正常大气压下来对衬底进行退火,将衬底加热至约150摄氏度至约1000摄氏度的温度,保持压力和温度以实现更大的离子扩散和限制 交换,并以适当的降速率将结构冷却至环境温度。 在本发明的另一方面,将与结晶基底相同的化学组成的粉末引入退火处理室中,以在退火期间限制结晶底物从脱气碱土金属氧化物。 在本发明的另一方面,提供一种退火容器,其允许结晶基材在粉末存在下进行退火,而不会在退火过程中用粉末污染基材。 根据该方法制造的波导显示出优异的漂移性能。
    • 3. 发明申请
    • Wafer produced thereby, and associated methods and devices using the wafer
    • 由此制造的晶片,以及使用晶片的相关方法和装置
    • US20030024472A1
    • 2003-02-06
    • US09920448
    • 2001-08-01
    • CRYSTAL PHOTONICS, INCORPORATED
    • Herbert Paul MaruskaJohn Joseph GallagherMitch M.C. Chou
    • C30B028/12C30B023/00C30B028/14C30B025/00
    • C30B25/02C30B25/18C30B29/403C30B29/406Y10S117/91
    • A method for making a free-standing, single crystal, gallium nitride (GaN) wafer includes forming a single crystal GaN layer directly on a single crystal LiAlO2 substrate using a gallium halide reactant gas, and removing the single crystal LiAlO2 substrate from the single crystal GaN layer to make the free-standing, single crystal GaN wafer. Forming the single crystal GaN layer may comprise depositing GaN by vapor phase epitaxy (VPE) using the gallium halide reactant gas and a nitrogen-containing reactant gas. Because gallium halide is used as a reactant gas rather than a metal organic reactant such as trimethygallium (TMG), the growth of the GaN layer can be performed using VPE which provides commercially acceptable rapid growth rates. In addition, the GaN layer is also devoid of carbon throughout. Because the GaN layer produced is high quality single crystal, it may have a defect density of less than about 107 cmnull2.
    • 制造独立的单晶氮化镓(GaN)晶片的方法包括:使用卤化镓反应气体直接在单晶LiAlO 2衬底上形成单晶GaN层,并从单晶中除去单晶LiAlO 2衬底 GaN层制作独立的单晶GaN晶圆。 形成单晶GaN层可以包括使用卤化镓反应气体和含氮反应气体通过气相外延(VPE)沉积GaN。 由于卤化镓用作反应气体而不是诸如三甲基镓(TMG)的金属有机反应物,所以可以使用提供商业上可接受的快速生长速率的VPE进行GaN层的生长。 另外,GaN层整体也没有碳。 由于所制造的GaN层是高质量的单晶,因此可能具有小于约107cm -2的缺陷密度。