会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Method for forming programmable logic arrays using vertical gate transistors
    • 使用垂直栅极晶体管形成可编程逻辑阵列的方法
    • US07164294B2
    • 2007-01-16
    • US10929831
    • 2004-08-30
    • Leonard ForbesKie Y. Ahn
    • Leonard ForbesKie Y. Ahn
    • G11C8/00H03K19/084G06F7/38H01L29/76
    • H01L27/112H01L27/11233H01L27/11803H01L29/42324H01L29/42368H01L29/66484H01L29/7831
    • One aspect disclosed herein relates to a method for forming a programmable logic array. Various embodiments of the method include forming a first logic plane and a second logic plane, each including a plurality of logic cells interconnected to implement a logical function. Forming the logic cells includes forming a horizontal substrate with a source region, a drain region, and a depletion mode channel region separating the source and the drain regions, and further includes forming a number of vertical gates located above different portions of the depletion mode channel region. At least one vertical gate is separated from the depletion mode channel region by a first oxide thickness, and at least one of the vertical gates is separated from the depletion mode channel region by a second oxide thickness. Other aspects and embodiments are provided herein.
    • 本文公开的一个方面涉及一种用于形成可编程逻辑阵列的方法。 该方法的各种实施例包括形成第一逻辑平面和第二逻辑平面,每个逻辑平面和第二逻辑平面包括互连的多个逻辑单元以实现逻辑功能。 形成逻辑单元包括:形成具有分离源极区和漏极区的源极区,漏极区和耗尽模式沟道区的水平衬底,并且还包括形成位于耗尽模式沟道的不同部分上方的多个垂直栅极 地区。 至少一个垂直栅极与耗尽模式沟道区分离第一氧化物厚度,并且至少一个垂直栅极与耗尽模式沟道区分离第二氧化物厚度。 本文提供了其它方面和实施例。