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1. 发明授权

US09766551B2 Heat actuated and projected lithography systems and methods 有权
公开(公告)号：US09766551B2
公开(公告)日：2017-09-19
申请号：US14439252
申请日：2013-10-15
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Xing Liao , Keith A. Brown , Guoliang Liu , Abrin L. Schmucker , Shu He , Wooyoung Shim , Daniel J. Eichelsdoerfer , Boris Rasin
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20 , G03F7/00 , B05D1/26 , B05D3/06 , G02B13/14 , B82Y40/00
CPC分类号： G03F7/7035 , B05D1/26 , B05D3/06 , B82Y40/00 , G02B13/143 , G03F7/0002 , G03F7/20 , G03F7/2049 , G03F7/70141 , G03F7/70325 , G03F7/70383 , G03F7/7045
摘要： In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array to selectively irradiate tips of the tip array and pattern the substrate, wherein the second pattern of radiation corresponds to a tip pattern for the second frame section; and repeating the disposing and projecting for each frame section in the set of frame sections to pattern the image.

2. 发明申请

US20150309073A1 MULTIFUNCTIONAL GRAPHENE COATED SCANNING TIPS 审中-公开
标题翻译：多功能石墨涂层扫描提示
公开(公告)号：US20150309073A1
公开(公告)日：2015-10-29
申请号：US14414042
申请日：2013-07-12
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Wooyoung Shim , Keith A. Brown , Boris Rasin , Xing Liao , Xiaozhu Zhou
IPC分类号： G01Q70/06 , G01Q70/16 , G01Q80/00 , G01Q70/14
CPC分类号： G01Q70/06 , G01Q70/14 , G01Q70/16 , G01Q80/00 , G03F7/0002
摘要： A coat micro tip can include a tip having a base and an oppositely disposed tip end having a radius of curvature of less than 1 μm and a graphene film conformally coated on the tip. A method of making a graphene coated tip can include immersing a tip in a fluid comprising a graphene film floating on a surface of the fluid over the tip, disposing the immersed tip at an angle relative to the graphene film floating on the surface of the fluid as measured from a plane parallel to the base of the tip, and coating the tip with the graphene film by gradually bringing the graphene film into contact with the tip while maintaining the relative angle between the floating portion of the film and the tip during coating
摘要翻译：涂层微尖端可以包括具有基部和相对设置的具有小于1μm的曲率半径的尖端的尖端和在尖端上共形涂覆的石墨烯膜。制造石墨烯涂覆的尖端的方法可以包括将尖端浸入包含漂浮在流体的表面上的石墨烯膜的流体超过尖端，将浸没的尖端相对于漂浮在流体表面上的石墨烯膜设置成一定角度从平行于尖端的基底的平面测量，并且通过逐渐使石墨烯膜与尖端接触而涂覆具有石墨烯膜的尖端，同时在涂覆期间保持膜的浮动部分与尖端之间的相对角度

3. 发明授权

US10203598B2 Gradient spray coating polymer pen arrays 有权
公开(公告)号：US10203598B2
公开(公告)日：2019-02-12
申请号：US15295914
申请日：2016-10-17
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Keith A. Brown , James L. Hedrick, III
IPC分类号： G03F7/00 , B05D5/06
摘要： The disclosure provides a method of inking a polymer pen lithography tip array (“PPL tip array”), including applying an ink composition to a PPL tip array using at least two spray applicators to deposit the ink as a non-uniform ink layer. The disclosure further provides a method of depositing at least two ink compositions on PPL tip array, including applying a first ink to a first defined area using a first spray applicator, and applying a second ink to a second defined area using a second spray applicator. The disclosure further provides a method of scaling a linear ink composition gradient provided by at least two spray applicators to a PPL tip array having a length, L, including positioning the spray applicators at a distance of about 5.0 L to about 8.0 L relative to the surface of the PPL tip array, positioning the spray applicators at a distance of about 0.5 L to about 3.0 L relative to each other, and applying an ink composition.

4. 发明申请

US20180059550A1 HEAT ACTUATED AND PROJECTED LITHOGRAPHY SYSTEMS AND METHODS 审中-公开
公开(公告)号：US20180059550A1
公开(公告)日：2018-03-01
申请号：US15693942
申请日：2017-09-01
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Xing Liao , Keith A. Brown , Guoliang Liu , Abrin L. Schmucke , Shu He , Wooyoung Shim , Daniel J. Eichelsdoerfer , Boris Rasin
IPC分类号： G03F7/20 , B05D1/26 , G03F7/00 , G02B13/14 , B05D3/06 , B82Y40/00
CPC分类号： G03F7/7035 , B05D1/26 , B05D3/06 , B82Y40/00 , G02B13/143 , G03F7/0002 , G03F7/20 , G03F7/2049 , G03F7/70141 , G03F7/70325 , G03F7/70383 , G03F7/7045
摘要： In accordance with an embodiment of the disclosure, a tip array can include an elastomeric tip substrate layer comprising a first surface and an oppositely disposed second surface, the tip substrate layer being formed from an elastomeric material; a plurality of tips fixed to the first surface, the tips each comprising a tip end disposed opposite the first surface, the tips having a radius of curvature of less than about 1 micron; and an array of heaters disposed on the second surface of the tip substrate layer and configured such that when the tip substrate layer is heated by a heater, a tip disposed in a location of a heated portion of tip substrate layer is lowered relative to a tip disposed in a location of an unheated portion of the tip substrate layer.

5. 发明申请

US20170115558A1 Silica polymer pen lithography 有权
公开(公告)号：US20170115558A1
公开(公告)日：2017-04-27
申请号：US15299565
申请日：2016-10-21
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Keith A. Brown , James L. Hedrick, III
IPC分类号： G03F7/00 , C23C16/50 , B81C1/00 , C23C16/40
CPC分类号： G03F7/0002 , C23C16/402
摘要： Provided here are hard transparent polymer pen arrays, methods of printing indicia using the same, and methods of preparing the same.

6. 发明申请

US20150210868A1 METHOD FOR SYNTHESIZING NANOPARTICLES ON SURFACES 审中-公开
标题翻译：在表面上合成纳米颗粒的方法
公开(公告)号：US20150210868A1
公开(公告)日：2015-07-30
申请号：US14419360
申请日：2013-09-06
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Guoliang Liu , Daniel J. Eichelsdoerfer , Keith A. Brown
IPC分类号： C09D11/10 , B05D1/02 , C08K3/22 , B05D1/18 , B05D1/28 , B05D3/00 , B05D1/00
CPC分类号： C09D11/10 , B05D1/005 , B05D1/02 , B05D1/18 , B05D1/28 , B05D3/007 , B22F1/00 , B22F1/0018 , B22F9/20 , B81C1/00111 , B81C2201/0149 , B82Y40/00 , C08K3/22 , C09D11/037 , C09D11/52 , C23C18/06 , C23C18/08
摘要： A method of forming a nanostructure on a substrate surface can include heating a substrate comprising a composition comprising a block copolymer and a nanostructure precursor to a temperature above the glass transition temperature of the block copolymer and below the decomposition temperature of the block copolymer to aggregate the nanostructure precursor to form a nanostructure precursor aggregated composition. The method can further include heating the nanostructure precursor aggregated composition to a temperature above the decomposition temperature of the nanostructure precursor to decompose the polymer and form the nanostructure.
摘要翻译：在衬底表面上形成纳米结构的方法可以包括将包含嵌段共聚物和纳米结构前体的组合物的衬底加热至高于嵌段共聚物的玻璃化转变温度的温度并且低于嵌段共聚物的分解温度以聚集纳米结构前体形成纳米结构前体聚集组合物。该方法还可以包括将纳米结构前体凝集组合物加热至高于纳米结构前体分解温度的温度以分解聚合物并形成纳米结构。

7. 发明申请

US20150185156A1 Dispersible Surface-Enhanced Raman Scattering Nanosheets 审中-公开
标题翻译：可分散表面增强拉曼散射纳米片
公开(公告)号：US20150185156A1
公开(公告)日：2015-07-02
申请号：US14415304
申请日：2013-07-30
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Kyle D. Osberg , Matthew J. Rycenga , Gilles R. Bourret , Keith A. Brown
IPC分类号： G01N21/65 , B42D25/30
CPC分类号： G01N21/658 , B42D25/30 , B82Y30/00 , Y10T428/24628 , Y10T428/24669 , Y10T428/249921 , Y10T428/249953 , Y10T428/256 , Y10T428/268 , Y10T428/27
摘要： Provided are nanosheets of SERS-active nanostructures embedded in the sheets and methods of using the same.
摘要翻译：提供了嵌入片材中的SERS活性纳米结构的纳米片和使用它们的方法。

8. 发明授权

US09971239B2 Silica polymer pen lithography 有权
公开(公告)号：US09971239B2
公开(公告)日：2018-05-15
申请号：US15299565
申请日：2016-10-21
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Keith A. Brown , James L. Hedrick, III
IPC分类号： G03F7/00 , C23C16/40
CPC分类号： G03F7/0002 , C23C16/402
摘要： Provided here are hard transparent polymer pen arrays, methods of printing indicia using the same, and methods of preparing the same.

9. 发明申请

US20170108772A1 GRADIENT SPRAY COATING POLYMER PEN ARRAYS 审中-公开
公开(公告)号：US20170108772A1
公开(公告)日：2017-04-20
申请号：US15295914
申请日：2016-10-17
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Keith A. Brown , James L. Hedrick, III
IPC分类号： G03F7/00 , B05D1/36 , B05D1/02
CPC分类号： G03F7/0002 , B05D5/061 , B05D2490/60
摘要： The disclosure provides a method of inking a polymer pen lithography tip array (“PPL tip array”), including applying an ink composition to a PPL tip array using at least two spray applicators to deposit the ink as a non-uniform ink layer. The disclosure further provides a method of depositing at least two ink compositions on PPL tip array, including applying a first ink to a first defined area using a first spray applicator, and applying a second ink to a second defined area using a second spray applicator. The disclosure further provides a method of scaling a linear ink composition gradient provided by at least two spray applicators to a PPL tip array having a length, L, including positioning the spray applicators at a distance of about 5.0 L to about 8.0 L relative to the surface of the PPL tip array, positioning the spray applicators at a distance of about 0.5 L to about 3.0 L relative to each other, and applying an ink composition.

10. 发明申请

US20150286148A1 Heat Actuated and Projected Lithography Systems and Methods 有权
标题翻译：热激活和投影光刻系统和方法
公开(公告)号：US20150286148A1
公开(公告)日：2015-10-08
申请号：US14439252
申请日：2013-10-15
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Xing Liao , Keith A. Brown , Guoliang Liu , Abrin L. Schmucker , Shu He , Wooyoung Shim , Daniel J. Eichelsdoerfer , Boris Rasin
IPC分类号： G03F7/20 , B05D3/06 , G02B13/14 , B05D1/26
CPC分类号： G03F7/7035 , B05D1/26 , B05D3/06 , B82Y40/00 , G02B13/143 , G03F7/0002 , G03F7/20 , G03F7/2049 , G03F7/70141 , G03F7/70325 , G03F7/70383 , G03F7/7045
摘要： In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array to selectively irradiate tips of the tip array and pattern the substrate, wherein the second pattern of radiation corresponds to a tip pattern for the second frame section; and repeating the disposing and projecting for each frame section in the set of frame sections to pattern the image.
摘要翻译：根据本公开的实施例，图案化方法可以包括将图像划分成一组帧部分; 在所述一组框架部分的每个框架部分中确定要由所述尖端阵列的每个尖端构图的图像的相应部分的尖端图案; 将所述尖端阵列布置在所述基板的第一位置中的图案化位置，所述第一位置对应于所述基板的位置，所述框架部分组中的第一框架部分将被构图; 将第一辐射模式投影到所述尖端阵列上以选择性地照射所述尖端阵列中的一个或多个尖端并对所述衬底进行图案化，其中所述第一辐射图案对应于所述第一框架部分的尖端图案; 将所述末端阵列布置在所述基板的第二位置中的对应于所述基板的位置的图案化位置中，在所述基板的位置中所述框架部分组中的第二框架部分将被图案化; 将第二辐射模式投影到所述尖端阵列上以选择性地照射所述尖端阵列的尖端并对所述衬底进行图案化，其中所述第二辐射图案对应于所述第二框架部分的尖端图案; 并且重复对所述一组帧部分中的每个帧部分的布置和投影以对图像进行图案化。

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