专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09552958B2 Alignment marking for rock sample analysis 有权
标题翻译：岩石样品分析对准标记
公开(公告)号：US09552958B2
公开(公告)日：2017-01-24
申请号：US14189506
申请日：2014-02-25
申请人： Weatherford/Lamb, Inc.
发明人： Kultaransingh N. Hooghan
IPC分类号： H01J37/20 , H01J37/28 , G01N23/225 , G01N1/32
CPC分类号： H01J37/20 , G01N1/32 , G01N23/2251 , G01N23/2255 , G01N2223/616 , H01J37/28 , H01J2237/08 , H01J2237/202 , H01J2237/3174 , H01J2237/31749
摘要： A method for using a Focused Ion Beam and/or Scanning Electron Microscope (FIB/SEM) for etching one or more alignment markers on a rock sample, the one or more alignment markers being etched on the rock sample using the FIB/SEM. The one or more alignment markers may further be deposited with a platinum alloy or other suitable compositions for increasing alignment marker visibility.
摘要翻译：使用聚焦离子束和/或扫描电子显微镜（FIB / SEM）蚀刻岩石样品上的一个或多个对准标记物的方法，使用FIB / SEM在岩石样品上蚀刻一个或多个对准标记。一个或多个对准标记可以进一步用铂合金或其它合适的组合物沉积，以增加对准标记的可视性。

2. 发明申请

US20150243471A1 Alignment Marking for Rock Sample Analysis 有权
标题翻译：岩石样品分析对准标记
公开(公告)号：US20150243471A1
公开(公告)日：2015-08-27
申请号：US14189506
申请日：2014-02-25
申请人： Weatherford/Lamb, Inc.
发明人： Kultaransingh N. Hooghan
IPC分类号： H01J37/20 , H01J37/28
CPC分类号： H01J37/20 , G01N1/32 , G01N23/2251 , G01N23/2255 , G01N2223/616 , H01J37/28 , H01J2237/08 , H01J2237/202 , H01J2237/3174 , H01J2237/31749
摘要： A method for using a Focused Ion Beam and/or Scanning Electron Microscope (FIB/SEM) for etching one or more alignment markers on a rock sample, the one or more alignment markers being etched on the rock sample using the FIB/SEM. The one or more alignment markers may further be deposited with a platinum alloy or other suitable compositions for increasing alignment marker visibility.
摘要翻译：使用聚焦离子束和/或扫描电子显微镜（FIB / SEM）蚀刻岩石样品上的一个或多个对准标记物的方法，使用FIB / SEM在岩石样品上蚀刻一个或多个对准标记。一个或多个对准标记可以进一步用铂合金或其它合适的组合物沉积，以增加对准标记的可视性。

3. 发明申请

US20140291508A1 FOCUSED ION BEAM APPARATUS, METHOD FOR OBSERVING CROSS-SECTION OF SAMPLE BY USING THE SAME, AND STORAGE MEDIUM 有权
标题翻译：聚焦离子束装置，使用该方法观察样品交叉分段的方法和储存介质
公开(公告)号：US20140291508A1
公开(公告)日：2014-10-02
申请号：US14224164
申请日：2014-03-25
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Atsushi UEMOTO , Xin MAN , Tatsuya ASAHATA
IPC分类号： H01J37/04
CPC分类号： H01J37/28 , G01N23/2255 , G01N2223/045 , H01J37/222 , H01J2237/226 , H01J2237/24585 , H01J2237/2804 , H01J2237/2806 , H01J2237/2807
摘要： A focused ion beam apparatus including: a focused ion beam irradiation mechanism forming first and second cross-sections; a first image generation unit generating a first image, including a reflected electron image or a secondary electron image, of the first and second cross-sections; a second image generation unit generating a second image, including an EDS image or a secondary ion image, of the first and second cross-sections; and a control section causing the second image generation unit to generate the second image of the second cross-section, in a case where the first and second images of the first cross-section are acquired, the first image of the second cross-section is acquired, and the first image of the second cross-section includes a region different from a region representing a specific composition in the first image of the first cross-section.
摘要翻译：一种聚焦离子束装置，包括：形成第一和第二横截面的聚焦离子束照射机构; 产生包括第一和第二横截面的反射电子图像或二次电子图像的第一图像的第一图像生成单元; 产生包括第一和第二横截面的EDS图像或二次离子图像的第二图像的第二图像生成单元; 以及控制部，其使得所述第二图像生成部生成所述第二横截面的第二图像，在获取所述第一横截面的所述第一图像和所述第二图像的情况下，所述第二横截面的所述第一图像为并且第二横截面的第一图像包括与表示第一横截面的第一图像中的特定构图的区域不同的区域。

4. 发明申请

US20140131575A1 CROSS-SECTION PROCESSING AND OBSERVATION METHOD AND CROSS-SECTION PROCESSING AND OBSERVATION APPARATUS 有权
标题翻译：交叉处理和观察方法及交叉处理和观察装置
公开(公告)号：US20140131575A1
公开(公告)日：2014-05-15
申请号：US14078852
申请日：2013-11-13
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Atsushi UEMOTO , Xin MAN , Tatsuya ASAHATA
IPC分类号： H01J37/28
CPC分类号： H01J37/265 , G01N1/32 , G01N23/04 , G01N23/2208 , G01N23/225 , G01N23/2251 , G01N23/2255 , G01T1/36 , H01J37/28 , H01J37/3005 , H01J37/304 , H01J37/3045 , H01J2237/2611 , H01J2237/28 , H01J2237/2807 , H01J2237/2812 , H01J2237/30472 , H01J2237/30483 , H01J2237/31745 , H01J2237/31749
摘要： A cross-section processing and observation method performed by a cross-section processing and observation apparatus, the method comprising: a cross-section processing step of forming a cross-section by irradiating a sample with an ion beam; a cross-section observation step of obtaining an observation image of the cross-section by irradiating the cross-section with an electron beam; and repeating the cross-section processing step and the cross-section observation step so as to obtain observation images of a plurality of cross-sections, wherein, in a case where Energy Dispersive X-ray Spectrometry (EDS) measurement of the cross-section is performed and an X-ray of a specified material is detected, an irradiation condition of the ion beam is changed so as to obtain observation images of a plurality of cross-sections of the specified material, and the cross-section processing and observation of the specified material is performed.
摘要翻译：一种横截面加工和观察装置的横截面处理和观察方法，该方法包括：横截面处理步骤，用离子束照射样品形成横截面; 横截面观察步骤，通过用电子束照射横截面来获得横截面的观察图像; 并且重复横截面处理步骤和横截面观察步骤以获得多个横截面的观察图像，其中，在横截面的能量分散X射线光谱（EDS）测量的情况下并且检测到特定材料的X射线，改变离子束的照射条件以获得指定材料的多个横截面的观察图像，并且对横截面加工和观察执行指定的材料。

5. 发明授权

US08648299B2 Isotope ion microscope methods and systems 有权
标题翻译：同位素离子显微镜的方法和系统
公开(公告)号：US08648299B2
公开(公告)日：2014-02-11
申请号：US13783534
申请日：2013-03-04
申请人： John A. Notte, IV , Sybren Sijbrandij
发明人： John A. Notte, IV , Sybren Sijbrandij
IPC分类号： G01N23/225 , H01J37/317 , H01J37/30
CPC分类号： H01J37/285 , G01N23/2255 , H01J37/08 , H01J37/28 , H01J37/317 , H01J2237/0807 , H01J2237/2817
摘要： Ion microscope methods and systems are disclosed. In general, the systems and methods involve relatively light isotopes, minority isotopes or both. In some embodiments, an isotope of Neon is used.
摘要翻译：公开了离子显微镜的方法和系统。通常，系统和方法涉及相对较轻的同位素，少数同位素或两者。在一些实施方案中，使用氖的同位素。

6. 发明授权

US08519329B2 Time-of-flight mass spectrometry of surfaces 有权
标题翻译：飞行时间质谱的表面
公开(公告)号：US08519329B2
公开(公告)日：2013-08-27
申请号：US13328091
申请日：2011-12-16
申请人： J. Albert Schultz , Thomas F. Egan , Steven R. Ulrich , Kelley L. Waters
发明人： J. Albert Schultz , Thomas F. Egan , Steven R. Ulrich , Kelley L. Waters
IPC分类号： H01J49/40
CPC分类号： H01J49/40 , G01N23/203 , G01N23/2206 , G01N23/2255
摘要： The present invent provides a particle detector for counting and measuring the flight time of secondary electrons and scattered ions and neutrals and to correlate coincidences between these and backscattered ions/and neutrals while maintaining a continuous unpulsed microfocused primary ion beam for impinging a surface. Intensities of the primary particle scattering and secondary particle emissions are correlated with the position of impact of the focused beam onto a materials surface so that a spatially resolved surface elemental and electronic structural mapping is obtained by scanning the focused beam across the surface.
摘要翻译：本发明提供了一种用于计数和测量二次电子和散射离子和中性粒子的飞行时间的粒子检测器，并且使这些和背散射离子和中性粒子之间的一致性相关联，同时保持用于冲击表面的连续的未脉冲的聚焦的初始离子束。初级粒子散射和二次粒子发射的强度与聚焦光束在材料表面上的冲击位置相关，从而通过扫描聚焦束穿过表面获得空间分辨的表面元素和电子结构映射。

7. 发明授权

US08399834B2 Isotope ion microscope methods and systems 有权
标题翻译：同位素离子显微镜的方法和系统
公开(公告)号：US08399834B2
公开(公告)日：2013-03-19
申请号：US12999683
申请日：2009-05-26
申请人： John Notte, IV , Sybren Sijbrandij
发明人： John Notte, IV , Sybren Sijbrandij
IPC分类号： G01N23/225 , G21K5/00 , H01J37/08 , H01J1/50 , H01J3/14
CPC分类号： H01J37/285 , G01N23/2255 , H01J37/08 , H01J37/28 , H01J37/317 , H01J2237/0807 , H01J2237/2817
摘要： Ion microscope methods and systems are disclosed. In general, the systems and methods involve relatively light isotopes, minority isotopes or both. In some embodiments, He-3 is used.
摘要翻译：公开了离子显微镜的方法和系统。通常，系统和方法涉及相对较轻的同位素，少数同位素或两者。在一些实施方案中，使用He-3。

8. 发明申请

US20110127428A1 ELECTRON DETECTION SYSTEMS AND METHODS 审中-公开
标题翻译：电子检测系统和方法
公开(公告)号：US20110127428A1
公开(公告)日：2011-06-02
申请号：US12994316
申请日：2009-05-26
申请人： Raymond Hill , John A. Notte, IV
发明人： Raymond Hill , John A. Notte, IV
IPC分类号： G01N23/225
CPC分类号： G01N23/2255 , H01J37/244 , H01J37/28 , H01J2237/0807 , H01J2237/2448 , H01J2237/2449
摘要： Systems and methods to detect electrons from one or more samples are disclosed. In some embodiments, the systems and methods involve one or more magnetic field sources, for deflecting secondary electrons emitted from the surface of the samples.
摘要翻译：公开了从一个或多个样品检测电子的系统和方法。在一些实施例中，系统和方法涉及用于偏转从样品表面发射的二次电子的一个或多个磁场源。

9. 发明申请

US20110073758A1 MICRO-SAMPLE PROCESSING METHOD, OBSERVATION METHOD AND APPARATUS 有权
标题翻译：微量样品处理方法，观察方法和装置
公开(公告)号：US20110073758A1
公开(公告)日：2011-03-31
申请号：US12963201
申请日：2010-12-08
申请人： Tsuyoshi OHNISHI
发明人： Tsuyoshi OHNISHI
IPC分类号： G01N23/04
CPC分类号： H01J37/26 , G01N23/2255 , H01J37/244 , H01J37/3056 , H01J2237/30466 , H01J2237/30472
摘要： As sample sizes have decreased to microscopic levels, it has become desirable to establish a method for thin film processing and observation with a high level of positional accuracy, especially for materials which are vulnerable to electron beam irradiation. The technological problem is to judge a point at which to end FIB processing and perform control so that the portion to be observed ends up in a central portion of the thin film. The present invention enables display of structure in cross-section by setting a strip-like processing region in an inclined portion of a sample cross-section and enlarging the display of the strip-like processing region on a processing monitor in a short-side direction. It is then possible to check the cross-sectional structure without additional use of an electron beam. Since it is possible to check the processed section without using an electron beam, electron beam-generated damage or deformation to the processed section is avoided. Further, performing the observation using a high-speed electron beam after forming the thin film enables observation with suppressed sample damage. Processing of even thinner thin films using the FIB while observing images of the sample generated using an electron beam is then possible.
摘要翻译：由于样品尺寸已经降低到微观水平，因此希望以高水平的位置精度建立薄膜加工和观察方法，特别是对于易受电子束照射的材料而言。技术问题是判断结束FIB处理的一个点并进行控制，使得待观察的部分最终在薄膜的中心部分。本发明能够通过在样本横截面的倾斜部分中设置条状处理区域并且在短边方向上在处理监视器上放大带状处理区域的显示来显示横截面结构。然后可以检查横截面结构，而不需要额外使用电子束。由于可以在不使用电子束的情况下检查处理部分，因此避免了对处理部分的电子束产生的损伤或变形。此外，在形成薄膜之后使用高速电子束进行观察使得能够以抑制的样品损伤进行观察。然后可以使用FIB处理甚至更薄的薄膜，同时观察使用电子束产生的样品的图像。

10. 发明授权

US07531796B2 Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods 有权
标题翻译：聚焦离子束装置和样品截面成型及薄片样品制备方法
公开(公告)号：US07531796B2
公开(公告)日：2009-05-12
申请号：US11840575
申请日：2007-08-17
申请人： Junichi Tashiro , Yutaka Ikku , Toshiaki Fujii
发明人： Junichi Tashiro , Yutaka Ikku , Toshiaki Fujii
IPC分类号： H01J37/305 , H01J37/30 , G01N23/22
CPC分类号： G01N23/2255 , G01N1/32 , G01N2223/104 , G01N2223/32 , G01N2223/611 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/30466 , H01J2237/30488 , H01J2237/31745 , H01J2237/31749
摘要： Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing amount of the detected secondary electron signal an end-point detecting mechanism detects an end point to thereby terminate the etching, so that a center position of a defect or a contact hole is effectively detected even with an FIB apparatus not having a SEM observation function.
摘要翻译：检测到的是通过照射聚焦离子束而同时进行蚀刻样品部分和周围扫描照射聚焦离子束而产生的二次电子。从检测到的二次电子信号的变化量中，终点检测机构检测终点，从而终止蚀刻，即使不具有SEM的FIB装置也能够有效地检测缺陷或接触孔的中心位置观察功能。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式