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1. 发明申请

US20230083479A1 Scatter Diagram Display Device, Scatter Diagram Display Method, and Analyzer 有权
公开(公告)号：US20230083479A1
公开(公告)日：2023-03-16
申请号：US17941540
申请日：2022-09-09
申请人： JEOL Ltd.
发明人： Naoki Kato , Takashi Kimura , Kazunori Tsukamoto
IPC分类号： G01N23/2252
摘要： Provided is a scatter diagram display device that creates a plurality of scatter diagrams based on mapping data acquired by an analyzer and displays a scatter diagram matrix in which the created plurality of scatter diagrams are arranged in a matrix on a display section, the scatter diagram display device including: a display condition acceptance section that accepts a designation of a display range of an item in each of the plurality of scatter diagrams, and a display control section that extracts all scatter diagrams having the item whose display range has been designated from the plurality of scatter diagrams and changes the display range of the item in the extracted scatter diagrams based on the designation of the display range.

2. 发明授权

US11579100B2 Method for determining a material composition 有权
公开(公告)号：US11579100B2
公开(公告)日：2023-02-14
申请号：US17095336
申请日：2020-11-11
申请人： BRUKER NANO GMBH
发明人： Ralf Terborg
IPC分类号： G01N23/2252 , G01J3/443 , G01B15/02
摘要： A method comprises the steps of: (a) Obtaining a measured X-ray spectrum for the coated sample, for determining characteristics for the sample and for a coating material; (b) Determining a simulated X-ray spectrum for the sample based on an initial sample composition; (c) Determining an adapted sample composition that improves a match between the characteristics of the sample and an adapted simulated X ray spectrum; (d) Determining an adapted coating thickness for the coating material based on the adapted sample composition and characteristics of the coating; and (e) Repeating the steps (b) to (d) using the adapted sample composition and the adapted coating thickness of the coating material instead of the initial values, wherein the coating thickness is used for determining an absorption of X-rays.

3. 发明授权

US11378530B2 Apparatus and method for analyzing chemical state of battery material 有权
公开(公告)号：US11378530B2
公开(公告)日：2022-07-05
申请号：US16971518
申请日：2018-02-21
申请人： Shimadzu Corporation
发明人： Kenji Sato , Satoshi Tokuda , Takuro Izumi , Tetsuya Yoneda , Susumu Adachi
IPC分类号： G01N23/223 , G01N23/207 , G01N23/2209 , G01N23/2252
摘要： A chemical state analysis apparatus 10 includes: an excitation source 11 configured to irradiate an irradiation region A of a predetermined surface in a sample S containing a battery material with an excitation rays for generating characteristic X-rays of the battery material; an analyzing crystal 13 of a flat plate arranged so as to face the irradiation region A; a slit 12 arranged between the irradiation region A and the analyzing crystal 13, the slit being arranged in parallel to the irradiation region A and a predetermined crystal plane of the analyzing crystal 13; an X-ray linear sensor 15 in which linear detecting elements 151 each having a length in a direction parallel to the slit 12 are arranged in a direction perpendicular to the slit; a wavelength spectrum generation unit 161 configured to generate a wavelength spectrum based on intensity of the characteristic X-rays detected by the X-ray linear sensor 15; a peak wavelength determination unit 162 configured to determine a peak wavelength which is a wavelength in a peak of the wavelength spectrum; and a chemical state specification unit 163 configured to specify a value for specifying a chemical state of the battery material in the sample S from the peak wavelength determined by the peak wavelength determination unit 162 and a standard curve representing a relation between a value representing the chemical state and the peak wavelength.

4. 发明申请

US20220155246A1 SURFACE ANALYZER 有权
公开(公告)号：US20220155246A1
公开(公告)日：2022-05-19
申请号：US17360711
申请日：2021-06-28
申请人： Shimadzu Corporation
发明人： Akira OGOSHI
IPC分类号： G01N23/2252 , G01N23/223
摘要： A surface analyzer is provided with a measuring unit, a scatter diagram generation unit, a cluster analysis unit, and a cluster region detection unit. The measuring unit acquires a signal reflecting a quantity of each of a plurality of components or elements that are analysis targets at a plurality of positions on a sample. The scatter diagram generation unit generates a scatter diagram based on a measurement result by the measuring unit. The cluster analysis unit performs the clustering of points in the scatter diagram. The cluster region detection unit acquires, based on clustering information given to each point in the scatter diagram by the cluster analysis unit, for each cluster, cluster region boundary information on a polygon having a predetermined number or less of vertices.

5. 发明申请

US20220026373A1 METHODS AND SYSTEMS FOR INCLUSION ANALYSIS 有权
公开(公告)号：US20220026373A1
公开(公告)日：2022-01-27
申请号：US17496605
申请日：2021-10-07
申请人： FEI Company
发明人： Jean-Marc Bohlen , Cornelis van Beek
IPC分类号： G01N21/892 , G01N21/67 , G01N23/2252
摘要： Various methods and systems are provided for analyzing sample inclusions. As one example, a correction factor may be generated based on inclusion properties of a first sample determined using both an optical emission spectrometry (OES) system and a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system. The OES system may be calibrated with the correction factor. The inclusion properties of a second, different, sample may be determined using the calibrated OES system.

6. 发明申请

US20210389262A1 X-RAY ANALYSIS APPARATUS AND X-RAY GENERATION UNIT 有权
公开(公告)号：US20210389262A1
公开(公告)日：2021-12-16
申请号：US17287696
申请日：2019-08-27
申请人： HORIBA, LTD.
发明人： Tomoki AOYAMA
IPC分类号： G01N23/2252 , G01N23/223
摘要： The X-ray analysis apparatus contains an X-ray generation unit. The X-ray generation unit includes a target plate having a target that is irradiated with an electron beam from an electron beam source and generates X-rays, X-ray convergence optics that converges X-rays generated from the target in conjunction with a movement of the target plate, and a driving unit that changes a position of the target plate or the X-ray convergence optics relative to the electron beam source.

7. 发明申请

US20210231652A1 ORGANOMETALLIC LABELS FOR THE DETECTION OF BIOMOLECULES, METHODS OF SYNTHESIS AND PROCESSES FOR CONJUGATING AN ORGANOMETALLIC LABELS TO A BIOMOLECULE 有权
公开(公告)号：US20210231652A1
公开(公告)日：2021-07-29
申请号：US17059081
申请日：2019-05-30
申请人： George Mason Research Foundation, Inc.
发明人： Lance A. LIOTTA , Alessandra Luchini KUNKEL , Amanda N. Haymond STILL
IPC分类号： G01N33/543 , G01N23/2252
摘要： A labeling molecule is provided. The labeling molecule includes a compound of the following formula: CA-(M)-A]n. In the formula, “A” is a label anchor moiety, “M” is an identification moiety, and “CA” is a coordination agent moiety. The label anchor is an organic moiety that binds to a surface of a targeted biomolecule through noncovalent or covalent interactions at one end of the label anchor and binds a coordination moiety. The coordination moiety includes an identification moiety at an end that is distal to the end conjugated to the surface of the targeted biomolecule, and the subscript “n” is 1, 2, 3, 4, or 5.

8. 发明申请

US20210181128A1 X-RAY BASED EVALUATION OF A STATUS OF A STRUCTURE OF A SUBSTRATE 有权
公开(公告)号：US20210181128A1
公开(公告)日：2021-06-17
申请号：US17153765
申请日：2021-01-20
申请人： APPLIED MATERIALS ISRAEL LTD.
发明人： Dror Shemesh
IPC分类号： G01N23/2252 , G01N23/2206
摘要： A method for x-ray based evaluation of a status of a structure of a substrate, the method may include acquiring an electron image of a region of the substrate, the region comprises the structure; acquiring an x-ray image of the structure; and evaluating the status of the structure, wherein the evaluating is based at least on a number of x-ray photons that were emitted from the structure.

9. 发明授权

US10928336B1 X-ray based evaluation of a status of a structure of a substrate 有权
公开(公告)号：US10928336B1
公开(公告)日：2021-02-23
申请号：US16525037
申请日：2019-07-29
申请人： APPLIED MATERIALS ISRAEL LTD.
发明人： Dror Shemesh
IPC分类号： G01N23/22 , G01N23/2252 , G01N23/2206
摘要： A method for x-ray based evaluation of a status of a structure of a substrate, the method may include acquiring an electron image of a region of the substrate, the region comprises the structure; acquiring an x-ray image of the structure; and evaluating the status of the structure, wherein the evaluating is based at least on a number of x-ray photons that were emitted from the structure.

10. 发明申请

US20210033550A1 X-RAY BASED EVALUATION OF A STATUS OF A STRUCTURE OF A SUBSTRATE 有权
公开(公告)号：US20210033550A1
公开(公告)日：2021-02-04
申请号：US16525037
申请日：2019-07-29
申请人： APPLIED MATERIALS ISRAEL LTD.
发明人： Dror Shemesh
IPC分类号： G01N23/2252 , G01N23/2206
摘要： A method for x-ray based evaluation of a status of a structure of a substrate, the method may include acquiring an electron image of a region of the substrate, the region comprises the structure; acquiring an x-ray image of the structure; and evaluating the status of the structure, wherein the evaluating is based at least on a number of x-ray photons that were emitted from the structure.

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