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1. 发明授权

US12043225B1 Cleaning vehicle sensors 有权
公开(公告)号：US12043225B1
公开(公告)日：2024-07-23
申请号：US17540051
申请日：2021-12-01
申请人： Zoox, Inc.
发明人： Rajith Jayaratne , Daniel Glenn Johnson , Bingchao Han , Carter William McEathron , Raghuraman Surineedi , Evan David Cook
IPC分类号： B60S1/62 , B08B5/02
CPC分类号： B60S1/62 , B08B5/02 , B08B2240/00
摘要： Techniques are described for cleaning sensors of a vehicle. An attribute of the surrounding environment (e.g., type of precipitation, intensity of precipitation, etc.) is determined along with orientations and/or attributes of the sensors (e.g. fields-of-view, focal lengths, spectral ranges, etc). Cleaning frequencies are then be determined based, at least in part, on the attribute of the environment together with the orientations and/or attributes of the sensors. Cleaning elements are then activated at the determined frequencies to clean the sensors. In some examples, the cleaning frequencies may be determined based additionally on an attribute of travel of the vehicle (e.g. direction of travel of the vehicle, speed of the vehicle, etc.).

2. 发明公开

US20240001409A1 METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER 审中-公开
公开(公告)号：US20240001409A1
公开(公告)日：2024-01-04
申请号：US18226495
申请日：2023-07-26
申请人： Kuang-Wei Cheng , Cheng-Lung Wu , Chyi-Tsong Ni
发明人： Kuang-Wei Cheng , Cheng-Lung Wu , Chyi-Tsong Ni
IPC分类号： B08B3/02 , B08B3/04
CPC分类号： B08B3/02 , B08B3/04 , B08B2240/00
摘要： A method of cleaning a semiconductor wafer includes: loading a semiconductor wafer into a cell having an annular trough; moving a plurality of nozzles into operational orientations for spraying a cleaning solution onto a top surface of the loaded semiconductor wafer; spraying the cleaning solution from each nozzle onto the top surface of the loaded semiconductor wafer in a direction defined by each nozzle's operational orientation such that a patterned flow of cleaning solution is formed on the top surface of the loaded semiconductor wafer; and collecting the cleaning solution in the annular trough of the cell as it flows off the top surface of the loaded semiconductor wafer.

3. 发明公开

US20230191460A1 CLEANING DEVICE AND CLEANING METHOD 审中-公开
公开(公告)号：US20230191460A1
公开(公告)日：2023-06-22
申请号：US17924939
申请日：2021-05-14
申请人： EBARA CORPORATION
发明人： Yuki TANAKA , Takeshi IIZUMI , Takayuki KAJIKAWA
IPC分类号： B08B3/02
CPC分类号： B08B3/02 , B08B2240/00 , H01L21/67005
摘要： A cleaning device includes: a substrate rotation mechanism that holds and rotates a substrate around center axis thereof; a first single-tube nozzle that discharges first cleaning liquid toward a top surface of the substrate; and a second single-tube nozzle that discharges second cleaning liquid toward the top surface of the substrate. The first single-tube nozzle and the second single-tube nozzle are disposed such that the second single-tube nozzle discharges the second cleaning liquid in a forward direction of a rotation direction of the substrate at a position farther away from the center of the substrate than a landing position of the first cleaning liquid, and a part is generated in which liquid flow on the top surface of the substrate after landing of the first cleaning liquid and liquid flow on the top surface of the substrate after landing of the second cleaning liquid are combined.

4. 发明授权

US10052664B2 Mask-cleaning apparatus 有权
公开(公告)号：US10052664B2
公开(公告)日：2018-08-21
申请号：US14966277
申请日：2015-12-11
申请人： Ming-Sheng Chen
发明人： Ming-Sheng Chen
IPC分类号： B08B1/00 , B08B1/04 , B08B1/02
CPC分类号： B08B1/006 , B08B1/00 , B08B1/008 , B08B1/02 , B08B1/04 , B08B2240/00 , G03F1/0092 , G03F1/82
摘要： A mask-cleaning apparatus includes a frame, a wet cleaning mechanism supported on the frame, and a dry cleaning mechanism supported on the frame and located after the wet cleaning mechanism in a direction of feeding a clean-room wiper. The wet cleaning mechanism wipes a mask before the dry cleaning mechanism wipes the mask. Each of the wet and dry cleaning mechanisms includes a wiping module that includes a vertical plate, a feeder reel, a retriever reel, direction-changing rollers and a pushing roller. The wiping module of the wet cleaning mechanism includes a sprayer mechanism adapted for spraying cleaning liquid onto a portion of the clean-room wiper on the pushing roller.

5. 发明授权

US12102940B2 Reducing surface and bulk contamination in plastic 有权
公开(公告)号：US12102940B2
公开(公告)日：2024-10-01
申请号：US18470841
申请日：2023-09-20
申请人： The Procter & Gamble Company
发明人： Norman Scott Broyles , Dimitris Ioannis Collias
IPC分类号： B01D11/02 , B08B3/04 , B29B17/00 , B29B17/02 , B29K105/26 , C08J11/08 , C08J7/02
CPC分类号： B01D11/0288 , B01D11/0203 , B08B3/04 , B29B17/00 , C08J11/08 , B01D11/0292 , B08B2220/00 , B08B2240/00 , B29B2017/0015 , B29B2017/0289 , B29B2017/0293 , B29K2105/26 , C08J7/02 , C08J2300/30
摘要： The present invention generally relates to a method of reducing contamination from plastics. The resulting purer plastic can be used in demanding applications.

6. 发明授权

US11911807B2 Method and apparatus for cleaning substrates 有权
公开(公告)号：US11911807B2
公开(公告)日：2024-02-27
申请号：US16967963
申请日：2018-02-07
申请人： ACM Research (Shanghai) Inc.
发明人： Hui Wang , Xi Wang , Fuping Chen , Xiaoyan Zhang , Fufa Chen
IPC分类号： B08B3/12 , B08B3/08 , H01L21/02 , H01L21/67
CPC分类号： B08B3/12 , B08B3/08 , H01L21/02057 , H01L21/67051 , H01L21/67098 , B08B2220/00 , B08B2240/00
摘要： The present invention provides a method for cleaning substrates comprising the steps of: placing a substrate on a substrate holder; implementing a bubble less or bubble-free pre-wetting process for the substrate; and implementing an ultra/mega sonic cleaning process for cleaning the substrate.

7. 发明公开

US20230234089A1 Cavity Cleaning and Coating System 审中-公开
公开(公告)号：US20230234089A1
公开(公告)日：2023-07-27
申请号：US18190267
申请日：2023-03-27
申请人： Russell R. Gohl
发明人： Russell R. Gohl
IPC分类号： B05B13/04 , B05B12/14 , B08B9/093
CPC分类号： B05B13/0431 , B05B12/14 , B08B9/0936 , B08B2240/00
摘要： A cavity cleaning and coating system for safely and efficiently cleaning and coating the interior of a cavity without requiring entry of any workers. The cavity cleaning and coating system generally includes a mount which is coupled with a movable arm of a vehicle. The mount includes an inner plate, which is coupled to the arm, and an outer plate. A shaft is coupled to the outer plate. The mount is adjustable independently of the arm of the vehicle, including outwardly, inwardly, and rotatably. A spray head is connected to the shaft. The spray head is rotatable and includes a dispenser for dispensing fluids. The vehicle is positioned near a cavity to be treated. The mount is adjusted for optimal positioning of the spray head. The spray head is lowered into the cavity to dispense a cleaning fluid and, after the cleaning fluid has dried, a coating fluid.

8. 发明授权

US09339852B1 Crystal detailer 有权
标题翻译：水晶细节
公开(公告)号：US09339852B1
公开(公告)日：2016-05-17
申请号：US14251218
申请日：2014-04-11
申请人： Keith S. Campbell
发明人： Keith S. Campbell
IPC分类号： B08B3/02 , B08B3/04 , B08B11/00
CPC分类号： B08B3/02 , B08B3/006 , B08B3/04 , B08B3/14 , B08B11/00 , B08B2240/00
摘要： An apparatus for cleaning items includes a container having a bottom wall, an open top, and an item-supporting screen formed in the bottom wall. A cleaning station has an open top and slideably receives the container. The container and cleaning station are in fluid communication with a remote vacuum source. A jet nozzle positioned inside the container is in fluid communication with a remote source of clean water and sprays clean water on the item upon activation of a pump. Ambient air for drying the item after cleaning is drawn into the container through an opening formed in a container lid and follows a path of travel that envelopes the item and dries the item when the remote source of vacuum is activated. The rate of flow of ambient air as well as the breadth of the flow is controlled by the size of the opening in the container lid.
摘要翻译：一种用于清洁物品的设备包括具有底壁，开口顶部和形成在底壁中的物品支撑丝网的容器。清洁站具有敞开的顶部并且可滑动地容纳容器。容器和清洁站与远程真空源流体连通。定位在容器内部的喷嘴与远程清洁水源流体连通，并在泵启动时在物品上喷洒清洁水。在清洁之后将物品干燥的环境空气通过形成在容器盖中的开口吸入容器中，并且当远程真空源被激活时，沿着包围物品的行进路径并干燥物品。环境空气的流速以及流量的宽度由容器盖中的开口的尺寸来控制。

9. 发明申请

US20130326829A1 DEVICE STORAGE CASE 审中-公开
标题翻译：设备存储案例
公开(公告)号：US20130326829A1
公开(公告)日：2013-12-12
申请号：US13911938
申请日：2013-06-06
申请人： Roger Dale WILSON
发明人： Roger Dale WILSON
IPC分类号： B08B1/00
CPC分类号： B08B1/006 , A45C11/00 , A45C13/00 , A45C15/00 , A45C2011/002 , A45C2011/003 , B08B1/008 , B08B1/02 , B08B1/04 , B08B2240/00 , G06F1/1628 , G06F2200/1633 , H04M1/04
摘要： There is a device storage case including a housing having a device access aperture. The device storage case includes a device engagement mechanism coupled to the housing and configured to convert mechanical power derived through user interaction with deposition of a device through the device access aperture to a form usable by the device storage case. The device storage case includes a surface cleaning mechanism configured to clean a surface of a device disposed within the housing, and functionally coupled to the device engagement mechanism such that the device engagement mechanism powers operation of the surface cleaning device. The surface cleaning mechanism includes a plurality of rollers functionally coupled to the device engagement mechanism and configured to clean a surface of the device when powered by the device engagement mechanism.
摘要翻译：存在具有设备接入孔的壳体的设备存储盒。设备存储壳体包括耦合到壳体的设备接合机构，并且被配置为将通过用户交互获得的机械功率转换成通过设备访问孔径将设备沉积到设备存储盒可用的形式。设备储存箱包括表面清洁机构，其被配置为清洁设置在壳体内的装置的表面，并且功能地联接到装置接合机构，使得装置接合机构对表面清洁装置的操作起动作用。表面清洁机构包括多个辊，其功能性地联接到装置接合机构并且构造成当由装置接合机构供电时清洁装置的表面。

10. 发明公开

US20240238851A1 Plasma cleaning head and plasma cleaning equipment for optical parts 审中-公开
公开(公告)号：US20240238851A1
公开(公告)日：2024-07-18
申请号：US18505084
申请日：2023-11-08
申请人： Harbin Institute of Technology
发明人： Peng ZHANG , Lihua LU , Qiang GAO , Yuheng GUAN , Hang ZHAO , Yongzhi CAO , Jiaxuan CHEN
IPC分类号： B08B7/00 , B08B5/00 , G02B27/00 , H05H1/46
CPC分类号： B08B7/00 , B08B5/00 , G02B27/0006 , H05H1/4645 , B08B2240/00 , H05H2245/40
摘要： The present disclosure relates to the technical field of plasma cleaning, and provides a plasma cleaning head for an optical member and a plasma cleaning device, including a plasma circulation assembly having a hollow shape and a lens frame mounted on the plasma circulation assembly, wherein the plasma circulation assembly is provided with an outlet port which is larger than an ejection port adapted to eject a plasma and is adapted to diffuse the plasma, and the lens frame is in communication with and surrounds the outlet port, and the lens frame is adapted to embed an optical lens body so that the optical lens body is arranged opposite to the outlet port to help improve dispersion and stability of the plasma flowing from the outlet port to the optical lens body, and helps to promote the energy absorption of the plasma by the optical lens body.

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