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1. 发明申请

US20150255315A1 APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE 审中-公开
标题翻译：装置和处理基板的方法
公开(公告)号：US20150255315A1
公开(公告)日：2015-09-10
申请号：US14716980
申请日：2015-05-20
申请人： Katsuhiko MIYA , Hiroaki KITAGAWA
发明人： Katsuhiko MIYA , Hiroaki KITAGAWA
IPC分类号： H01L21/67 , B08B7/00
CPC分类号： H01L21/67028 , B08B7/0014 , H01L21/67034
摘要： A rinsing liquid adheres to a substrate subjected to a cleaning process. The rinsing liquid on the substrate is first replaced with IPA liquid. While the substrate covered with the IPA liquid is held in a dryer chamber, liquid carbon dioxide is supplied to the surface of the substrate. Liquid nitrogen is supplied to cool down the interior of the dryer chamber. This solidifies the liquid carbon dioxide on the substrate into solid carbon dioxide. Thereafter, the pressure in the dryer chamber is returned to atmospheric pressure, and gaseous nitrogen is supplied into the dryer chamber. Thus, the temperature in the dryer chamber increases. The solid carbon dioxide on the surface of the substrate is sublimated, and is hence removed from the substrate. All of the steps are performed while carbon dioxide is not in a supercritical state but in a non-supercritical state.
摘要翻译：冲洗液体粘附到经过清洁处理的基板上。首先用IPA液体代替基板上的冲洗液。当用IPA液体覆盖的基板被保持在干燥室中时，液体二氧化碳被供应到基板的表面。供应液氮以冷却干燥室的内部。这将基材上的液态二氧化碳固化成固体二氧化碳。此后，将干燥室中的压力恢复至大气压，并将气态氮供应到干燥室中。因此，干燥室中的温度升高。将基板表面上的固体二氧化碳升华，从而从基板上除去。所有的步骤都是在二氧化碳不处于超临界状态但处于非超临界状态的情况下进行的。

2. 发明申请

US20150091963A1 PRINTING APPARATUS AND METHOD OF CORRECTING STEP SHIFT THEREOF 有权
标题翻译：印刷装置和校正其移位的方法
公开(公告)号：US20150091963A1
公开(公告)日：2015-04-02
申请号：US14283914
申请日：2014-05-21
申请人： DAINIPPON SCREEN MFG. CO. LTD.
发明人： Kazuki YAMANAKA , Seiya NOMURA
IPC分类号： B41J2/07
CPC分类号： B41J2/07 , B41J2/155 , B41J2/2135 , B41J2/2146 , B41J2202/20
摘要： A printing apparatus performing printing to a print medium includes a printer having at least two line heads with a plurality of recording modules; a scanner configured to scan an image printed with the printer to obtain a scanned image; a correcting-chart printing unit configured to print first and second correcting charts in first and second line head printing areas, respectively; a scanned image collecting unit configured to collect first and second scanned images; a correction-data calculating device configured to calculate correction data by determining a reference head difference from the first scanned image, determining an individual head difference from the second scanned image, summing up the reference head difference and the individual head difference to obtain a total, the reference head difference and the total being regarded as the correction data for the first and second line heads, respectively; and an adjusting device configured to adjust a timing
摘要翻译：对打印介质执行打印的打印设备包括具有至少两个具有多个记录模块的行头的打印机; 扫描器，被配置为扫描用打印机打印的图像以获得扫描图像; 校正图形打印单元，被配置为分别在第一和第二行头打印区域中打印第一和第二校正图; 扫描图像收集单元，被配置为收集第一和第二扫描图像; 校正数据计算装置，被配置为通过从所述第一扫描图像确定参考头部差异来确定与所述第二扫描图像的单独头部差异，对所述参考头部差异和所述个体头部差异进行求和来计算校正数据，参考头差和总数分别被认为是第一和第二行头的校正数据; 以及被配置为调整定时的调整装置

3. 发明授权

US08987123B2 Heat treatment apparatus and heat treatment method for heating substrate by irradiating substrate with flash of light 有权
标题翻译：热处理装置和通过用闪光照射基板来加热基板的热处理方法
公开(公告)号：US08987123B2
公开(公告)日：2015-03-24
申请号：US13790313
申请日：2013-03-08
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Takahiro Yamada , Kenichi Yokouchi
IPC分类号： H01L21/223 , H01L21/67
CPC分类号： H01L21/223 , H01L21/67115
摘要： After the completion of the transport of a semiconductor wafer into a chamber, the flow rate of nitrogen gas supplied into the chamber is decreased. In this state, a preheating treatment and flash irradiation are performed. The flow rate of nitrogen gas supplied into the chamber is increased when the temperature of the front surface of the semiconductor wafer is decreased to become equal to the temperature of the back surface thereof after reaching its maximum temperature by the irradiation of the substrate with a flash of light. Thereafter, the supply flow rate of nitrogen gas is maintained at a constant value until the semiconductor wafer is transported out of the chamber. This achieves the reduction in particles deposited on the semiconductor wafer while suppressing adverse effects resulting from the nonuniform in-plane temperature distribution of the semiconductor wafer.
摘要翻译：在将半导体晶片输送到室中完成之后，供应到室中的氮气的流量减小。在这种状态下，进行预热处理和闪光照射。当半导体晶片的前表面的温度通过用闪光灯照射基板达到其最大温度后，其后表面的温度降低时，供应到室中的氮气的流量增加的光。此后，将氮气的供给流量保持为恒定值，直到将半导体晶片输送到室外。由此，能够抑制由于半导体晶片的面内温度分布不均匀而导致的沉积在半导体晶片上的微粒的减少。

4. 发明授权

US08974022B2 Inkjet printer and image recording method 有权
标题翻译：喷墨打印机和图像记录方法
公开(公告)号：US08974022B2
公开(公告)日：2015-03-10
申请号：US13621082
申请日：2012-09-15
申请人： Kiyoomi Mitsuki
发明人： Kiyoomi Mitsuki
IPC分类号： B41J29/38
CPC分类号： B41J2/04581 , B41J2/04588 , B41J2/04593 , B41J2/04596
摘要： In an inkjet printer, an ejecting part for K color is previously selected as an ejecting part for outputting three values used for formation of a large dot, formation of a medium dot, and non-ejection (step S12). In the course of image recording (steps S13, S14, and S15), three values are output regarding K color, and four values used for formation of a large dot, formation of a medium dot, formation of a small dot, and non-ejection are output regarding C, M, and Y colors. Thus, even if the quality of a dot in K color is reduced at the time of outputting four values, a high-quality dot can be formed regarding K color, so that the quality of a recorded image can be improved in a case where line drawing or a character or the like is recorded.
摘要翻译：在喷墨打印机中，预先选择用于K色的喷射部分作为用于输出用于形成大点，形成中点和不喷射的三个值的喷射部分（步骤S12）。在图像记录过程中（步骤S13，S14和S15），输出关于K色的三个值，用于形成大点的四个值，形成中点，形成小点，输出关于C，M和Y颜色的喷射。因此，即使在输出四个值时K颜色的点的质量降低，可以形成关于K色的高质量点，从而可以在线的情况下提高记录图像的质量记录图形或字符等。

5. 发明授权

US08974019B2 Apparatus for and method of supplying liquid 有权
标题翻译：液体供应设备及方法
公开(公告)号：US08974019B2
公开(公告)日：2015-03-10
申请号：US14223584
申请日：2014-03-24
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Takashi Sakamoto , Satoshi Yasuda , Masahiko Kakuda , Takanori Tsuji
IPC分类号： B41J2/195 , B41J2/175
CPC分类号： B41J2/17566 , B41J2/17596 , B41J2002/17569
摘要： A liquid supply apparatus includes a reservoir for storing a liquid therein, a supply path for supplying the liquid from the reservoir to a liquid consuming apparatus, a pump for feeding the liquid from the reservoir to the supply path, and a controller for outputting a driving signal to the pump to control the supply of the liquid. The controller acquires a target feed volume of the liquid from the pump to gradually change a feed volume of the liquid from the pump from a current feed volume to the target feed volume, based on a request signal from the liquid consuming apparatus serving as a destination to which the liquid is supplied. This suppresses an abrupt change in pressure in the liquid consuming apparatus serving as the destination to which the liquid is supplied.
摘要翻译：液体供给装置包括用于在其中储存液体的储存器，用于将液体从储存器供应到液体消耗装置的供应路径，用于将液体从储存器供给到供应路径的泵以及用于输出驱动的控制器信号到泵来控制液体的供应。控制器基于来自用作目的地的液体消耗装置的请求信号，从泵获取来自泵的液体的目标进料体积，以将来自泵的液体的进料体积从当前进料体积逐渐改变到目标进料体积供应液体。这抑制了用作供应液体的目的地的液体消耗装置中的压力突然变化。

6. 发明授权

US08967770B2 Inkjet printer and printing method 有权
标题翻译：喷墨打印机和打印方式
公开(公告)号：US08967770B2
公开(公告)日：2015-03-03
申请号：US13621013
申请日：2012-09-15
申请人： Masayuki Nakano
发明人： Masayuki Nakano
IPC分类号： B41J2/145
CPC分类号： B41J29/38 , B41J2/04516 , B41J2/04581 , B41J2/04593 , B41J2/2128
摘要： In a head (21) of an inkjet printer, a plurality of outlet rows are arranged in a scanning direction, the plurality of outlet rows each having a plurality of outlets arranged in a direction intersecting the scanning direction. The plurality of outlets are each capable of forming dots of a plurality of sizes on printing paper upon receiving different driving signals from an ejection control part (44). In the inkjet printer, under control of the ejection control part (44), some of the outlet rows form dots of only one size out of the plurality of sizes, and the other outlet rows form dots of only another size. In this way, causing the plurality of outlets in each outlet row to form dots of only one size makes it possible to reduce the occurrence of satellite droplets or the like and improve print quality.
摘要翻译：在喷墨打印机的头部（21）中，沿扫描方向布置多个排出列，所述多个出口排各自具有沿与扫描方向相交的方向排列的多个出口。多个出口能够在从喷射控制部分（44）接收到不同的驱动信号时能够在打印纸上形成多个尺寸的点。在喷墨打印机中，在排出控制部分（44）的控制下，一些出口行形成多个尺寸中只有一个尺寸的点，而另一个出口行形成仅一个尺寸的点。以这种方式，使每个出口排中的多个出口形成仅一个尺寸的点，可以减少卫星液滴等的出现并提高打印质量。

7. 发明申请

US20150029256A1 INKJET PRINTING APPARATUS AND METHOD OF CORRECTING STEP SHIFT THEREOF 有权
标题翻译：喷墨打印设备和校正其移位的方法
公开(公告)号：US20150029256A1
公开(公告)日：2015-01-29
申请号：US14283890
申请日：2014-05-21
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Kazuki YAMANAKA , Seiya NOMURA
IPC分类号： B41J2/07
CPC分类号： B41J2/2135 , B41J2029/3935
摘要： Provided is an inkjet printing apparatus configured to perform printing by discharging ink droplets onto a print medium. The apparatus includes a printing head having a plurality of inkjet heads and configured to perform printing by discharging the ink droplets from the plurality of inkjet heads onto the print medium; a chart printing device configured to print a step-shift correcting chart with the printing head; a reading device configured to read the step-shift correcting chart printed on the print medium; a print medium-processed portion detecting device configured to detect a processed portion of the print medium; an uninfluenced step-shift correcting-chart generating device configured to generate an uninfluenced step-shift correcting chart; and a shift-amount calculating device configured to calculate a shift amount for correcting the step shift in accordance with the uninfluenced step-shift correcting chart.
摘要翻译：提供了一种配置为通过将墨滴喷射到打印介质上来执行打印的喷墨打印设备。该装置包括具有多个喷墨头并被配置为通过将墨滴从多个喷墨头排放到打印介质上来进行打印的打印头; 图形打印装置，被配置为用所述打印头打印步进位移校正图; 读取装置，被配置为读取打印在所述打印介质上的步进偏移校正图; 打印介质处理部分检测装置，被配置为检测所述打印介质的处理部分; 一种未受影响的步进偏移校正图生成装置，其被配置为生成未受影响的步进偏移校正图; 以及移动量计算装置，被配置为根据未受影响的步进偏移校正图来计算用于校正步进偏移的移动量。

8. 发明授权

US08893647B2 Pattern forming apparatus 有权
标题翻译：图案形成装置
公开(公告)号：US08893647B2
公开(公告)日：2014-11-25
申请号：US13531206
申请日：2012-06-22
申请人： Masanobu Iwashima , Masakazu Sanada , Hiroyuki Ueno
发明人： Masanobu Iwashima , Masakazu Sanada , Hiroyuki Ueno
IPC分类号： B05C3/00 , B05C5/02 , B05B3/00 , B05C13/02 , B05C17/005
CPC分类号： B05C5/0212 , B05C17/00516
摘要： A tip section of a discharge nozzle 31 is shaped like a wedge, and projections 310 which further protrude are formed at the tip of the wedge. Lower surfaces 310b of the projections 310 define a substrate-facing-surface which is brought into proximity to the substrate, and discharge outlet bearing surfaces 310c, which gradually retract back from the substrate W, are formed as if to rise from the edges of the lower surfaces 310b. At adjacent positions within the discharge outlet bearing surface 310c which are adjacent to the substrate-facing-surface 310b, discharge outlets 311 for discharging an application liquid are opened. Areas around the discharge outlets 311 and a wall around a fluid feeding path 312 are integrated with each other.
摘要翻译：排出喷嘴31的尖端部分成形为楔形，并且在楔形物的尖端处形成进一步突出的突出部310。突出部310的下表面310b限定了与衬底接近的面向衬底的表面，并且从衬底W逐渐缩回的排出出口支承表面310c形成为从下表面310b。在排出口承载面310c的与面向基板的表面310b相邻的相邻位置，打开用于排出涂布液的排出口311。排出口311周围的区域和流体供给路径312周围的壁彼此一体化。

9. 发明授权

US08891948B2 Heat treatment apparatus and heat treatment method for heating substrate by irradiating substrate with flashes of light 有权
标题翻译：热处理装置和通过用闪光照射基板来加热基板的热处理方法
公开(公告)号：US08891948B2
公开(公告)日：2014-11-18
申请号：US13109169
申请日：2011-05-17
申请人： Tatsufumi Kusuda , Kazuyuki Hashimoto
发明人： Tatsufumi Kusuda , Kazuyuki Hashimoto
IPC分类号： G01J5/10 , G01J5/20 , G01J5/28 , F27B5/18 , F27D19/00 , H01L21/67 , H01L21/687 , F27B17/00 , F27D11/12
CPC分类号： F27B17/0025 , F27D11/12 , H01L21/67115 , H01L21/6719 , H01L21/67248 , H01L21/68792
摘要： A photodiode excellent in responsivity receives flashes of light emitted from flash lamps in the process of heating a semiconductor wafer by irradiation with flashes of light, and the waveform of the intensity of the flashes of light versus time is acquired using voltage data obtained from an output from the photodiode. Then, a temperature calculating part performs a heat conduction simulation using the acquired data to calculate the temperature of the semiconductor wafer irradiated with the flashes of light from the flash lamps. The temperature of the semiconductor wafer is computed using data corresponding to the intensity of the flashes of light obtained from the output from the photodiode. This allows the determination of the surface temperature of the semiconductor wafer irradiated with the flashes of light, irrespective of the waveform of the emission intensity of the flash lamps.
摘要翻译：响应性优异的光电二极管在通过照射闪光而加热半导体晶片的过程中接收从闪光灯发出的光的闪光，并且使用从输出获得的电压数据获取光的闪光强度的波形从光电二极管。然后，温度计算部使用获取的数据进行热传导模拟，以计算从闪光灯照射的闪光的半导体晶片的温度。使用与从光电二极管的输出获得的闪光的强度对应的数据来计算半导体晶片的温度。这允许确定用闪光灯照射的半导体晶片的表面温度，而与闪光灯的发射强度的波形无关。

10. 发明授权

US08857449B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US08857449B2
公开(公告)日：2014-10-14
申请号：US11689073
申请日：2007-03-21
申请人： Katsuhiko Miya
发明人： Katsuhiko Miya
IPC分类号： B08B3/00 , H01L21/67
CPC分类号： H01L21/67051
摘要： A rinsing liquid adheres in a piled up state to the entire front surface of the substrate which is rinsed with the rinsing liquid discharged from a rinse nozzle, thereby forming a so-called puddle-like rinse layer. An opposed surface of a proximity block is positioned in the vicinity of a front surface of a substrate and a liquid-tight layer is formed in a gap space between the opposed surface and the front surface of the substrate. In a condition that the liquid-tight layer is formed, the proximity block moves in the moving direction, and a solvent gas containing a solvent component, which dissolves in the liquid to reduce a surface tension, is supplied toward an upstream-side edge of the liquid-tight layer.
摘要翻译：冲洗液体堆积在基板的整个前表面上，用从冲洗喷嘴排出的冲洗液体冲洗，从而形成所谓的水坑状漂洗层。邻近块的相对表面位于基板的正面附近，并且在基板的相对表面和前表面之间的间隙中形成液密层。在形成液密层的状态下，接近块在移动方向上移动，并且将溶解在液体中以降低表面张力的溶剂成分的溶剂气体向上游侧边缘液密层。

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