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1. 发明授权

US08499878B2 Motorcycle rear portion structure 有权
标题翻译：摩托车后部结构
公开(公告)号：US08499878B2
公开(公告)日：2013-08-06
申请号：US13580331
申请日：2010-02-23
申请人： Yutaka Yamakura , Jun Hirose
发明人： Yutaka Yamakura , Jun Hirose
IPC分类号： B62K19/30 , B62J6/04
CPC分类号： B62J15/00 , B62J6/005 , B62J15/02 , B62J23/00 , B62K11/04 , B62K19/40
摘要： A rear portion structure (100) of a motorcycle (1) comprises a chassis frame (5); a rear wheel (17) positioned below the rear portion of the chassis frame (5); a fender main body portion (110) anchored to the rear portion of the chassis frame (5) and positioned above the rear wheel (17); a fender hanging portion (120) configured separately from the fender main body portion (110) and covering at least a portion of the rear wheel (17); and a support stay (130) anchored to the rear end portion of the chassis frame (5) (rear end frame portion (5a), extending aft approximately horizontally from the rear end portion, and supporting the fender hanging portion (120).
摘要翻译：摩托车（1）的后部结构（100）包括底架（5）; 位于所述底盘框架（5）后部的后轮（17）。锚固在底盘框架（5）的后部并且位于后轮（17）上方的挡泥板主体部分（110）; 翼子板悬挂部分（120），其与所述翼子板主体部分（110）分开设置并且覆盖所述后轮（17）的至少一部分; 以及支撑架（130），其支撑在底架框架（5）的后端部（后端框架部分5a），从后端部大致水平地延伸，并支撑翼子板悬挂部分（120）。

2. 发明申请

US20120320612A1 MOTORCYCLE REAR PORTION STRUCTURE 有权
标题翻译：摩托车后部结构
公开(公告)号：US20120320612A1
公开(公告)日：2012-12-20
申请号：US13580331
申请日：2010-02-23
申请人： Yutaka Yamakura , Jun Hirose
发明人： Yutaka Yamakura , Jun Hirose
IPC分类号： B62K19/30 , B62J6/04
CPC分类号： B62J15/00 , B62J6/005 , B62J15/02 , B62J23/00 , B62K11/04 , B62K19/40
摘要： A rear portion structure (100) of a motorcycle (1) comprises a chassis frame (5); a rear wheel (17) positioned below the rear portion of the chassis frame (5); a fender main body portion (110) anchored to the rear portion of the chassis frame (5) and positioned above the rear wheel (17); a fender hanging portion (120) configured separately from the fender main body portion (110) and covering at least a portion of the rear wheel (17); and a support stay (130) anchored to the rear end portion of the chassis frame (5) (rear end frame portion (5a), extending aft approximately horizontally from the rear end portion, and supporting the fender hanging portion (120).
摘要翻译：摩托车（1）的后部结构（100）包括底架（5）; 位于所述底盘框架（5）后部的后轮（17）。锚固在底盘框架（5）的后部并且位于后轮（17）上方的挡泥板主体部分（110）; 翼子板悬挂部分（120），其与所述翼子板主体部分（110）分开设置并且覆盖所述后轮（17）的至少一部分; 以及支撑架（130），其支撑在底架框架（5）的后端部（后端框架部分5a），从后端部大致水平地延伸，并支撑翼子板悬挂部分（120）。

3. 发明授权

US09169558B2 Fluid control apparatus 有权
标题翻译：流体控制装置
公开(公告)号：US09169558B2
公开(公告)日：2015-10-27
申请号：US13203866
申请日：2009-11-06
申请人： Jun Hirose , Kazuyuki Tezuka , Yohei Uchida , Mutsunori Koyomogi , Takahiro Matsuda , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
发明人： Jun Hirose , Kazuyuki Tezuka , Yohei Uchida , Mutsunori Koyomogi , Takahiro Matsuda , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： C23C16/455 , H01L21/67
CPC分类号： C23C16/45561 , H01L21/67017 , Y10T137/0396
摘要： To provide a fluid control apparatus capable of reducing the space, while reducing the cost. A fluid control apparatus has a fluid controlling unit and a fluid introducing unit. The fluid introducing unit is divided into three parts: a first and a second inlet-side shutoff/open parts disposed on the inlet side, each made up of 2×N/2, disposed between the first and second inlet-side shutoff/open parts and the fluid controlling unit.
摘要翻译：提供能够减少空间的流体控制装置，同时降低成本。流体控制装置具有流体控制单元和流体引入单元。流体引入单元被分为三部分：设置在入口侧的第一和第二入口侧截止/打开部分，每个由2×N / 2构成，设置在第一和第二入口侧截止/打开之间零件和流体控制单元。

4. 发明授权

US08631888B2 Cowling structure for saddle-ride type vehicle 有权
标题翻译：鞍式车辆的结构结构
公开(公告)号：US08631888B2
公开(公告)日：2014-01-21
申请号：US13012198
申请日：2011-01-24
申请人： Omi Iida , Jun Hirose , Shigeto Inami , Nobutaka Ban
发明人： Omi Iida , Jun Hirose , Shigeto Inami , Nobutaka Ban
IPC分类号： B60K11/06
CPC分类号： B62J17/00 , B60K11/08 , B60Y2200/12 , B62K11/04
摘要： A cowling structure for a saddle-ride type vehicle for cooling an engine and providing a windshield for a rider. The cowling structure includes a seat for a rider to sit thereon, the seat is arranged behind and above an engine suspended from a vehicle body frame. An under cowl covers at least part of a lower portion of the engine. The under cowl is formed to cover at least part of a side surface of the engine. A guide portion is provided in an upper portion of the under cowl, the guide portion extending inward in a vehicle width direction and toward the side surface of the engine. An opening is provided in front of the guide portion, the opening introducing a flow of air into the under cowl. The guide portion has a slope surface which slopes downward from the front to the rear of the vehicle.
摘要翻译：用于鞍式车辆的整流罩结构，用于冷却发动机并为骑手提供挡风玻璃。整流罩结构包括用于骑车者坐在其上的座位，座椅布置在从车体框架悬挂的发动机的后面和上方。底部罩盖覆盖发动机下部的至少一部分。底罩被形成为覆盖发动机的侧表面的至少一部分。引导部设置在下罩的上部，引导部沿车宽方向向内延伸并朝向发动机的侧面延伸。在引导部分的前方设有开口，该开口将空气流引入下罩内。引导部具有从车辆的前方向后方倾斜的倾斜面。

5. 发明授权

US07506610B2 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US07506610B2
公开(公告)日：2009-03-24
申请号：US11137516
申请日：2005-05-26
申请人： Akira Koshiishi , Jun Hirose , Masahiro Ogasawara , Taichi Hirano , Hiromitsu Sasaki , Tetsuo Yoshida , Michishige Saito , Hiroyuki Ishihara , Jun Ooyabu , Kohji Numata
发明人： Akira Koshiishi , Jun Hirose , Masahiro Ogasawara , Taichi Hirano , Hiromitsu Sasaki , Tetsuo Yoshida , Michishige Saito , Hiroyuki Ishihara , Jun Ooyabu , Kohji Numata
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32577 , H01J37/32082 , H01J37/32174 , H01L21/31116
摘要： A plasma processing apparatus includes a process container configured to have a vacuum atmosphere therein. An upper electrode is disposed to face a target substrate placed within the process container. An electric feeder includes a first cylindrical conductive member continuously connected to the upper electrode in an annular direction. The electric feeder is configured to supply a first RF output from a first RF power supply to the upper electrode.
摘要翻译：一种等离子体处理装置，包括被配置为在其中具有真空气氛的处理容器。上电极被设置为面对放置在处理容器内的目标衬底。电动给料器包括在环形方向上连续地连接到上电极的第一圆柱形导电构件。电馈送器被配置为将第一RF电源的第一RF输出提供给上电极。

6. 发明申请

US20060260747A1 Gas introduction system for temperature adjustment of object to be processed 审中-公开
公开(公告)号：US20060260747A1
公开(公告)日：2006-11-23
申请号：US11496585
申请日：2006-08-01
申请人： Jun Hirose , Shinji Hamamoto , Hiroshi Koizumi , Kenichi Nakagawa
发明人： Jun Hirose , Shinji Hamamoto , Hiroshi Koizumi , Kenichi Nakagawa
IPC分类号： C23F1/00
CPC分类号： H01L21/67248 , C23C16/466 , H01J2237/2001 , H01L21/67109
摘要： According to the present invention, there is disclosed a gas introduction system for temperature adjustment comprising passing a gas whose temperature is managed for the temperature adjustment of an object to be processed between a mounting surface of a mounting base for holding the object to be processed under vacuum and a back surface of the object to be processed through a gas supply line, controlling a flow rate adjustment valve by control means based on a measured pressure of the gas supply line measured by a manometer, and adjusting a gas flow rate to the gas supply line so as to obtain a set pressure, so that the gas pressure can be set to a predetermined value in a short time, and the system is miniaturized with little waste of the gas.

7. 发明授权

US06450190B2 Method of detecting abnormalities in flow rate in pressure-type flow controller 有权
标题翻译：压力式流量控制器流量异常检测方法
公开(公告)号：US06450190B2
公开(公告)日：2002-09-17
申请号：US09826834
申请日：2001-04-06
申请人： Tadahiro Ohmi , Seiichi Iida , Satoshi Kagatsume , Jun Hirose , Kazuo Fukasawa , Hiroshi Koizumi , Hideki Nagaoka , Tomio Uno , Kouji Nishino , Nobukazu Ikeda , Ryousuke Dohi , Eiji Ideta
发明人： Tadahiro Ohmi , Seiichi Iida , Satoshi Kagatsume , Jun Hirose , Kazuo Fukasawa , Hiroshi Koizumi , Hideki Nagaoka , Tomio Uno , Kouji Nishino , Nobukazu Ikeda , Ryousuke Dohi , Eiji Ideta
IPC分类号： G05D706
CPC分类号： G05B23/0235 , G05B23/0256 , G05D7/0635 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/8326
摘要： A method of detecting abnormalities in flow rate in pressure-type flow controller. The method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice—the pressure-type flow controller wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated by the equation QC=KP1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal QY between the calculated flow rate QC and the set flow rate QS.
摘要翻译：一种检测压力型流量控制器流量异常的方法。该方法在使用孔口压力型流量控制器控制压力型流量控制器FCS中的流体流量的同时检查异常流量，其中上游压力P1保持大于下游压力的两倍或更多倍 P2，通过等式QC = KP1（K：常数）计算下游流量QC，并且其中基于所计算的流量QC和设定流量QS之间的差信号QY来控制控制阀CV。

8. 发明授权

US6092786A Gate valve 失效
标题翻译：闸阀
公开(公告)号：US6092786A
公开(公告)日：2000-07-25
申请号：US60546
申请日：1998-04-15
申请人： Hiroki Oka , Yoji Iizuka , Kenichi Nakagawa , Jun Hirose , Tatsuya Nakagome , Hiroshi Koizumi , Hiroshi Ohno
发明人： Hiroki Oka , Yoji Iizuka , Kenichi Nakagawa , Jun Hirose , Tatsuya Nakagome , Hiroshi Koizumi , Hiroshi Ohno
IPC分类号： C23F4/00 , F16K1/16 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/677 , F16K3/18 , H01L21/66
CPC分类号： F16K1/16
摘要： Provided is a gate valve for opening and closing an aperture formed in a body of a chamber and designed so that an object is loaded into or unloaded from the chamber, comprising a lift mechanism provided on a side portion of the chamber body, a supporting portion supported by a lift mechanism for up-and-down motion, a valve plate supported by the supporting portion and movable between a closed position such as to close the aperture of the chamber body and an open position such that the valve plate is separated from the aperture to leave the aperture open as the supporting portion is moved up and down by the lift mechanism, and a separating mechanism for allowing the valve plate to move to a position ahead of the aperture so that the valve plate is separated from the aperture.
摘要翻译：提供了一种用于打开和关闭形成在室体中的孔的闸阀，其设计成使得物体被装载到或者从室卸载，包括设置在室主体的侧部上的提升机构，支撑部分由用于上下运动的升降机构支撑的阀板，由支撑部分支撑并可在闭合位置之间移动的阀板，以关闭室主体的孔口和打开位置，使得阀板与阀板分离孔由于支撑部分由提升机构上下移动而使孔开放，以及分离机构，用于允许阀板移动到孔前方的位置，使得阀板与孔分离。

9. 发明授权

US6033333A Eccentric orbiting type planetary gear device 失效
标题翻译：偏心轨道式行星齿轮装置
公开(公告)号：US6033333A
公开(公告)日：2000-03-07
申请号：US976328
申请日：1997-11-21
申请人： Shigehisa Muraki , Jun Hirose , Shotaro Kodaka
发明人： Shigehisa Muraki , Jun Hirose , Shotaro Kodaka
IPC分类号： B23P15/14 , F16H1/32
CPC分类号： F16H1/32 , Y10T29/49636
摘要： An eccentric orbiting type planetary gear device includes a bearing which requires no pre-load adjustment. The planetary gear device is small in the number of components when compared with the conventional device, and is improved in performance and in assembling efficiency. In manufacturing an eccentric orbiting type planetary gear device in which a supporting block (31) is made up of a supporting member (32) having a plurality of pillar-like portions (32a), and a disk (33), the supporting member and the disk being fastened to each other with fastening members (35) with an external gear (21) between the supporting member and the disk in such a manner the external gear is engaged with an internal gear; the supporting member and the disk are abutted against each other through end faces thereof, and are fastened to each other to form the supporting block, and bearing rolling surfaces (32b) and (33a) corresponding to inner races are formed in the supporting member and the disk at a predetermined interval.
摘要翻译：偏心轨道式行星齿轮装置包括不需要预加载调节的轴承。与常规装置相比，行星齿轮装置的部件数量小，并且性能和组装效率提高。在制造其中支撑块（31）由具有多个柱状部分（32a）的支撑构件（32）和盘（33）构成的偏心轨道式行星齿轮装置中，支撑构件和所述盘通过所述支撑构件和所述盘之间的外齿轮（21）的紧固构件（35）彼此固定，所述外齿轮与内齿轮接合; 支撑构件和盘通过其端面彼此抵靠，并且彼此紧固以形成支撑块，并且在支撑构件中形成有与内圈对应的轴承滚动表面（32b）和（33a），并且磁盘以预定间隔。

10. 发明授权

US09076636B2 Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method 有权
标题翻译：等离子体处理装置，等离子体处理方法和用于存储用于执行该方法的程序的存储介质
公开(公告)号：US09076636B2
公开(公告)日：2015-07-07
申请号：US13232207
申请日：2011-09-14
申请人： Mitsunori Ohata , Hidetoshi Kimura , Kiyoshi Maeda , Jun Hirose , Tsuyoshi Hida
发明人： Mitsunori Ohata , Hidetoshi Kimura , Kiyoshi Maeda , Jun Hirose , Tsuyoshi Hida
IPC分类号： C23C16/00 , H01L21/306 , C23F1/00 , H01J7/24 , H05B31/26 , H01J37/32 , H01L21/67 , H01L21/687
CPC分类号： H01J37/32642 , C23C16/52 , H01J37/32091 , H01L21/67069 , H01L21/68735
摘要： There is provided a plasma processing apparatus including a susceptor 114, having a substrate mounting portion for mounting thereon a substrate, to which a high frequency power is applied; a focus ring 210, disposed to surround the substrate mounted on the substrate mounting portion, including an outer ring 214 having a top surface higher than a top surface of the substrate and an inner ring 212 extending inwardly from the outer ring so as to allow at least a part of the inner ring to be positioned below a periphery of the substrate, the outer ring and the inner ring being formed as a single member; a dielectric ring 220 positioned between the focus ring and the susceptor; a dielectric constant varying device 250 for varying a dielectric constant of the dielectric ring.
摘要翻译：提供了一种等离子体处理装置，其包括：基座114，具有用于安装其上的基板的基板安装部，施加高频电力; 设置为围绕安装在基板安装部分上的基板的聚焦环210，包括具有高于基板的顶表面的顶表面的外环214和从外环向内延伸的内环212，所述内圈的至少一部分被定位在所述基板的周边的下方，所述外圈和所述内圈形成为单个构件; 定位在聚焦环和基座之间的电介质环220; 用于改变介电环的介电常数的介电常数变化装置250。

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