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    • 2. 发明授权
    • Laser treatment apparatus
    • 激光治疗仪
    • US4692924A
    • 1987-09-08
    • US783967
    • 1985-10-04
    • Hiroshi KoizumiMasatsugu KijimaSinya Tanaka
    • Hiroshi KoizumiMasatsugu KijimaSinya Tanaka
    • A61B18/20A61N5/06H01S3/131H01S3/13
    • H01S3/131
    • A laser treatment apparatus for determining that the output power of a treatment laser beam is proper in accordance with the selected output power. The treatment apparatus comprises a laser source for generating a treatment laser pulse beam, a laser optical path for guiding the treatment laser pulse beam toward an object to be treated, a power setting means for controlling the laser source to set the power output of the treatment laser pulse beam, and a radiation switch for selectively switching the laser source on and off. A safety device is provided to cause the laser source to output a checking laser pulse beam prior to actual transmission of the treatment laser pulse beam and at a time after the activation of the radiation switch. The checking laser pulse beam has a power corresponding to the actual power of the treatment laser pulse beam to be outputted by the laser source. A power detector detects the power output of the checking laser pulse beam and a comparator determines whether the power output of the checking laser pulse beam is correct in view of the power of the treatment laser pulse beam set by the power setting means.
    • 一种用于根据所选择的输出功率确定治疗激光束的输出功率正确的激光治疗装置。 处理装置包括用于产生治疗激光脉冲光束的激光源,用于将治疗激光脉冲光束引向待治疗对象的激光光路;功率设定装置,用于控制激光源以设定治疗的功率输出 激光脉冲光束和用于选择性地切换激光源的辐射开关。 提供了一种安全装置,用于使激光源在实际传输治疗激光脉冲光束之前和激活辐射开关之后的时刻输出检查激光脉冲光束。 检查激光脉冲光束具有与由激光源输出的处理激光脉冲光束的实际功率相对应的功率。 功率检测器检测检查激光脉冲光束的功率输出,并且比较器鉴于由功率设定装置设置的治疗激光脉冲光束的功率,确定检查激光脉冲光束的功率输出是否正确。
    • 4. 发明授权
    • Substrate replacing method and substrate processing apparatus
    • 基板更换方法和基板处理装置
    • US08663489B2
    • 2014-03-04
    • US12732451
    • 2010-03-26
    • Shigeru IshizawaHiroshi KoizumiTatsuya Ogi
    • Shigeru IshizawaHiroshi KoizumiTatsuya Ogi
    • B44C1/22
    • H01L21/67745H01L21/67748
    • A method for replacing plural substrates to be processed by a substrate processing apparatus which includes a substrate processing chamber, a load lock chamber, and a conveying apparatus including first and second conveying members for conveying the plural substrates into and out from the substrate processing chamber and the load lock chamber. The method includes the steps of a) conveying a first substrate out from the substrate processing chamber with the first conveying member, b) conveying a second substrate into the substrate processing chamber with the second conveying member, c) conveying the second substrate out from the load lock chamber with the second conveying member, and d) conveying the first substrate into the load lock chamber with the first conveying member. The steps c) and d) are performed between step a) and step b).
    • 一种用于替换多个基板的方法,所述基板处理装置包括基板处理室,负载锁定室和输送装置,所述基板处理装置包括用于将多个基板输入和移出基板处理室的第一和第二输送部件, 负载锁定室。 该方法包括以下步骤:a)用第一输送部件从基板处理室输出第一基板,b)用第二输送部件将第二基板输送到基板处理室中,c)将第二基板从 负载锁定室与第二输送构件,以及d)用第一输送构件将第一基板输送到装载锁定室。 在步骤a)和步骤b)之间执行步骤c)和d)。