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1. 发明授权

US08614500B2 Film forming apparatus, film forming method, and semiconductor device 有权
标题翻译：成膜装置，成膜方法和半导体装置
公开(公告)号：US08614500B2
公开(公告)日：2013-12-24
申请号：US13048612
申请日：2011-03-15
申请人： Tsuyoshi Sato , Hiroyasu Kondo , Naoaki Sakurai , Katsuyuki Soeda , Kenichi Ooshiro , Shuichi Kimura
发明人： Tsuyoshi Sato , Hiroyasu Kondo , Naoaki Sakurai , Katsuyuki Soeda , Kenichi Ooshiro , Shuichi Kimura
IPC分类号： H01L23/58
CPC分类号： H01L21/6715 , B05D1/005 , B05D3/0486 , G03F7/162 , H01L21/67253
摘要： According one embodiment, a film forming apparatus includes a stage, a coating section, a vapor supply section, a blower section, and a controller. On the stage, an coating target is placed. The coating section applies a material to a predetermined region on the coating target placed on the stage to form a coating film. The vapor supply section generates solvent vapor capable of dissolving the coating film. The blower section blows the solvent vapor generated by the vapor supply section onto the coating film on the coating target placed on the stage. The controller controls an amount of the solvent vapor to be blown by the blower section so that: the coating film is dissolved; viscosity in a part of the coating film on a surface layer side is lower than that in a part thereof on the coating target side; and the viscosity in the part on the surface layer side and the viscosity of the coating target side take such values that prevent the coating film on the coating target from spreading.
摘要翻译：根据一个实施例，一种成膜装置包括载物台，涂布部分，蒸气供应部分，鼓风机部分和控制器。在舞台上放置涂层目标。涂布部分将材料施加到放置在载物台上的涂布靶上的预定区域上以形成涂膜。蒸气供给部产生能够溶解涂膜的溶剂蒸气。鼓风机部分将由蒸汽供应部分产生的溶剂蒸气吹到放置在载物台上的涂覆靶上的涂膜上。控制器控制由鼓风机部分吹送的溶剂蒸气的量，使得涂膜溶解; 表面层侧的一部分涂膜的粘度比涂布目标侧的一部分的粘度低; 并且表面层侧的部分中的粘度和涂布目标侧的粘度取得防止涂布靶上的涂膜扩散的值。

2. 发明申请

US20120067847A1 APPARATUS AND METHOD OF PROCESSING SUBSTRATE 审中-公开
标题翻译：装置和处理基板的方法
公开(公告)号：US20120067847A1
公开(公告)日：2012-03-22
申请号：US13223555
申请日：2011-09-01
申请人： Naoaki Sakurai , Hideaki Hirabayashi
发明人： Naoaki Sakurai , Hideaki Hirabayashi
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： H01L21/67248 , H01L21/31111 , H01L21/6708 , H01L21/67109
摘要： According to one embodiment, an apparatus of processing a substrate includes a treatment chamber, a holder, a feed device, and a temperature control device. The holder is provided in the treatment chamber and is configured to rotatably hold the substrate. The feed device includes a nozzle configured to eject an etching solution to a surface of the substrate held by the holder. The temperature control device includes first and second devices, and a controller. The first device is configured to heat and/or cool an atmosphere inside the treatment chamber. The second device is configured to heat and/or cool the etching solution. The controller is configured to control operation of the first and second devices such that a temperature of the atmosphere is higher than that of the etching solution in the nozzle and that difference between the temperature of the atmosphere and that of the etching solution is maintained constant.
摘要翻译：根据一个实施例，处理基板的装置包括处理室，保持器，进给装置和温度控制装置。保持器设置在处理室中并且构造成可旋转地保持基板。进料装置包括喷嘴，该喷嘴构造成将蚀刻溶液喷射到由保持器保持的基板的表面上。温度控制装置包括第一和第二装置以及控制器。第一装置被配置为加热和/或冷却处理室内的气氛。第二装置被配置为加热和/或冷却蚀刻溶液。控制器被配置为控制第一和第二装置的操作，使得气氛的温度高于喷嘴中的蚀刻溶液的温度，并且气氛的温度与蚀刻溶液的温度之间的差保持恒定。

3. 发明申请

US20090201352A1 INK JET SYSTEM AND METHOD FOR REMOVING AIR BUBBLES INSIDE OF AN INK JET NOZZLE 有权
标题翻译：喷墨喷嘴系统和移除喷墨喷嘴内的空气泡沫的方法
公开(公告)号：US20090201352A1
公开(公告)日：2009-08-13
申请号：US12365400
申请日：2009-02-04
申请人： Naoaki Sakurai , Tsuyoshi Sato , Hiroyasu Kondo
发明人： Naoaki Sakurai , Tsuyoshi Sato , Hiroyasu Kondo
IPC分类号： B41J2/19
CPC分类号： B41J2/19 , B41J2/1707
摘要： An ink jet system according to the present invention is provided with an air bubble removing unit including: an ink jet body having a plurality of ink supply path; a nozzle plate connected to an end of the ink jet body and having a plurality of spaced nozzle holes therein; and a cap configured to cover the nozzle holes formed in the nozzle plate wherein a first ink channel space is formed continuous to the nozzle holes and the plurality of ink supply path, and a second ink channel space is formed between a recess of the cap and a surface of the nozzle plate, so that the second ink channel space and the first ink channel space are continuous through the nozzle holes.
摘要翻译：根据本发明的喷墨系统设置有气泡去除单元，其包括：具有多个供墨路径的喷墨体; 喷嘴板，其连接到喷墨体的端部并且在其中具有多个间隔开的喷嘴孔; 以及帽，其构造成覆盖形成在喷嘴板中的喷嘴孔，其中形成与喷嘴孔和多个供墨路径连续的第一墨水通道空间，并且在盖的凹部和喷嘴板的表面，使得第二墨水通道空间和第一墨水通道空间通过喷嘴孔连续。

4. 发明申请

US20090044844A1 ULTRASONIC CLEANING APPARATUS 有权
标题翻译：超声波清洗装置
公开(公告)号：US20090044844A1
公开(公告)日：2009-02-19
申请号：US12248514
申请日：2008-10-09
申请人： Naoaki SAKURAI , Hiroshi Fujita
发明人： Naoaki SAKURAI , Hiroshi Fujita
IPC分类号： B08B13/00
CPC分类号： H01L21/67051 , B08B3/12 , Y10S134/902
摘要： An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the surface, and has a curved portion on a first plane placed close to the surface, an ultrasonic transducer which is provided on a second plane placed opposite the first plane of the ultrasonic wave transmission member, and generates and applies an ultrasonic wave to a cleaning liquid on the surface through the ultrasonic wave transmission member, and a preventive portion which is provided in the ultrasonic wave transmission member, and prevents the ultrasonic wave applied to the cleaning liquid and reflected on the surface from entering the ultrasonic transducer through the ultrasonic wave transmission member.
摘要翻译：一种超声波清洗装置，其通过从超声波施加头向表面上的清洗液提供超声波来清洗表面的材料，并且清洁表面，其中超声波施加头具有设置有超声波传递部件在与表面相邻的第一平面上具有弯曲部分，设置在与超声波传播部件的第一平面相对的第二平面上的超声波换能器，并且产生并施加超声波到通过超声波传递部件在表面上清洗液体，以及设置在超声波传递部件中的防止部，防止施加到清洗液上并在表面上反射的超声波通过超声波进入超声波换能器传输部件。

5. 发明申请

US20080110473A1 Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal display 审中-公开
标题翻译：超声波洗涤装置，超声波洗涤装置，超声波洗涤法，半导体装置的制造方法以及液晶显示装置的制造方法
公开(公告)号：US20080110473A1
公开(公告)日：2008-05-15
申请号：US11976267
申请日：2007-10-23
申请人： Naoaki Sakurai , Hiroshi Fujita
发明人： Naoaki Sakurai , Hiroshi Fujita
IPC分类号： B08B3/12
CPC分类号： H01L21/67259 , B08B3/12 , H01L21/67051 , H01L21/67253 , H01L21/68
摘要： An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.
摘要翻译：一种超声波洗涤装置，其特征在于，包括通过粘合剂固定超声波振动体的超声波振动板，与所述振动板相对的超声波传递板，液体供给装置，其向限定的空间在所述振动板和所述透射板之间，以及用于从所述空间排出液体的液体排出装置。

6. 发明申请

US20050145264A1 Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal display 审中-公开
标题翻译：超声波洗涤装置，超声波洗涤装置，超声波洗涤法，半导体装置的制造方法以及液晶显示装置的制造方法
公开(公告)号：US20050145264A1
公开(公告)日：2005-07-07
申请号：US11072326
申请日：2005-03-07
申请人： Naoaki Sakurai , Hiroshi Fujita
发明人： Naoaki Sakurai , Hiroshi Fujita
IPC分类号： B05B17/06 , B05D3/12 , B08B3/12 , H01L21/00 , H01L21/304 , H01L21/68 , B08B3/10
CPC分类号： H01L21/67259 , B08B3/12 , H01L21/67051 , H01L21/67253 , H01L21/68
摘要： An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.
摘要翻译：一种超声波洗涤装置，其特征在于，包括通过粘合剂固定超声波振动体的超声波振动板，与所述振动板相对的超声波传递板，液体供给装置，其向限定的空间在所述振动板和所述透射板之间，以及用于从所述空间排出液体的液体排出装置。

7. 发明授权

US5980703A Electrolytic cell for producing acidic water and alkaline water 失效
标题翻译：用于生产酸性水和碱性水的电解槽
公开(公告)号：US5980703A
公开(公告)日：1999-11-09
申请号：US53781
申请日：1998-04-02
申请人： Kuniaki Yamada , Seiichi Anzai , Masashi Tanaka , Takayuki Shimamune , Yoshinori Nishiki , Naoaki Sakurai , Naoya Hayamizu , Hiroshi Fujita
发明人： Kuniaki Yamada , Seiichi Anzai , Masashi Tanaka , Takayuki Shimamune , Yoshinori Nishiki , Naoaki Sakurai , Naoya Hayamizu , Hiroshi Fujita
IPC分类号： C02F1/46 , C02F1/42 , C02F1/461 , C02F1/469 , C02F9/00 , C25B9/00 , C25B9/08 , C25B9/18
CPC分类号： C02F1/469 , C02F1/4618 , C02F1/42 , C02F2001/46133 , C02F2001/46142 , C02F2001/46161 , C02F2103/04 , C02F2201/46115 , C02F2201/46125 , C02F2201/46195 , C02F9/00
摘要： An electrolytic cell for producing acidic water and alkaline water is disclosed. High-purity acidic water and high-purity alkaline water can be produced in a well balanced proportion from ultrapure water which is supplied in the minimum amount necessary for producing the desired acidic and alkaline waters using the minimum amount of electricity. The electrolytic cell includes an electrolytic acidic-water production unit 3 comprising an anode chamber 6 and an auxiliary cathode chamber 7 separated therefrom by a first ion-exchange membrane 5, and an electrolytic alkaline-water production unit 4 comprising a cathode chamber 10 and an auxiliary anode chamber 9 separated therefrom by a second ion-exchange membrane 8. Separately controllable power supplies are also provided for supplying power to each of the two units. The supply amount of pure water and the amount of electricity used can be fixed according to the desired amounts of acidic and alkaline waters. Thus, wasteful use of ultrapure water and electric power can be avoided.
摘要翻译：公开了一种用于生产酸性水和碱性水的电解池。高纯度酸性水和高纯度碱性水可以以超纯水的平衡比例生产，以最少的电量生产所需的酸性和碱性水所需的最小量。电解池包括电解酸性水生产单元3，其包括由第一离子交换膜5与其隔开的阳极室6和辅助阴极室7;以及电解碱水生产单元4，其包括阴极室10和辅助阳极室9由第二离子交换膜8分离。也提供了单独可控的电源，用于向两个单元中的每一个供电。纯水的供给量和使用的电量可以根据所需量的酸性和碱性水而固定。因此，可以避免浪费使用超纯水和电力。

8. 发明授权

US08490571B2 Coater, method for manufacturing coated article, and fluid blowing unit 有权
标题翻译：涂布机，涂布制品的制造方法和流体吹送装置
公开(公告)号：US08490571B2
公开(公告)日：2013-07-23
申请号：US12528866
申请日：2008-02-27
申请人： Tsuyoshi Sato , Hiroyasu Kondo , Naoaki Sakurai , Junsei Yamabe , Katsuyuki Soeda , Hiroshi Koizumi , Shuichi Kimura , Shizuo Kinoshita
发明人： Tsuyoshi Sato , Hiroyasu Kondo , Naoaki Sakurai , Junsei Yamabe , Katsuyuki Soeda , Hiroshi Koizumi , Shuichi Kimura , Shizuo Kinoshita
IPC分类号： B05D3/00 , B05C11/00
CPC分类号： H01L21/67028 , B05D3/105 , G02F1/1303 , H01L21/6715 , H01L21/6776
摘要： A coater (1) includes: a droplet jet part (4) which ejects droplets of a first solution toward an object to be coated (2) to apply the droplets to the object to be coated (2); and a remoisturizing-drying part (6) which gives a residue of the first solution applied on the object to be coated (2) a solvent capable of dissolving the residue to form an applied body with a second solution containing the residue as a solute, and which dries the formed applied body with the second solution.
摘要翻译：涂布机（1）包括：液滴喷射部分（4），其向待涂覆物体（2）喷射第一溶液的液滴以将液滴施加到待涂覆物体（2）上; 和再次干燥部分（6），其将施加在待涂覆物体上的第一溶液的残渣（2）提供能够溶解残余物以形成施加体的溶剂，其中第二溶液含有残留物作为溶质，并且用第二溶液干燥形成的应用体。

9. 发明申请

US20120135135A1 COATING APPARATUS AND COATING METHOD 审中-公开
标题翻译：涂装和涂装方法
公开(公告)号：US20120135135A1
公开(公告)日：2012-05-31
申请号：US13365973
申请日：2012-02-03
申请人： Naoaki SAKURAI , Tsuyoshi Sato , Masakuni Ikagawa
发明人： Naoaki SAKURAI , Tsuyoshi Sato , Masakuni Ikagawa
IPC分类号： B05D5/12
CPC分类号： H05K3/125 , B05C9/08 , B05C13/02 , B41M5/0011 , B41M5/0047 , B41M5/007 , B41M7/0027 , H05K2203/013 , H05K2203/0783
摘要： In applying a coating liquid including a solute and a solvent onto a given area on a substrate so as to allow the coating liquid to be solidified on the substrate by volatizing the solvent, an atmosphere in a vicinity of a coated area of the substrate is kept under an atmosphere that reduces volatilization of the solvent until applying the coating liquid onto the given area of the substrate is finished.
摘要翻译：在将包含溶质和溶剂的涂布液涂布在基板上的给定区域上以使溶剂通过挥发溶剂使涂布液固化在基板上，保持基板的涂布区域附近的气氛在减少溶剂挥发直到将涂布液涂覆到基材的给定区域上的气氛下完成。

10. 发明申请

US20110204400A1 LIGHT EMITTING DEVICE, METHOD FOR MANUFACTURING THE SAME AND APPARATUS FOR MANUFACTURING LIGHT EMITTING DEVICE 审中-公开
标题翻译：发光装置，其制造方法和制造发光装置的装置
公开(公告)号：US20110204400A1
公开(公告)日：2011-08-25
申请号：US13026631
申请日：2011-02-14
申请人： Hiroshi Koizumi , Yasuhide Okada , Junsei Yamabe , Naoaki Sakurai
发明人： Hiroshi Koizumi , Yasuhide Okada , Junsei Yamabe , Naoaki Sakurai
IPC分类号： H01L33/58 , H01L21/66 , H01L21/00
CPC分类号： H05B33/145 , H01L33/504 , H01L2224/32245 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2933/0041 , H05B33/10 , H01L2924/00014 , H01L2924/00
摘要： According to one embodiment, a light emitting device includes a package member, a light emitting element provided in the package member, a first phosphor layer and a second phosphor layer. A first phosphor layer is provided on the light emitting element and has a first phosphor. A second phosphor layer is provided on the first phosphor layer and has a second phosphor. A luminescent efficiency of the first phosphor is higher than a luminescent efficiency of the second phosphor.
摘要翻译：根据一个实施例，发光器件包括封装构件，设置在封装构件中的发光元件，第一荧光体层和第二荧光体层。第一荧光体层设置在发光元件上并具有第一荧光体。第二荧光体层设置在第一荧光体层上并具有第二荧光体。第一荧光体的发光效率高于第二荧光体的发光效率。

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