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    • 1. 发明授权
    • System for constant field erasure in a flash EPROM
    • 闪存EPROM中的常量字段擦除系统
    • US5629893A
    • 1997-05-13
    • US634512
    • 1996-04-18
    • Yuan TangChi ChangJames C. Yu
    • Yuan TangChi ChangJames C. Yu
    • G11C16/14G11C13/00
    • G11C16/14
    • A FLASH EPROM cell in accordance with the present invention is disclosed in which the erasure is accomplished under a constant electric field. The FLASH EPROM cell includes a semiconductor device including a source, a drain and a gate and a constant current circuit coupled to the source. The constant current circuit ensures that a constant field is applied to the tunneling oxide of the FLASH EPROM cell during erasure thereof. In so doing, the FLASH EPROM cell can be erased with a minimum of stress to the device. In addition, the FLASH EPROM cell of the present invention can be used with various power supplies without affecting the characteristics thereof. Finally, through the FLASH EPROM cell of the present invention, the short channel effect associated with smaller device sizes can be substantially reduced.
    • 公开了根据本发明的闪存EPROM单元,其中擦除在恒定电场下完成。 FLASH EPROM单元包括包括源极,漏极和栅极的半导体器件以及耦合到源极的恒流电路。 恒流电路确保在其擦除期间将恒定场施加到FLASH EPROM单元的隧道氧化物。 在这样做时,可以以最小的压力擦除FLASH EPROM单元。 此外,本发明的FLASH EPROM单元可以与各种电源一起使用而不影响其特性。 最后,通过本发明的FLASH EPROM单元,可以显着地减少与较小设备尺寸相关的短信道效应。
    • 2. 发明授权
    • System for constant field erasure in a FLASH EPROM
    • FLASH EPROM中常量字段擦除的系统
    • US5805502A
    • 1998-09-08
    • US795024
    • 1997-02-04
    • Yuan TangChi ChangJames C. Yu
    • Yuan TangChi ChangJames C. Yu
    • G11C16/14G11C13/00
    • G11C16/14
    • A FLASH EPROM cell in accordance with the present invention is disclosed in which the erasure is accomplished under a constant electric field. The FLASH EPROM cell includes a semiconductor device including a source, a drain and a gate and a constant current circuit coupled to the source. The constant current circuit ensures that a constant field is applied to the tunneling oxide of the FLASH EPROM cell during erasure thereof. In so doing, the FLASH EPROM cell can be erased with a minimum of stress to the device. In addition, the FLASH EPROM cell of the present invention can be used with various power supplies without affecting the characteristics thereof. Finally, through the FLASH EPROM cell of the present invention, the short channel effect associated with smaller device sizes can be substantially reduced.
    • 公开了根据本发明的闪存EPROM单元,其中擦除在恒定电场下完成。 FLASH EPROM单元包括包括源极,漏极和栅极的半导体器件以及耦合到源极的恒流电路。 恒流电路确保在其擦除期间将恒定场施加到FLASH EPROM单元的隧道氧化物。 在这样做时,可以以最小的压力擦除FLASH EPROM单元。 此外,本发明的FLASH EPROM单元可以与各种电源一起使用而不影响其特性。 最后,通过本发明的FLASH EPROM单元,可以显着地减少与较小设备尺寸相关的短信道效应。
    • 3. 发明授权
    • Unified erase method in flash EEPROM
    • 闪存EEPROM中的统一擦除方法
    • US06172915B2
    • 2001-01-09
    • US09408705
    • 1999-09-30
    • Yuan TangJames C. YuJeffrey W. Anthony
    • Yuan TangJames C. YuJeffrey W. Anthony
    • G11C1604
    • G11C16/16G11C8/12
    • A unified erase method used in an array of flash EEPROM memory cells arranged in a plurality of sectors for performing either a single-sector, multiple-sector, or all-sector erasing operation with a reduced amount of total erase time and a uniform VT distribution as good as that of a single-sector erase operation is provided. An erase-verify operation is performed sequentially on the plurality of sectors from a first sector to a last sector beginning with a first address of each sector if its corresponding erase-on signal is not turned OFF. The current address of each sector is stored at a point where the erase-verify operation failed. An erase pulse is applied only to all sectors simultaneously that have not passed the erase-verify operation. The erase-verify operation is then repeated beginning at the current address stored. The erasing operation is terminated when the erase-on signal has been turned OFF in all sectors in the plurality of sectors.
    • 在用于执行单扇区,多扇区或全扇区擦除操作的闪存EEPROM存储器单元阵列中使用的统一擦除方法,其具有减少的总擦除时间量和均匀的VT分布 与单扇区擦除操作一样好。 如果其对应的擦除信号没有关闭,则从第一扇区到最后扇区的多个扇区中顺序执行擦除验证操作,从每个扇区的第一地址开始。 每个扇区的当前地址存储在擦除验证操作失败的点。 擦除脉冲仅对未通过擦除验证操作的所有扇区同时施加。 然后从存储的当前地址开始重复擦除验证操作。 当在多个扇区的所有扇区中已经关闭了擦除信号时,结束擦除操作。
    • 5. 发明授权
    • Unified program method and circuitry in flash EEPROM
    • 闪存EEPROM中的统一程序方法和电路
    • US06222771B1
    • 2001-04-24
    • US09494456
    • 2000-01-31
    • Yuan TangJames C. Yu
    • Yuan TangJames C. Yu
    • G11C1606
    • G11C16/3481G11C11/5628G11C16/10G11C16/3468G11C2211/5624
    • A unified program method and circuitry for performing concurrently a programming and verifying operation in an array of Flash EEPROM memory cells is provided. Each of the memory cells includes a floating gate array core transistor. A single bandgap voltage is provided which corresponds to a predetermined amount of drain current at which programming is to be terminated. A program voltage is selectively connected to at least one of the columns of array bit lines containing the array core transistor which is to be programmed. A control gate bias voltage corresponding to a programmable memory state is selectively connected to the gate of the array core transistor. A core cell current flowing through the array core transistor and the predetermined amount of drain current is compared. The program voltage is disconnected so as to terminate automatically programming of the array core transistor when the core cell current falls below the predetermined amount of drain current.
    • 提供了一种统一的程序方法和电路,用于同时执行闪存EEPROM存储单元阵列中的编程和验证操作。 每个存储单元包括浮栅阵列核心晶体管。 提供单个带隙电压,其对应于将终止编程的预定量的漏极电流。 选择性地将编程电压连接到包含待编程的阵列芯晶体管的阵列位线列中的至少一列。 对应于可编程存储器状态的控制栅极偏置电压选择性地连接到阵列核心晶体管的栅极。 比较流过阵列核心晶体管的核心单元电流和预定量的漏极电流。 程序电压被断开,从而当核心单元电流低于预定的漏极电流量时自动编程阵列核心晶体管。
    • 8. 发明授权
    • Method for decreasing the discharge time of a flash EPROM cell
    • 降低闪速EPROM单元的放电时间的方法
    • US5596531A
    • 1997-01-21
    • US450167
    • 1995-05-25
    • David K. Y. LiuMing S. KwanChi ChangSameer HaddadYuan Tang
    • David K. Y. LiuMing S. KwanChi ChangSameer HaddadYuan Tang
    • G11C16/14G11C7/00
    • G11C16/14
    • The present invention presents methods for reducing the discharge time of a Flash EPROM cell. In one aspect, a method includes the steps of forcing an ultraviolet voltage threshold, UVV.sub.t, below a discharge threshold voltage, V.sub.t. The method further comprises reducing the UVV.sub.t to about 0 V. Further, the method further comprises the step of reducing a core cell implant of a p-type dopant into a substrate of the cell. In a further aspect, a method for decreasing the discharge time includes the steps of providing a core cell implant of a p-type dopant into a surface of a substrate of the cell, and providing a surface doping of an n-type dopant into the core of the substrate, where the core implant reduces punchthrough and the surface doping of an n-type dopant reduces V.sub.t in the cell. In yet another aspect, a method for decreasing a discharge time of a Flash EPROM cell while reducing punchthrough includes the steps of providing a high energy core cell implant of a p type dopant into a substrate of the cell, wherein the core has a doping concentration profile with a low dopant concentration at a surface of the core to reduce UVV.sub.t and a high dopant concentration at lower than the surface to reduce punchthrough.
    • 本发明提出了减少闪存EPROM单元的放电时间的方法。 在一个方面,一种方法包括以下步骤:将紫外线电压阈值UVVt强制在放电阈值电压Vt以下,该方法还包括将UVVt降低到约0V。此外,该方法还包括如下步骤: 将p型掺杂剂细胞注入细胞的底物。 在另一方面,一种减少放电时间的方法包括以下步骤:将p型掺杂剂的核心单元注入提供到电池的衬底的表面中,并且向n型掺杂剂表面掺杂 衬底的芯部,其中芯体植入物减少穿透并且n型掺杂剂的表面掺杂减小了电池中的Vt。 在另一方面,一种减少穿透时减少闪存EPROM单元的放电时间的方法包括以下步骤:将ap型掺杂剂的高能核心单元注入提供到电池的衬底中,其中芯具有掺杂浓度分布 在芯的表面处具有低掺杂剂浓度以降低UVVt,并且在低于表面的情况下具有高掺杂剂浓度以减少穿透。
    • 9. 发明授权
    • Sensing scheme of flash EEPROM
    • 闪存EEPROM的检测方案
    • US06490203B1
    • 2002-12-03
    • US09863697
    • 2001-05-24
    • Yuan Tang
    • Yuan Tang
    • G11C1604
    • G11C16/345G11C16/28G11C16/3409G11C16/3436G11C16/3445G11C16/3459
    • There is provided a reading circuit and method for performing program verify, erase verify, and over-erase-correction verify modes of operations on a selected memory core cell in an array of Flash EEPROM memory core cells. A fixed control gate bias voltage is applied to the control gate of a core cell transistor whose state is to be verified for generating a core cell drain current. Varied control gate bias voltages are applied to the control gate of a single reference cell transistor for generating different reference currents corresponding to predetermined modes of operations. In a second embodiment, the different reference currents are generated from a current source.
    • 提供了一种用于在闪存EEPROM存储器核心单元阵列中的选定的存储器核心单元上执行程序验证,擦除验证和过擦除校正验证模式的读取电路和方法。 将固定的控制栅极偏置电压施加到其状态将被验证以产生核心单元漏极电流的核心单元晶体管的控制栅极。 各种控制栅极偏置电压被施加到单个参考单元晶体管的控制栅极,用于产生对应于预定操作模式的不同参考电流。 在第二实施例中,从电流源产生不同的参考电流。